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1. 发明申请

US20120244639A1 METHOD OF MANUFACTURING MAGNETIC MEMORY 失效
标题翻译：制造磁记忆的方法
公开(公告)号：US20120244639A1
公开(公告)日：2012-09-27
申请号：US13226868
申请日：2011-09-07
申请人： Yuichi OHSAWA , Shigeki Takahashi , Junichi Ito , Daisuke Saida , Kyoichi Suguro , Hiroaki Yoda
发明人： Yuichi OHSAWA , Shigeki Takahashi , Junichi Ito , Daisuke Saida , Kyoichi Suguro , Hiroaki Yoda
IPC分类号： H01L43/12
CPC分类号： H01L43/12 , H01L29/82
摘要： According to one embodiment, a method of manufacturing a magnetic memory, the method includes forming a first magnetic layer having a variable magnetization, forming a tunnel barrier layer on the first magnetic layer, forming a second magnetic layer on the tunnel barrier layer, the second magnetic layer having an invariable magnetization, forming a hard mask layer as a mask on the second magnetic layer, patterning the second magnetic layer by using the mask of the hard mask layer, and executing a GCIB-irradiation by using the mask of the hard mask layer, after the patterning.
摘要翻译：根据一个实施例，一种制造磁存储器的方法，该方法包括形成具有可变磁化强度的第一磁性层，在第一磁性层上形成隧道势垒层，在隧道势垒层上形成第二磁性层，具有不变磁化的磁性层，在第二磁性层上形成硬掩模层作为掩模，通过使用硬掩模层的掩模对第二磁性层进行构图，并使用硬掩模的掩模执行GCIB照射层，图案后。

2. 发明申请

US20120244640A1 METHOD OF MANUFACTURING MULTILAYER FILM 有权
标题翻译：制造多层膜的方法
公开(公告)号：US20120244640A1
公开(公告)日：2012-09-27
申请号：US13226960
申请日：2011-09-07
申请人： Yuichi OHSAWA , Shigeki Takahashi , Junichi Ito , Daisuke Saida , Kyoichi Suguro , Hiroaki Yoda
发明人： Yuichi OHSAWA , Shigeki Takahashi , Junichi Ito , Daisuke Saida , Kyoichi Suguro , Hiroaki Yoda
IPC分类号： H01L43/12
CPC分类号： H01L43/12 , H01L29/82
摘要： According to one embodiment, a method of manufacturing a multilayer film, the method includes forming a first layer, forming a second layer on the first layer, and transcribing a crystal information of one of the first and second layers to the other one of the first and second layers by executing a GCIB-irradiation to the second layer.
摘要翻译：根据一个实施例，一种制造多层膜的方法，该方法包括：形成第一层，在第一层上形成第二层，以及将第一层和第二层之一的晶体信息转录到第一层中的另一层并且通过对第二层执行GCIB照射来产生第二层。

3. 发明申请

US20130029431A1 METHOD FOR MANUFACTURING NONVOLATILE MEMORY DEVICE 有权
标题翻译：制造非易失性存储器件的方法
公开(公告)号：US20130029431A1
公开(公告)日：2013-01-31
申请号：US13534673
申请日：2012-06-27
申请人： Shigeki TAKAHASHI , Kyoichi SUGURO , Junichi ITO , Yuichi OHSAWA , Hiroaki YODA
发明人： Shigeki TAKAHASHI , Kyoichi SUGURO , Junichi ITO , Yuichi OHSAWA , Hiroaki YODA
IPC分类号： H01L21/306
CPC分类号： H01L43/12
摘要： According to one embodiment, a method for manufacturing a nonvolatile memory device including a plurality of memory cells is disclosed. Each of the plurality of memory cells includes a base layer including a first electrode, a magnetic tunnel junction device provided on the base layer, and a second electrode provided on the magnetic tunnel junction device. The magnetic tunnel junction device includes a first magnetic layer, a tunneling barrier layer provided on the first magnetic layer, and a second magnetic layer provided on the tunneling barrier layer. The method can include etching a portion of the second magnetic layer and a portion of the first magnetic layer by irradiating gas clusters onto a portion of a surface of the second magnetic layer or a portion of a surface of the first magnetic layer.
摘要翻译：根据一个实施例，公开了一种用于制造包括多个存储单元的非易失性存储器件的方法。多个存储单元中的每一个包括基底层，其包括第一电极，设置在基底层上的磁性隧道结器件和设置在磁性隧道结装置上的第二电极。磁隧道结装置包括第一磁性层，设置在第一磁性层上的隧道势垒层，以及设置在隧道势垒层上的第二磁性层。该方法可以包括通过将气体簇照射到第二磁性层的表面的一部分或第一磁性层的表面的一部分上来蚀刻第二磁性层的一部分和第一磁性层的一部分。

