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1. 发明申请

WO2006114294A2 ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：微波曝光装置照明系统
公开(公告)号：WO2006114294A2
公开(公告)日：2006-11-02
申请号：PCT/EP2006003864
申请日：2006-04-26
申请人： ZEISS CARL SMT AG , SOHMER ALEXANDER , DODOC AURELIAN , FELDMANN HEIKO , ULRICH WILHELM , FUERTER GERHARD , EGGER RAFAEL , MOEGELE ARTUR , RAUM MICHAEL
发明人： SOHMER ALEXANDER , DODOC AURELIAN , FELDMANN HEIKO , ULRICH WILHELM , FUERTER GERHARD , EGGER RAFAEL , MOEGELE ARTUR , RAUM MICHAEL
IPC分类号： G02B19/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666') that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606) .
摘要翻译：微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。冷凝器具有透镜组（L14，L15，L16，L17; L24，L25，L26，L27，L28; L34，L35，L36，L37; L44，L45，L46; L53，L54，L55）连续镜头。这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。透镜组的至少一个透镜（L15，L16，L17; L25，L26; L34，L44，L45; L54）具有凹面。照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

2. 发明申请

WO2005096098A3 PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标，投影曝光装置和反射镜
公开(公告)号：WO2005096098A3
公开(公告)日：2006-07-06
申请号：PCT/EP2005002898
申请日：2005-03-18
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , BADER DIETER , EPPLE ALEXANDER
发明人： DODOC AURELIAN , ULRICH WILHELM , BADER DIETER , EPPLE ALEXANDER
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective (120) for microlithography serves for imaging a pattern of a mask (130) arranged in its object surface into an image field (104) arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis (121) of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an image side numerical aperture NA > 0.85 and a demagnifying imaging scale where IßI
摘要翻译：用于微光刻的投影物镜（120）用于将布置在其物体表面中的掩模（130）的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场（104）。它具有沿着投影物镜的光轴（121）布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有像侧数值孔径NA> 0.85和缩小成像刻度， IΦI<0.05，并且具有适合于大于1mm的微光刻的最小图像场直径的平面图像场（104）。

3. 发明申请

WO2005040890A3 CATADIOPTRIC PROJECTION OBJECTIVE WITH REAL INTERMEDIATE IMAGES 审中-公开
标题翻译：具有真实中间图像的目标投影目标
公开(公告)号：WO2005040890A3
公开(公告)日：2005-06-30
申请号：PCT/EP2004011587
申请日：2004-10-15
申请人： ZEISS CARL SMT AG , SHAFER DAVID , DODOC AURELIAN , EPPLE ALEXANDER , ULRICH WILHELM , SCHUSTER KARL-HEINZ
发明人： SHAFER DAVID , DODOC AURELIAN , EPPLE ALEXANDER , ULRICH WILHELM , SCHUSTER KARL-HEINZ
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要翻译：一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将位于物平面中的物场投影到第一实际中间图像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

4. 发明申请

WO2005054956A2 PROJECTION OPTICAL SYSTEM 审中-公开
标题翻译：投影光学系统
公开(公告)号：WO2005054956A2
公开(公告)日：2005-06-16
申请号：PCT/EP2004013519
申请日：2004-11-25
申请人： ZEISS CARL SMT AG , ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
发明人： ROSTALSKI HANS-JUERGEN , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G02B13/14 , G03F7/20
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation (1) is fulfilled: (1) wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, phii is a refractive power in mm of the i lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为正和负折射光焦度的四个不重叠的透镜组，其中满足以下关系式（1）：（1）其中：y是成像的最大图像场的直径的一半直径（mm）通过投影光学系统，NA是第二物体一侧的最大数值孔径，phii是第i个透镜的折射力，单位为mm -1，k是投影光学透镜的总数系统，其中V1大于0.045。

5. 发明申请

WO2006069795A2 PROJECTION OPTICAL SYSTEM 审中-公开
标题翻译：投影光学系统
公开(公告)号：WO2006069795A2
公开(公告)日：2006-07-06
申请号：PCT/EP2005014148
申请日：2005-12-30
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM
发明人： DODOC AURELIAN , ULRICH WILHELM
IPC分类号： G03F7/20 , G02B13/14
CPC分类号： G03F7/70225 , G02B13/143 , G03F7/70241
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses, such that a total refractive power of each group of lenses is one of a negative refractive power and a positive refractive power; and wherein a refractive power of each lens of the fourth group of lenses is equal to or greater than 0. A lens of the third group of lenses which is disposed directly adjacent to a lens of the fourth group of lenses may have a concave surface facing towards the second object.
摘要翻译：投影光学系统包括沿着投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分成四个不重叠的透镜组，使得每组透镜的总屈光力为负屈光力和正屈光力中的一种; 并且其中第四组透镜的每个透镜的折射力等于或大于0.与第四组透镜的透镜直接相邻布置的第三组透镜的透镜可以具有面对的凹面朝向第二个对象。

6. 发明申请

WO2005069055A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005000262
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
发明人： SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面（201）中的图案成像到投影物镜的像平面（202）上的反射折射投射物镜（200）包括：第一物镜部分（210），用于对设置在投影物镜物平面成为第一中间图像; 第二目标部分（220），用于将第一中间成像成像成第二中间图像; 用于将所述第二中间成像直接成像到所述图像平面上的第三目标部分（230）其中具有第一连续镜面的第一凹面镜（221）和具有第二连续镜面的至少一个第二凹面镜（222）布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

