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1. 发明申请

US20060131183A1 Grinding machine 审中-公开
标题翻译：磨床
公开(公告)号：US20060131183A1
公开(公告)日：2006-06-22
申请号：US10544201
申请日：2004-01-20
申请人： Raymond Jacobus Knaapen , Marinus Josephus Dona , Krassimir Krastev , Jakob Vijfvinkel , Piet Van Rens
发明人： Raymond Jacobus Knaapen , Marinus Josephus Dona , Krassimir Krastev , Jakob Vijfvinkel , Piet Van Rens
IPC分类号： B23H3/00
CPC分类号： B24B49/16 , B24B53/001 , G05B2219/45159
摘要： A grinding machine (1) for grinding a workpiece (40) comprises the following components: a cup wheel (10) having an annular grinding surface (11); a disc-shaped electrode (60), which is positioned in the vicinity of at least a portion of the grinding surface (11) such that a dressing area (75) is obtained in which a relatively small gap is present between the electrode (60) and the grinding surface (11), feed means (70) for feeding electrolyte to the dressing area (75); and a generator (20) for generating an electric current between the grinding surface (11) and the electrode (60), via the electrolyte. The electrode (60) is movable with respect to the dressing area (75), so that contamination of the electrode (60), which normally occurs as a result of the dressing process, is continuously removed. Consequently, the quality of the dressing process is maintained at a high level.
摘要翻译：一种用于研磨工件（40）的磨床（1）包括以下部件：具有环形研磨表面（11）的杯轮（10）; 位于磨削表面（11）的至少一部分附近的圆盘形电极（60），从而获得在电极（60）之间存在相对较小间隙的修整区域（75））和研磨表面（11），用于将电解质供给到更衣区（75）的进料装置（70）; 以及用于经由所述电解质在所述研磨面（11）与所述电极（60）之间产生电流的发电机（20）。电极（60）能够相对于修整区域（75）移动，从而连续地去除由于修整过程而通常发生的电极（60）的污染。因此，修整过程的质量保持在高水平。

2. 发明授权

US06597433B1 Multi-stage drive arrangements and their application in lithographic projection apparatuses 失效
标题翻译：多级驱动装置及其在光刻投影装置中的应用
公开(公告)号：US06597433B1
公开(公告)日：2003-07-22
申请号：US09551232
申请日：2000-04-17
申请人： Michael J. M. Renkens , Adrianus G. Bouwer , Johannes C. Driessen , Theodorus H. J. Bisschops , Hermanus M. J. R. Soemers , Jakob Vijfvinkel
发明人： Michael J. M. Renkens , Adrianus G. Bouwer , Johannes C. Driessen , Theodorus H. J. Bisschops , Hermanus M. J. R. Soemers , Jakob Vijfvinkel
IPC分类号： G03B2762
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725
摘要： A lithographic apparatus for step-and-scan operation has a three stage structure for the wafer stage. During step-and-scan operation, the long-stroke stage is moved steadily along the row or column of dies to be exposed sequentially. An intermediate scanning stage moves in a figure-of-eight motion relative to the long-stroke stage so that the net movement of the fine stage, which is carried by the scanning stage, is a meander path.
摘要翻译：用于步进扫描操作的光刻设备具有用于晶片台的三级结构。在扫描扫描期间，长行程段沿模具行或列逐渐移动，以顺序曝光。中间扫描台以相对于长行程级的八位运动移动，使得由扫描台携带的细台的净移动是曲折路径。

3. 发明申请

US20070222956A1 Contamination barrier with expandable lamellas 失效
标题翻译：可扩展薄片的污染屏障
公开(公告)号：US20070222956A1
公开(公告)日：2007-09-27
申请号：US11798710
申请日：2007-05-16
申请人： Levinus Bakker , Marcel Marie Dierichs , Johannes Freriks , Frank Schuurmans , Jakob Vijfvinkel , Wilhelmus Box
发明人： Levinus Bakker , Marcel Marie Dierichs , Johannes Freriks , Frank Schuurmans , Jakob Vijfvinkel , Wilhelmus Box
IPC分类号： G03B27/52
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
摘要翻译：被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽或来自辐射源的碎片。

