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1. 发明授权

US6001191A Substrate washing method, substrate washing-drying method, substrate washing apparatus and substrate washing-drying apparatus 失效
标题翻译：基板清洗方法，基板洗涤干燥方法，基板清洗装置和基板清洗干燥装置
公开(公告)号：US6001191A
公开(公告)日：1999-12-14
申请号：US760801
申请日：1996-12-05
申请人： Yuuji Kamikawa , Kinya Ueno , Naoki Shindo , Yoshio Kumagai
发明人： Yuuji Kamikawa , Kinya Ueno , Naoki Shindo , Yoshio Kumagai
IPC分类号： B08B3/04 , B08B3/08 , B08B3/10 , H01L21/00 , H01L21/306 , B08B3/00
CPC分类号： H01L21/02052 , B08B3/04 , B08B3/08 , B08B3/102 , H01L21/67028 , Y10S134/902
摘要： Disclosed is a method of washing substrates, comprising the steps of (a) introducing a washing solution into a processing vessel having a wafer boat movably mounted therein to fill the vessel with the washing solution, (b) allowing a plurality of wafers to be held collectively by chuck such that the wafers held by the chuck are arranged at substantially an equal pitch, (c) dipping the wafers together with the chuck in the washing solution within the processing vessel, (d) transferring the wafers from the chuck onto the wafer boat in an upper region of the processing vessel, (e) moving the wafers together with the wafer boat within the washing solution to allow the substrates to be positioned in a lower region of the processing vessel, (f) discharging the washing solution from the upper region of the processing vessel, (g) supplying a fresh washing solution into the lower region of the processing vessel so as to cause the washing solution within the processing vessel to overflow the processing vessel, (h) taking the washed wafers out of the processing vessel.
摘要翻译：公开了一种洗涤基板的方法，包括以下步骤：（a）将洗涤溶液引入到具有可移动地安装在其中的晶片舟皿的处理容器中，以便用清洗溶液填充容器，（b）允许多个晶片被保持（c）将晶片与卡盘一起浸入处理容器内的洗涤溶液中，（d）将晶片从卡盘转移到晶片上在处理容器的上部区域中运行，（e）将晶片与晶片舟皿一起移动到洗涤溶液中，以使基底定位在处理容器的下部区域，（f）将洗涤溶液从处理容器的上部区域，（g）将新鲜的洗涤溶液供应到处理容器的下部区域，以使处理容器内的洗涤液溢出（h）将洗涤过的晶片从处理容器中取出。

2. 发明授权

US5845660A Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus 失效
标题翻译：基板洗涤和干燥装置，基板清洗方法和基板清洗装置
公开(公告)号：US5845660A
公开(公告)日：1998-12-08
申请号：US761752
申请日：1996-12-05
申请人： Naoki Shindo , Yuuji Kamikawa , Shori Mokuo , Yoshio Kumagai
发明人： Naoki Shindo , Yuuji Kamikawa , Shori Mokuo , Yoshio Kumagai
IPC分类号： H01L21/00 , B08B3/10
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.
摘要翻译：一种基板清洗和干燥装置，其特征在于，包括用于保持晶片的处理部，向所述处理部引入用于将所述晶片干燥的处理液和用于干燥所述晶片的蒸气，用于将所述溶液导入所述处理部的供给排出口，用于从多种溶液中选择一种的溶液供给机构，具有用于产生干燥产生蒸气的加热器的干燥蒸汽发生部，具有用于从处理部快速排出溶液的开口的排出溶液机构，电阻率检测装置用于检测处理溶液的电阻率值;以及控制器，用于基于由电阻率检测装置检测的电阻率值来控制对处理部分的溶液的供应。

