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1. 发明申请

WO2010009807A8 ACTUATOR AND PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：执行器和投影曝光装置
公开(公告)号：WO2010009807A8
公开(公告)日：2010-04-22
申请号：PCT/EP2009004892
申请日：2009-07-07
申请人： ZEISS CARL SMT AG , WEBER ULRICH , HEMBACHER STEFAN , SCHOEPPACH ARMIN
发明人： WEBER ULRICH , HEMBACHER STEFAN , SCHOEPPACH ARMIN
IPC分类号： G03F7/20 , H01L41/09
CPC分类号： G03F7/70141 , F16H21/44 , G03F7/70258 , G03F7/70825 , H02N1/002 , H02N2/023 , Y10T74/18992
摘要： The actuator (1) according to the invention comprises a housing (2) and a rotor (3) that can be moved in relation to the housing (2) in the effective direction of the actuator, wherein the actuator (1) comprises an advancing unit that is connected to the rotor (3) at least part of the time. The advancing unit comprises at least one deformation unit (6) and at least one deformer (5) for deforming the deformation unit (6). The at least one deformer (5) is suited to deform the deformation unit (6) perpendicular to the effective direction of the actuator (1) such that the total length of the deformation unit (6) changes in the effective direction as a result of the deformation. The invention further relates to a projection exposure system (310) for semiconductor lithography comprising an actuator (1) according to the invention, and to a method for operating an actuator (1) according to the invention.
摘要翻译：根据本发明（1）的致动器具有一个壳体（2）和在所述致动器可动流道（3）的有效方向的相对于所述壳体（2），其中，所述致动器（1）包括进给单元，其至少暂时与该转子（3）通信。馈送单元示出用于变形单元（6）的变形的至少一个变形单元（6）和至少一个变形器（5）; 所述至少一个变形器（5）适于在垂直于（1），使得所述变形单元（6）的在有效方向的总长度变化作为变形的结果，致动器的动作方向变形变形单元（6）。此外，本发明涉及具有根据本发明的致动器（1）的用于半导体光刻的投影曝光设备（310）以及根据本发明的用于操作致动器（1）的方法。

2. 发明申请

WO2008064859A3 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS 审中-公开
标题翻译：具有可更换，可调节的校正装置的光学系统，用于减少图像错误
公开(公告)号：WO2008064859A3
公开(公告)日：2008-08-21
申请号：PCT/EP2007010286
申请日：2007-11-27
申请人： ZEISS CARL SMT AG , XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
发明人： XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
IPC分类号： G03F7/20 , G02B7/14
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator (14) for reducing image aberrations, wherein the manipulator (14) contains at least one optical element (8) which can be manipulated by means of at least one actuator (13), and wherein the manipulator (14) is formed in changeable fashion together with an actuator (13).
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光设备，包括至少一个用于减少像差的操纵器（14），其中操纵器（14）包含至少一个光学元件（8），该光学元件可以通过至少一个致动器（13），并且其中所述操纵器（14）与致动器（13）一起以可变方式形成。

3. 发明申请

WO2007017013A2 ARRANGEMENT FOR MOUNTING AN OPTICAL COMPONENT 审中-公开
标题翻译：安排用于存储的光学元件的
公开(公告)号：WO2007017013A2
公开(公告)日：2007-02-15
申请号：PCT/EP2006006353
申请日：2006-06-30
申请人： ZEISS CARL SMT AG , SCHOEPPACH ARMIN , ZENGERLING CHRISTIAN
发明人： SCHOEPPACH ARMIN , ZENGERLING CHRISTIAN
IPC分类号： G02B7/02 , G03F7/20
CPC分类号： G03F7/70825 , G02B7/004 , G02B7/023 , G02B7/1824
摘要： The invention relates to an arrangement for mounting an optical element (18, 21) having an outer peripheral area, particularly a lens or a mirror, relative to a support (6) via at least three coupling locations (17) located on the outer peripheral area of the optical element (18, 21). The optical element (18, 21) is held in a non-positive manner via the coupling locations (17) in at least one direction by means of elastic elements (14, 15, 16), these elastic elements for each coupling location (17) being located in a bearing device (1) with a supporting body (2). The bearing devices (1) hold the optical element in a statically appointed manner on the support (6).
摘要翻译：用于安装的布置的具有光学元件（18，21），特别是透镜或经由至少三个反射镜，相对于载体（6）上的光学元件（18，21）的外周部设置连接点（17）的外周区域。由弹性的弹性元件的光学元件（18，21）关于在至少一个方向上的铰接点（17）（14，15，16）持有的非正，其中，在轴承装置中的各铰接点（17）的弹性元件（1 ）（具有载体本体2）的位置。轴承装置（1）保持光元件的第（6）支持静态地确定。

