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1. 发明授权

US07688517B2 Projection optical system and method for photolithography and exposure apparatus and method using same 失效
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07688517B2
公开(公告)日：2010-03-30
申请号：US11907801
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B3/00 , G02B1/06 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.
摘要翻译：用于紫外光的光学系统包括由对紫外线透明的材料制成的多个光学元件。至少两个光学元件用于形成至少一个具有第一限定光学元件，第二限定光学元件和液体透镜的液体透镜组，该透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中第二分隔光学元件并且包含对紫外光透明的液体。

2. 发明授权

US07688422B2 Projection optical system, exposure system, and exposure method 失效
标题翻译：投影光学系统，曝光系统和曝光方法
公开(公告)号：US07688422B2
公开(公告)日：2010-03-30
申请号：US11665490
申请日：2005-10-12
申请人： Hironori Ikezawa , Yasuhiro Omura
发明人： Hironori Ikezawa , Yasuhiro Omura
IPC分类号： G03B27/42 , G03B27/58 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G03F7/70983
摘要： An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1
摘要翻译：成像光学系统是一种允许在液体中的平面平行板被替代的液浸式系统，而不会显着降低成像性能，同时确保边界透镜的足够高的激光电阻。成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。第一光学透明构件和第二平面之间的光路可以被第一液体填充，并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。成像光学系统满足1

3. 发明申请

US20080049336A1 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080049336A1
公开(公告)日：2008-02-28
申请号：US11907797
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
IPC分类号： G02B9/64 , G02B17/00 , G02B3/00 , G02B9/04 , G02B9/12 , G02B9/62
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.
摘要翻译：浸入式光学系统包括沿着浸没式光学系统的光束路径设置的多个透镜。多个透镜包括可与液体层接触的液体浸没透镜。物镜表面的光学共轭点形成在浸没式光学系统的光束路径中。物体表面可与液体接触。

4. 发明授权

US07978310B2 Projection optical system, exposure system, and exposure method 有权
标题翻译：投影光学系统，曝光系统和曝光方法
公开(公告)号：US07978310B2
公开(公告)日：2011-07-12
申请号：US12719455
申请日：2010-03-08
申请人： Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
发明人： Hironori Ikezawa , Yuji Kudo , Yasuhiro Omura
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70341
摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25
摘要翻译：一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于1.1的液体（Lm1）并且在透光构件的侧面（41,42）上形成用于遮蔽光通过的遮光膜（36）。当D是第二表面和遮光膜之间的空间时，Θ是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

5. 发明授权

US07551362B2 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US07551362B2
公开(公告)日：2009-06-23
申请号：US11907679
申请日：2007-10-16
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.
摘要翻译：浸入式光学系统包括具有可与液体，凸面和光轴接触的光学表面的液体浸入式光学元件。液体浸没的光学元件的侧表面相对于光轴倾斜。

6. 发明申请

US20080094696A1 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080094696A1
公开(公告)日：2008-04-24
申请号：US11907679
申请日：2007-10-16
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G02B17/08 , G02B3/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.
摘要翻译：浸入式光学系统包括具有可与液体，凸面和光轴接触的光学表面的液体浸入式光学元件。液体浸没的光学元件的侧表面相对于光轴倾斜。

7. 发明申请

US20080068576A1 Projection optical system and method for photolithography and exposure apparatus and method using same 失效
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080068576A1
公开(公告)日：2008-03-20
申请号：US11976028
申请日：2007-10-19
申请人： Yasuhiro Omura , Hironori Ikezawa
发明人： Yasuhiro Omura , Hironori Ikezawa
IPC分类号： G03B27/54 , G02B3/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such that a position of the image plane with respect to the final lens element is adjustable.
摘要翻译：微光刻投影曝光装置的投影透镜包括最终透镜元件和终端元件，该终端元件和终端元件之间没有整体折光力，该终端元件位于最终透镜元件和投影透镜的图像平面之间但间隔开。图像平面可调节地定位成使得像平面相对于最终透镜元件的位置是可调节的。

8. 发明申请

US20080049306A1 Projection optical system and method for photolithography and exposure apparatus and method using same 失效
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20080049306A1
公开(公告)日：2008-02-28
申请号：US11907801
申请日：2007-10-17
申请人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
IPC分类号： G02B13/14 , G02B1/06 , G03B27/54
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.
摘要翻译：用于紫外光的光学系统包括由对紫外线透明的材料制成的多个光学元件。至少两个光学元件用于形成至少一个具有第一限定光学元件，第二限定光学元件和液体透镜的液体透镜组，该透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中第二分隔光学元件并且包含对紫外光透明的液体。

9. 发明申请

US20060087633A1 Projection optical system, exposure apparatus, and exposure method 有权
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20060087633A1
公开(公告)日：2006-04-27
申请号：US11260160
申请日：2005-10-28
申请人： Yasuhiro Omura , Hironori Ikezawa , Kumiko Ishida
发明人： Yasuhiro Omura , Hironori Ikezawa , Kumiko Ishida
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70241 , G03F7/70341 , G03F7/70425 , G03F7/70466
摘要： An exposure apparatus uses a dioptric projection optical system easy to manufacture and a mask of an ordinary size, and is able to effect a projection exposure in a high resolution with high throughput, while securing a large effective image-side numerical aperture through the intervention of a high-refractive-index medium in an optical path between the projection optical system and a photosensitive substrate. The exposure apparatus is configured to effect a projection exposure of a reduced image of a pattern formed on the mask (R), through the projection optical system (PL) onto the photosensitive substrate (W). Where a refractive index of an atmosphere in an optical path of the projection optical system is 1, the optical path between the projection optical system and the photosensitive substrate is filled with a medium having the refractive index larger than 1.1. The projection optical system has still exposure regions substantially smaller than one shot-area to be formed on the photosensitive substrate, and repeats a projection exposure in a portion of the shot-area more than once in the projection exposure in the shot-area.
摘要翻译：曝光装置使用易于制造的屈光度投影光学系统和普通尺寸的掩模，并且能够以高生产率以高分辨率实现投影曝光，同时通过干涉来确保大的有效图像侧数值孔径在投影光学系统和感光基板之间的光路中的高折射率介质。曝光装置被配置为通过投影光学系统（PL）将形成在掩模（R）上的图案的缩小图像投影到感光基板（W）上。在投影光学系统的光路中的气氛的折射率为1的情况下，用折射率大于1.1的介质填充投影光学系统和感光基板之间的光路。投影光学系统的曝光区域仍然具有比形成在感光基板上的一个拍摄区域的曝光区域，并且在拍摄区域的投影曝光中多次重复拍摄区域的一部分中的投影曝光。

10. 发明申请

US20050248856A1 Projection optical system and method for photolithography and exposure apparatus and method using same 有权
标题翻译：投影光学系统及光刻法及曝光装置及其使用方法
公开(公告)号：US20050248856A1
公开(公告)日：2005-11-10
申请号：US10525372
申请日：2003-08-22
申请人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
发明人： Yasuhiro Omura , Hironori Ikezawa , David Williamson
IPC分类号： G02B13/14 , G02B13/18 , G02B13/24 , G02B17/08 , G03F7/20 , H01L21/027 , G02B17/00 , G02B3/00 , G02B9/00
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/08 , G02B21/33 , G03F7/70225 , G03F7/70341
摘要： Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
摘要翻译：光学投影系统和光刻方法。一种用于在宽视野下以高分辨率投影图像的光刻浸没投影系统和方法。投影系统和方法包括最终透镜，其在光线进入浸没液体以撞击到图像平面之前减小光路的边缘射线角度。

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