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1. 发明专利

IL240857D0 Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240857D0
公开(公告)日：2015-10-29
申请号：IL24085715
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F20060101 , G03F7/20 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

2. 发明专利

IL240857A Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240857A
公开(公告)日：2018-05-31
申请号：IL24085715
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENG CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
发明人： HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03B20060101 , G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

3. 发明专利

IL240860A Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240860A
公开(公告)日：2018-04-30
申请号：IL24086015
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENG CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
发明人： HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03B20060101 , G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

4. 发明专利

IL240860D0 Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240860D0
公开(公告)日：2015-10-29
申请号：IL24086015
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F20060101 , G03F7/20 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

5. 发明专利

IL179936D0 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 未知
公开(公告)号：IL179936D0
公开(公告)日：2007-05-15
申请号：IL17993606
申请日：2006-12-10
申请人： NIKON CORP , HIROYUKI NAGASAKA , MINORU ONDA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： An exposure apparatus EX has a projection optical system PL. The projection optical system PL has a first optical element LS1 closest to an image plane thereof and a second optical element LS2 which is second closest to the image plane with respect to the first optical element LS1. The first optical element LS1 has a lower surface T1 arranged opposite to a surface of a substrate P and an upper surface T2 arranged opposite to the second optical element LS2. A space between the second optical element LS2 and the upper surface T2 of the first optical element LS1 is filled with a second liquid LQ2 so that a liquid immersion area is formed in an area of the upper surface T2, the area including an area AR' through which an exposure light beam EL passes. The substrate P is exposed by radiating the exposure light beam EL onto the substrate P through a first liquid LQ1 on a side of the lower surface T1 of the first optical element LS1 and the second liquid LQ2 on a side of the upper surface T2. It is possible to avoid any deterioration of the exposure accuracy caused by the pollution of the optical element, and to suppress any enormous expansion of the liquid immersion area.

6. 发明专利

IL258838D0 Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL258838D0
公开(公告)日：2018-06-28
申请号：IL25883818
申请日：2018-04-22
申请人： NIKON CORP , NIKON ENG CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
发明人： HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F20060101 , G03F7/20 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

7. 发明专利

IL223536D0 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE AND OPTICAL PART 未知
公开(公告)号：IL223536D0
公开(公告)日：2013-02-03
申请号：IL22353612
申请日：2012-12-09
申请人： NIKON CORP , HITOSHI ISHIZAWA , HIROYUKI NAGASAKA , HIROAKI TAKAIWA , SHIGERU HIRUKAWA , RYUICHI HOSHIKA
IPC分类号： G03F7/20 , H01L20060101 , H01L21/027
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

8. 发明专利

IL180840D0 EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：IL180840D0
公开(公告)日：2007-06-03
申请号：IL18084007
申请日：2007-01-21
申请人： NIKON CORP , HIROYUKI NAGASAKA , TOMOHARU FUJIWARA
IPC分类号： H01L20100101

9. 发明专利

IL179787D0 EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：IL179787D0
公开(公告)日：2007-05-15
申请号：IL17978706
申请日：2006-12-03
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

10. 发明专利

IL176057D0 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART 未知
公开(公告)号：IL176057D0
公开(公告)日：2006-10-05
申请号：IL17605706
申请日：2006-05-31
申请人： NIKON CORP , HITOSHI ISHIZAWA , HIROYUKI NAGASAKA , HIROAKI TAKAIWA , SHIGERU HIRUKAWA , RYUICHI HOSHIKA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

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