专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5845660A Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus 失效
标题翻译：基板洗涤和干燥装置，基板清洗方法和基板清洗装置
公开(公告)号：US5845660A
公开(公告)日：1998-12-08
申请号：US761752
申请日：1996-12-05
申请人： Naoki Shindo , Yuuji Kamikawa , Shori Mokuo , Yoshio Kumagai
发明人： Naoki Shindo , Yuuji Kamikawa , Shori Mokuo , Yoshio Kumagai
IPC分类号： H01L21/00 , B08B3/10
CPC分类号： H01L21/67028 , Y10S134/902
摘要： A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process section, a solution supply mechanism for selecting one from a plurality of kinds of solution, a drying vapor generation section having a heater for generation vapor for drying, a discharging solution mechanism having an opening for rapidly discharging the solution from the processing section, resistivity detecting means for detecting a resistivity value of the process solution, and a controller for controlling the supply of solution to the process section based on the resistivity value detected by the resistivity detecting means.
摘要翻译：一种基板清洗和干燥装置，其特征在于，包括用于保持晶片的处理部，向所述处理部引入用于将所述晶片干燥的处理液和用于干燥所述晶片的蒸气，用于将所述溶液导入所述处理部的供给排出口，用于从多种溶液中选择一种的溶液供给机构，具有用于产生干燥产生蒸气的加热器的干燥蒸汽发生部，具有用于从处理部快速排出溶液的开口的排出溶液机构，电阻率检测装置用于检测处理溶液的电阻率值;以及控制器，用于基于由电阻率检测装置检测的电阻率值来控制对处理部分的溶液的供应。

2. 发明授权

US6001191A Substrate washing method, substrate washing-drying method, substrate washing apparatus and substrate washing-drying apparatus 失效
标题翻译：基板清洗方法，基板洗涤干燥方法，基板清洗装置和基板清洗干燥装置
公开(公告)号：US6001191A
公开(公告)日：1999-12-14
申请号：US760801
申请日：1996-12-05
申请人： Yuuji Kamikawa , Kinya Ueno , Naoki Shindo , Yoshio Kumagai
发明人： Yuuji Kamikawa , Kinya Ueno , Naoki Shindo , Yoshio Kumagai
IPC分类号： B08B3/04 , B08B3/08 , B08B3/10 , H01L21/00 , H01L21/306 , B08B3/00
CPC分类号： H01L21/02052 , B08B3/04 , B08B3/08 , B08B3/102 , H01L21/67028 , Y10S134/902
摘要： Disclosed is a method of washing substrates, comprising the steps of (a) introducing a washing solution into a processing vessel having a wafer boat movably mounted therein to fill the vessel with the washing solution, (b) allowing a plurality of wafers to be held collectively by chuck such that the wafers held by the chuck are arranged at substantially an equal pitch, (c) dipping the wafers together with the chuck in the washing solution within the processing vessel, (d) transferring the wafers from the chuck onto the wafer boat in an upper region of the processing vessel, (e) moving the wafers together with the wafer boat within the washing solution to allow the substrates to be positioned in a lower region of the processing vessel, (f) discharging the washing solution from the upper region of the processing vessel, (g) supplying a fresh washing solution into the lower region of the processing vessel so as to cause the washing solution within the processing vessel to overflow the processing vessel, (h) taking the washed wafers out of the processing vessel.
摘要翻译：公开了一种洗涤基板的方法，包括以下步骤：（a）将洗涤溶液引入到具有可移动地安装在其中的晶片舟皿的处理容器中，以便用清洗溶液填充容器，（b）允许多个晶片被保持（c）将晶片与卡盘一起浸入处理容器内的洗涤溶液中，（d）将晶片从卡盘转移到晶片上在处理容器的上部区域中运行，（e）将晶片与晶片舟皿一起移动到洗涤溶液中，以使基底定位在处理容器的下部区域，（f）将洗涤溶液从处理容器的上部区域，（g）将新鲜的洗涤溶液供应到处理容器的下部区域，以使处理容器内的洗涤液溢出（h）将洗涤过的晶片从处理容器中取出。

