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1. 发明授权

US07364349B2 Chemical dilution system for semiconductor device processing system 失效
标题翻译：半导体器件处理系统化学稀释系统
公开(公告)号：US07364349B2
公开(公告)日：2008-04-29
申请号：US11439303
申请日：2006-05-22
申请人： Younes Achkire , Julia Svirchevski , Jonathan S. Frankel , Kien-Bang Lam
发明人： Younes Achkire , Julia Svirchevski , Jonathan S. Frankel , Kien-Bang Lam
IPC分类号： B01F15/04
CPC分类号： H01L21/67253 , G05D11/133
摘要： A dilution stage is adapted to supply a dilute chemistry to a semiconductor device processing apparatus. The dilution stage includes a first vessel adapted to store the chemistry after dilution and a second vessel adapted to store the chemistry prior to dilution. The dilution stage may also include a control mechanism which is adapted to selectively control flowing of the chemistry and a dilutant to the first vessel. The control mechanism may be operative to fill the second vessel with the chemistry, and to flow the dilutant to the first vessel via the second vessel.
摘要翻译：稀释阶段适于向半导体器件处理设备提供稀释化学物质。稀释阶段包括适于在稀释后储存化学物质的第一容器和适于在稀释之前储存化学物质的第二容器。稀释阶段还可以包括适于选择性地控制化学物质和稀释剂流向第一容器的控制机构。控制机构可操作以用化学物质填充第二容器，并且通过第二容器将稀释剂流经第一容器。

2. 发明申请

US20060211344A1 Chemical dilution system for semiconductor device processing system 失效
标题翻译：半导体器件处理系统化学稀释系统
公开(公告)号：US20060211344A1
公开(公告)日：2006-09-21
申请号：US11439303
申请日：2006-05-22
申请人： Younes Achkire , Julia Svirchevski , Jonathan Frankel , Kien-Bang Lam
发明人： Younes Achkire , Julia Svirchevski , Jonathan Frankel , Kien-Bang Lam
IPC分类号： B24B1/00
CPC分类号： H01L21/67253 , G05D11/133
摘要： A dilution stage is adapted to supply a dilute chemistry to a semiconductor device processing apparatus. The dilution stage includes a first vessel adapted to store the chemistry after dilution and a second vessel adapted to store the chemistry prior to dilution. The dilution stage may also include a control mechanism which is adapted to selectively control flowing of the chemistry and a dilutant to the first vessel. The control mechanism may be operative to fill the second vessel with the chemistry, and to flow the dilutant to the first vessel via the second vessel.
摘要翻译：稀释阶段适于向半导体器件处理设备提供稀释化学物质。稀释阶段包括适于在稀释后储存化学物质的第一容器和适于在稀释之前储存化学物质的第二容器。稀释阶段还可以包括适于选择性地控制化学物质和稀释剂流向第一容器的控制机构。控制机构可操作以用化学物质填充第二容器，并且通过第二容器将稀释剂流经第一容器。

3. 发明授权

US08322045B2 Single wafer apparatus for drying semiconductor substrates using an inert gas air-knife 有权
标题翻译：使用惰性气体气刀干燥半导体衬底的单晶片装置
公开(公告)号：US08322045B2
公开(公告)日：2012-12-04
申请号：US12249956
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： F26B21/06
CPC分类号： H01L21/67034
摘要： In one aspect, a substrate processing apparatus is provided. The apparatus comprises a mechanism for forming a meniscus on a surface of a substrate by moving the substrate through a fluid; an air knife apparatus positioned to apply an air knife to shorten the meniscus formed on the surface of the substrate; and a drying vapor nozzle positioned to direct a drying vapor to the meniscus shortened by the air knife. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种基板处理装置。该装置包括用于通过移动衬底通过流体在衬底的表面上形成弯液面的机构; 定位成施加气刀以缩短形成在基板表面上的弯液面的气刀装置; 以及干燥蒸汽喷嘴，定位成将干燥蒸汽引导到由气刀缩短的弯液面。提供了许多其他方面。

4. 发明申请

US20090044839A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 有权
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090044839A1
公开(公告)日：2009-02-19
申请号：US12249956
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B13/00
CPC分类号： H01L21/67034
摘要： In one aspect, a substrate processing apparatus is provided. The apparatus comprises a mechanism for forming a meniscus on a surface of a substrate by moving the substrate through a fluid; an air knife apparatus positioned to apply an air knife to shorten the meniscus formed on the surface of the substrate; and a drying vapor nozzle positioned to direct a drying vapor to the meniscus shortened by the air knife. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种基板处理装置。该装置包括用于通过移动衬底通过流体在衬底的表面上形成弯液面的机构; 定位成施加气刀以缩短形成在基板表面上的弯液面的气刀装置; 以及干燥蒸汽喷嘴，定位成将干燥蒸汽引导到由气刀缩短的弯液面。提供了许多其他方面。

5. 发明申请

US20090032068A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 审中-公开
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090032068A1
公开(公告)日：2009-02-05
申请号：US12249961
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B5/00 , B08B3/04
CPC分类号： H01L21/67034
摘要： In one aspect, a method is provided. The method comprises forming a meniscus at an interface between a substrate and a fluid surface by moving the substrate through the fluid; shortening the meniscus by applying an air knife to the meniscus at the interface between the substrate and the fluid surface; and Marangoni drying the substrate by applying a drying vapor to the shortened meniscus. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种方法。该方法包括通过移动衬底通过流体在衬底和流体表面之间的界面处形成弯液面; 通过在基板和流体表面之间的界面处向弯液面施加气刀来缩短弯月面; 并且Marangoni通过对缩短的弯液面施加干燥蒸气来干燥基底。提供了许多其他方面。

