专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2010037732A2 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS 审中-公开
标题翻译：用于生产半导体元件的微刻技术的投影曝光设备
公开(公告)号：WO2010037732A2
公开(公告)日：2010-04-08
申请号：PCT/EP2009/062584
申请日：2009-09-29
申请人： CARL ZEISS SMT AG , FISCHER, Juergen , SCHOEPPACH, Armin , ORTH, Matthias , MUEHLBERGER, Norbert , RASSEL, Thorsten , WERBER, Armin , HUBER, Jürgen
发明人： FISCHER, Juergen , SCHOEPPACH, Armin , ORTH, Matthias , MUEHLBERGER, Norbert , RASSEL, Thorsten , WERBER, Armin , HUBER, Jürgen
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： The invention relates to a projection exposure apparatus (1) for microlithography for the production of semiconductor components, in which at least one optical assembly (9a) with at least one optical element (8a) which can be actuated in a mechanically controlled manner is mounted in a structure (6), wherein, for carrying out the mechanical actuation, a control signal transmission device (11) and/or an energy transmission device (12) are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly (9a) at least during specific operating states of the projection exposure apparatus (1).
摘要翻译：本发明涉及一种用于制造半导体元件的微光刻的投影曝光设备（1），其中至少一个光学组件（9a）具有至少一个光学元件（8a），该光学元件（8a）可以是以机械控制方式启动的控制信号传输装置（11）和/或能量传输装置（12）被安装在结构（6）中，其中为了执行机械致动，提供了控制信号传输装置（11）和/ s）至少在投影曝光设备（1）的特定操作状态期间，没有寄生机械效应进入光学组件（9a）。

2. 发明申请

WO2005091077A3 PROJECTION LENS OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2005091077A3
公开(公告)日：2006-04-27
申请号：PCT/EP2005000947
申请日：2005-02-01
申请人： ZEISS CARL SMT AG , FISCHER JUERGEN
发明人： FISCHER JUERGEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G03F7/70266
摘要： A projection lens of a microlithographic projection exposure system comprises a number of optical elements (15, 16, 18, 20, L1 to L4). A selected optical element (20), e.g. a mirror, can be deformed by exerting a mechanical force generated by an actuator (30, 130, 330, 430, 530). With the aid of a manipulator (26a, 26b, 26c, 126a, 126b, 226a, 226b, 326a, 326b, 326c, 426a, 426b, 426c, 526b) the spatial position of one of the optical elements and, in particular, of the deformed optical element (20) can be altered depending on the force exerted y the actuator (30; 130, 330, 430, 530). This enables tipping movements or other changes in position, which occur due to the interaction of a mounting (22a, 22b, 22c, 122a, 122b, 222a, 222b) and the forces generated by the actuator (30, 130, 330, 430, 530), to be canceled once again at least in part.
摘要翻译：微光刻投射曝光设备的投射物镜包括多个光学元件（15，16，18，20，L1至L4）的。选定的光学元件（20），例如镜，通过由致动器施加机械力（30，130，330，430，530）被产生，变形。与操纵器（26A，26B，26C，126A，126B，226A，226B，326A，326B，326C，426A，426B，426C，526B），所述光学元件的空间位置，特别是变形的光学元件的帮助下（20）来改变施加的力;根据所述由致动器（130，330，430，530 30）。以这种方式，倾斜或者在位置等变化，由于轴承的相互作用的（22A，22B，22C，122A，122B，222A，222B），并通过产生的形成在致动器力（30，130，330，430，530），至少部分地松开。

3. 发明申请

WO03085727A2 SEMICONDUCTOR CHIP COMPRISING A PROTECTIVE LAYER AND A CORRESPONDING PRODUCTION METHOD 审中-公开
标题翻译：具有保护层与法半导体芯片
公开(公告)号：WO03085727A2
公开(公告)日：2003-10-16
申请号：PCT/DE0301149
申请日：2003-04-08
申请人： INFINEON TECHNOLOGIES AG , BEYER VOLKER , FISCHER JUERGEN , HEINEMANN ERIK , MARBACH-FISCHBACH IDA
发明人： BEYER VOLKER , FISCHER JUERGEN , HEINEMANN ERIK , MARBACH-FISCHBACH IDA
IPC分类号： H01L21/56 , H01L21/60 , H01L23/31
CPC分类号： H01L24/81 , H01L21/563 , H01L23/3185 , H01L24/28 , H01L2224/05568 , H01L2224/05573 , H01L2224/16225 , H01L2224/274 , H01L2224/73203 , H01L2224/73204 , H01L2224/81801 , H01L2924/01005 , H01L2924/01011 , H01L2924/01033 , H01L2924/01052
摘要： The invention relates to the flip-chip mounting of semiconductor chips. In order to protect against mechanical stress or damage and to electrically insulate, a protective layer (7) is applied to the rear side of the semiconductor chip (2). This protective layer can also be provided on the flanks (8) of the semiconductor chip. The protective layer can be applied before starting the entire assembly process sequence or when the semiconductor is fixed upside down to a support (1).
摘要翻译：在倒装芯片安装的半导体芯片：对于抗机械应力或损坏，保护和电绝缘性，在半导体芯片（2）的背面上的保护层（7）被施加。该保护层也可以存在于半导体芯片的侧面（8）。该保护层可以在整个装配过程链之前，或者只在所述半导体芯片的固定被施加在基板1上颠倒。

