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1. 发明专利

IL183515D0 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：IL183515D0
公开(公告)日：2007-09-20
申请号：IL18351507
申请日：2007-05-29
申请人： NIKON CORP , TAKAYA OKADA
IPC分类号： H01L20100101

2. 发明授权

US08854601B2 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US08854601B2
公开(公告)日：2014-10-07
申请号：US13229589
申请日：2011-09-09
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/42 , G03F7/20 , G02B17/08 , G02B1/06 , G02B21/33
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

3. 发明申请

US20080291555A1 OPTICAL ELEMENT HOLDING APPARATUS, BARREL, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光学元件保持装置，条形，曝光装置和装置制造方法
公开(公告)号：US20080291555A1
公开(公告)日：2008-11-27
申请号：US12126621
申请日：2008-05-23
申请人： Takaya OKADA
发明人： Takaya OKADA
IPC分类号： G02B7/02
CPC分类号： G02B7/028 , G03F7/70825
摘要： An optical element holding apparatus includes an aluminum buffer member accommodated in a stainless steel frame body and having a linear expansion coefficient differing from that of the frame body. The buffer member contacts a first member of a rotation link block. The frame body includes slits defining the rotation link block, a second connection block, a first connection block, and a displacement block. Drive force generated by expansion of the buffer member when the temperature changes is amplified by the rotation link block, the second connection block, the first connection block, and the displacement block and transmitted to the support member to move the support member toward the lens.
摘要翻译：光学元件保持装置包括容纳在不锈钢框架体中并具有与框体不同的线膨胀系数的铝缓冲构件。缓冲构件接触旋转连杆块的第一构件。框架主体包括限定旋转连杆块的狭缝，第二连接块，第一连接块和位移块。当温度变化时，通过缓冲构件的膨胀产生的驱动力由旋转连杆块，第二连接块，第一连接块和位移块放大，并被传递到支撑构件以将支撑构件朝向透镜移动。

4. 发明申请

US20080106718A1 Exposure Apparatus and Device Manufacturing Method 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080106718A1
公开(公告)日：2008-05-08
申请号：US11791990
申请日：2005-11-30
申请人： Takaya Okada , Ryu Sugawara
发明人： Takaya Okada , Ryu Sugawara
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： An exposure apparatus emits exposure light onto a substrate (P) via a projection optical system (PL) to expose the substrate (P). The projection optical system (PL) includes a first optical element (LS1) closest to an image plane of the projection optical system (PL) and a second optical element (LS2) closest to the image plane next to the first optical element (LS1). The exposure apparatus is disposed alia position higher than a lower surface (T3) of the second optical element (LS2) and includes a second collection port (42) that recovers a second liquid (LQ2) held in a second space (K2) between an upper surface (T2) of the first optical element (LS1) and the lower surface (T3) of the second optical element (LS2).
摘要翻译：曝光装置经由投影光学系统（PL）将曝光光发射到基板（P）上以露出基板（P）。投影光学系统（PL）包括最靠近投影光学系统（PL）的像面的第一光学元件（LS 1）和最靠近第一光学元件的像面的第二光学元件（LS 2） LS 1）。曝光装置的位置高于第二光学元件（LS 2）的下表面（T 3），并且包括回收保持在第二空间（K）中的第二液体（LQ 2）的第二收集口（42） 2）在第一光学元件（LS 1）的上表面（T 2）和第二光学元件（LS 2）的下表面（T 3）之间。

5. 发明申请

US20090046268A1 Projection optical system, exposure apparatus, and exposure method 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20090046268A1
公开(公告)日：2009-02-19
申请号：US11920332
申请日：2006-05-08
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/54
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

6. 发明申请

US20120002186A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20120002186A1
公开(公告)日：2012-01-05
申请号：US13229589
申请日：2011-09-09
申请人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
发明人： Yasuhiro Omura , Takaya Okada , Hiroyuki Nagasaka
IPC分类号： G03B27/54 , G02B3/02
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

