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1. 发明授权

US06416935B1 Method for forming the air bearing surface of a slider 有权
标题翻译：用于形成滑块的空气轴承表面的方法
公开(公告)号：US06416935B1
公开(公告)日：2002-07-09
申请号：US09632860
申请日：2000-08-07
申请人： Yiping Hsiao , Cherngye Hwang , Ciaran A. Fox , Richard Hsiao
发明人： Yiping Hsiao , Cherngye Hwang , Ciaran A. Fox , Richard Hsiao
IPC分类号： G03F700
CPC分类号： G11B5/6005 , G11B5/3106
摘要： The invention relates to a method for producing magnetic sliders having a permanent protective coating of carbon over the air bearing surface. The method comprises the steps of: (a) depositing a protective coating on a surface of the slider, the protective coating comprising an underlayer of carbon and a top layer selected from silicon and titanium; (b) depositing a photoresist layer onto the protective coating; (c) imagewise exposing the photoresist layer to radiation; (d) developing the image in the photoresist layer to expose the protective coating; (e) transferring the image through the protective layer and into the slider to form the air bearing pattern in the slider; and (f) removing the top layer of the protective coating.
摘要翻译：本发明涉及一种用于制造在空气轴承表面上具有碳永久保护涂层的磁性滑块的方法。该方法包括以下步骤：（a）在滑块的表面上沉积保护涂层，保护涂层包括碳底层和选自硅和钛的顶层; （b）在保护涂层上沉积光致抗蚀剂层; （c）将光致抗蚀剂层成像曝光于辐射; （d）在光致抗蚀剂层中显影图像以露出保护涂层; （e）将图像传送通过保护层并进入滑块以在滑块中形成空气轴承图案; 和（f）去除保护涂层的顶层。

2. 发明授权

US06503406B1 Method for forming the air bearing surface of a slider using nonreactive plasma 失效
标题翻译：使用非反应性等离子体形成滑块的空气轴承表面的方法
公开(公告)号：US06503406B1
公开(公告)日：2003-01-07
申请号：US09633500
申请日：2000-08-07
申请人： Yiping Hsiao , Cherngye Hwang , Ciaran A. Fox , Richard Hsiao
发明人： Yiping Hsiao , Cherngye Hwang , Ciaran A. Fox , Richard Hsiao
IPC分类号： G11B5127
CPC分类号： G11B5/10 , G11B5/102 , G11B5/255 , G11B5/6005 , Y10S430/162 , Y10T29/49046
摘要： The invention relates to a method for producing magnetic sliders having a permanent protective coating of carbon over the air bearing surface. The method comprises the steps of: (a) depositing a temporary protective coating on a surface of the slider, the temporary protective coating comprising a layer carbon; (b) depositing a photoresist layer onto the temporary protective coating; (c) imagewise exposing the photoresist layer to radiation; (d) developing the image in the photoresist layer to expose the temporary protective coating; (e) transferring the image through the temporary protective coating and into the slider to form the air bearing pattern in the slider; (f) removing the temporary protective coating using nonreactive plasma; and (g) depositing a permanent protective coating comprising a layer of carbon.
摘要翻译：本发明涉及一种用于制造在空气轴承表面上具有碳永久保护涂层的磁性滑块的方法。该方法包括以下步骤：（a）在滑块的表面上沉积临时保护涂层，所述临时保护涂层包含层碳; （b）将光致抗蚀剂层沉积到临时保护涂层上; （c）将光致抗蚀剂层成像曝光于辐射; （d）在光致抗蚀剂层中显影图像以暴露临时保护涂层; （e）将图像通过临时保护涂层转移到滑块中以在滑块中形成空气轴承图案; （f）使用非反应性等离子体去除临时保护涂层; 和（g）沉积包含一层碳的永久保护涂层。