4. 发明申请

WO03052511A2 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 审中-公开
标题翻译：图像设置在投影曝光系统
公开(公告)号：WO03052511A2
公开(公告)日：2003-06-26
申请号：PCT/EP0214380
申请日：2002-12-17
申请人： ZEISS CARL SEMICONDUCTOR MFG , HUMMEL WOLFGANG , FISCHER JUERGEN , AUBELE KARL-EUGEN , MERZ ERICH , RAOUL REINER , RIEF KLAUS , SCHOENGART STEFAN , NEUMAIER MARKUS , TROSSBACH BAERBEL , RASSEL THORSTEN , WEBER ULRICH , MUEHLBEYER MICHAEL , HOLDERER HUBERT , KOHL ALEXANDER , WEBER JOCHEN , LIPPERT JOHANNES
发明人： HUMMEL WOLFGANG , FISCHER JUERGEN , AUBELE KARL-EUGEN , MERZ ERICH , RAOUL REINER , RIEF KLAUS , SCHOENGART STEFAN , NEUMAIER MARKUS , TROSSBACH BAERBEL , RASSEL THORSTEN , WEBER ULRICH , MUEHLBEYER MICHAEL , HOLDERER HUBERT , KOHL ALEXANDER , WEBER JOCHEN , LIPPERT JOHANNES
IPC分类号： G02B7/02 , G03F7/20 , G03F7/207 , H01L21/027 , G03F
CPC分类号： G03F7/70258 , G03F7/70825
摘要： Disclosed is an imaging device (7) in a projection exposure facility (1) used in microlithography, comprising at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41) provided with a linear drive (11) for manipulating the position of the optical element (10, 33, 34). The linear drive (11) encompasses a driven section (14) and a non-driven section (15) which are movable towards each other along an axis (17). The two sections (14, 15) are at least temporarily connected to each other at least approximately parallel to the axis of movement (17) via functional elements (18) operable along an axis (17) and via functional elements (19) operable in one direction.
摘要翻译：在用于微光刻的投射曝光设备（1）的成像装置（7）具有用于操纵光学元件的位置的至少一个光学元件（10，33，34）和一个线性驱动器中的至少一个（11）操纵器（9，36，41）（10，33，34）。线性驱动器（11）具有一个驱动部分（14）和一非驱动部分（15），其相对于彼此在运动（17）的轴线的方向上是可移动的。部分区域（14，15）通过具有作用（17）和功能元件（19）与有效方向的轴至少大致平行于运动（17）的相关联的轴线彼此至少暂时的功能元件（18）相连接。

5. 发明申请

WO0249249A2 IMPROVEMENTS IN OR RELATING TO POINT-TO-MULTIPOINT CONNECTION ARRANGEMENTS 审中-公开
标题翻译：关于点对多点连接安排的改进或相关
公开(公告)号：WO0249249A2
公开(公告)日：2002-06-20
申请号：PCT/IB0102773
申请日：2001-12-05
申请人： MARCONI COMM GMBH , FISCHER JUERGEN , KAFFENBERGER RUEDIGER
发明人： FISCHER JUERGEN , KAFFENBERGER RUEDIGER
IPC分类号： H04J3/06 , H04L1/22 , H04L5/14 , H04Q11/00 , H04J3/16
CPC分类号： H04Q11/0062 , H04J3/0682 , H04L1/22 , H04L5/1484 , H04Q11/0067 , H04Q2011/0081
摘要： An optical point-to-multipoint connection arrangement comprises a number of ONUs connected via an optical distribution network (ODN) to an OLT containing a main CTF (CTFA) and one or more redunctant CTFs (CTFR). The CTF (CTFA) carries out ranging on at least one of the ONUs (ONUA), then CTFR requests ONUA to transmit at a given time a signal burst which it expects to receive, taking ranging into account, at time t0, but receives instead at a time t0+ delta , delta being positive or negative. CTFR then alters its own time-reference in the same direction as the delta , i.e. where delta is positive, delaying its time-reference by that amount and where delta is negative, advancing its time-reference by the same amount. The result is that, when operation is switched from the main to the redundant path, a major interruption in service is avoided.
摘要翻译：光点对多点连接装置包括通过光分配网络（ODN）连接到包含主CTF（CTFA）和一个或多个重定向CTF（CTFR）的OLT的多个ONU。 CTF（CTFA）在至少一个ONU（ONUA）上执行测距，则CTFR请求ONUA在给定时间在时间t0考虑其期望接收的信号突发，而不是接收在时间t0 + delta，δ为正或负。 CTFR然后以与增量相同的方向改变其自身的时间参考，即在δ为正的情况下，将其时间参考延迟该量，并且其中δ为负，则将其参考时间提前相同的量。结果是当操作从主机切换到冗余路径时，避免了主要的服务中断。

