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1. 发明申请

US20090110824A1 Substrate processing apparatus and method of controlling substrate processing apparatus 审中-公开
标题翻译：基板处理装置及其控制方法
公开(公告)号：US20090110824A1
公开(公告)日：2009-04-30
申请号：US12289463
申请日：2008-10-28
申请人： Yuichi Takenaga , Takahito Kasai , Minoru Obata , Yoshihiro Takezawa , Kazuo Yabe
发明人： Yuichi Takenaga , Takahito Kasai , Minoru Obata , Yoshihiro Takezawa , Kazuo Yabe
IPC分类号： C23C16/44 , C23C16/54
CPC分类号： C23C16/481 , C23C16/52
摘要： In accordance with a set temperature profile including: a first step in which a temperature is varied from a first temperature to a second temperature during a first time period; a second step in which the temperature is maintained at the second temperature during a second time period; and a third step in which the temperature is varied from the second temperature to a third temperature; a substrate is subjected to a film deposition process. The first temperature, the second temperature, and the third temperature are determined based on the first relationship between temperature and film thickness, the measured film thicknesses at the plurality of positions, and a predetermined target film thickness. There are calculated expected film thicknesses at a plurality of positions on a substrate to be actually processed in accordance with the set temperature profile corresponding to the determined first temperature, the determined second temperature, and the determined third temperature. When the expected film thicknesses at the plurality of positions are not within a predetermined allowable range with respect to the predetermined target film thickness, at least one of the first time period, the second time period, and the third time period is varied.
摘要翻译：根据设定温度曲线图，包括：第一步骤，其中温度在第一时间段内从第一温度变化到第二温度; 在第二时间段内将温度保持在第二温度的第二步骤; 以及第三步骤，其中温度从第二温度变化到第三温度; 对基板进行成膜处理。基于温度和膜厚度之间的第一关系，多个位置处测量的膜厚度和预定的目标膜厚度来确定第一温度，第二温度和第三温度。根据对应于所确定的第一温度，确定的第二温度和确定的第三温度的设定温度曲线，计算待实际处理的基板上的多个位置处的预期膜厚度。当多个位置处的预期膜厚度相对于预定目标膜厚度不在预定的允许范围内时，第一时间段，第二时间段和第三时间段中的至少一个是变化的。

2. 发明申请

US20050073914A1 Source selection apparatus, information output apparatus, source allocation method 审中-公开
标题翻译：源选择装置，信息输出装置，源分配方法
公开(公告)号：US20050073914A1
公开(公告)日：2005-04-07
申请号：US10942847
申请日：2004-09-17
申请人： Kazuo Yabe
发明人： Kazuo Yabe
IPC分类号： H04N5/76 , G11B19/02 , G11B20/00 , G11B31/00 , G11B7/00
CPC分类号： G11B19/02
摘要： A source selection apparatus comprises: a first source selection device which selects one source out of one or more sources belonging to a first source group; a second source selection device which selects one source out of one or more sources belonging to a second source group; a determination device which determines a kind of contents recorded on an information recording medium; and an allocation device which, based on the kind of the contents, allocates the kind of the contents to either the first source selection device or the second source selection device as the source to be thereby selectable.
摘要翻译：源选择装置包括：第一源选择装置，其从属于第一源组的一个或多个源中选择一个源; 第二源选择装置，其从属于第二源组的一个或多个源中选择一个源; 确定装置，其确定记录在信息记录介质上的内容的种类; 以及分配装置，其基于内容的种类，将内容的种类分配给第一源选择装置或第二源选择装置作为可选择的源。

3. 发明授权

US07368384B2 Film formation apparatus and method of using the same 有权
标题翻译：成膜装置及其使用方法
公开(公告)号：US07368384B2
公开(公告)日：2008-05-06
申请号：US11110931
申请日：2005-04-21
申请人： Atsushi Endo , Tomonori Fujiwara , Yuichiro Morozumi , Katsushige Harada , Shigeru Nakajima , Dong-Kyun Choi , Haruhiko Furuya , Kazuo Yabe
发明人： Atsushi Endo , Tomonori Fujiwara , Yuichiro Morozumi , Katsushige Harada , Shigeru Nakajima , Dong-Kyun Choi , Haruhiko Furuya , Kazuo Yabe
IPC分类号： H01L21/302
CPC分类号： B08B7/0035 , C23C16/4405 , Y10S438/90
摘要： A method of using a film formation apparatus for a semiconductor process includes a step of removing a by-product film deposited on an inner surface of a reaction chamber of the film formation apparatus. This step is performed while supplying a cleaning gas containing hydrogen fluoride into the reaction chamber, and forming a first atmosphere within the reaction chamber, which allows water to be present as a liquid film.
摘要翻译：使用半导体工艺的成膜装置的方法包括除去沉积在成膜装置的反应室的内表面上的副产物膜的步骤。在向反应室供给含有氟化氢的清洁气体的同时进行该步骤，并且在反应室内形成允许水以液膜形式存在的第一气氛。