3. 发明授权

US06589436B1 Method of adjusting the flatness of a slider using selective plasma etching 失效
标题翻译：使用选择性等离子体蚀刻来调节滑块的平坦度的方法
公开(公告)号：US06589436B1
公开(公告)日：2003-07-08
申请号：US09593990
申请日：2000-06-14
申请人： Jila Tabib , Yiping Hsiao , Richard Hsiao , Richard T. Campbell , Ciaran A. Fox
发明人： Jila Tabib , Yiping Hsiao , Richard Hsiao , Richard T. Campbell , Ciaran A. Fox
IPC分类号： G11B1732
CPC分类号： G11B5/6005 , Y10T29/49041
摘要： Provided is a reactive ion etching (RIE) method for use in altering the flatness of a slider, whereby a slider or row of sliders is placed within a RIE apparatus. The apparatus comprises essentially an electrode within a chamber having an inlet and an outlet. The electrode is controlled by a bias power source. A source power is provided to the chamber to generate the plasma, wherein a gas or gas mixture is first introduced to the chamber and the source power is adjusted to maximize the plasma composition of ions and reactive neutral species. The ions and reactive neutral species are generated from reactive chemical species such as CHF3 and other F-containing species. An inert gas such as Argon may also be present. Typically, TiC within the Al2O3 matrix of the slider substrate surface is etched at a faster rate than other substrate species.
摘要翻译：提供了用于改变滑块的平坦度的反应离子蚀刻（RIE）方法，由此在RIE装置内放置滑块或滑块排。该设备基本上包括具有入口和出口的腔室内的电极。电极由偏压电源控制。将源功率提供给腔室以产生等离子体，其中首先将气体或气体混合物引入腔室，并且调节源功率以最大化离子和反应性中性物质的血浆组成。离子和反应性中性物质由反应性化学物质如CHF3和其他含F物质产生。惰性气体如氩气也可能存在。通常，滑块衬底表面的Al 2 O 3基体内的TiC以比其它衬底物质更快的速度被蚀刻。

4. 发明授权

US06346183B1 Use of thin carbon films as a bottom anti-reflective coating in manufacturing magnetic heads 失效
标题翻译：在制造磁头时使用薄碳膜作为底部抗反射涂层
公开(公告)号：US06346183B1
公开(公告)日：2002-02-12
申请号：US09632501
申请日：2000-08-03
申请人： Amanda Baer , Richard Hsiao , Cherngye Hwang , Clinton David Snyder , Hong Xu
发明人： Amanda Baer , Richard Hsiao , Cherngye Hwang , Clinton David Snyder , Hong Xu
IPC分类号： C25C1434
CPC分类号： G11B5/3163 , G03F7/091 , G11B5/3133 , G11B5/3166
摘要： A fabrication method using a bottom anti-reflective coating (BARC) eliminating deleterious effects of unwanted reflected light during the photo exposure step of a photolithographic process. The BARC coating comprises a carbon coating having a thickness of 300 angstroms, deposited by a carbon ion beam deposition tool, and an initial silicon BARC coating layer having thickness of 20 angstroms deposited before the carbon coating. Where the BARC layer is utilized in a photolithographic NiFe pole tip fabrication process, a NiFe seed layer is first deposited upon a substrate. The BARC layer is then formed on the NiFe seed layer and the pole tip trench is then photolithographically created. Thereafter, the BARC layer is removed from the bottom of the trench, utilizing a reactive ion etch process, exposing the NiFe seed layer. The NiFe pole tip is then fabricated into the trench, and any remaining photoresist and BARC layer are removed.
摘要翻译：使用底部抗反射涂层（BARC）的制造方法，其消除光刻工艺的光曝光步骤期间不期望的反射光的有害影响。 BARC涂层包括通过碳离子束沉积工具沉积的具有300埃厚度的碳涂层，以及在碳涂覆之前淀积厚度为20埃的初始硅BARC涂层。在光刻NiFe极尖制造工艺中使用BARC层的情况下，首先将NiFe种子层沉积在衬底上。然后在NiFe种子层上形成BARC层，然后光刻形成极尖沟槽。此后，利用反应离子蚀刻工艺将BARC层从沟槽的底部移除，暴露出NiFe种子层。然后将NiFe极尖制成沟槽，并且去除任何剩余的光致抗蚀剂和BARC层。