3. 发明申请

US20130180659A1 LIQUID TREATMENT APPARATUS 有权
标题翻译：液体处理装置
公开(公告)号：US20130180659A1
公开(公告)日：2013-07-18
申请号：US13823205
申请日：2012-08-01
申请人： Norihiro Itoh , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
发明人： Norihiro Itoh , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
IPC分类号： H01L21/02 , H01L21/465
CPC分类号： H01L21/02041 , H01L21/465 , H01L21/67051 , H01L21/6719 , H01L21/68785 , H01L21/68792
摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).
摘要翻译：液体处理装置包括：水平地保持基板并旋转基板的基板保持件（21），将处理液体供给到由基板保持件保持的基板的处理液喷嘴（82），布置在由基板保持器保持的基板的周缘的外侧，接收由处理液喷嘴供给到基板的处理液，从上方覆盖基板保持体的基板的顶板（32），旋转顶板的顶板旋转驱动机构和围绕顶板的周缘的液体接收构件（130），并具有圆形的液体容纳空间（132）。

4. 发明授权

US08449684B2 Substrate cleaning method, substrate cleaning system and program storage medium 有权
标题翻译：基板清洗方法，基板清洗系统和程序存储介质
公开(公告)号：US08449684B2
公开(公告)日：2013-05-28
申请号：US11783748
申请日：2007-04-11
申请人： Tsukasa Watanabe , Naoki Shindo
发明人： Tsukasa Watanabe , Naoki Shindo
IPC分类号： B08B7/00 , B08B7/04 , B08B3/00
CPC分类号： H01L21/67057 , B08B3/048 , B08B3/12
摘要： The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate W is subjected to an ultrasonic cleaning process. The step of generating ultrasonic waves includes a step of generating ultrasonic waves in the cleaning tank while the cleaning liquid is being supplied into the cleaning tank. A supply rate at which the cleaning liquid is supplied into the cleaning tank at a certain timing in the step of generating ultrasonic waves differs from a supply rate at which the cleaning liquid is supplied into the cleaning tank at another timing in the step of generating ultrasonic waves.
摘要翻译：本发明提供一种能够以高去除效率从待处理基板的整个表面去除颗粒的基板清洗方法。在本发明的基板清洗方法中，将待处理基板W浸入清洗槽12内的清洗液中。然后，在包含在清洗槽12内的清洗液中产生超声波，使基板 W进行超声波清洗处理。产生超声波的步骤包括在将清洁液供给到清洗槽中时在清洗槽中产生超声波的步骤。在产生超声波的步骤中的某个时刻将清洗液供给到清洗槽中的供给速度与在生成超声波的步骤中的另一定时将清洗液供给到清洗槽中的供给速度不同波浪。

5. 发明申请

US20120283980A1 METHOD OF MANAGING CLINICAL TESTING APPARATUS, CLINICAL TESTING SYSTEM, AND MAINTENANCE MANAGEMENT APPARATUS 有权
标题翻译：临床试验装置，临床试验系统和维护管理装置的管理方法
公开(公告)号：US20120283980A1
公开(公告)日：2012-11-08
申请号：US13459848
申请日：2012-04-30
申请人： Yusuke Suga , Naoki Shindo , Atsumasa Sone , Hiroyuki Koyama , Shunsuke Ariyoshi
发明人： Yusuke Suga , Naoki Shindo , Atsumasa Sone , Hiroyuki Koyama , Shunsuke Ariyoshi
IPC分类号： G06F17/18
CPC分类号： G06F19/366 , G01N35/00623 , G01N35/00871 , G05B2219/24001 , G05B2219/2657 , G06F19/00 , G16H10/40
摘要： A management system connected with a clinical testing apparatus is disclosed. The system acquires, from the clinical testing apparatus, a parameter that varies according to deterioration of the unit at a plurality of points of time, stores the parameters and/or analysis results that are obtained by analyzing the parameters, and provides a screen data for showing the stored parameters and/or the stored analysis results in a time-series format. A method for managing a clinical testing apparatus and a clinical testing system for the method are also disclosed.
摘要翻译：公开了一种与临床试验装置连接的管理系统。该系统从临床测试装置获取根据多个时间点的单元的劣化而变化的参数，存储通过分析参数获得的参数和/或分析结果，并提供用于以时间序列格式显示存储的参数和/或存储的分析结果。还公开了用于管理该方法的临床测试装置和临床测试系统的方法。

