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1. 发明授权

US5496402A Method and liquid coating composition for the formation of silica-based coating film on substrate surface 失效
标题翻译：用于在基材表面形成二氧化硅基涂膜的方法和液体涂料组合物
公开(公告)号：US5496402A
公开(公告)日：1996-03-05
申请号：US307063
申请日：1994-09-16
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： C08G77/18 , C03C1/00 , C08G77/06 , C09D183/02 , C09D183/04 , C09D183/05 , C09D183/06 , C03C3/06
CPC分类号： C03C1/008 , C09D183/02 , C09D183/04
摘要： Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3, in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4, in which each R has the same meaning as defined above, in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
摘要翻译：提出了一种液体涂料组合物，用于形成具有良好保存稳定性的硅质涂膜，用于各种基材表面的保护，调平或电绝缘。该组合物是均匀的溶液，其包含：（A）（a）由通式HSi（OR）3表示的第一可水解硅烷化合物的部分共水解 - 缩聚产物，其中每个R独立地为烷基具有1至4个碳原子的基团或苯基，和（b）由通式Si（OR）4表示的第二可水解硅烷化合物，其中每个R具有与上述相同的含义，摩尔比为 a）:( b）在1:9至9:1的范围内; 和（B）有机溶剂以溶解组分（A）。通过将其中含有的醇作为硅烷化合物的水解产物除去不超过15重量％的含量，可以提高涂料组合物的保存稳定性。

2. 发明授权

US5614251A Method and liquid coating composition for the formation of silica-based coating film on substrate surface 失效
标题翻译：用于在基材表面形成二氧化硅基涂膜的方法和液体涂料组合物
公开(公告)号：US5614251A
公开(公告)日：1997-03-25
申请号：US564710
申请日：1995-11-29
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： C08G77/18 , C03C1/00 , C08G77/06 , C09D183/02 , C09D183/04 , C09D183/05 , B05D3/02
CPC分类号： C03C1/008 , C09D183/02 , C09D183/04
摘要： Proposed is a liquid coating composition for the formation of a siliceous coating film having good storage stability against gelation for the protection, levelling or electric insulation of various substrate surfaces. The composition is a uniform solution comprising:(A) a partial cohydrolysis-cocondensation product of(a) a first hydrolyzable silane compound represented by the general formulaHSi(OR).sub.3, in which each R is, independently from the others, an alkyl group having 1 to 4 carbon atoms or a phenyl group, and(b) a second hydrolyzable silane compound represented by the general formulaSi(OR).sub.4, in which each R has the same meaning as defined above,in a molar ratio of (a):(b) in the range from 1:9 to 9:1; and (B) an organic solvent to dissolve the component (A). The storage stability of the coating composition can be improved by removing the alcohol contained therein as the hydrolysis product of the silane compounds to such a content as not to exceed 15% by weight.
摘要翻译：提出了一种液体涂料组合物，用于形成具有良好保存稳定性的硅质涂膜，用于各种基材表面的保护，调平或电绝缘。该组合物是一种均匀溶液，其包含：（A）（a）由通式为H（OR）3表示的第一可水解硅烷化合物的部分共水解 - 缩聚产物，其中每个R独立地为烷基具有1至4个碳原子或苯基，和（b）由通式Si（OR）4表示的第二可水解硅烷化合物，其中每个R具有与上述相同的含义，摩尔比为（a）：（b）在1：9至9：1的范围内; 和（B）有机溶剂以溶解组分（A）。通过将其中含有的醇作为硅烷化合物的水解产物除去不超过15重量％的含量，可以提高涂料组合物的保存稳定性。

3. 发明授权

US5762697A Coating solution for silica-based coating film and method for the preparation thereof 失效
标题翻译：二氧化硅系涂膜用涂布液及其制备方法
公开(公告)号：US5762697A
公开(公告)日：1998-06-09
申请号：US749845
申请日：1996-11-15
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： C08G77/06 , C08J3/09 , C09D183/04 , H01L21/316 , C09D183/06
CPC分类号： C08J3/095 , C08G77/06 , C09D183/04 , C08J2383/04
摘要： Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.
摘要翻译：提出了用于在半导体器件的制造工艺中使用的基板表面上形成二氧化硅基涂膜的涂布溶液以及涂布溶液的方法，其表现出优异的储存稳定性而没有凝胶化，并且能够形成即使当涂膜具有相对较大的厚度时也由于诸如裂纹形成等气体的析出而无法解决的二氧化硅系涂膜。通过加入特定量的水，然后除去由三烷氧基硅烷的水解反应形成的醇，通过溶解在规定浓度的丙二醇二甲醚中的三烷氧基硅烷如三乙氧基硅烷等水解反应制备涂布溶液，蒸馏到使涂布溶液中的醇的含量不超过10重量％，优选3重量％的程度。

4. 发明授权

US5795378A Coating solution for silica-based coating film and method for the preparation thereof 失效
公开(公告)号：US5795378A
公开(公告)日：1998-08-18
申请号：US935510
申请日：1997-09-23
申请人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Yoshinori Sakamoto , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： C08G77/06 , C08J3/09 , C09D183/04 , H01L21/316 , C09D183/06
CPC分类号： C08J3/095 , C08G77/06 , C09D183/04 , C08J2383/04
摘要： Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.