5. 发明授权

US6031695A Combined read head and write head with non-magnetic electrically conductive layer on upper pole tip thereof 失效
标题翻译：组合读头和写磁头与上磁极上的非磁性导电层
公开(公告)号：US6031695A
公开(公告)日：2000-02-29
申请号：US924395
申请日：1997-09-05
申请人： Richard Hsiao , Cherngye Hwang , Hugo Alberto Emilio Santini
发明人： Richard Hsiao , Cherngye Hwang , Hugo Alberto Emilio Santini
IPC分类号： G11B5/012 , G11B5/31 , G11B5/39 , G11B5/187 , G11B5/265
CPC分类号： G11B5/3967 , G11B5/012 , G11B5/3133 , G11B5/3163
摘要： A combined read head and write head includes at least one write coil layer embedded in an insulation stack. The insulation stack is sandwiched between first and second pole piece layers that are connected at a back gap. The pole piece layers have first and second pole tips that have edges that form a portion of an air bearing surface. A write gap layer that forms a portion of the air bearing surface is sandwiched between a top surface of the first pole tip and a bottom surface of the second pole tip. A non-magnetic electrically conductive layer on top of the second pole tip forms a portion of the air bearing surface. A magnetoresistive sensor is sandwiched between first and second gap layers, which are sandwiched between first and second shield layers. The second shield layer is a common layer with the first pole piece layer.
摘要翻译：组合读头和写头包括嵌入绝缘堆叠中的至少一个写入线圈层。绝缘堆叠被夹在第一和第二极靴层之间，后端间隔连接。极片层具有第一和第二极尖，其具有形成空气轴承表面的一部分的边缘。形成空气轴承表面的一部分的写入间隙层被夹在第一极尖的顶表面和第二极尖的底表面之间。在第二极尖顶部的非磁性导电层形成空气轴承表面的一部分。磁阻传感器夹在第一和第二间隙层之间，夹在第一和第二屏蔽层之间。第二屏蔽层是具有第一极片层的公共层。

6. 发明授权

US6027660A Method of etching ceramics of alumina/TiC with high density plasma 失效
标题翻译：用高密度等离子体蚀刻氧化铝/ TiC陶瓷的方法
公开(公告)号：US6027660A
公开(公告)日：2000-02-22
申请号：US75625
申请日：1998-05-11
申请人： Richard Hsiao , Cherngye Hwang , Son Van Nguyen , Diana Perez
发明人： Richard Hsiao , Cherngye Hwang , Son Van Nguyen , Diana Perez
IPC分类号： C04B41/53 , C04B41/91 , G11B5/10 , G11B5/60 , G11B21/00 , G11B21/21 , B44C1/22
CPC分类号： C04B41/009 , C04B41/5346 , C04B41/91 , G11B21/00 , G11B21/21 , G11B5/6005 , G11B5/102
摘要： A method of patterning a ceramic slider by plasma etching is disclosed. The ceramic slider contains alumina and titanium carbide. The method includes the steps of forming an etch pattern by depositing and developing a photoresist on the ceramic slider, and reactive ion etching a first surface on the ceramic slider using an etchant gas. The etchant gas generally includes argon, and a fluorine containing gas. The power source density, during etching ranges from about 0.5 W/(cm.sup.2) to 8 W/(cm.sup.2). Another aspect of the invention is a ceramic slider resulting from the method of the invention having a smoothness ranging from about 20 to 300 .ANG. as measured by atomic force microscopy.
摘要翻译：公开了通过等离子体蚀刻图案化陶瓷滑块的方法。陶瓷滑块包含氧化铝和碳化钛。该方法包括以下步骤：通过在陶瓷滑块上沉积和显影光致抗蚀剂来形成蚀刻图案，并且使用蚀刻剂气体对陶瓷滑块上的第一表面进行反应离子蚀刻。蚀刻剂气体通常包括氩气和含氟气体。在蚀刻期间的电源密度为约0.5W /（cm 2）至8W /（cm 2）。本发明的另一方面是由本发明的方法获得的陶瓷滑块，其具有通过原子力显微镜测量的约20至300埃的平滑度。