6. 发明申请

US20120180828A1 Liquid Processing Apparatus and Liquid Processing Method 有权
标题翻译：液体处理设备和液体处理方法
公开(公告)号：US20120180828A1
公开(公告)日：2012-07-19
申请号：US13351653
申请日：2012-01-17
申请人： Jiro HIGASHIJIMA , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
发明人： Jiro HIGASHIJIMA , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
IPC分类号： B08B3/00
CPC分类号： H01L21/68728 , B08B3/04 , B08B3/041 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68742
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

7. 发明授权

US08090585B2 Audio decoding device 有权
标题翻译：音频解码装置
公开(公告)号：US08090585B2
公开(公告)日：2012-01-03
申请号：US11822907
申请日：2007-07-11
申请人： Hideyuki Kakuno , Naoki Shindo
发明人： Hideyuki Kakuno , Naoki Shindo
IPC分类号： G10L19/00 , G10L21/00
CPC分类号： H04S3/008 , G10L19/008 , H04N21/439 , H04S2420/03
摘要： An audio decoding device comprises an audio decoding section for decoding first stream data and second stream data to generate two pieces of audio data and a data processing parameter, an external setting section in which a parameter corresponding to the data processing parameter is set, and an audio data processing section for processing the two pieces of audio data. When the data processing parameter contained in the second stream data is inappropriate, the audio data processing section performs data processing using the parameter set in the external setting section. When the data processing parameter contained in the second stream data is appropriate, the audio data processing section performs data processing using the data processing parameter generated by the audio decoding section.
摘要翻译：音频解码装置包括用于解码第一流数据的音频解码部分和第二数据流数据以产生两条音频数据和数据处理参数，其中设置与数据处理参数对应的参数的外部设置部分，以及音频数据处理部分，用于处理两个音频数据。当包含在第二流数据中的数据处理参数不合适时，音频数据处理部分使用在外部设置部分中设置的参数进行数据处理。当包含在第二流数据中的数据处理参数适当时，音频数据处理部分使用由音频解码部分生成的数据处理参数进行数据处理。

8. 发明申请

US20070240736A1 Substrate cleaning method, substrate cleaning system and program storage medium 有权
标题翻译：基板清洗方法，基板清洗系统和程序存储介质
公开(公告)号：US20070240736A1
公开(公告)日：2007-10-18
申请号：US11783748
申请日：2007-04-11
申请人： Tsukasa Watanabe , Naoki Shindo
发明人： Tsukasa Watanabe , Naoki Shindo
IPC分类号： B08B7/04 , B08B3/00 , B08B3/12
CPC分类号： H01L21/67057 , B08B3/048 , B08B3/12
摘要： The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 12. Then, ultrasonic waves are generated in the cleaning liquid contained in the cleaning tank 12, so that the substrate W is subjected to an ultrasonic cleaning process. The step of generating ultrasonic waves includes a step of generating ultrasonic waves in the cleaning tank while the cleaning liquid is being supplied into the cleaning tank. A supply rate at which the cleaning liquid is supplied into the cleaning tank at a certain timing in the step of generating ultrasonic waves differs from a supply rate at which the cleaning liquid is supplied into the cleaning tank at another timing in the step of generating ultrasonic waves.
摘要翻译：本发明提供一种能够以高去除效率从待处理基板的整个表面去除颗粒的基板清洗方法。在本发明的基板清洗方法中，将被处理基板W浸渍在清洗槽12内的清洗液中。然后，在包含在清洗槽12中的清洗液中产生超声波，从而对基板W进行超声波清洗处理。产生超声波的步骤包括在将清洁液供给到清洗槽中时在清洗槽中产生超声波的步骤。在产生超声波的步骤中的某个时刻将清洗液供给到清洗槽中的供给速度与在生成超声波的步骤中的另一定时将清洗液供给到清洗槽中的供给速度不同波浪。