4. 发明申请

WO2005054953A3 HOLDING DEVICE FOR AN OPTICAL ELEMENT IN AN OBJECTIVE 审中-公开
标题翻译：用于目标的光学元件的保持装置
公开(公告)号：WO2005054953A3
公开(公告)日：2006-01-05
申请号：PCT/EP2004013228
申请日：2004-11-22
申请人： ZEISS CARL SMT AG , ASML NETHERLANDS BV , GELLRICH BERNHARD , WURMBRAND ANDREAS , KUGLER JENS , SCHOEPPACH ARMIN , ZENGERLING CHRISTIAN , BRUYNOOGHE STEPHANE
发明人： GELLRICH BERNHARD , WURMBRAND ANDREAS , KUGLER JENS , SCHOEPPACH ARMIN , ZENGERLING CHRISTIAN , BRUYNOOGHE STEPHANE
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： A holding device (6) for an optical element (5) in an objective (1) has a mount (4) that is connected to the objective (1) , on the one hand, and at least indirectly to the optical element (5), on the other hand. Arranged between the mount (4) and the optical element (5) is a reinforcing element (8) whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element (5).
摘要翻译：一种用于物镜（1）中的光学元件（5）的保持装置（6）具有安装件（4），一方面连接到物镜（1），并且至少间接地连接到光学元件（5）），另一方面。安装件（4）和光学元件（5）之间的布置是其热膨胀系数基本上对应于光学元件（5）的热膨胀系数的增强元件（8）。

5. 发明申请

WO2010007036A3 OPTICAL DEVICE HAVING A DEFORMABLE OPTICAL ELEMENT 审中-公开
标题翻译：可变形光学元件的光学设备
公开(公告)号：WO2010007036A3
公开(公告)日：2010-06-10
申请号：PCT/EP2009058943
申请日：2009-07-14
申请人： ZEISS CARL SMT AG , SCHOEPPACH ARMIN , STEINBACH MANFRED
发明人： SCHOEPPACH ARMIN , STEINBACH MANFRED
IPC分类号： G03F7/20 , G02B7/02
CPC分类号： G03F7/7015 , G02B26/06 , G02B27/0068 , G03F7/70266 , G03F7/70825
摘要： The present invention relates to an optical device (108), in particular for microlithography, having an optical module (109) and a supporting structure (110), wherein the supporting structure supports the optical module. The optical module has an optical element (107.1) and a holding device (111), wherein the holding device holds the optical element. The holding device has a deformation device (114) with a plurality of active deformation units (114.1), which make contact with the optical element and are designed to apply a defined deformation to the optical element. The optical module is attached to the supporting structure such that it can be replaced.
摘要翻译：本发明涉及一种光学设备（108），特别是用于微光刻，包括：光学模块（109）和支撑结构（110），其中，所述支撑结构支撑的光模块。光学模块包括光学元件（107.1）和保持装置（111），其中，所述保持装置保持所述光学元件。所述保持装置包括具有多个活性变形单元（114.1），它们是到所述光学元件接触，并且被配置以赋予所限定的光学元件的变形的变形装置（114）。光模块更换地安装在支撑结构上。