4. 发明授权

US06774374B1 Isolation mounts for use with vacuum chambers and their application in lithographic projection apparatuses 有权
标题翻译：用于真空室的隔离装置及其在光刻投影设备中的应用
公开(公告)号：US06774374B1
公开(公告)日：2004-08-10
申请号：US09551323
申请日：2000-04-17
申请人： Johannes C. Driessen , Theodorus H. J. Bisschops , Jakob Vijfvinkel , Marinus J. J. Dona , Mark T. Meuwese , Ronald M. Schneider , Michel A. Mors , Hugo M. Visser
发明人： Johannes C. Driessen , Theodorus H. J. Bisschops , Jakob Vijfvinkel , Marinus J. J. Dona , Mark T. Meuwese , Ronald M. Schneider , Michel A. Mors , Hugo M. Visser
IPC分类号： G03B2754
CPC分类号： F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , G03F7/70691 , G03F7/70808 , G03F7/70825 , G03F7/70841 , G03F7/709
摘要： A reference frame provided in a vacuum chamber is supported by support pillars extending through and isolated from the vacuum chamber walls to isolate the reference frame from vibrations in the vacuum chamber. The gap between the support pillar and the vacuum chamber wall may be sealed by a low-stiffness seal. The low stiffness seal may be a three part seal allowing relative motion in six-degrees of freedom.
摘要翻译：设置在真空室中的参考框架由延伸穿过真空室壁并与真空室壁隔离的支撑柱支撑，以使参考系与真空室中的振动隔离。支撑柱和真空室壁之间的间隙可以通过低刚度密封来密封。低刚度密封件可以是允许六自由度相对运动的三部分密封件。

5. 发明授权

US06421112B1 Movable support in a vacuum chamber and its application in lithographic projection apparatuses 失效
公开(公告)号：US06421112B1
公开(公告)日：2002-07-16
申请号：US09551224
申请日：2000-04-17
申请人： Theodorus H. J. Bisschops , Hermanus M. J. R. Soemers , Jakob Vijfvinkel , Johannes C. Driessen , Michael J. M. Renkens , Adrianus G. Bouwer
发明人： Theodorus H. J. Bisschops , Hermanus M. J. R. Soemers , Jakob Vijfvinkel , Johannes C. Driessen , Michael J. M. Renkens , Adrianus G. Bouwer
IPC分类号： G03B2742
CPC分类号： G03F7/70841 , F16C32/0603 , F16C33/748 , F16C2300/62 , G03F7/70716 , G03F7/70758
摘要： An object table is supported in a vacuum chamber by an elongate beam or beams extending though elongate slots in opposite walls of the vacuum chamber. Displacement of the beam in two orthogonal directions is achieved by displacing the beam laterally and longitudinally. The elongate slots are sealed by sliding plates supported by a gas bearing. The beam is driven longitudinally by linear motors acting against between a balance mass and the beam. The beam is driven laterally by linear motors acting between a balance mass and the sliding plates. The two balance masses may be separate or combined.

6. 发明授权

US5818318A Magnetic clamping device 失效
标题翻译：磁夹紧装置
公开(公告)号：US5818318A
公开(公告)日：1998-10-06
申请号：US662712
申请日：1996-06-10
申请人： Henricus J. Ligthart , Petrus H. W. Swinkels , Jakob Vijfvinkel
发明人： Henricus J. Ligthart , Petrus H. W. Swinkels , Jakob Vijfvinkel
IPC分类号： B23Q3/15 , B23Q3/154 , H01F7/04 , B23B31/28
CPC分类号： B23Q3/1546
摘要： The invention relates to a magnetic clamping device with a clamping body (1) comprising a cylinder plate (2) of non-magnetizable material provided with cylinders (5), a clamping plate (3) of non-magnetizable material situated at one side of the cylinder plate, a closing plate (4) situated at the other side of the cylinder plate, and pistons (9) made at least partly from magnetic material which are movable in the respective cylinders, which clamping body is further provided with channels (13, 14) to which a fluidic pressure source can be connected for the simultaneous movement of the pistons in the cylinders towards and away from the clamping plate. To improve the magnetic clamping action, all magnetic pistons (9) are fastened to a common piston plate (8). This ensures that all magnetic pistons, when energized, will exert their magnetic influence on the object to be clamped.
摘要翻译：本发明涉及一种具有夹紧主体（1）的磁性夹紧装置，该夹紧体（1）包括具有圆柱体（5）的不可磁化材料的气缸板（2），一个不可磁化材料夹紧板（3）气缸板，位于气缸板另一侧的闭合板（4）和至少部分由磁性材料制成的活塞（9），所述活塞（9）可在各个气缸中移动，该夹紧体还设有通道（13），14），流体压力源可以连接到其上，以使活塞在气缸中朝着和远离夹紧板同时移动。为了改善磁力夹紧动作，所有的磁性活塞（9）都固定在共同的活塞板（8）上。这确保了所有的磁性活塞在通电时都会对待夹持的物体产生磁力的影响。