4. 发明申请

US20120074511A1 MAGNETIC MEMORY AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：磁记忆及其制造方法
公开(公告)号：US20120074511A1
公开(公告)日：2012-03-29
申请号：US13231894
申请日：2011-09-13
申请人： Shigeki TAKAHASHI , Yuichi OHSAWA , Junichi ITO , Chikayoshi KAMATA , Saori KASHIWADA , Minoru AMANO , Hiroaki YODA
发明人： Shigeki TAKAHASHI , Yuichi OHSAWA , Junichi ITO , Chikayoshi KAMATA , Saori KASHIWADA , Minoru AMANO , Hiroaki YODA
IPC分类号： H01L27/22 , H01L43/12 , H01L43/02
CPC分类号： H01L43/12 , H01L27/228 , H01L43/08 , H01L43/10
摘要： A magnetic memory according to an embodiment includes: at least one memory cell comprising a magnetoresistive element as a memory element, and first and second electrodes that energize the magnetoresistive element. The magnetoresistive element includes: a first magnetic layer having a variable magnetization direction perpendicular to a film plane; a tunnel barrier layer on the first magnetic layer; and a second magnetic layer on the tunnel barrier layer, and having a fixed magnetization direction perpendicular to the film plane. The first magnetic layer including: a first region; and a second region outside the first region so as to surround the first region, and having a smaller perpendicular magnetic anisotropy energy than that of the first region. The second magnetic layer including: a third region; and a fourth region outside the third region, and having a smaller perpendicular magnetic anisotropy energy than that of the third region.
摘要翻译：根据实施例的磁存储器包括：包括作为存储元件的磁阻元件的至少一个存储单元，以及激励磁阻元件的第一和第二电极。磁阻元件包括：具有与膜平面垂直的可变磁化方向的第一磁性层; 在第一磁性层上的隧道阻挡层; 以及隧道势垒层上的第二磁性层，并且具有与膜平面垂直的固定的磁化方向。所述第一磁性层包括：第一区域; 以及围绕第一区域的第一区域外的第二区域，并且具有比第一区域小的垂直磁各向异性能量。第二磁性层包括：第三区域; 以及第三区域外的第四区域，并且具有比第三区域小的垂直磁各向异性能量。

5. 发明申请

US20120236633A1 MAGNETIC RECORDING ELEMENT AND NONVOLATILE MEMORY DEVICE 失效
标题翻译：磁记录元件和非易失性存储器件
公开(公告)号：US20120236633A1
公开(公告)日：2012-09-20
申请号：US13228040
申请日：2011-09-08
申请人： Daisuke SAIDA , Minoru AMANO , Junichi ITO , Yuichi OHSAWA , Saori KASHIWADA , Chikayoshi KAMATA , Tadaomi DAIBOU
发明人： Daisuke SAIDA , Minoru AMANO , Junichi ITO , Yuichi OHSAWA , Saori KASHIWADA , Chikayoshi KAMATA , Tadaomi DAIBOU
IPC分类号： G11C11/15 , G11B5/66
CPC分类号： G11B5/66 , G11C11/161 , H01L27/228 , H01L43/08
摘要： According to one embodiment, a magnetic recording element includes a stacked body. The stacked body includes a first and a second stacked unit. The first stacked unit includes first and second ferromagnetic layers and a first nonmagnetic layer. The first nonmagnetic layer is provided between the first and second ferromagnetic layers. The second stacked unit is stacked with the first stacked unit and includes third and fourth ferromagnetic layers and a second nonmagnetic layer. The fourth ferromagnetic layer is stacked with the third ferromagnetic layer. The second nonmagnetic layer is provided between the third and fourth ferromagnetic layers. An outer edge of the fourth ferromagnetic layer includes a portion outside an outer edge of the first stacked unit in a plane. A magnetization direction of the second ferromagnetic layer is determined by causing a spin-polarized electron and a rotating magnetic field to act on the second ferromagnetic layer.
摘要翻译：根据一个实施例，磁记录元件包括堆叠体。堆叠体包括第一和第二堆叠单元。第一堆叠单元包括第一和第二铁磁层和第一非磁性层。第一非磁性层设置在第一和第二铁磁层之间。第二堆叠单元与第一堆叠单元堆叠并且包括第三和第四铁磁层和第二非磁性层。第四铁磁层与第三铁磁层层叠。第二非磁性层设置在第三和第四铁磁层之间。第四铁磁层的外边缘包括平面内第一堆叠单元的外边缘外侧的部分。通过使自旋极化电子和旋转磁场作用于第二铁磁层来确定第二铁磁层的磁化方向。