7. 发明授权

US06004473A Magnetic write head having a coil with submicron pitch 失效
标题翻译：具有亚微米间距的线圈的磁性写头
公开(公告)号：US06004473A
公开(公告)日：1999-12-21
申请号：US876157
申请日：1997-06-13
申请人： Richard Hsiao , Cherngye Hwang , David John Seagle
发明人： Richard Hsiao , Cherngye Hwang , David John Seagle
IPC分类号： G11B5/31 , G11B5/39 , B44C1/22
CPC分类号： G11B5/3967 , G11B5/313 , G11B5/3163 , Y10T29/49052
摘要： A method is provided wherein first and second sacrificial layers of a write element in a merged magnetic head are provided on top of a coil material layer, wherein the first sacrificial layer serves as a mask for shaping the coil material layer into a write coil, and the second sacrificial layer is employed for patterning the desired shape of the first sacrificial layer. The second sacrificial layer is shaped by a first reactive ion etching (RIE) step through a spiral opening in a photoresist layer. The result is a spiral-shaped second sacrificial layer that is employed as a mask for a second RIE to etch the first sacrificial layer through a spiral opening in the second sacrificial layer. The remaining spiral-shaped first sacrificial layer is then employed as a mask for ion milling the coil material layer through a spiral opening in the first sacrificial layer resulting in a write coil with a submicron pitch and sloping edges, which together increase a width of the base of the coil for increased current inducting capability.
摘要翻译：提供了一种方法，其中合并磁头中的写入元件的第一和第二牺牲层设置在线圈材料层的顶部，其中第一牺牲层用作将线圈材料层成形为写入线圈的掩模，以及使用第二牺牲层来图案化第一牺牲层的期望形状。通过在光致抗蚀剂层中的螺旋形开口的第一反应离子蚀刻（RIE）步骤来成形第二牺牲层。结果是螺旋形的第二牺牲层，其用作第二RIE的掩模，以通过第二牺牲层中的螺旋开口蚀刻第一牺牲层。然后将剩余的螺旋状第一牺牲层用作通过第一牺牲层中的螺旋开口对线圈材料层进行离子铣削的掩模，得到具有亚微米间距和倾斜边缘的写入线圈，这些线圈一起增加了线圈的基极，用于增加电流感应能力。

8. 发明授权

US5867890A Method for making a thin film merged magnetoresistive read/inductive write head having a pedestal pole tip 失效
标题翻译：用于制造具有基座极尖的薄膜合并磁阻读/写写头的方法
公开(公告)号：US5867890A
公开(公告)日：1999-02-09
申请号：US992026
申请日：1997-12-17
申请人： Richard Hsiao , Cherngye Hwang , Neil Leslie Robertson , Hugo Alberto Santini
发明人： Richard Hsiao , Cherngye Hwang , Neil Leslie Robertson , Hugo Alberto Santini
IPC分类号： G11B5/31 , G11B5/39 , G11B5/42
CPC分类号： G11B5/3967 , G11B5/3116 , G11B5/3133 , G11B5/3163 , Y10T29/49044 , Y10T29/49046 , Y10T29/49052
摘要： A method is described for making a merged thin film read/write head where a common layer serves as both a magnetic shield for the magentoresistive read element and the first pole piece for the inductive write element, and where the first pole piece thus includes a pedestal pole tip portion that extends up from the first pole piece layer. During fabrication a nonmagnetic spacer layer is deposited over the second pole tip and the gap layer, and then reactive ion etching (RIE) removes the spacer layer from the top of the second pole tip and the gap layer not beneath the second pole piece, but leaves the spacer layer on the sidewalls of the second pole tip. The ion bombardment of the RIE process is perpendicular to the gap layer and is continued after removal of the spacer layer to also remove the gap layer in the region not beneath the second pole piece so that the first pole piece layer is exposed. The RIE uses a gas that is more reactive with the gap material than the material of the second pole tip so that the top surface of the second pole tip is not substantially removed during etching of the gap layer. Next, ion milling removes the material from the layer of the first pole piece to form a first pedestal pole tip beneath the gap. Material ejected from the first pole piece layer during ion milling that gets redeposited on the second pole piece is prevented from contacting the sidewalls of the second pole tip because of the spacer layer.
摘要翻译：描述了一种用于制造合并的薄膜读/写头的方法，其中公共层用作磁阻读取元件的磁屏蔽和用于感应写元件的第一极片，并且其中第一极片因此包括基座极尖部分，其从第一极片层向上延伸。在制造期间，在第二极尖和间隙层上沉积非磁性间隔层，然后反应离子蚀刻（RIE）从第二极尖顶部和第二极片下面的间隙层去除间隔层，但是将间隔层留在第二极尖的侧壁上。 RIE工艺的离子轰击垂直于间隙层，并且在去除间隔层之后继续移除在第二极靴下方的区域中的间隙层，以使第一极片层露出。 RIE使用比间隙材料更能反应的气体，而不是第二极尖的材料，使得在蚀刻间隙层期间第二极尖的顶表面基本上不被去除。接下来，离子铣削从第一极靴的层移除材料以在间隙下方形成第一基座极尖。由于间隔层，防止了离子研磨期间从第一极片层排出的材料再次沉积在第二极片上与第二极尖端的侧壁接触。

