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    • 2. 发明授权
    • Systems and methods for electrostatic discharge protection
    • 静电放电保护系统和方法
    • US08194372B1
    • 2012-06-05
    • US12424810
    • 2009-04-16
    • Nui ChongHong-Tsz Pan
    • Nui ChongHong-Tsz Pan
    • H02H9/00
    • H01L27/0274
    • A system for protecting an integrated circuit (IC) from electrostatic discharge (ESD) events includes a sensing circuit that detects an occurrence of an ESD event on one of a plurality of power supply rails of the IC and, in response, outputs an alert signal identifying the occurrence of the ESD event. The system includes a driver circuit that, responsive to receiving the alert signal, outputs an enable signal, and a cascaded switch. The cascaded switch includes first and second gates disposed upon a channel located between a drain of the cascaded switch coupled to a first power supply rail and a source of the cascaded switch coupled to a second power supply rail. Each of the two gates receives the enable signal and, responsive to the enable signal, the cascaded switch closes to establish a coupling between the first power supply rail and the second power supply rail.
    • 用于保护集成电路(IC)免受静电放电(ESD)事件的系统包括感测电路,其检测IC的多个电源轨道中的一个上的ESD事件的发生,并且作为响应,输出警报信号 识别ESD事件的发生。 该系统包括响应于接收到警报信号而输出使能信号和级联开关的驱动器电路。 级联开关包括设置在耦合到第一电源轨的级联开关的漏极和耦合到第二电源轨的级联开关的源之间的通道的第一和第二门。 两个门中的每一个接收使能信号,响应于使能信号,级联开关闭合以建立第一电源轨和第二电源轨之间的耦合。
    • 6. 发明授权
    • High-voltage protection device and process
    • 高压保护装置及工艺
    • US07307319B1
    • 2007-12-11
    • US10837086
    • 2004-04-30
    • Nui ChongFarrokh Omid-Zohoor
    • Nui ChongFarrokh Omid-Zohoor
    • H01L23/62
    • H01L29/8611H01L27/0255H01L29/6656H01L29/66659H01L29/7391H01L29/78
    • A high-voltage circuit protection device includes a p-n junction in a semiconductor substrate that is spaced apart from a first electrode region by a diode region. A semiconductor layer overlies the diode region and is separated therefrom by a dielectric layer. A shallow-doped region resides in the diode region spaced apart from the p-n junction by a predetermined distance. The predetermined distance preferably ranges from about 0 to about 50% of the length of the diode region. A process for fabricating the high-voltage device includes forming the shallow-doped region using a threshold adjustment mask followed by formation of the first electrode region using the semiconductor layer in a self-aligned doping process. The shallow-doped region functions to reduce the clamping voltage of the device.
    • 高电压电路保护装置包括在半导体衬底中的通过二极管区与第一电极区间隔开的p-n结。 半导体层覆盖二极管区域,并通过介电层与其分离。 浅掺杂区域位于与p-n结隔开预定距离的二极管区域中。 预定距离优选在二极管区域的长度的约0至约50%的范围内。 一种用于制造高压器件的工艺包括使用阈值调节掩模形成浅掺杂区域,随后在自对准掺杂工艺中使用半导体层形成第一电极区域。 浅掺杂区域用于降低器件的钳位电压。