4. 发明授权

US5199080A Voice-operated remote control system 失效
标题翻译：语音遥控系统
公开(公告)号：US5199080A
公开(公告)日：1993-03-30
申请号：US578706
申请日：1990-09-07
申请人： Toshiyuki Kimura , Kazuo Yabe
发明人： Toshiyuki Kimura , Kazuo Yabe
IPC分类号： G10L11/00 , G10L15/00 , G10L15/02 , G10L15/06 , G10L15/10 , G10L15/22 , G10L15/26 , G10L15/28 , G10L15/32 , G10L15/34 , H03J1/00 , H03J9/00 , H04N5/44 , H04Q9/00
CPC分类号： H03J9/00 , G10L15/26 , H03J1/0025
摘要： A voice-operated remote control system which transmits a remote control signal in response to a voice command has a speech recognition circuit for recognizing the voice command. The speech recognition circuit has standard pattern data storage unit for storing a plurality of standard pattern data with respect to each of voice commands. The input voice command is compared with the plural standard pattern data for accurate speech recognition.
摘要翻译：响应于语音命令发送遥控信号的语音遥控系统具有用于识别语音命令的语音识别电路。语音识别电路具有用于存储关于每个语音命令的多个标准模式数据的标准模式数据存储单元。将输入语音命令与用于准确语音识别的多个标准模式数据进行比较。

5. 发明申请

US20120028471A1 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：US20120028471A1
公开(公告)日：2012-02-02
申请号：US13259764
申请日：2011-02-18
申请人： Kenichi Oyama , Kazuo Yabe , Hidetami Yaegashi
发明人： Kenichi Oyama , Kazuo Yabe , Hidetami Yaegashi
IPC分类号： H01L21/308
CPC分类号： H01L21/32139 , H01L21/0337 , H01L27/0207 , H01L27/11 , H01L27/1104
摘要： A method of manufacturing a semiconductor device includes: forming a thin film on a substrate; forming a resist mask which forms a photoresist mask having an elliptical hole pattern on the thin film; shrinking a hole size of the second pattern by forming an insulating film on a side wall of the second pattern of the photoresist layer; and etching the thin film using the insulating film and the photoresist layer which form the second pattern having the shrinked hole size as a mask.
摘要翻译：一种制造半导体器件的方法包括：在衬底上形成薄膜; 形成在薄膜上形成具有椭圆孔图案的光致抗蚀剂掩模的抗蚀剂掩模; 通过在光致抗蚀剂层的第二图案的侧壁上形成绝缘膜来缩小第二图案的孔尺寸; 并且使用形成具有缩小孔尺寸的第二图案的绝缘膜和光致抗蚀剂层作为掩模来蚀刻薄膜。

6. 发明申请

US20050245099A1 Film formation apparatus and method of using the same 有权
标题翻译：成膜装置及其使用方法
公开(公告)号：US20050245099A1
公开(公告)日：2005-11-03
申请号：US11110931
申请日：2005-04-21
申请人： Atsushi Endo , Tomonori Fujiwara , Yuichiro Morozumi , Katsushige Harada , Shigeru Nakajima , Dong-Kyun Choi , Haruhiko Furuya , Kazuo Yabe
发明人： Atsushi Endo , Tomonori Fujiwara , Yuichiro Morozumi , Katsushige Harada , Shigeru Nakajima , Dong-Kyun Choi , Haruhiko Furuya , Kazuo Yabe
IPC分类号： B08B5/00 , B08B7/00 , B08B7/04 , C23C16/00 , C23C16/44 , H01L21/304 , H01L21/3065 , H01L21/31 , H01L21/469
CPC分类号： B08B7/0035 , C23C16/4405 , Y10S438/90
摘要： A method of using a film formation apparatus for a semiconductor process includes a step of removing a by-product film deposited on an inner surface of a reaction chamber of the film formation apparatus. This step is performed while supplying a cleaning gas containing hydrogen fluoride into the reaction chamber, and forming a first atmosphere within the reaction chamber, which allows water to be present as a liquid film.
摘要翻译：使用半导体工艺的成膜装置的方法包括除去沉积在成膜装置的反应室的内表面上的副产物膜的步骤。在向反应室供给含有氟化氢的清洁气体的同时进行该步骤，并且在反应室内形成允许水以液膜形式存在的第一气氛。