6. 发明申请

US20120243308A1 MAGNETIC ELEMENT AND NONVOLATILE MEMORY DEVICE 失效
标题翻译：磁性元件和非易失性存储器件
公开(公告)号：US20120243308A1
公开(公告)日：2012-09-27
申请号：US13227959
申请日：2011-09-08
申请人： Daisuke SAIDA , Minoru AMANO , Junichi ITO , Yuichi OHSAWA , Saori KASHIWADA , Chikayoshi KAMATA , Tadaomi DAIBOU
发明人： Daisuke SAIDA , Minoru AMANO , Junichi ITO , Yuichi OHSAWA , Saori KASHIWADA , Chikayoshi KAMATA , Tadaomi DAIBOU
IPC分类号： G11C11/15 , H01L29/82
CPC分类号： G11C11/161 , G11C11/1655 , G11C11/1659 , G11C11/1673 , G11C11/1675 , H01L27/228 , H01L43/08
摘要： According to one embodiment, a magnetic element includes first and second conductive layers, an intermediate interconnection, and first and second stacked units. The intermediate interconnection is provided between the conductive layers. The first stacked unit is provided between the first conductive layer and the interconnection, and includes first and second ferromagnetic layer and a first nonmagnetic layer provided between the first and second ferromagnetic layers. The second stacked unit is provided between the second conductive layer and the interconnection, and includes third and fourth ferromagnetic layers and a second nonmagnetic layer provided between the third and fourth ferromagnetic layers. A magnetization direction of the second ferromagnetic layer is determined by causing a spin-polarized electron and a magnetic field to act on the second ferromagnetic layer.
摘要翻译：根据一个实施例，磁性元件包括第一和第二导电层，中间互连以及第一和第二堆叠单元。中间互连设置在导电层之间。第一层叠单元设置在第一导电层和互连之间，并且包括第一和第二铁磁层和设置在第一和第二铁磁层之间的第一非磁性层。第二堆叠单元设置在第二导电层和互连之间，并且包括第三和第四铁磁层以及设置在第三和第四铁磁层之间的第二非磁性层。通过使自旋极化电子和磁场作用于第二铁磁层来确定第二铁磁层的磁化方向。

7. 发明申请

US20120196084A1 NANO-IMPRINT MOLD AND SUBSTRATE WITH UNEVEN PATTERNS MANUFACTURED BY USING THE MOLD 有权
标题翻译：使用模具制造的未加工图案的纳米印模和基材
公开(公告)号：US20120196084A1
公开(公告)日：2012-08-02
申请号：US13422897
申请日：2012-03-16
申请人： Yuichi OHSAWA , Junichi Ito , Tomotaka Ariga , Yoshinari Kurosaki , Saori Kashiwada
发明人： Yuichi OHSAWA , Junichi Ito , Tomotaka Ariga , Yoshinari Kurosaki , Saori Kashiwada
IPC分类号： B29C59/02 , B32B3/10 , B82Y40/00
CPC分类号： B29C59/022 , B29C2059/023 , Y10T428/24355
摘要： According to one embodiment, a nano-imprint mold includes plural pairs of first and second protrusions formed on a base layer, each of which is formed along the same straight line. Each protrusion has a top surface and four side surfaces. The first and second protrusions are mirror-symmetrical with each other. A first side surface of the first protrusion and a second side surface of the second protrusion face each other. A first angle between the first side surface or the second side surface and a main surface of the base layer is not less than 85° and not more than 90°. A second angle between a third side surface in the first protrusion or a fourth side surface in the second protrusion and the main surface of the base layer is not less than 70° and not more than 88°. The first angle is larger than the second angle.
摘要翻译：根据一个实施例，纳米压印模具包括形成在基底层上的多对第一和第二突起，其中每一个沿着相同的直线形成。每个突起具有顶表面和四个侧表面。第一和第二突起彼此镜像对称。第一突起的第一侧表面和第二突起的第二侧表面彼此面对。第一侧表面或第二侧表面与基层的主表面之间的第一角度不小于85°且不大于90°。第一突起中的第三侧表面或第二突起中的第四侧表面与基底层的主表面之间的第二角度不小于70°且不大于88°。第一角度大于第二角度。

