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    • 2. 发明授权
    • Forming patterned thin film metal layers
    • 形成图案化的薄膜金属层
    • US06770549B2
    • 2004-08-03
    • US10141362
    • 2002-05-08
    • Zhenan BaoPeter Kian-Hoon HoTakao Someya
    • Zhenan BaoPeter Kian-Hoon HoTakao Someya
    • H01L2120
    • H01L21/76838H01L21/288H01L51/0021H01L51/0024H01L51/0097H01L51/0512
    • The specification describes a pattern transfer technique for forming patterns of thin films of high resolution over large areas. It involves forming a pattern layer on a transfer substrate, patterning the pattern layer while on the transfer substrate, then contacting the transfer substrate with the receiving substrate. The surface of the receiving substrate is treated to activate the surface thereby improving adhesion of the transfer pattern to the receiving substrate. The activation treatment involves forming a layer of metal particles on the surface of the receiving substrate. The pattern layer is preferably of the same metal, or a similar metal or alloy, and is transferred from the transfer substrate to the receiving substrate by metallurgical bonding. The method of the invention is particularly useful for printing metal conductor patterns (metalization), and device features, on flexible polymer substrates in, for example, thin film transistor (TFT) technology.
    • 本说明书描述了用于在大面积上形成高分辨率薄膜图案的图案转印技术。 它涉及在转移基板上形成图案层,在转印衬底上图案化图案层,然后使转印衬底与接收衬底接触。 处理接收基板的表面以激活表面,从而改善转印图案对接收基板的粘附。 活化处理包括在接收基材的表面上形成一层金属颗粒。 图案层优选为相同的金属或类似的金属或合金,并且通过冶金结合从转印基板转移到接收基板。本发明的方法特别适用于印刷金属导体图案(金属化)和 在诸如薄膜晶体管(TFT)技术的柔性聚合物基板上的器件特征。
    • 6. 发明申请
    • DUAL-GATE TRANSISTORS
    • 双门极晶体管
    • US20120154025A1
    • 2012-06-21
    • US13345038
    • 2012-01-06
    • Lay-Lay CHUAPeter Kian-Hoon HoRichard Henry Friend
    • Lay-Lay CHUAPeter Kian-Hoon HoRichard Henry Friend
    • G05F3/02
    • H01L51/0508H01L27/283H01L51/0512H01L51/0554
    • A field effect transistor device comprising: a source electrode; a drain electrode; a semiconductive region comprising an organic semiconductor material and defining a channel of the device between the source electrode and the drain electrode; a first gate structure comprising a first gate electrode and a first dielectric region located between the first gate electrode and the semiconductive region; and a second gate structure comprising a second gate electrode and a second dielectric region located between the second gate electrode and the semiconductive region; whereby the conductance of the semiconductor region in the channel can be influenced by potentials applied separately or to both the first gate electrode and the second gate electrode.
    • 一种场效应晶体管器件,包括:源电极; 漏电极; 半导体区域,包括有机半导体材料,并且限定所述源电极和所述漏电极之间的所述器件的沟道; 第一栅极结构,包括位于第一栅极电极和半导体区域之间的第一栅极电极和第一电介质区域; 以及第二栅极结构,包括位于所述第二栅极电极和所述半导体区域之间的第二栅电极和第二电介质区域; 由此沟道中的半导体区域的电导可以受单独施加的电位或第一栅极电极和第二栅极电极的影响。