5. 发明授权

US6074962A Method for the formation of silica-based coating film 失效
标题翻译：二氧化硅基涂膜的形成方法
公开(公告)号：US6074962A
公开(公告)日：2000-06-13
申请号：US070881
申请日：1998-05-01
申请人： Yoshinori Sakamoto , Yoshio Hagiwara
发明人： Yoshinori Sakamoto , Yoshio Hagiwara
IPC分类号： C23C18/14 , G02F1/1333 , H01L21/312 , H01L21/316 , B05D3/02 , B05D3/06 , H01L21/31 , H01L21/4763
CPC分类号： H01L21/02126 , G02F1/133345 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/3122 , H01L21/316
摘要： Disclosed is a method for the formation of a silica-based coating film of a relatively large thickness in the manufacturing process of semiconductor devices and liquid crystal display panels by repeating the sequence consisting of coating of the surface with a coating solution containing a partial hydrolysis-condensation product of a trialkoxy silane compound followed by drying until a desired overall thickness of the coating film is obtained prior to a final baking treatment at 350 to 500.degree. C . The invention provides an improvement obtained by an ultraviolet irradiation treatment of the coating film intervening between a sequence of coating and drying and the next sequence of coating and drying so that the adhesion between the coating layers formed by repeating the sequence of coating and drying can be improved along with an advantage of absence of pinholes in the coating film.
摘要翻译：本发明公开了一种在半导体器件和液晶显示面板的制造工艺中形成厚度相对较大的二氧化硅系涂膜的方法，其中，通过重复由包含部分水解反应器的涂布液，三醇烷氧基硅烷化合物的缩合产物，然后在350-500℃下进行最终烘烤处理之前，直到获得所需的涂膜总厚度为止。本发明提供了通过在涂布和干燥顺序之间的涂膜的紫外线照射处理和下一个涂布和干燥顺序的紫外线照射处理而获得的改进，使得通过重复涂布和干燥顺序形成的涂层之间的粘合力可以是改善了涂膜中没有针孔的优点。

6. 发明授权

US06515073B2 Anti-reflective coating-forming composition 失效
标题翻译：防反射涂层组合物
公开(公告)号：US06515073B2
公开(公告)日：2003-02-04
申请号：US09817077
申请日：2001-03-26
申请人： Yoshinori Sakamoto , Katsumi Omori , Yoshio Hagiwara
发明人： Yoshinori Sakamoto , Katsumi Omori , Yoshio Hagiwara
IPC分类号： C08G7718
CPC分类号： C08F8/42
摘要： An anti-reflective coating-forming composition comprising: (A) at least one compound selected from the group consisting of (i) a compound represented by the following formula (1): Si(OR1)a(OR2)b(OR3)c(OR4)d (1) (ii) a compound represented by the following formula (2): R5Si(OR6)e(OR7)f(OR8)g (2) and (iii) a compound represented by the following formula (3): R9R10Si(OR11)h(OR12)I (3) and (B) a thermosetting resin which can be condensed to said component (A) and has an absorption capacity with respect to exposing light.
摘要翻译：一种抗反射涂层组合物，其包含：（A）至少一种选自（i）由下式（1）表示的化合物的化合物：（ii）由下式（2）表示的化合物：和（iii）由下式（3）表示的化合物：和（B）可以与所述组分（A）冷凝并具有相对于曝光的吸收能力的热固性树脂。

7. 发明申请

US20090155546A1 FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-DIMENSIONAL MOLD 审中-公开
标题翻译：成膜组合物，形成图案的方法和三维模具
公开(公告)号：US20090155546A1
公开(公告)日：2009-06-18
申请号：US12064342
申请日：2006-08-28
申请人： Naoki Yamashita , Kiyoshi Ishikawa , Yoshinori Sakamoto , Takuma Hojo
发明人： Naoki Yamashita , Kiyoshi Ishikawa , Yoshinori Sakamoto , Takuma Hojo
IPC分类号： B32B5/00 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0043 , B81C99/009 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045 , G03F7/0757 , G03F7/203 , Y10T428/24802
摘要： Disclosed are a film-forming composition which can form a pattern having an enhanced contrast by the action of uneven surface morphology produced after image development, and a method for forming a pattern and a three-dimensional mold using the composition. A composition comprising at least one of a hydrolysate and a condensation product of an alkoxy metal compound represented by the chemical formula (A), the composition additionally comprising a compound which can respond to at least one of light and heat to control the solubility of a finished film in a developing solution. R1n-M(OR2)4-n (A) wherein M represents a silicon, a germanium, a titanium, a tantalum, an indium or a tin; R1 represents a hydrogen atom or a monovalent organic group; R2 represents a monovalent organic group; and n represents an integer of 1 to 3.
摘要翻译：公开了一种成膜组合物，其可以通过图像显影后产生的不均匀表面形态的作用形成具有增强的对比度的图案，以及使用该组合物形成图案的方法和三维模具。一种组合物，其包含由化学式（A）表示的烷氧基金属化合物的水解产物和缩合产物中的至少一种，所述组合物另外包含可以响应于光和热中的至少一种以控制溶解度的化合物成品薄膜在开发中的解决方案。 <？in-line-formula description =“In-line Formulas”end =“lead”？> R1n-M（OR2）4-n（A）<？in-line-formula description =“In-line Formulas”end =“尾”→其中M表示硅，锗，钛，钽，铟或锡; R1表示氢原子或一价有机基团; R2表示一价有机基团; n表示1〜3的整数。