3. 发明授权

US5443540A Apparatus and method for drying substrates 失效
标题翻译：用于干燥基材的装置和方法
公开(公告)号：US5443540A
公开(公告)日：1995-08-22
申请号：US171643
申请日：1993-12-22
申请人： Yuuji Kamikawa
发明人： Yuuji Kamikawa
IPC分类号： F25D9/00 , F26B21/14 , H01L21/00 , H01L21/304 , H01L21/306 , F26B3/00
CPC分类号： H01L21/02052 , F26B21/145 , H01L21/67034
摘要： An apparatus for drying substrates such as wafers while contacting IPA vapor with them to remove that solution, which adheres to them when they are washed, includes a vessel in which IPA is stored, a unit for supplying the IPA into the vessel, a unit for draining the IPA from the vessel, heater block arranged contactable with the underside of the vessel to heat the IPA in the vessel by heat conduction, a boat elevator for positioning the substrates in a steam existing space in which steam generated from the heated process solution and a water cooling system arranged in the vessel to exchanged heat between the IPA and cooling water so as to cool the IPA, which is to be drained from the vessel, by the cooling water.
摘要翻译：一种用于干燥基板例如晶片的装置，同时与它们接触IPA蒸气以去除在洗涤时粘附到其上的溶液，包括其中存储IPA的容器，用于将IPA供应到容器中的单元，从容器中排出IPA，加热器块布置成与容器的下侧接触，以通过热传导来加热容器中的IPA;船用升降机，用于将基板定位在蒸汽存在的空间中，在加热过程溶液中产生蒸汽，设置在容器中的水冷却系统，以在IPA和冷却水之间交换热量，以便通过冷却水将要从容器排出的IPA冷却。

4. 发明授权

US5887604A Washing apparatus, and washing method 失效
标题翻译：洗衣机和洗涤方法
公开(公告)号：US5887604A
公开(公告)日：1999-03-30
申请号：US743836
申请日：1996-11-05
申请人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.
摘要翻译：本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。该室具有开口，设计用于清洗从外部通过开口运送的物体。打开/关闭机构设计成打开和关闭洗涤室的开口。喷嘴用于清洗打开/关闭机构。该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当洗涤液从洗涤液中排出时，当物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上船只。

5. 发明授权

US5782990A Method for washing objects 失效
标题翻译：清洗物品的方法
公开(公告)号：US5782990A
公开(公告)日：1998-07-21
申请号：US789537
申请日：1997-01-27
申请人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： A washing method for washing objects includes the steps of supplying a washing liquid to a washing vessel and immersing objects in the washing liquid contained in the washing vessel. The method also includes the steps of discharging the liquid at least once from the washing vessel, and starting to apply the washing liquid to the objects when the objects are partly exposed to air as the liquid is discharged from the washing vessel. The washing liquid application is continued during exposure of the objects to the air to prevent the surface of the objects from being dried and stained.
摘要翻译：用于清洗物体的清洗方法包括以下步骤：将洗涤液体供应到洗涤容器中，并将物品浸入容纳在洗涤容器中的洗涤液体中。该方法还包括以下步骤：从洗涤容器排出至少一次液体，并且当液体从洗涤容器中排出时，当物体部分暴露在空气中时，开始将洗涤液施加到物体上。在将物体暴露于空气中期间继续洗涤液体的应用，以防止物体的表面被干燥和染色。

6. 发明授权

US5671764A Washing apparatus, and washing method 失效
标题翻译：洗衣机和洗涤方法
公开(公告)号：US5671764A
公开(公告)日：1997-09-30
申请号：US560708
申请日：1995-11-20
申请人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
发明人： Shinya Murakami , Yuuji Kamikawa , Sinichiro Izumi , Noriyuki Anai , Takami Satoh , Hirofumi Shiraishi , Koji Harada , Takayuki Tomoeda , Hiroshi Tanaka
IPC分类号： B08B3/02 , B08B3/04 , B08B3/10 , H01L21/00 , H01L21/677 , B08B15/00
CPC分类号： H01L21/67754 , B08B3/02 , B08B3/04 , B08B3/102 , H01L21/67051 , H01L21/67057 , H01L21/67757 , Y10S134/902
摘要： Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.
摘要翻译：本文公开了一种洗涤装置，包括洗涤室，打开/关闭机构和喷嘴。该室具有开口，设计用于清洗从外部通过开口运送的物体。打开/关闭机构设计成打开和关闭洗涤室的开口。喷嘴用于清洗打开/关闭机构。该装置还包括一个填充有洗涤液体的洗涤容器，用于清洗物体，还有一个喷嘴，用于当清洗液体从洗涤液中排出时物体被部分暴露时，将洗涤液施加到位于洗涤容器中的物体上船只。