6. 发明申请

WO2008006403A1 METHOD, APPARATUS AND COMPUTER PROGRAM PRODUCT FOR CONTROLLING DEVICES 审中-公开
标题翻译：用于控制设备的方法，装置和计算机程序产品
公开(公告)号：WO2008006403A1
公开(公告)日：2008-01-17
申请号：PCT/EP2006/064161
申请日：2006-07-12
申请人： TELEFONAKTIEBOLAGET LM ERICSSON (PUBL) , FISCHER, Juergen
发明人： FISCHER, Juergen
IPC分类号： H04L12/24 , H04L29/06 , G06F21/00
CPC分类号： G06F21/42 , G06F21/10 , G06F21/31 , G06F21/629 , H04L41/0813 , H04L41/0866 , H04L63/061 , H04L67/125 , H04W88/02
摘要： A method of controlling an apparatus comprising a plurality of features and adapted to receive messages via a first network interface, wherein said method is implemented in a filter superposed on the top of an existing architecture of the apparatus. The method comprises the following steps: receiving network management message via said first network interface; interrogating said message in order to identify a feature said network management message relates to and filtering the received management message such that said management message is rejected if the identified feature is classified as disabled and said management message is allowed top go through if said feature is classified as enabled.
摘要翻译：一种控制包括多个特征并适于经由第一网络接口接收消息的装置的方法，其中所述方法在叠加在所述装置的现有架构的顶部上的滤波器中实现。该方法包括以下步骤：经由所述第一网络接口接收网络管理消息; 询问所述消息以便识别所述网络管理消息涉及的功能并对所接收的管理消息进行过滤，使得如果所识别的特征被分类为禁用，则所述管理消息被拒绝，并且如果所述特征被分类，则允许所述管理消息被顶层通过启用

7. 发明申请

WO2002088434A1 ALUMINIUM ELECTROPLATING FORMULATIONS 审中-公开
标题翻译：铝电镀配方
公开(公告)号：WO2002088434A1
公开(公告)日：2002-11-07
申请号：PCT/US2002/013832
申请日：2002-04-30
申请人： ALUMIPLATE INCORPORATED , FISCHER, Juergen, K., S.
发明人： FISCHER, Juergen, K., S.
IPC分类号： C25D3/44
CPC分类号： C25D3/44
摘要： Electroplating electrolyte compositions including CA•(nA1(C 3 H 7 ) 3 (2-n)A1R 3 ) where n is 0 and less than or equal to 2; C is Li, Na, K, Rb, Cs, NR' 4 , or mixtures thereof wherein R' is H, CH 3 , C 2 H 5 , C 3 H 7 , C 4 H 9 , C 5 H 11 , C 6 H 13 , C 7 H 15 , C 8 H 17 , or mixtures thereof; A is H, F, Cl, Br, or mixtures thereof; R is H, halogen, CH 3 , C 2 H 5 , C 3 H 7 , C 4 H 9 , C 5 H 11 , C 6 H 13 , C 7 H 15 , C 8 H 17 , or mixtures thereof; and an aromatic hydrocarbon, aliphatic hydrocarbon, or mixtures thereof are described. Aluminum and magnesium/aluminum electroplating compositions including C•(nA1(C 3 H 7 ) 4 (1-n)A1R 4 ) where n is 0 and less than or equal to 1, where C is a cation such as, li, Na, K, Rb, Cs, or mixtures thereof; R is H or an alkyl such as, CH 3 , C 2 H 5 , C 3 H 7 , C 4 H 9 , C 5 H 11 , C 6 H 13 , C 7 H 15 , C 8 H 17 , or mixtures thereof are also described. The aluminum and magnesium/aluminum electroplating compositions formulation can include a solvent such as, an aromatic hydrocarbon, aliphatic hydrocarbon, or mixtures thereof.
摘要翻译：包括CA·（nA1（C3H7）3（2-n）A1R3）的电镀电解质组合物，其中n为0且小于或等于2; C是Li，Na，K，Rb，Cs，NR'4或其混合物，其中R'是H，CH 3，C 2 H 5，C 3 H 7，C 4 H 9，C 5 H 11，C 6 H 13，C 7 H 15，C 8 H 17或其混合物; A是H，F，Cl，Br或其混合物; R是H，卤素，CH 3，C 2 H 5，C 3 H 7，C 4 H 9，C 5 H 11，C 6 H 13，C 7 H 15，C 8 H 17或其混合物; 和芳烃，脂族烃或其混合物。包括C·（nAl（C 3 H 7）4（1-n）AlR 4）的铝和镁/铝电镀组合物，其中n为0且小于或等于1，其中C为阳离子，例如，Li，Na，K，Rb ，Cs或其混合物; 还描述了R是H或诸如CH 3，C 2 H 5，C 3 H 7，C 4 H 9，C 5 H 11，C 6 H 13，C 7 H 15，C 8 H 17的烷基或其混合物的烷基。铝和镁/铝电镀组合物制剂可以包括溶剂如芳族烃，脂族烃或其混合物。

