专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090212462A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20090212462A1
公开(公告)日：2009-08-27
申请号：US12391954
申请日：2009-02-24
申请人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karal Diederick Van Der Mast , Klaus Simon
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karal Diederick Van Der Mast , Klaus Simon
IPC分类号： B28B3/00 , B29C59/02
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

2. 发明授权

US07517211B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07517211B2
公开(公告)日：2009-04-14
申请号：US11312659
申请日：2005-12-21
申请人： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon
发明人： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon
IPC分类号： B29C59/00
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

3. 发明授权

US08753557B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08753557B2
公开(公告)日：2014-06-17
申请号：US13331985
申请日：2011-12-20
申请人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
IPC分类号： B28B11/08
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

4. 发明授权

US08100684B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08100684B2
公开(公告)日：2012-01-24
申请号：US12391954
申请日：2009-02-24
申请人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
IPC分类号： B29C59/00 , B29C35/08 , B28B17/00
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

5. 发明申请

US20120091629A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20120091629A1
公开(公告)日：2012-04-19
申请号：US13331985
申请日：2011-12-20
申请人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychencko , Karel Diederick Van Der Mast , Klaus Simon
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychencko , Karel Diederick Van Der Mast , Klaus Simon
IPC分类号： B29C59/02
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

6. 发明授权

US07943080B2 Alignment for imprint lithography 失效
标题翻译：刻印光刻对准
公开(公告)号：US07943080B2
公开(公告)日：2011-05-17
申请号：US11316361
申请日：2005-12-23
申请人： Johan Frederik Dijksman , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
发明人： Johan Frederik Dijksman , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
IPC分类号： B29C35/08 , B29C59/02 , B29C41/00
CPC分类号： G03F9/7053 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , Y10S977/877 , Y10S977/888
摘要： A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.
摘要翻译：公开了一种将压印模板相对于衬底的目标区域对准的方法，该方法包括在目标区域内沉积一定量的可压印介质; 将压印模板接触到可压印介质，使得可压印介质被压缩并且允许压印模板，目标区域或两者在目标区域和压印模板之间的界面张力下相对于彼此横向移动，其中提供了比衬底少润湿的材料，其形式至少部分地围绕衬底的目标区域。

7. 发明申请

US20080063830A1 MEMS device and assembly method 有权
标题翻译： MEMS器件和组装方法
公开(公告)号：US20080063830A1
公开(公告)日：2008-03-13
申请号：US11519204
申请日：2006-09-12
申请人： Jan Bex , Raymond Jacobus Knaapen , Gerard Johannes Pieter Nijsse , Gerard Kums
发明人： Jan Bex , Raymond Jacobus Knaapen , Gerard Johannes Pieter Nijsse , Gerard Kums
IPC分类号： B32B37/12 , B32B41/00 , B32B3/26
CPC分类号： B81C3/001 , B81C2203/032 , Y10T428/20 , Y10T428/218 , Y10T428/219 , Y10T428/249953
摘要： A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.
摘要翻译：将MEMS器件接合到衬底以形成MEMS器件组件的方法。确定MEMS器件的厚度分布和/或衬底的配合表面的平坦度。将粘合剂沉积到MEMS器件的配合表面和/或衬底的配合表面上。 MEMS器件和衬底的配合表面被带到一起，使得粘合剂可以将MEMS器件接合到衬底。沉积在配合表面上的特定位置处的粘合剂的体积被改变以补偿MEMS装置的厚度分布的局部变化和/或基底的配合表面的平坦度。

8. 发明授权

US07628875B2 MEMS device and assembly method 有权
标题翻译： MEMS器件和组装方法
公开(公告)号：US07628875B2
公开(公告)日：2009-12-08
申请号：US11519204
申请日：2006-09-12
申请人： Jan Bex , Raymond Jacobus Knaapen , Gerard Johannes Pieter Nijsse , Gerard Kums
发明人： Jan Bex , Raymond Jacobus Knaapen , Gerard Johannes Pieter Nijsse , Gerard Kums
IPC分类号： B32B37/12
CPC分类号： B81C3/001 , B81C2203/032 , Y10T428/20 , Y10T428/218 , Y10T428/219 , Y10T428/249953
摘要： A method of bonding a MEMS device to a substrate to form a MEMS device assembly. A thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate is determined. An adhesive is deposited onto a mating surface of the MEMS device and/or the mating surface of the substrate. The mating surfaces of the MEMS device and substrate are brought together, such that the adhesive can bond the MEMS device to the substrate. The volume of adhesive deposited at particular locations on the mating surface is varied to compensate for local variations in the thickness profile of the MEMS device and/or the flatness of the mating surface of the substrate.
摘要翻译：将MEMS器件接合到衬底以形成MEMS器件组件的方法。确定MEMS器件的厚度分布和/或衬底的配合表面的平坦度。将粘合剂沉积到MEMS器件的配合表面和/或衬底的配合表面上。 MEMS器件和衬底的配合表面被带到一起，使得粘合剂可以将MEMS器件接合到衬底。沉积在配合表面上的特定位置处的粘合剂的体积被改变以补偿MEMS装置的厚度分布的局部变化和/或基底的配合表面的平坦度。

9. 发明申请

US20060131183A1 Grinding machine 审中-公开
标题翻译：磨床
公开(公告)号：US20060131183A1
公开(公告)日：2006-06-22
申请号：US10544201
申请日：2004-01-20
申请人： Raymond Jacobus Knaapen , Marinus Josephus Dona , Krassimir Krastev , Jakob Vijfvinkel , Piet Van Rens
发明人： Raymond Jacobus Knaapen , Marinus Josephus Dona , Krassimir Krastev , Jakob Vijfvinkel , Piet Van Rens
IPC分类号： B23H3/00
CPC分类号： B24B49/16 , B24B53/001 , G05B2219/45159
摘要： A grinding machine (1) for grinding a workpiece (40) comprises the following components: a cup wheel (10) having an annular grinding surface (11); a disc-shaped electrode (60), which is positioned in the vicinity of at least a portion of the grinding surface (11) such that a dressing area (75) is obtained in which a relatively small gap is present between the electrode (60) and the grinding surface (11), feed means (70) for feeding electrolyte to the dressing area (75); and a generator (20) for generating an electric current between the grinding surface (11) and the electrode (60), via the electrolyte. The electrode (60) is movable with respect to the dressing area (75), so that contamination of the electrode (60), which normally occurs as a result of the dressing process, is continuously removed. Consequently, the quality of the dressing process is maintained at a high level.
摘要翻译：一种用于研磨工件（40）的磨床（1）包括以下部件：具有环形研磨表面（11）的杯轮（10）; 位于磨削表面（11）的至少一部分附近的圆盘形电极（60），从而获得在电极（60）之间存在相对较小间隙的修整区域（75））和研磨表面（11），用于将电解质供给到更衣区（75）的进料装置（70）; 以及用于经由所述电解质在所述研磨面（11）与所述电极（60）之间产生电流的发电机（20）。电极（60）能够相对于修整区域（75）移动，从而连续地去除由于修整过程而通常发生的电极（60）的污染。因此，修整过程的质量保持在高水平。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式