7. 发明授权

US5301700A Washing system 失效
标题翻译：洗涤系统
公开(公告)号：US5301700A
公开(公告)日：1994-04-12
申请号：US26771
申请日：1993-03-05
申请人： Yuuji Kamikawa , Kouki Kuroda , Yoshiyuki Honda , Eiichi Mukai , Mitsuo Nishi
发明人： Yuuji Kamikawa , Kouki Kuroda , Yoshiyuki Honda , Eiichi Mukai , Mitsuo Nishi
IPC分类号： B08B3/02 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67057 , B08B3/022 , H01L21/67051 , H01L21/67766 , H01L21/67781 , Y10S134/902 , Y10S414/138 , Y10S414/14
摘要： A washing system comprising a wafer washing section having plural chemical washing vessels, plural water washing vessels and a drier, a cassette washing section having a water washing device and a drier, a loader section for taking out the wafers from the cassettes and loading the wafers into the wafer washing section, an unloader section for returning the washed wafers in the washed cassette and unloading the wafers from the wafer washing section, a wafer transfer device the wafers in the wafer washing section, a cassette lifter for carrying the cassettes from the loader section to the cassette washing section, and a wire drive unit for carrying the cassettes in the cassette washing section.
摘要翻译：一种洗涤系统，包括具有多个化学洗涤容器，多个水洗涤容器和干燥器的晶片洗涤部分，具有水洗装置和干燥器的盒式洗涤部分，用于从盒中取出晶片并装载晶片的装载部分进入晶片洗涤部分，用于将洗涤过的晶片返回洗涤后的盒子并从晶片洗涤部分卸载晶片的卸载器部分，晶片转移装置，晶片洗涤部分中的晶片，用于从装载器运送盒的盒式升降器以及用于将盒带携带在盒式洗涤部中的线驱动单元。

8. 发明授权

US5445699A Processing apparatus with a gas distributor having back and forth parallel movement relative to a workpiece support surface 失效
标题翻译：具有气体分配器的处理装置相对于工件支撑表面具有前后平行移动
公开(公告)号：US5445699A
公开(公告)日：1995-08-29
申请号：US145663
申请日：1993-11-04
申请人： Yuuji Kamikawa , Kimiharu Matsumura , Masafumi Nomura , Junichi Nagata
发明人： Yuuji Kamikawa , Kimiharu Matsumura , Masafumi Nomura , Junichi Nagata
IPC分类号： C23C16/44 , C23C16/455 , C23C16/52
CPC分类号： C23C16/45589 , C23C16/455
摘要： A processing apparatus comprising a reaction chamber, a workpiece-supporting section located in the reaction chamber for supporting a workpiece, a gas distributor located in the reaction chamber and facing the workpiece-supporting section for distributing reaction gas to a workpiece that is on the supporting surface of the workpiece-supporting section, a gas supply for supplying the reaction gas into the reaction chamber through the gas distributor and at a predetermined pressure, and a drive mechanism for moving the gas distributor back and forth relative to the workpiece-supporting section in a direction that is parallel to the supporting surface of the workpiece-supporting section. The speed of the relative movement can be varied and the reaction gas flow rate can be controlled in accordance with the speed the relative movement or the position of the gas distributor with respect to the workpiece-supporting sector during the relative movement.
摘要翻译：一种处理装置，包括反应室，位于用于支撑工件的反应室中的工件支撑部分，位于反应室中的面对工件支撑部分的气体分配器，用于将反应气体分配到在支撑件上的工件工件支撑部分的表面，用于通过气体分配器以预定压力将反应气体供应到反应室中的气体供应源和用于相对于工件支撑部分来回移动气体分配器的驱动机构，与工件支承部的支承面平行的方向。可以改变相对运动的速度，并且可以根据在相对运动期间气体分配器相对于工件支撑扇区的相对运动或位置的速度来控制反应气体流量。