6. 发明申请

US20090078292A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 审中-公开
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090078292A1
公开(公告)日：2009-03-26
申请号：US12249960
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B13/00
CPC分类号： H01L21/67034
摘要： In one aspect, an apparatus is provided. The apparatus comprises a chamber; a plurality of rollers adapted to support a wafer in a vertical orientation within a chamber; a pair of brushes adapted to scrub a first and a second side of the wafer respectively; a first spray bar adapted to spray a liquid on the wafer to form a meniscus on the wafer as the wafer is lifted out of the chamber; and a second spray bar adapted to direct a vapor to the meniscus, the vapor being adapted to lower a surface tension of the liquid at the meniscus to perform Marangoni drying of the wafer as the wafer is lifted out of the chamber. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种装置。该装置包括一个室; 适于在腔室内以垂直取向支撑晶片的多个辊; 一对刷子，分别用于擦拭所述晶片的第一和第二侧; 第一喷杆，当晶片被提升出室时，适于在晶片上喷射液体以在晶片上形成弯月面; 以及适于将蒸汽引导到弯液面的第二喷杆，所述蒸汽适于降低所述弯液面处的液体的表面张力，以在所述晶片被提升到所述腔室之后执行所述晶片的马兰戈尼干燥。提供了许多其他方面。

7. 发明授权

US06957749B2 Liquid delivery system 失效
标题翻译：液体输送系统
公开(公告)号：US06957749B2
公开(公告)日：2005-10-25
申请号：US10452798
申请日：2003-05-30
申请人： Younes Achkire , Jonathan S Frankel , Brian J Brown
发明人： Younes Achkire , Jonathan S Frankel , Brian J Brown
IPC分类号： H01L21/00 , B67D5/00 , B67D5/56 , C23C16/00
CPC分类号： H01L21/67057
摘要： In a first aspect, a liquid delivery system is provided that includes a first liquid delivery module adapted to store and dispense a first chemical and a second liquid delivery module adapted to store and dispense a second chemical. The liquid delivery system further includes at least one connecting mechanism coupled to the first and second delivery modules and adapted to couple the first and second delivery modules to a substrate processing device. Each delivery module includes a vessel including a first chamber and a second chamber. The vessel is configured to receive a liquid from a bulk supply and to receive a pressurized flow of gas from a gas source. Each liquid delivery module also includes a valve assembly operable to selectively permit fluid communication between the first chamber and the second chamber during a non-refill state and to prevent fluid communication between the first chamber and the second chamber during a refill state.
摘要翻译：在第一方面，提供一种液体输送系统，其包括适于储存和分配第一化学品的第一液体输送模块和适于储存和分配第二化学品的第二液体输送模块。液体输送系统还包括耦合到第一和第二输送模块的至少一个连接机构，并且适于将第一和第二输送模块耦合到基板处理装置。每个输送模块包括一个包括第一室和第二室的容器。容器构造成从大量供应源接收液体并且接收来自气体源的加压气体流。每个液体输送模块还包括阀组件，可操作以在非再填充状态期间选择性地允许第一腔室和第二腔室之间的流体连通，并且在再填充状态期间防止第一腔室和第二腔室之间的流体连通。

8. 发明授权

US07774887B2 Scrubber box and methods for using the same 有权
标题翻译：洗涤箱和使用方法
公开(公告)号：US07774887B2
公开(公告)日：2010-08-17
申请号：US12102846
申请日：2008-04-14
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B7/00 , A47L25/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

9. 发明申请

US20050087212A1 Scrubber box and methods for using the same 有权
标题翻译：洗涤箱和使用方法
公开(公告)号：US20050087212A1
公开(公告)日：2005-04-28
申请号：US10976012
申请日：2004-10-28
申请人： Joseph Yudovsky , Avi Tepman , Kenneth Reynolds , Younes Achkire , Dan Marohl , Steve Ghanayem , Alexander Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth Reynolds , Younes Achkire , Dan Marohl , Steve Ghanayem , Alexander Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B1/04 , H01L21/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

10. 发明申请

US20090241996A1 SINGLE WAFER DRYER AND DRYING METHODS 审中-公开
标题翻译：单辊干燥机和干燥方法
公开(公告)号：US20090241996A1
公开(公告)日：2009-10-01
申请号：US12345642
申请日：2008-12-29
申请人： Younes Achkire , Alexander N. Lerner , Boris I. Govzman , Boris Fishkin , Michael N. Sugarman , Rashid A. Mavliev , Haoquan Fang , Shijian Li , Guy E. Shirazi , Jianshe Tang
发明人： Younes Achkire , Alexander N. Lerner , Boris I. Govzman , Boris Fishkin , Michael N. Sugarman , Rashid A. Mavliev , Haoquan Fang , Shijian Li , Guy E. Shirazi , Jianshe Tang
IPC分类号： B08B3/00
CPC分类号： H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要： In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.
摘要翻译：在第一方面，提供一种适于处理晶片的模块。模块包括具有一个或多个特征的处理部分，例如（1）可旋转晶片支撑件，用于从第一取向旋转输入晶片，其中晶片与负载端口对准至第二取向，其中晶片与卸货港（2）捕捉器，其适于在从所述处理部分卸载时与晶片被动接触和行进; （3）适于产生从其一侧到另一侧的层流空气流的封闭输出部分; （4）具有多个晶片接收器的输出部分; （5）浸没式流体喷嘴; 和/或（6）干燥气体导流板等。其它方面包括晶片处理的方法。

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