6. 发明申请

WO2010037732A3 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS 审中-公开
标题翻译：投影曝光装置用于生产半导体元件的微电影
公开(公告)号：WO2010037732A3
公开(公告)日：2010-06-10
申请号：PCT/EP2009062584
申请日：2009-09-29
申请人： ZEISS CARL SMT AG , FISCHER JUERGEN , SCHOEPPACH ARMIN , ORTH MATTHIAS , MUEHLBERGER NORBERT , RASSEL THORSTEN , WERBER ARMIN , HUBER JUERGEN
发明人： FISCHER JUERGEN , SCHOEPPACH ARMIN , ORTH MATTHIAS , MUEHLBERGER NORBERT , RASSEL THORSTEN , WERBER ARMIN , HUBER JUERGEN
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： The invention relates to a projection exposure apparatus (1) for microlithography for the production of semiconductor components, in which at least one optical assembly (9a) with at least one optical element (8a) which can be actuated in a mechanically controlled manner is mounted in a structure (6), wherein, for carrying out the mechanical actuation, a control signal transmission device (11) and/or an energy transmission device (12) are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly (9a) at least during specific operating states of the projection exposure apparatus (1).
摘要翻译：本发明涉及一种用于生产半导体部件的微光刻的投影曝光装置（1），其中至少一个光学组件（9a）具有可以以机械控制的方式被致动的至少一个光学元件（8a）在结构（6）中，为了进行机械致动，提供了控制信号传输装置（11）和/或能量传输装置（12），其将无寄生机械效应引入光学组件（9a）至少在投影曝光设备（1）的特定操作状态期间。

7. 发明申请

WO2008049574A3 METHOD AND APPARATUS FOR CONNECTING AN OPTICAL ELEMENT TO A MOUNT 审中-公开
标题翻译：用于连接具有一种版本的光学元件的方法和设备
公开(公告)号：WO2008049574A3
公开(公告)日：2008-07-03
申请号：PCT/EP2007009177
申请日：2007-10-23
申请人： ZEISS CARL SMT AG , SCHOEPPACH ARMIN , RAU JOHANNES , FEDOSENKO GENNADY , GORKHOVER LEONID , KLOSE GERHARD , WIESNER STEFAN , TREFZ HANS-JOACHIM , WIDMANN MICHAEL , BINGEL ULRICH , EKSTEIN CLAUDIA , ALBRECHT GUENTER
发明人： SCHOEPPACH ARMIN , RAU JOHANNES , FEDOSENKO GENNADY , GORKHOVER LEONID , KLOSE GERHARD , WIESNER STEFAN , TREFZ HANS-JOACHIM , WIDMANN MICHAEL , BINGEL ULRICH , EKSTEIN CLAUDIA , ALBRECHT GUENTER
IPC分类号： C03C27/04 , B23K1/005 , G02B7/02 , G03F7/20
CPC分类号： B23K1/0056 , B23K1/0008 , G02B7/02 , G02B7/025 , G03F7/70825 , Y10T156/10
摘要： The invention relates to a method and an apparatus for connecting an optical element (1) to a mount (2) at at least one connecting point (7) in an integral manner. Here, the optical element (1) and the mount (2) are positioned prior to connection so as to avoid relative movements during the connection to one another using a contact element (3) which is designed as part of the mount (2). As an alternative or in addition, it is possible for a metallic coating which is integrally connected to the mount (2) first to be applied to the optical element (1).
摘要翻译：本发明涉及一种用于在至少一个连接点（7）处将光学元件（1）材料连接到保持器（2）的方法和装置。在这种情况下，所述光学元件（1）和插座（2）之前将结合到由一个支撑元件（3）被定位，其被形成为插座（2）的一部分的方式彼此粘合期间避免相对运动。可替换地或附加地，首先，可以将金属层施加到以材料锁定方式连接到插座（2）的光学元件（1）。