9. 发明授权

US06623652B1 Reactive ion etching of the lapped trailing edge surface of a slider 失效
标题翻译：滑块的后跟边缘表面的反应离子蚀刻
公开(公告)号：US06623652B1
公开(公告)日：2003-09-23
申请号：US09593348
申请日：2000-06-14
申请人： Richard Hsiao , Cherngye Hwang , Hugo Alberto Emilio Santini
发明人： Richard Hsiao , Cherngye Hwang , Hugo Alberto Emilio Santini
IPC分类号： G11B5127
CPC分类号： G11B5/6005 , G11B5/102 , G11B5/1871 , G11B5/3106 , G11B5/3136 , G11B5/3903 , G11B5/40 , Y10T29/49032
摘要： A method of altering the topography of a trailing edge or ABS of a slider is disclosed, the slider having a substrate surface, at least one magnetic recording head on top of the alumina, and an overcoat of a material, preferably SiO2. The steps include first applying an SiO2 overcoat at the wafer level followed by slicing the wafer into rows, then lapping the rows. The rows are then placed on a bias electrode, exposing the trailing edge to a plasma generated from a controlled source in a reactive ion etching process. The plasma is generated using an chemical etchant such as CHF3 and other F-containing compounds, the plasma being generated with a combination of an inert gas such as Argon and the chemical etchant. In the plasma, the electrode is charged to accelerate the plasma ions towards the exposed surface. Reacted material is drawn from the surface of the slider. The SiO2 trailing edge reacts preferentially with the plasma, thus effectuating a change in the trailing edge topography.
摘要翻译：公开了一种改变滑块的后缘或ABS的形貌的方法，滑块具有衬底表面，在氧化铝顶部上的至少一个磁记录头和材料的外涂层，优选为SiO 2。这些步骤包括首先在晶片级施加SiO 2外涂层，然后将晶片切片成行，然后研磨行。然后将行放置在偏置电极上，将后缘暴露于在反应离子蚀刻工艺中由受控源产生的等离子体。使用诸如CHF 3和其它含F化合物的化学蚀刻剂产生等离子体，等离子体通过惰性气体如氩气和化学蚀刻剂的组合产生。在等离子体中，电极被加电以将等离子体离子加速到暴露的表面。从滑块的表面抽出反应材料。 SiO 2后缘优先与等离子体反应，从而实现后缘形貌的变化。

10. 发明授权

US06328859B1 Method of making second pole tip of a write head with a narrow track width 失效
标题翻译：具有窄轨道宽度的写头的第二极端的方法
公开(公告)号：US06328859B1
公开(公告)日：2001-12-11
申请号：US09368068
申请日：1999-08-03
申请人： Richard Hsiao , Cherngye Hwang , Hugo Alberto Emilio Santini
发明人： Richard Hsiao , Cherngye Hwang , Hugo Alberto Emilio Santini
IPC分类号： C23F100
CPC分类号： G11B5/3967 , G11B5/012 , G11B5/3133 , G11B5/3163
摘要： A method is provided for forming a final second pole tip of a write head wherein the final second pole tip is bounded in part by a final top and final first and second side walls, the final first and second side walls being separated by a final track width at an air bearing surface (ABS). The method includes the steps of forming a preliminary second pole tip that is bounded in part by the final top and preliminary first and second side walls. The preliminary first and second side walls are separated by a preliminary width at the ABS that is wider than the final track width. Next, a non-magnetic sacrificial layer is formed on the final top of the preliminary second pole tip. Ion beam milling is then employed for milling the preliminary first and second side walls to form the final second pole tip with the final first and second side walls separated by the final track width with at least a portion of the sacrificial layer remaining on the final top of the final second pole tip.
摘要翻译：提供了一种用于形成写头的最终第二极尖的方法，其中最后的第二极尖部分由最终的顶部和最终的第一和第二侧壁限定，最终的第一和第二侧壁被最后的轨道分开空气轴承表面（ABS）的宽度。该方法包括以下步骤：形成由最终顶部和初步的第一和第二侧壁部分限定的预备的第二极头。初步的第一和第二侧壁在ABS处的宽度比最终轨道宽度宽的初步宽度分开。接下来，在初步第二极尖的最终顶部上形成非磁性牺牲层。然后使用离子束铣削研磨初步的第一和第二侧壁以形成最终的第二极尖，最后的第一和第二侧壁与最后的轨道宽度分开，牺牲层的至少一部分保留在最终的顶部的最后的第二极点。

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