7. 发明授权

US5247580A Voice-operated remote control system 失效
标题翻译：语音遥控系统
公开(公告)号：US5247580A
公开(公告)日：1993-09-21
申请号：US917672
申请日：1992-07-22
申请人： Toshiyuki Kimura , Kazuo Yabe
发明人： Toshiyuki Kimura , Kazuo Yabe
IPC分类号： G10L15/26 , H03J1/00 , H04B1/20 , H04B10/10
CPC分类号： H04B10/114 , G10L15/26 , H03J1/0025 , H04B1/202
摘要： A voice-operated remote control system which transmits a remote control signal in response to a voice command has a degree-of-importance determining unit for determining the degree of importance of the voice command that is applied to the remote control system. The degree-of-importance determining unit sends a degree-of-importance signal corresponding to the degree of importance of the voice command to a recognition accuracy determining unit. Depending on the degree of importance of the input voice command as indicated by the degree-of-importance signal, the recognition accuracy determining unit determines whether the accuracy of the recognition result is high or low, and delivers only the recognition result of higher recognition accuracy to a transmitting circuit.
摘要翻译：响应于语音命令发送远程控制信号的语音遥控系统具有确定应用于遥控系统的语音命令的重要程度的重要度确定单元。重要度确定单元将与语音命令的重要程度相对应的重要度信号发送到识别精度确定单元。根据由重要度信号所表示的输入语音命令的重要程度，识别精度确定单元确定识别结果的精度是高还是低，并且仅传递更高识别精度的识别结果发送电路。

8. 发明授权

US07200239B2 Acoustic apparatus having balance adjustment 失效
标题翻译：具有平衡调节的声学设备
公开(公告)号：US07200239B2
公开(公告)日：2007-04-03
申请号：US10021436
申请日：2001-12-19
申请人： Kazuo Yabe , Hideshi Ishiyama , Takahiro Ushiba
发明人： Kazuo Yabe , Hideshi Ishiyama , Takahiro Ushiba
IPC分类号： H03G3/00 , H04B1/00
CPC分类号： H04S7/00 , H04R5/04 , H04R2499/13 , H04S7/40 , H04S2400/13
摘要： In an acoustic apparatus, one or more front and rear speakers are provided in a space such as a car compartment. The volume levels of the audio signals output from the speakers are controlled by the volume control unit. Also, the valance between the volume levels of the audio signals from the front speaker and the rear speaker is controlled by the balance control unit. The balance control unit generally controls the balance according to the input by a user. To the front speaker or the rear speaker, an external audio signal can be supplied. When the external audio signal is supplied to one of the front speaker and the second speaker which has not been attenuated by the balance control device and the balance control device attenuates the volume level of said one of the front speaker and the second speaker, the volume level of the audio signal is attenuated. Therefore, the external audio signal becomes easy for the user to hear.
摘要翻译：在声学装置中，在诸如汽车隔间的空间中设置一个或多个前后扬声器。扬声器输出的音频信号的音量由音量控制单元控制。此外，来自前置扬声器和后置扬声器的音频信号的音量之间的差值由平衡控制单元控制。平衡控制单元一般根据用户的输入控制平衡。可以向前置扬声器或后置扬声器提供外部音频信号。当外部音频信号被提供给尚未被平衡控制装置衰减的前置扬声器和第二扬声器之一并且平衡控制装置衰减前置扬声器和第二扬声器中的所述一个的音量时，音量音频信号的电平被衰减。因此，外部音频信号变得容易使用户听到。

9. 发明授权

US06657317B2 Electronic device with erroneous operation button state judging 失效
标题翻译：具有错误操作按钮状态判断的电子设备
公开(公告)号：US06657317B2
公开(公告)日：2003-12-02
申请号：US10026829
申请日：2001-12-27
申请人： Hideshi Ishiyama , Kazuo Yabe
发明人： Hideshi Ishiyama , Kazuo Yabe
IPC分类号： H01H8300
CPC分类号： H02H11/00 , H01H2239/012 , H01H2239/03 , H01H2239/066 , Y10T307/858
摘要： An electronic device does not carry out control operation corresponding to a signal from an operation button which is kept in pressed state when electric power is supplied. When electric power is supplied, the voltage changing depending on open and closed state of switches SW1 to SW4 corresponding to operation buttons to be manipulated is judged to be a specified value or not. When the voltage is not judged to be specified value, the control unit does not carry out control operation corresponding to the signal from the operation button that has been in pressed state.
摘要翻译：电子设备不进行与提供电力时保持在按压状态的操作按钮的信号相对应的控制操作。当供电时，与要操作的操作按钮相对应的开关SW1至SW4的打开和关闭状态的电压变化被判定为指定值。当电压未被判断为指定值时，控制单元不执行与已经处于按压状态的操作按钮的信号相对应的控制操作。

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