8. 发明申请

WO9908850A3 MOULD AND METHOD FOR MAKING A COMPOSITE PLASTIC BODY 审中-公开
标题翻译：按FORM和方法生产塑料复合体，
公开(公告)号：WO9908850A3
公开(公告)日：1999-11-18
申请号：PCT/DE9802446
申请日：1998-08-20
申请人： SIEMENS AG , ATZESDORFER ALEXANDRA , FISCHER JUERGEN , SYRI ERICH , NEUMANN KLAUS , VIDAL ULRICH , HUBER MARTIN , BLUMENAUER MICHAEL , POHL JENS , TUTSCH GUENTER
发明人： ATZESDORFER ALEXANDRA , FISCHER JUERGEN , SYRI ERICH , NEUMANN KLAUS , VIDAL ULRICH , HUBER MARTIN , BLUMENAUER MICHAEL , POHL JENS , TUTSCH GUENTER
IPC分类号： H01L21/56 , B29C45/76 , B29C33/00 , B29C45/14 , B29C45/56 , B29L31/36
CPC分类号： H01L21/565 , H01L2924/0002 , H01L2924/00
摘要： The invention concerns a mould (1; 101) having a cavity (14; 114) provided with mobile surface zones (9; 107, 109) which, in order to prevent entrapped air bubble while the material to be moulded (119) is being injected, are maintained in such a way as to provide the material to be moulded with a regular linear flow surface (120). In closed position, said surface zones (208, 209) can also divide the cavity (204) into two zones (210, 211) separated from each other. After injecting the material to be moulded (206), the surface zones (208, 209) which were at first opened are brought into closed position. A mould (301), designed for making an electrical component consisting of a box in thermosetting plastic enclosing a circuit, has a cavity (303) and an injection zone connected to the cavity (303) by a runner (305, 306). The invention is characterised in that the mould has at least two runners (305, 306) for one single cavity (303), thereby enabling to optimise the flow of the material to be moulded. Moreover, filling the cavity (303) is facilitated by shortening the circulation channels.
摘要翻译：的模具（1; 101）具有一个空腔（14; 114）具有可动表面区域（9; 107，109），其被保持，以防止空气夹杂物中的模制复合物（119）的驱动期间，使得具有均匀的成型材料流动直流峰（120）被确保。表面区域（208，209）来划分在闭合位置所述空腔（204）在两个相互独立的区域（210，211）。按压成型化合物（206）放置在所述关闭位置所述第一开放表面面积（208，209）之后。一种用于生产包括围绕热固性塑料外壳中的电路的电组件模（301）具有经由连接到所述腔（303）一个流道（305，306）的腔（303）和栅极区。至少两个根据提供用于相应的腔（303）的本发明流道（305，306）。因此，模塑料的流动可以被优化。此外，所述腔体（303）的填充可以通过缩短流路来促进。