9. 发明授权

US6109278A Liquid treatment method and apparatus 有权
标题翻译：液体处理方法和装置
公开(公告)号：US6109278A
公开(公告)日：2000-08-29
申请号：US317116
申请日：1999-05-24
申请人： Naoki Shindo , Miyako Yamasaka , Yuji Kamikawa
发明人： Naoki Shindo , Miyako Yamasaka , Yuji Kamikawa
IPC分类号： B08B3/00 , B08B9/02 , C03C23/00 , G02F1/1333 , H01L21/00 , B08B3/04
CPC分类号： B08B9/027 , B08B3/00 , C03C23/0075 , H01L21/67028 , H01L21/6708 , H01L21/67086 , G02F1/1333 , Y10S134/902
摘要： Disclosed is a liquid treatment for an object to be processed, such as a semiconductor wafer or a glass LCD substrate, which is designed to remove any chemicals remaining in chemical supply nozzles and also improve the rinse capability and throughput. To that end, a processing liquid supply means is configured as jet nozzle pipes 40, a bottom surface 40c of each of the jet nozzle pipes 40 is inclined so as to slope downward from a chemical supply side thereof to an end portion, and the end portion is connected to a drain pipe 55 by a waste liquid orifice 40d and a drain valve 54. A chemical is supplied from nozzle orifices 40b of the jet nozzle pipes 40, the chemical is brought into contact with wafers W, and a treatment is performed thereby. Thereafter, a chemical-removing agent such as pure water or N.sub.2 is supplied through the jet nozzle pipes 40 to remove any remaining chemical from the jet nozzle pipes 40, then pure water is brought into contact with the wafers W to wash them.
摘要翻译：公开了用于被处理物体的液体处理，例如半导体晶片或玻璃LCD基板，其被设计成去除化学品供应喷嘴中残留的任何化学物质，并且还提高冲洗能力和生产量。为此，处理液供给单元构成为喷嘴管40，各喷射管40的底面40c倾斜，从化学物质供给侧向端部倾斜，部分通过废液孔40d和排水阀54连接到排水管55.化学品从喷嘴管40的喷嘴孔40b供应，化学品与晶片W接触，并进行处理从而。此后，通过喷嘴喷嘴管40供给诸如纯水或N2的化学除去剂，以从喷嘴管40中除去任何剩余的化学物质，然后使纯水与晶片W接触以进行洗涤。

10. 发明授权

US09202731B2 Liquid processing apparatus, liquid processing method, and recording medium having program for executing liquid processing method recorded therein 有权
标题翻译：液体处理装置，液体处理方法和具有记录在其中的用于执行液体处理方法的程序的记录介质
公开(公告)号：US09202731B2
公开(公告)日：2015-12-01
申请号：US13334406
申请日：2011-12-22
申请人： Shigeru Kasai , Ayuta Suzuki , Ikuo Sawada , Naoki Shindo , Masatake Yoneda , Kazuhiro Ooya
发明人： Shigeru Kasai , Ayuta Suzuki , Ikuo Sawada , Naoki Shindo , Masatake Yoneda , Kazuhiro Ooya
IPC分类号： H01L21/00 , H01L21/67 , H01L21/02
CPC分类号： H01L21/67115 , H01L21/02052 , H01L21/02057 , H01L21/67028 , H01L21/67051
摘要： Disclosed is a liquid processing apparatus that processes a substrate with a processing liquid. The processing apparatus includes: a substrate holder configured to hold the substrate; a processing liquid supply unit configured to supply the processing liquid to the substrate held by the substrate holder; a rinsing liquid supply unit configured to supply a rinsing liquid to the substrate; and a light emitting element configured to emit light of a wavelength range, which is absorbed only by the substrate, and irradiate the emitted light to the substrate.
摘要翻译：公开了一种用处理液处理基板的液体处理装置。所述处理装置包括：基板保持器，其构造成保持所述基板; 处理液供给部，其将处理液供给到由所述基板保持体保持的基板; 冲洗液体供给单元，其配置为向所述基板供给冲洗液; 以及发光元件，被配置为发射仅被衬底吸收的波长范围的光，并将发射的光照射到衬底。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式