7. 发明申请

US20100033700A1 OPTICAL ELEMENT, OPTICAL ELEMENT HOLDING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光学元件，光学元件保持装置，曝光装置和装置制造方法
公开(公告)号：US20100033700A1
公开(公告)日：2010-02-11
申请号：US11922098
申请日：2006-06-13
申请人： Takaya Okada , Ryu Sugawara
发明人： Takaya Okada , Ryu Sugawara
IPC分类号： G02B7/00 , G03B27/54
CPC分类号： G02B7/022 , G02B7/026 , G03F7/70825
摘要： An optical element (LS2) has, in a side face (T6), a groove portion (50) for insertion of a portion of an optical element holding device.
摘要翻译：光学元件（LS2）在侧面（T6）中具有用于插入光学元件保持装置的一部分的槽部（50）。

8. 发明申请

US20080192222A1 Exposure Apparatus, Exposure Method, and Device Manufacturing Method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20080192222A1
公开(公告)日：2008-08-14
申请号：US11791994
申请日：2005-12-02
申请人： Takaya Okada
发明人： Takaya Okada
IPC分类号： G03B27/54
CPC分类号： G03F7/70341 , G02B3/12 , G02B7/023 , G03F7/70258
摘要： An exposure apparatus irradiates a substrate with exposure light via a projection optical system to expose the substrate. The projection optical system has a first optical element nearest to an image plane of the projection optical system and a second optical element second nearest to the image plane after the first optical element. The exposure apparatus includes: an immersion mechanism that fills a first space on a bottom surface side of the second optical element with a liquid; a gas substitution apparatus that fills a second space on an upper surface side of the second optical element with a gas; and a control apparatus that adjusts a pressure difference between a pressure of the liquid in the first space and a pressure of the gas in the second space.
摘要翻译：曝光装置通过投影光学系统对具有曝光光的基板照射曝光基板。投影光学系统具有最靠近投影光学系统的像面的第一光学元件和在第一光学元件之后的最靠近像面的第二光学元件。曝光装置包括：浸渍机构，其用液体填充第二光学元件的底面侧的第一空间; 气体置换装置，用气体填充第二光学元件的上表面侧的第二空间; 以及控制装置，其调节第一空间中的液体的压力与第二空间中的气体的压力之间的压力差。

9. 发明申请

US20070285634A1 Maintenance Method, Exposure Method, Exposure Apparatus, And Method For Producing Device 审中-公开
标题翻译：维护方法，曝光方法，曝光装置和生产装置的方法
公开(公告)号：US20070285634A1
公开(公告)日：2007-12-13
申请号：US11667856
申请日：2005-11-18
申请人： Hiroyuki Nagasaka , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
发明人： Hiroyuki Nagasaka , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
IPC分类号： G03B27/42
CPC分类号： G03F7/70975 , G03F7/70341
摘要： An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical system, is filled with a liquid. When the exposure light beam is not irradiated during, for example, the maintenance or the like, the liquid in the space is substituted by a functional fluid different from the liquid. This makes it possible to reduce any influence exerted by the liquid on the exposure apparatus.
摘要翻译：曝光装置照射曝光光束，其中预定光学元件之间的空间和包括在投影光学系统中的多个光学元件之间的空间被填充有液体。当例如维护等期间曝光光束不被照射时，空间中的液体被不同于液体的功能流体代替。这使得可以减少液体对曝光装置的影响。

10. 发明申请

US20120307220A1 Maintenance Method, Exposure Method, Exposure Apparatus, and Method for Producing Device 审中-公开
标题翻译：维护方法，曝光方法，曝光装置以及生产装置的方法
公开(公告)号：US20120307220A1
公开(公告)日：2012-12-06
申请号：US13586686
申请日：2012-08-15
申请人： Hiroyuki NAGASAKA , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
发明人： Hiroyuki NAGASAKA , Takaya Okada , Motoi Ueda , Ryuichi Hoshika
IPC分类号： G03B27/52
CPC分类号： G03F7/70975 , G03F7/70341
摘要： An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated during, for example, the maintenance or the like, the liquid LQ in the space KS is substituted by a functional fluid LK different from the liquid LQ. This makes it possible to reduce any influence exerted by the liquid LQ on the exposure apparatus.
摘要翻译：曝光装置以包含在投影光学系统中的多个光学元件中的预定光学元件LS1和LS2之间的空间KS填充有液体LQ的状态来照射曝光光束EL。在例如维护等期间曝光用光束EL不被照射的情况下，空间KS中的液体LQ被与液体LQ不同的功能流体LK代替。这使得可以减少液体LQ对曝光装置的影响。

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