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1. 发明申请

WO2008064859A3 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS 审中-公开
标题翻译：具有可更换，可调节的校正装置的光学系统，用于减少图像错误
公开(公告)号：WO2008064859A3
公开(公告)日：2008-08-21
申请号：PCT/EP2007010286
申请日：2007-11-27
申请人： ZEISS CARL SMT AG , XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
发明人： XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
IPC分类号： G03F7/20 , G02B7/14
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator (14) for reducing image aberrations, wherein the manipulator (14) contains at least one optical element (8) which can be manipulated by means of at least one actuator (13), and wherein the manipulator (14) is formed in changeable fashion together with an actuator (13).
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光设备，包括至少一个用于减少像差的操纵器（14），其中操纵器（14）包含至少一个光学元件（8），该光学元件可以通过至少一个致动器（13），并且其中所述操纵器（14）与致动器（13）一起以可变方式形成。

2. 发明申请

WO2010009807A8 ACTUATOR AND PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：执行器和投影曝光装置
公开(公告)号：WO2010009807A8
公开(公告)日：2010-04-22
申请号：PCT/EP2009004892
申请日：2009-07-07
申请人： ZEISS CARL SMT AG , WEBER ULRICH , HEMBACHER STEFAN , SCHOEPPACH ARMIN
发明人： WEBER ULRICH , HEMBACHER STEFAN , SCHOEPPACH ARMIN
IPC分类号： G03F7/20 , H01L41/09
CPC分类号： G03F7/70141 , F16H21/44 , G03F7/70258 , G03F7/70825 , H02N1/002 , H02N2/023 , Y10T74/18992
摘要： The actuator (1) according to the invention comprises a housing (2) and a rotor (3) that can be moved in relation to the housing (2) in the effective direction of the actuator, wherein the actuator (1) comprises an advancing unit that is connected to the rotor (3) at least part of the time. The advancing unit comprises at least one deformation unit (6) and at least one deformer (5) for deforming the deformation unit (6). The at least one deformer (5) is suited to deform the deformation unit (6) perpendicular to the effective direction of the actuator (1) such that the total length of the deformation unit (6) changes in the effective direction as a result of the deformation. The invention further relates to a projection exposure system (310) for semiconductor lithography comprising an actuator (1) according to the invention, and to a method for operating an actuator (1) according to the invention.
摘要翻译：根据本发明（1）的致动器具有一个壳体（2）和在所述致动器可动流道（3）的有效方向的相对于所述壳体（2），其中，所述致动器（1）包括进给单元，其至少暂时与该转子（3）通信。馈送单元示出用于变形单元（6）的变形的至少一个变形单元（6）和至少一个变形器（5）; 所述至少一个变形器（5）适于在垂直于（1），使得所述变形单元（6）的在有效方向的总长度变化作为变形的结果，致动器的动作方向变形变形单元（6）。此外，本发明涉及具有根据本发明的致动器（1）的用于半导体光刻的投影曝光设备（310）以及根据本发明的用于操作致动器（1）的方法。

3. 发明专利

DE102007058158A1 Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner 未知
公开(公告)号：DE102007058158A1
公开(公告)日：2008-06-05
申请号：DE102007058158
申请日：2007-11-30
申请人： ZEISS CARL SMT AG
发明人： XALTER STEFAN , MEYER PETER , LIMBACH GUIDO , SORG FRANZ , SCHOEPPACH ARMIN , WEBER ULRICH , LOERING ULRICH , HELLWEG DIRK , KUGLER JENS , GELLRICH BERNHARD , HEMBACHER STEFAN , GEUPPERT BERNHARD , GOEHNERMEIER AKSEL
IPC分类号： G02B7/00 , G02B7/02 , G03F7/20
摘要： The system has an optical element e.g. lens (8), manipulated by an actuator (13) such as hydraulic or piezoactuator, of a manipulator (14) e.g. Alvarez-element. The manipulator (14) is designed in an exchangeable manner. The optical element has an aspherically formed surface, which is realized such that a deformation of a wave front spreading in the system is developed during shifting, twisting and/or a tilting of surfaces of the optical element. The manipulator is positioned in direction of an optical axis or orthogonal to the optical axis of the system.