9. 发明授权

US5370142A Substrate washing device 失效
标题翻译：基板清洗装置
公开(公告)号：US5370142A
公开(公告)日：1994-12-06
申请号：US149635
申请日：1993-11-09
申请人： Mitsuo Nishi , Takanori Miyazaki , Eiichi Mukai , Yuuji Kamikawa , Hiroshi Tanaka
发明人： Mitsuo Nishi , Takanori Miyazaki , Eiichi Mukai , Yuuji Kamikawa , Hiroshi Tanaka
IPC分类号： B08B11/02 , H01L21/00 , H01L21/304 , H01L21/673 , B08B3/04
CPC分类号： H01L21/67057 , Y10S134/902 , Y10S206/832
摘要： A substrates-cleaning apparatus comprising process vessels in which washing solutions are contained, a chuck mechanism having a first substrate holder section for carrying silicon wafers to the process vessels while holding them in it, and a boat mechanism having a second substrate holder section for receiving the wafers from the chuck mechanism and for supporting the wafers in the washing solutions, wherein said second substrate holder section comprises base members made of erosion and heat resistant material, and receiver members attached to the base members, having a plurality of substrate holding grooves thereon, and made of erosion and heat resistant synthetic resin substantially same in softness as or softer than the wafers.
摘要翻译：一种基板清洁装置，包括其中容纳有洗涤液的处理容器，具有用于在将硅晶片保持在其中的同时将硅晶片运送到处理容器的第一基板保持部分的卡盘机构，以及具有第二基板保持部分来自卡盘机构的晶片并且用于将晶片支撑在洗涤溶液中，其中所述第二基板保持器部分包括由耐腐蚀和耐热材料制成的基部构件，以及附接到基部构件的接收构件，其上具有多个基板保持槽由耐腐蚀和耐热合成树脂制成，其柔软度比晶片柔软或柔软。

10. 发明授权

US5431179A Wafer drying apparatus and fire-extinguishing method therefor 失效
标题翻译：晶圆烘干设备及其灭火方法
公开(公告)号：US5431179A
公开(公告)日：1995-07-11
申请号：US197285
申请日：1994-02-16
申请人： Takanori Miyazaki , Kazuhiko Kobayashi , Yuuji Kamikawa , Chihaya Tashima
发明人： Takanori Miyazaki , Kazuhiko Kobayashi , Yuuji Kamikawa , Chihaya Tashima
IPC分类号： F26B21/14 , F26B25/00 , H01L21/00 , H01L21/304 , H01L21/677 , B08B13/00
CPC分类号： H01L21/67034 , F26B21/145 , F26B25/009 , H01L21/67781 , Y10S134/902 , Y10S203/07
摘要： A wafer drying apparatus incorporated in a semiconductor wafer cleaning system includes a bath for storing IPA. A heater for generating an IPA vapor is arranged on the bath. The bath is surrounded by a housing. The housing has opening portions at three positions. The opening portions are opened/closed by shutters. A sensor for detecting a fire and a nozzle for discharging CO.sub.2 gas into the bath are arranged around the bath. A plurality of wafers are held by a chuck of a convey robot and are conveyed from the outside of the housing into the housing via the opening portions. When a fire is detected by the sensor, the chuck immediately retreats from the housing, and the shutters are closed. Signals for closing the shutters are transmitted to shutter drive sources again 10 seconds after the fire is detected, and discharging of CO.sub.2 gas is started 20 seconds after the fire is detected.
摘要翻译：结合在半导体晶片清洁系统中的晶片干燥装置包括用于存储IPA的浴槽。用于产生IPA蒸汽的加热器布置在浴缸上。浴室被房屋包围。壳体在三个位置具有开口部分。开口部分由百叶窗打开/关闭。用于检测火的传感器和用于将CO 2气体排放到浴中的喷嘴布置在浴周围。多个晶片由传送机器人的卡盘保持，并且经由开口部分从壳体的外部输送到壳体中。当传感器检测到火灾时，卡盘立即从壳体退出，并且快门关闭。在检测到火灾后10秒钟，关闭快门的信号再次传送到快门驱动源，并且在检测到火灾20秒后开始排放CO2气体。

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