9. 发明申请

WO2009127181A3 IMPLEMENT FOR PROCESSING, PARTICULARLY SEALING, GROUND SURFACES UNDER WATER, PARTICULARLY BOTTOMS AND EMBANKMENTS OF WATERWAYS, PARTICULARLY CANALS, A METHOD FOR SETTING UP THE SAME, A METHOD FOR MOVING THE SAME, A METHOD FOR SEALING GROUND SURFACES 审中-公开
标题翻译：工作装置用于治疗，特别是封口，地表下的水，特别鞋底和边坡的水道，特别是渠道，方式对于相同的，方法的建立用于移动同样的方法
公开(公告)号：WO2009127181A3
公开(公告)日：2009-12-30
申请号：PCT/DE2009000348
申请日：2009-03-13
申请人： MATTHAEI BAUUNTERNEHMEN GMBH & , FISCHER JUERGEN
发明人： FISCHER JUERGEN
IPC分类号： E02B3/12
CPC分类号： E02B3/121 , E02B5/02 , Y10T403/7015
摘要： The invention relates to an implement for processing, particularly sealing, ground surfaces under water, particularly bottoms and embankments of waterways, particularly canals, to a method for setting up the same, to a method for moving the same and to uses thereof. The implement comprises a plurality of parallel, polygonal hollow tubes (10, 12, 32, 34, 38), disposed next to each other at least substantially joint-free, the upper ends of which form a horizontal, at least substantially planar work platform (26), wherein each hollow tube on the outside wall thereof comprises at least one substantially horizontally extending appendage (14) having a vertically extending flange (16), disposed at the outer end thereof and at least one corresponding flange insertion opening (18) having a vertically extending longitudinal slot (20) connecting thereto at the top, the slot extending to the upper end of the hollow tube, wherein the flange insertion opening at the upper end of the hollow tube is disposed further away than the appendage having the flange and has a larger horizontal dimension than the longitudinal slot, and wherein adjoining hollow tubes by way of the respective appendage on one of the hollow tubes having a corresponding longitudinal slot are engaged in each other in the other one of the hollow tubes such that the hollow tubes cannot be moved relative to each other in the horizontal direction and that only at the outer edge of the work platform at least one hollow tube can be pulled out individually vertically upward.
摘要翻译：有水下描述的相同的作业装置进行处理，特别是密封，地表面的，尤其是鞋底和水道的堤防，特别是管，构造相同的，一种方法用于推进相同和用途的方法。工作设备包括多个平行且至少基本上无并排布置关节，多角空心管（10 12 32 34，，，，38），其上端形成水平，至少基本上平坦的工作平台（26），至少在其外壁上每个中空管基本上水平延伸的唇缘（14）具有设置在其外端垂直延伸的凸缘（16）和至少一个相应的Flanscheinführöffnung（18），其具有与其相邻顶部垂直延伸到延伸的纵向狭槽的中空管的上端（ 20），其中所述Flanscheinführöffnung在中空管位于比与另一相应的纵向狭槽的办法来凸缘和比纵向狭槽的较大水平尺寸并具有由相应的投影相邻的中空管上的中空管中的一个更远的上端空心管的s的彼此以这样的方式接合时相对于在水平方向上彼此空心管不能移动并且至少一个中空管可以单独垂直向上仅在所述工作平台的外边缘拉出。

10. 发明申请

WO2010037732A3 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS 审中-公开
标题翻译：投影曝光装置用于生产半导体元件的微电影
公开(公告)号：WO2010037732A3
公开(公告)日：2010-06-10
申请号：PCT/EP2009062584
申请日：2009-09-29
申请人： ZEISS CARL SMT AG , FISCHER JUERGEN , SCHOEPPACH ARMIN , ORTH MATTHIAS , MUEHLBERGER NORBERT , RASSEL THORSTEN , WERBER ARMIN , HUBER JUERGEN
发明人： FISCHER JUERGEN , SCHOEPPACH ARMIN , ORTH MATTHIAS , MUEHLBERGER NORBERT , RASSEL THORSTEN , WERBER ARMIN , HUBER JUERGEN
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： The invention relates to a projection exposure apparatus (1) for microlithography for the production of semiconductor components, in which at least one optical assembly (9a) with at least one optical element (8a) which can be actuated in a mechanically controlled manner is mounted in a structure (6), wherein, for carrying out the mechanical actuation, a control signal transmission device (11) and/or an energy transmission device (12) are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly (9a) at least during specific operating states of the projection exposure apparatus (1).
摘要翻译：本发明涉及一种用于生产半导体部件的微光刻的投影曝光装置（1），其中至少一个光学组件（9a）具有可以以机械控制的方式被致动的至少一个光学元件（8a）在结构（6）中，为了进行机械致动，提供了控制信号传输装置（11）和/或能量传输装置（12），其将无寄生机械效应引入光学组件（9a）至少在投影曝光设备（1）的特定操作状态期间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式