4. 发明专利

DE102006023876A1 未知
公开(公告)号：DE102006023876A1
公开(公告)日：2007-11-22
申请号：DE102006023876
申请日：2006-05-19
申请人： ZEISS CARL SMT AG
发明人： HEMBACHER STEFAN , GELLRICH BERNHARD , KUGLER JENS
IPC分类号： G03F7/20 , G02B7/00
摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

5. 发明专利

DE102007034652A1 未知
公开(公告)号：DE102007034652A1
公开(公告)日：2009-01-29
申请号：DE102007034652
申请日：2007-07-25
申请人： ZEISS CARL SMT AG
发明人： HEMBACHER STEFAN , HAUF MARKUS
IPC分类号： G03F7/20

6. 发明专利

DE102006021797A1 未知
公开(公告)号：DE102006021797A1
公开(公告)日：2007-11-15
申请号：DE102006021797
申请日：2006-05-09
申请人： ZEISS CARL SMT AG
发明人： GELLRICH BERNHARD , ITTNER THOMAS , KUGLER JENS , HEMBACHER STEFAN
IPC分类号： G03F7/20

7. 发明专利

DE102008034285A1 未知
公开(公告)号：DE102008034285A1
公开(公告)日：2010-02-04
申请号：DE102008034285
申请日：2008-07-22
申请人： ZEISS CARL SMT AG
发明人： WEBER ULRICH , HEMBACHER STEFAN , SCHOEPPACH ARMIN
IPC分类号： G02B7/00 , G02B7/10 , G03F7/20

8. 发明专利

DE102008000709B3 未知
公开(公告)号：DE102008000709B3
公开(公告)日：2009-11-26
申请号：DE102008000709
申请日：2008-03-17
申请人： ZEISS CARL SMT AG
发明人： HEMBACHER STEFAN
IPC分类号： G03F7/20 , B08B7/00

9. 发明专利

DE102008044365A1 Projection exposure system for manufacturing semiconductor component i.e. computer chip, has changing unit for changing optical assembly that is exchangeably formed, and bearing unit reducing deformations of optical element caused by holder 未知
公开(公告)号：DE102008044365A1
公开(公告)日：2009-06-25
申请号：DE102008044365
申请日：2008-12-04
申请人： ZEISS CARL SMT AG
发明人： SCHOEPPACH ARMIN , HEMBACHER STEFAN , LIMBACH GUIDO , PETASCH THOMAS , KWAN YIM-BUN-PATRICK , KULITSKY VIKTOR , BRUSCH CHRISTIAN , WEBER ULRICH , XALTER STEFAN , VOGT MARTIN , SCHWEIZER BRUNO
IPC分类号： G03F7/20 , G02B7/00
摘要： The system has an optical assembly held within a housing (2) by a bearing unit (4), and a changing unit for changing the optical assembly, where the optical assembly is exchangeably formed. The bearing unit reduces deformations of an optical element caused by a holder. The optical assembly has a support (1) for the optical element, where the bearing unit is formed as a part of the support. The bearing unit has a rotatable and formfit ball (41) supported in a recess of the support, where the ball is pressed against a support element (5) connected with the housing by a clamping device (3).

10. 发明专利

DE102006034755A1 未知
公开(公告)号：DE102006034755A1
公开(公告)日：2008-01-31
申请号：DE102006034755
申请日：2006-07-24
申请人： ZEISS CARL SMT AG
发明人： SCHRIEVER MARTIN , WEGMANN ULRICH , HEMBACHER STEFAN , GEUPPERT BERNHARD
IPC分类号： G03F7/20
摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.

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