7. 发明授权

US5397185A Device for the axial support of a rotatable body, and positioning device provided with such a device 失效
标题翻译：用于可旋转体的轴向支撑的装置，以及设置有这种装置的定位装置
公开(公告)号：US5397185A
公开(公告)日：1995-03-14
申请号：US161951
申请日：1993-12-02
申请人： Mark T. Meuwese , Jakob Vijfvinkel , Cornelis J. M. Naus
发明人： Mark T. Meuwese , Jakob Vijfvinkel , Cornelis J. M. Naus
IPC分类号： F16C13/02 , F16C32/06
CPC分类号： F16C32/0692 , F16C32/0603
摘要： A device (1) for supporting a rotatable body (3) in a direction parallel to an axis of rotation (5) of the body (3). The device (1) comprises a support member (17) with a fluid bearing (21) which maintains a beating gap (23) between a bearing surface (15) of the body (3) extending perpendicular to the axis of rotation (5) and a bearing surface (19) of the support member (17) extending perpendicular to the axis of rotation (5) during operation. Manufacturing tolerances may lead to deviations from perpendicularity of the beating surfaces (15, 19) relative to the axis of rotation (5), which deviations cause an undesirable vibration of the body (3) parallel to the axis of rotation (5) during rotation of the body (3). This vibration is prevented in that the support member (17) is coupled to a frame (11) of the device (1) by means of an elastically deformable coupling member (25), whereby the bearing surface (19) is pivotable about two mutually perpendicular pivot axes (27, 29) which intersect in a point of intersection (31) of the axis of rotation (5) and the bearing surface (19). The point of intersection (31) of the axis of rotation (5), the pivot axes (27, 29) and the bearing surface (19) is defined in relation to the axis of rotation by means of the coupling member (25). The device (1) is used in a positioning device (127) for machining a rotatable workpiece (171) by means of a tool (149), during which the workpiece (171) is supported parallel to the axis of rotation (5) by the device (1).
摘要翻译：一种用于在平行于主体（3）的旋转轴线（5）的方向上支撑可转动体（3）的装置（1）。装置（1）包括具有流体轴承（21）的支撑构件（17），该支撑构件在垂直于旋转轴线（5）延伸的主体（3）的支承表面（15）之间保持跳动间隙（23）以及在操作期间垂直于旋转轴线（5）延伸的支撑构件（17）的支承表面（19）。制造公差可能导致相对于旋转轴线（5）的跳动表面（15,19）的垂直度偏离，这种偏差导致在旋转期间平行于旋转轴线（5）的主体（3）的不期望的振动的身体（3）。通过可弹性变形的联接构件（25）将支撑构件（17）联接到装置（1）的框架（11），防止了这种振动，由此支承表面（19）可绕两个相互枢转垂直枢转轴线（27,29），其在旋转轴线（5）的交点（31）与支承表面（19）相交。通过联接构件（25）相对于旋转轴线限定旋转轴线（5），枢转轴线（27,29）和支承表面（19）的交点（31）。装置（1）用于定位装置（127），用于通过工具（149）加工可旋转工件（171），在此期间工件（171）平行于旋转轴线（5）被支撑设备（1）。

8. 发明申请

US20100200772A1 RADIATION SYSTEM WITH CONTAMINATION BARRIER 失效
标题翻译：具有污染障碍物的辐射系统
公开(公告)号：US20100200772A1
公开(公告)日：2010-08-12
申请号：US12771466
申请日：2010-04-30
申请人： Levinus Pieter BAKKER , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter BAKKER , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21K5/04
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
摘要翻译：辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。污染屏障包括多个薄片。薄片的表面包括材料。辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。收集器的光学表面包括与薄片表面的材料相同的材料。

9. 发明授权

US07737425B2 Contamination barrier with expandable lamellas 失效
标题翻译：可扩展薄片的污染屏障
公开(公告)号：US07737425B2
公开(公告)日：2010-06-15
申请号：US11798710
申请日：2007-05-16
申请人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21F1/12
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.
摘要翻译：被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽或来自辐射源的碎片。

10. 发明授权

US06597429B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
公开(公告)号：US06597429B2
公开(公告)日：2003-07-22
申请号：US09833077
申请日：2001-04-12
申请人： Eric W. A. Janssen , Marcel J. M. Renkens , Jakob Vijfvinkel , Ronald M. Schneider , Theo H. J. Bisschops , Rob Tabor
发明人： Eric W. A. Janssen , Marcel J. M. Renkens , Jakob Vijfvinkel , Ronald M. Schneider , Theo H. J. Bisschops , Rob Tabor
IPC分类号： G03B2742
CPC分类号： F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , F16F15/0275 , G03F7/70816 , G03F7/70841 , G03F7/709
摘要： A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.

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