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1. 发明申请

US20090046268A1 Projection optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20090046268A1
公开(公告)日：2009-02-19
申请号：US11920332
申请日：2006-05-08
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/54
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

2. 发明申请

US20120002186A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20120002186A1
公开(公告)日：2012-01-05
申请号：US13229589
申请日：2011-09-09
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/54 , G02B3/02
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

3. 发明授权

US08854601B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US08854601B2
公开(公告)日：2014-10-07
申请号：US13229589
申请日：2011-09-09
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/42 , G03F7/20 , G02B17/08 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

4. 发明授权

US08339578B2 Optical system, exposure system, and exposure method 失效
标题翻译：光学系统，曝光系统和曝光方法
公开(公告)号：US08339578B2
公开(公告)日：2012-12-25
申请号：US12656637
申请日：2010-02-05
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B5/30 , G02B27/28 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70091 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
摘要翻译：基于简单的配置，光学系统能够在抑制光量损失的同时实现透镜孔中的基本方位极化状态。本发明的光学系统设置有用于实现基本圆周分布或基本上径向分布作为透镜孔径中的快轴分布的双折射元件，以及位于双折射元件后面并适于旋转偏振状态的旋转器在镜头光圈。双折射元件具有由单轴晶体材料制成的光学透明构件，其晶轴基本上与光学系统的光轴平行。呈基本圆形极化状态的大致球形的光束入射到光学透明构件。

5. 发明授权

US08253924B2 Exposure method, exposure apparatus and device manufacturing method 有权
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：US08253924B2
公开(公告)日：2012-08-28
申请号：US11919669
申请日：2006-05-23
申请人： Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
发明人： Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/705 , G03F7/70558
摘要： An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.
摘要翻译：曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

6. 发明授权

US08208119B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08208119B2
公开(公告)日：2012-06-26
申请号：US10588297
申请日：2005-02-03
申请人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
发明人： Naoyuki Kobayashi , Soichi Owa , Shigeru Hirukawa , Yasuhiro Omura
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrate holder (PH), and a temperature adjusting system (60) for adjusting the temperature of the substrate holder (PH). The temperature of the substrate (P) is controlled so that there is no difference in temperature between the substrate (P) and the liquid (LQ), thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid (LQ).
摘要翻译：曝光装置（EX）通过液体（LQ）在基板（P）上照射曝光光（EL）而曝光基板（P）。曝光装置（EX）具有用于保持基板（P）的基板保持器（PH），能够移动由基板保持件（PH）保持的基板（P）的基板台（PST）和温度调节系统 60），用于调节衬底保持器（PH）的温度。控制基板（P）的温度，使得基板（P）和液体（LQ）之间的温度没有差异，从而防止由液体（LQ）的温度变化引起的曝光精度的降低。

7. 发明授权

US08009271B2 Projection optical system, exposure apparatus, exposure system, and exposure method 有权
标题翻译：投影光学系统，曝光装置，曝光系统和曝光方法
公开(公告)号：US08009271B2
公开(公告)日：2011-08-30
申请号：US11793402
申请日：2005-12-09
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G03B27/42
CPC分类号： G02B26/0891 , G02B13/24 , G02B27/0068 , G03F7/70308
摘要： A projection optical system PL for forming an image of a first plane M on a second plane P has at least one first wedge prism 4 each of an entrance surface and an exit surface of which has a plane and in which a predetermined first wedge angle is made between the plane of the entrance surface and the plane of the exit surface, and when a coordinate system is so defined that a Z-axis direction is set along a direction of a normal to the first plane M, an X-axis direction along a direction of an intersecting line between the plane of the entrance surface and the plane of the exit surface, and a Y-axis direction along a direction perpendicular to the Z-axis direction and the X-axis direction, the first wedge prism 4 is arranged rotatably substantially around the Y-axis direction.
摘要翻译：用于在第二平面P上形成第一平面M的图像的投影光学系统PL具有至少一个第一楔形棱镜4，每个第一楔形棱镜4的入射表面和出射表面具有平面，预定的第一楔形角在入射面的平面与出射面的平面之间形成的坐标系，并且当沿着与第一平面M的法线方向设定Z轴方向的坐标系时，沿着X轴方向入射面的平面和出射面的平面之间的交线的方向和沿着与Z轴方向和X轴方向垂直的方向的Y轴方向，第一楔形棱镜4是基本上围绕Y轴方向可旋转地布置。

8. 发明授权

US07688517B2 Projection optical system and method for photolithography and exposure apparatus and method using same 失效
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07688517B2
公开(公告)日：2010-03-30
申请号：US11907801
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B3/00 , G02B1/06 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.
摘要翻译：用于紫外光的光学系统包括由对紫外线透明的材料制成的多个光学元件。至少两个光学元件用于形成至少一个具有第一限定光学元件，第二限定光学元件和液体透镜的液体透镜组，该透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中第二分隔光学元件并且包含对紫外光透明的液体。

9. 发明授权

US07688422B2 Projection optical system, exposure system, and exposure method 失效
标题翻译：投影光学系统，曝光系统和曝光方法
公开(公告)号：US07688422B2
公开(公告)日：2010-03-30
申请号：US11665490
申请日：2005-10-12
申请人： Hironori Ikezawa , Yasuhiro Omura
发明人： Hironori Ikezawa , Yasuhiro Omura
IPC分类号： G03B27/42 , G03B27/58 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G03F7/70983
摘要： An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1
摘要翻译：成像光学系统是一种允许在液体中的平面平行板被替代的液浸式系统，而不会显着降低成像性能，同时确保边界透镜的足够高的激光电阻。成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。第一光学透明构件和第二平面之间的光路可以被第一液体填充，并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。成像光学系统满足1

10. 发明授权

US07457042B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US07457042B2
公开(公告)日：2008-11-25
申请号：US11224062
申请日：2005-09-13
申请人： Yasuhiro Omura
发明人： Yasuhiro Omura
IPC分类号： G02B9/00
CPC分类号： G03F7/70241
摘要： A projection optical system which uses, for example, an ArF excimer laser beam and can ensure a good imaging performance for an extended period while avoiding the variations in refractive index and the effect of the intrinsic double refraction of a fluorite containing a high-frequency component. A projection optical system for forming the demagnified image of a first plane (R) on a second plane (W). A first light transmitting member (L23) disposed closest to the second plane side and having almost no refraction power is provided. When the distance between the first light transmitting member and the second plane is WD, a numerical aperture on the second plane side NA, and the center wavelength of a light used L×10−6, the condition 0.06
摘要翻译：一种投影光学系统，其使用例如ArF准分子激光束并且可以在延长的时间段期间确保良好的成像性能，同时避免折射率的变化以及含有高频分量的萤石的本征双折射的影响。一种用于在第二平面（W）上形成第一平面（R）的缩小图像的投影光学系统。设置最靠近第二平面侧并且几乎没有折射能力的第一透光构件（L 23）。当第一透光构件和第二平面之间的距离为WD时，第二平面侧的数值孔径NA和使用的光的中心波长为L×10 -6，条件为0.06

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