会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Probe apparatus and probing method
    • 探头装置和探测方法
    • US07724007B2
    • 2010-05-25
    • US12237920
    • 2008-09-25
    • Yasuhito YamamotoKazuhiro OzawaFumito Kagami
    • Yasuhito YamamotoKazuhiro OzawaFumito Kagami
    • G01R31/02
    • G01R31/2891G01R31/2887
    • A probe apparatus includes an imaging unit imaging probes and a first and a second imaging unit imaging the wafer surface. The apparatus further includes a control unit obtaining positions of a mounting table at which focuses of the imaging unit and the first imaging unit are made to coincide with each other and then the focuses of the image unit and the second imaging unit are made to coincide with each other by moving the mounting table; obtaining positions of the mounting table at which the images of the wafer are sequentially taken by the first and the second imaging unit by moving the mounting table; obtaining a position of the mounting table at which the probes are imaged by the imaging unit, and calculating a position of the mounting table at which the wafer contacts with the probes based on the obtained positions of the mounting table.
    • 探针装置包括成像单元成像探针和成像晶片表面的第一和第二成像单元。 该装置还包括控制单元,其获得安装台的位置,使成像单元和第一成像单元的焦点彼此重合,然后使图像单元和第二成像单元的焦点与 彼此移动安装台; 通过移动安装台来获得安装台的位置,通过第一和第二成像单元依次取得晶片的图像; 基于所获得的安装台的位置,获得所述安装台的位置,所述安装台在所述位置处由所述成像单元成像,并且计算所述安装台的位置,所述安装台在所述安装台上与所述探针接触。
    • 3. 发明申请
    • PROBE APPARATUS AND PROBING METHOD
    • 探测器和探测方法
    • US20090085594A1
    • 2009-04-02
    • US12237920
    • 2008-09-25
    • Yasuhito YamamotoKazuhiro OzawaFumito Kagami
    • Yasuhito YamamotoKazuhiro OzawaFumito Kagami
    • G01R31/26
    • G01R31/2891G01R31/2887
    • A probe apparatus includes an imaging unit imaging probes and a first and a second imaging unit imaging the wafer surface. The apparatus further includes a control unit obtaining positions of a mounting table at which focuses of the imaging unit and the first imaging unit are made to coincide with each other and then the focuses of the image unit and the second imaging unit are made to coincide with each other by moving the mounting table; obtaining positions of the mounting table at which the images of the wafer are sequentially taken by the first and the second imaging unit by moving the mounting table; obtaining a position of the mounting table at which the probes are imaged by the imaging unit, and calculating a position of the mounting table at which the wafer contacts with the probes based on the obtained positions of the mounting table.
    • 探针装置包括成像单元成像探针和成像晶片表面的第一和第二成像单元。 该装置还包括控制单元,其获得安装台的位置,使成像单元和第一成像单元的焦点彼此重合,然后使图像单元和第二成像单元的焦点与 彼此移动安装台; 通过移动安装台来获得安装台的位置,通过第一和第二成像单元依次取得晶片的图像; 基于所获得的安装台的位置,获得所述安装台的位置,所述安装台在所述位置处由所述成像单元成像,并且计算所述安装台的位置,所述安装台在所述安装台上与所述探针接触。
    • 7. 发明授权
    • Method and device for detecting the center of a wafer
    • 用于检测晶片中心的方法和装置
    • US5264918A
    • 1993-11-23
    • US850811
    • 1992-03-13
    • Fumito Kagami
    • Fumito Kagami
    • H01L21/66H01L21/00H01L21/68
    • H01L21/67259H01L21/681
    • A wafer center detecting method comprises steps of giving turn to a wafer held by a holder, optically detecting two points at which the true rim line of the wafer crosses the fictitious rim line thereof obtained when the center of the wafer is in accord with the rotation center of the holder, and measuring an angle formed by these two intersecting points relative to a reference point, obtaining from the angle formed by the two intersecting points a direction in which the center of the wafer is shifted from the rotation center of the holder, obtaining a central angle formed by the two intersecting points relative to the rotation center of the holder, and obtaining, on the basis of the central angle and a previously-measured wafer radius, the extent to which the center of the wafer is shifted from the rotation center of the holder.
    • 晶片中心检测方法包括以下步骤:转动由保持器保持的晶片,光学地检测两个点,当晶片的中心与旋转的中心一致时,晶片的真实边缘线与虚构的边缘线交叉 并且测量由这两个相交点相对于参考点形成的角度,从由两个相交点形成的角度获得晶片的中心从保持器的旋转中心偏移的方向, 获得由相对于保持器的旋转中心的两个相交点形成的中心角度,并且基于中心角度和预先测量的晶片半径获得晶片的中心从 支架的旋转中心。