8. 发明申请

US20110244688A1 METHOD OF PRODUCING MASK 有权
标题翻译：生产面膜的方法
公开(公告)号：US20110244688A1
公开(公告)日：2011-10-06
申请号：US12873652
申请日：2010-09-01
申请人： Yuichi OHSAWA , Junichi Ito , Saori Kashiwada , Chikayoshi Kamata
发明人： Yuichi OHSAWA , Junichi Ito , Saori Kashiwada , Chikayoshi Kamata
IPC分类号： H01L21/311
CPC分类号： H01L21/0337 , H01L43/12
摘要： According to one embodiment, a method of producing a mask includes: a step of forming a pattern on a substrate; a step of forming a first film that covers the top surface and side surface of the pattern and contains a first material; a step of forming a second film containing a second material on the first film; a step of performing anisotropic etching of the first and second films in a way that forms a sidewall layer including the first and second films on the side surface of the pattern and removes the first and second films on any location other than the sidewall layer; a step of performing isotropic etching of the first film of the sidewall layer; and a step of removing the pattern.
摘要翻译：根据一个实施例，制造掩模的方法包括：在基板上形成图案的步骤; 形成覆盖图案的顶表面和侧表面并包含第一材料的第一膜的步骤; 在所述第一膜上形成含有第二材料的第二膜的步骤; 以在图案的侧表面上形成包括第一和第二膜的侧壁层的方式进行第一和第二膜的各向异性蚀刻的步骤，并且除了侧壁层之外的任何位置去除第一和第二膜; 对侧壁层的第一膜进行各向同性蚀刻的步骤; 以及去除图案的步骤。

9. 发明申请

US20130069182A1 MAGNETORESISTIVE EFFECT ELEMENT, MAGNETIC MEMORY, AND MAGNETORESISTIVE EFFECT ELEMENT MANUFACTURING METHOD 有权
标题翻译：磁阻效应元件，磁记忆和磁阻效应元件制造方法
公开(公告)号：US20130069182A1
公开(公告)日：2013-03-21
申请号：US13419011
申请日：2012-03-13
申请人： Yuichi OHSAWA , Tadaomi Daibou , Yushi Kato , Eiji Kitagawa , Saori Kashiwada , Minoru Amano , Junichi Ito
发明人： Yuichi OHSAWA , Tadaomi Daibou , Yushi Kato , Eiji Kitagawa , Saori Kashiwada , Minoru Amano , Junichi Ito
IPC分类号： H01L29/82 , H01L21/8246
CPC分类号： H01L29/82 , B82Y40/00 , G11C11/161 , H01F10/126 , H01F10/3286 , H01F41/303 , H01L27/228 , H01L43/08 , H01L43/10
摘要： According to one embodiment, a magnetoresistive effect element includes a first magnetic film having magnetic anisotropy and an invariable magnetization direction in a direction perpendicular to a film plane, a second magnetic film having magnetic anisotropy and a variable magnetization direction in the direction perpendicular to the film plane, and a nonmagnetic film between the first magnetic film and the second magnetic film. At least one of the first and second magnetic films includes a first magnetic layer. The first magnetic layer includes a rare earth metal, a transition metal, and boron.
摘要翻译：根据一个实施例，磁阻效应元件包括在垂直于膜平面的方向上具有磁各向异性和不变磁化方向的第一磁性膜，在垂直于膜的方向上具有磁各向异性和可变磁化方向的第二磁性膜平面和第一磁性膜与第二磁性膜之间的非磁性膜。第一和第二磁性膜中的至少一个包括第一磁性层。第一磁性层包括稀土金属，过渡金属和硼。

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