8. 发明申请

WO2008037496A2 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS WITH IMPROVED IMAGING PROPERTIES AND METHOD FOR IMPROVING THE IMAGING PROPERTIES OF THE PROJECTION OBJECTIVE 审中-公开
标题翻译：具有改进成像性能的微型成像设备的投影目标和用于改善投影目标的成像性质的方法
公开(公告)号：WO2008037496A2
公开(公告)日：2008-04-03
申请号：PCT/EP2007008476
申请日：2007-09-28
申请人： ZEISS CARL SMT AG , BECKENBACH MARIELLA , RIEF KLAUS , BERTELE ANDREAS , SIGEL BENJAMIN , BLEIDISTEL SASCHA , HUMMEL WOLFGANG , FROMMEYER ANDREAS , GRUNER TORALF , SCHWAER JOCHEN , SCHWAER BAERBEL , SCHLETTERER THOMAS , HOEGELE ARTUR , SCHOEPPACH ARMIN
发明人： BECKENBACH MARIELLA , RIEF KLAUS , BERTELE ANDREAS , SIGEL BENJAMIN , BLEIDISTEL SASCHA , HUMMEL WOLFGANG , FROMMEYER ANDREAS , GRUNER TORALF , SCHWAER JOCHEN , SCHWAER BAERBEL , SCHLETTERER THOMAS , HOEGELE ARTUR , SCHOEPPACH ARMIN
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for microlithography comprises a plurality of lenses (32, 34, 36, 38, 42) which in each case have a local optical axis (40), a first manipulator (60) with a first actuator (46, 72) and at least one second actuator (48, 74) being assigned to at least one first lens (42) from the plurality of lenses (32, 34, 36, 38). A first force input and/or moment input can be realized by means of the first actuator (46, 72) and a second force input and/or moment input can be realized by means of the second actuator (48, 74), wherein the first force input and/or moment input and the second force input and/or moment input differ with regard to at least one of the parameters: intensity of the force and/or moment input, direction of the force input relative to the local optical axis (40), direction of the moment input relative to a periphery of the first lens (42).
摘要翻译：用于微光刻的投影物镜包括多个分别具有局部光轴（40）的透镜（32,34,36,38,42），具有第一致动器（46,72）的第一机械手（60）和至少一个第二致动器（48,74）被分配给来自所述多个透镜（32,34,36,38）中的至少一个第一透镜（42）。借助第一致动器（46,72）可以实现第一力输入和/或力矩输入，并且借助第二致动器（48,74）可以实现第二力输入和/或力矩输入，其中，第一力输入和/或力矩输入以及第二力输入和/或力矩输入相对于至少一个参数不同：力和/或力矩输入的强度，力输入相对于局部光轴的方向（40），所述力矩输入相对于所述第一透镜（42）的周边的方向。

9. 发明专利

DE102007058158A1 Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner 未知
公开(公告)号：DE102007058158A1
公开(公告)日：2008-06-05
申请号：DE102007058158
申请日：2007-11-30
申请人： ZEISS CARL SMT AG
发明人： XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
IPC分类号： G02B7/00 , G02B7/02 , G03F7/20
摘要： The system has an optical element e.g. lens (8), manipulated by an actuator (13) such as hydraulic or piezoactuator, of a manipulator (14) e.g. Alvarez-element. The manipulator (14) is designed in an exchangeable manner. The optical element has an aspherically formed surface, which is realized such that a deformation of a wave front spreading in the system is developed during shifting, twisting and/or a tilting of surfaces of the optical element. The manipulator is positioned in direction of an optical axis or orthogonal to the optical axis of the system.

10. 发明专利

DE102006050653A1 Method for connecting an optical element with a fitting on at least one connecting site used in semiconductor lithography comprises indirectly or directly positioning the element and the fitting during connection using a support element 未知
公开(公告)号：DE102006050653A1
公开(公告)日：2008-04-30
申请号：DE102006050653
申请日：2006-10-24
申请人： ZEISS CARL SMT AG
发明人： SCHOEPPACH ARMIN , RAU JOHANNES , FEDOSENKO GENNADY , GORKHOVER LEONID , KLOSE GERD , WIESNER STEFAN , TREFZ HANS-JOCHAIM , WIDMANN MICHAEL , BINGEL ULRICH , EKSTEIN CLAUDIA , ALBRECHT GUENTER
IPC分类号： G02B7/00 , B23K1/005 , B23K26/02 , B23K26/20 , B23K31/02 , G02B27/62
摘要： Method for connecting an optical element (1) with a fitting (2) on at least one connecting site comprises indirectly or directly positioning the element and the fitting during connection using a support element (3) which is formed as part of the fitting. Independent claims are also included for the following: (1) Device comprising an optical element positioned in a fitting; and (2) Optical device with a fitting and an optical element arranged in the fitting using connection to at least one connecting site.

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