8. 发明申请

US20060077718A1 Nonvolatile memory and method of erasing for nonvolatile memory 有权
公开(公告)号：US20060077718A1
公开(公告)日：2006-04-13
申请号：US11284949
申请日：2005-11-23
申请人： Yoshinori Sakamoto , Tatsuya Bando
发明人： Yoshinori Sakamoto , Tatsuya Bando
IPC分类号： G11C16/04
CPC分类号： G11C16/3477 , G11C16/16
摘要： The number of rewrites for memory cells is to be increased, and the reliability of data reading to be substantially improved. Where data in memory cells are to be erased, the switching of an erase voltage to be applied to the control gate of each memory cell, while switching from one to another of voltages of any different levels, as the control gate voltage (=soft erase voltage) is accomplished according to the quantity of electric charges accumulated at the floating gate of each memory cell so as to keep substantially constant the voltage applied to the tunnel film of the memory cell. Upon acceptance of an erase command, a CPU supplies a control signal to a decoder, and on the basis of the resultant decode signal an erase voltage switching circuit generates a soft erase voltage of a certain level. After that, while switching from one to another of soft erase voltages differing in level, data in the memory cell are erased. Upon completion of erasing data in the memory cell, erase verification is carried out.

9. 发明授权

US06409844B1 Surface-treated article of magnesium or magnesium alloys, method of surface preparation and method of coating 失效
标题翻译：镁或镁合金的表面处理制品，表面处理方法和涂层方法
公开(公告)号：US06409844B1
公开(公告)日：2002-06-25
申请号：US09623218
申请日：2000-08-30
申请人： Naohiro Shikata , Yoshiaki Kondou , Yukio Nishikawa , Yoshihiko Nishizawa , Yoshinori Sakamoto , Takeshi Fujiwaki
发明人： Naohiro Shikata , Yoshiaki Kondou , Yukio Nishikawa , Yoshihiko Nishizawa , Yoshinori Sakamoto , Takeshi Fujiwaki
IPC分类号： C23C2207
CPC分类号： C23C22/60
摘要： An article of magnesium or its alloy having a surface layer containing magnesium condensed phosphate and magnesium phosphate, which can be produced by treating an article of magnesium or its alloy with a treating liquid containing 1,000 to 20,000 ppm of alkaline metal ions, 1,000 to 50,000 ppm of condensed phosphate ions, and 100 to 20,000 ppm of borate ions, and having pH of at least 8. The treated article has good corrosion resistance, and a coating can be formed on the surface of the article with good adhesion.
摘要翻译：一种镁或其合金制品，其具有包含镁缩合磷酸盐和磷酸镁的表面层，其可以通过用含有1,000至20,000ppm碱金属离子的处理液处理镁或其合金制品，其为1,000至50,000ppm 的浓缩磷酸根离子，100〜20,000ppm的硼酸根离子，pH值在8以上。处理过的制品具有良好的耐腐蚀性，可以在物品的表面形成具有良好粘附性的涂层。

10. 发明授权

US4958017A Purification of inosine from guanosine 失效
标题翻译：从肌苷提纯肌苷
公开(公告)号：US4958017A
公开(公告)日：1990-09-18
申请号：US283805
申请日：1988-12-13
申请人： Shohei Fujinawa , Yoshinori Sakamoto , Harumasa Iizuka
发明人： Shohei Fujinawa , Yoshinori Sakamoto , Harumasa Iizuka
IPC分类号： C07H19/16
CPC分类号： C07H19/16
摘要： An industrially advantageous process for producing an inosine-guanosine mixture having a higher weight ratio of guanosine/inosine than a starting mixture of nucleoside crystals and inosine subtantially free of guanosine from which comprises adjusting an aqueous fluid containing 10 to 30% by weight/volume of a nucleoside mixture to a pH of 9.1 to 9.5, wherein the total amount of inosine and guanosine is more than 95% by weight based on dry matters and the weight ratio of guanosine/inosine is 0.5 to 1, separating the resultant solids and then crystallizing inosine from the resulting solution.
摘要翻译：一种工业上有利的生产肌苷 - 鸟苷混合物的方法，其比鸟苷/肌苷重量比高于核苷结晶的起始混合物和肌苷酸不含鸟苷，其中包括调节含有10至30重量％/体积的核苷混合物，其pH为9.1至9.5，其中肌苷和鸟苷的总量基于干物质大于95重量％，并且鸟苷/肌苷的重量比为0.5至1，分离所得固体，然后结晶肌苷从所得溶液中。

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