7. 发明申请

WO2004107048A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：微光刻投射曝光设备
公开(公告)号：WO2004107048A3
公开(公告)日：2005-04-28
申请号：PCT/EP2004005816
申请日：2004-05-28
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , SCHUSTER KARL HEINZ , MALLMANN JOERG , ULRICH WILHELM , ROSTALKSI HANS-JUERGEN
发明人： DODOC AURELIAN , SCHUSTER KARL HEINZ , MALLMANN JOERG , ULRICH WILHELM , ROSTALKSI HANS-JUERGEN
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure system contains a lighting device (12) for producing a projection light (13) and a projection objective (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120), with which a reticle (24), which can be placed in an object plane (22) of the projection objective, can be projected onto a photosensitive layer (26) that can be placed in an image plane (28) of the projection objective. The projection objective is designed for an immersion operation during which a lens (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection objective, this lens being the closest one to the image, is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent to the projection light (13) is fixed between the lens closest to the image and the photosensitive layer.
摘要翻译：的微光刻投射曝光设备包括用于产生投射光（13）和投射物镜的照明装置（12）（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120），与（在物平面 22），其可以在一个被布置光罩（24），投影透镜（在投射物镜的像平面28）可以布置光敏层（26）可以被成像。投影物镜设计用于浸没操作，其中的像侧最后透镜（L5，L205; L605，L705，L805; L905，L1005，L1105）中的浸没液体投影透镜（34; 334A; 434A; 534A）浸入。一种用于投影（13）透过的封闭元件的光（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被固定的像侧最后透镜和以这样的方式在光敏感层之间。

8. 发明申请

WO2004092801A3 CATADIOPTRIC REDUCTION LENS COMPRISING A POLARISATION BEAM SPLITTER 审中-公开
标题翻译：带极化辐射的新型折反射透镜
公开(公告)号：WO2004092801A3
公开(公告)日：2004-12-09
申请号：PCT/EP2004003576
申请日：2004-04-03
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , GRUNER TORALF , SCHULTZ JOERG
发明人： DODOC AURELIAN , ULRICH WILHELM , GRUNER TORALF , SCHULTZ JOERG
IPC分类号： G02B13/14 , G02B17/08 , G02B27/28 , G03F7/20
CPC分类号： G03F7/70225 , G02B13/143 , G02B17/08 , G02B17/0804 , G02B17/0892 , G02B27/283
摘要： The invention relates to a catadioptric projection lens for reproducing a pattern that is located on the object plane of the projection lens on the imaging plane of said projection lens. The latter comprises an optical axis, a catadioptric first lens part (103) with a concave mirror (105) and a physical beam splitter (106) comprising at least one polarisation-selective beam-splitter layer (107), in addition to a second, preferably dioptric lens part (103). A retroreflective mirror (110) is situated in the optical path that includes the concave mirror (105), said retroreflective mirror retroreflecting the radiation emanating from the beam splitter towards said beam splitter. The multiple use of the beam splitter that is thus possible enables the creation of novel constructions, also including in particular catadioptric projection lenses with coaxial object and image fields.
摘要翻译：用于成像放置在投影透镜图案的物平面中的投射物镜的像平面中的对象的反射折射投影物镜具有至少一个偏振选择分束器层的光学轴，反射折射第一物镜部分（103）与凹面镜（105）和物理分束器（106）（107 ）和第二，优选屈光物镜部分（103）。在光路中，其包括凹面反射镜（105），后反射镜（110），用于从分束器来的辐射的背反射被布置在分束器的方向。在由此，能够多次使用分束器的使用允许新的设计，与同轴布置的物体和像场特别反射折射投影目标。

9. 发明申请

WO2007131161A2 OPTICAL LENS SYSTEM 审中-公开
标题翻译：光学透镜系统
公开(公告)号：WO2007131161A2
公开(公告)日：2007-11-15
申请号：PCT/US2007068227
申请日：2007-05-04
申请人： ZEISS CARL SMT AG , SHAFER DAVID , DODOC AURELIAN , FELDMANN HEIKO , ZELLNER JOHANNES , ULRICH WILHELM , WALTER HOLGER , LOERING ULRICH , KRAEHMER DANIEL , GUERTER GERHARD
发明人： SHAFER DAVID , DODOC AURELIAN , FELDMANN HEIKO , ZELLNER JOHANNES , ULRICH WILHELM , WALTER HOLGER , LOERING ULRICH , KRAEHMER DANIEL , GUERTER GERHARD
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： In general, in one aspect, the invention features a system that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in the projection objective are disclosed.
摘要翻译：通常，在一个方面，本发明的特征在于一种系统，其包括配置成在多个汞发射线处发射辐射的水银光源，被设置为接收由水银光源发射的辐射的投影物镜，以及被配置为定位晶片相对于投影物镜。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。公开了用于投影物镜的光学透镜系统。

10. 发明申请

WO2005111689A3 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 审中-公开
标题翻译：具有中间图像的目标投影
公开(公告)号：WO2005111689A3
公开(公告)日：2006-06-08
申请号：PCT/EP2005005250
申请日：2005-05-13
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
发明人： DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物体平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

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