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1. 发明授权

US5844249A Apparatus for detecting defects of wires on a wiring board wherein optical sensor includes a film of polymer non-linear optical material 失效
标题翻译：用于检测布线板上的导线缺陷的装置，其中光学传感器包括聚合物非线性光学材料的薄膜
公开(公告)号：US5844249A
公开(公告)日：1998-12-01
申请号：US779571
申请日：1997-01-07
申请人： Yusuke Takano , Shizuo Ogura , Tsunetoshi Sugiyama , Wen-Bing Kang
发明人： Yusuke Takano , Shizuo Ogura , Tsunetoshi Sugiyama , Wen-Bing Kang
IPC分类号： G01N21/956 , G01R31/309 , G01N21/86
CPC分类号： G01N21/956 , G01R31/309
摘要： A detecting apparatus capable of supporting even narrow wire widths and of detecting defects of wires in a non-contact manner is provided. The detecting apparatus comprises an optical sensor, a sensor head, and a signal processing unit. The optical sensor comprises a transparent substrate, a transparent electrode disposed on the transparent substrate, a thin film of a polymer non-linear optical material disposed on the transparent electrode, and a reflective film disposed on the thin film, and is positioned in close approximation to and without contacting an electrode to be measured on the wiring board. The sensor head comprises a light source, optical means for guiding light from the light source into the optical sensor, and detecting means for detecting reflected light from the optical sensor. The detecting means supplies the signal processing unit with a signal corresponding to the intensity of the reflected light when the electrode on the wiring board is applied with a voltage.
摘要翻译：提供能够以非接触方式支持甚至窄线宽度和检测线的缺陷的检测装置。检测装置包括光学传感器，传感器头和信号处理单元。光学传感器包括透明基板，设置在透明基板上的透明电极，设置在透明电极上的聚合物非线性光学材料的薄膜和设置在薄膜上的反射膜，并且近似定位在接线板上接触和不接触要测量的电极。传感器头包括光源，用于将来自光源的光引导到光学传感器中的光学装置，以及用于检测来自光学传感器的反射光的检测装置。当施加电压时，检测装置向信号处理单元提供与反射光的强度对应的信号。

2. 发明授权

US5652327A Triazine polymers 失效
标题翻译：三嗪聚合物
公开(公告)号：US5652327A
公开(公告)日：1997-07-29
申请号：US386886
申请日：1995-02-10
申请人： Wen-Bing Kang , Tsunetoshi Sugiyama , Shizuo Ogura , Yusuke Takano
发明人： Wen-Bing Kang , Tsunetoshi Sugiyama , Shizuo Ogura , Yusuke Takano
IPC分类号： G02F1/35 , C08G65/40 , C08G73/02 , C08G73/06 , C08G75/02 , C08G75/04 , G02F1/355 , G02F1/361 , C08F26/06 , C08F126/06
CPC分类号： G02F1/3617 , C08G65/4006 , C08G73/0273 , C08G73/0644
摘要： A polymer containing triazine rings that has a molecular weight of 5,000-1,000,000 and that comprises a recurring unit represented by the general formula (I): ##STR1## wherein X.sup.1 and X.sup.2 are each independently S, NR.sup.1 (R is a hydrogen atom, an alkyl group or an aryl group) or O; Y may be an alkylene group, a divalent substituted or unsubstituted aromatic ring group that do not contain chromophore moieties or a group in which said aromatic ring groups are bonded or condensed together; Z is either a spacer group comprising a group represented by --G--(CH.sub.2).sub.n -- (n is an integer of 1-10) or a direct bond (G is S, NR.sup.4 or O, and R.sup.4 is a hydrogen atom, an alkyl group or an aryl group); and A is an organic chromophore moiety in which an electron donative group and an electron attractive group are conjugated via a .pi.-electron system. The polymer is lightproof, forms a thin film of high quality and has a high glass transition point.
摘要翻译：包含分子量为5,000-1,000,000的三嗪环的聚合物，其包含由通式（I）表示的重复单元：其中X1和X2各自独立地为S，NR1（R为氢）原子，烷基或芳基）或O; Y可以是亚烷基，不含发色团部分的二价取代或未取代的芳环基团或所述芳环结合或缩合在一起的基团; Z是由-G-（CH2）n-（n为1-10的整数）或直接键（G为S，NR4或O，R4为氢原子，烷基或芳基）; A是有机发色团部分，其中给电子基团和吸电子基团通过π电子体系共轭。聚合物是防光的，形成高质量的薄膜，玻璃化转变温度高。

3. 发明授权

US5757193A Apparatus for detecting defects of wiring board 失效
标题翻译：检测接线板缺陷的装置
公开(公告)号：US5757193A
公开(公告)日：1998-05-26
申请号：US639835
申请日：1996-04-26
申请人： Nu Yu , Tsunetoshi Sugiyama , Shizuo Ogura , Yusuke Takano
发明人： Nu Yu , Tsunetoshi Sugiyama , Shizuo Ogura , Yusuke Takano
IPC分类号： G01R31/02 , G01R31/309 , G01N21/17
CPC分类号： G01R31/309
摘要： A low-cost, fast and highly accurate defective wire detector is provided for detecting defects of wires in a wiring board at least having one wiring layer. The detector has a light emitting element substrate comprising a transparent substrate and a light emitting element arranged thereon. The light emitting element is, for example, an organic light emitting element or an organic light emitting diode. The light emitting element substrate is placed to be in contact with wires on a wiring board under measurement. The detector detects and processes a condition of light emitted from the light emitting element substrate when a voltage is applied between the light emitting element substrate and the wiring board, and determines whether or not any defective wire is present.
摘要翻译：提供了一种低成本，快速和高精度的有缺陷的线检测器，用于检测至少具有一个布线层的布线板中的布线的缺陷。检测器具有包括透明基板和布置在其上的发光元件的发光元件基板。发光元件例如是有机发光元件或有机发光二极管。发光元件基板被放置成与被测量的布线板上的导线接触。当在发光元件基板和布线板之间施加电压时，检测器检测并处理从发光元件基板发出的光的状态，并且确定是否存在任何有缺陷的线。

4. 发明申请

US20100119717A1 WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME 审中-公开
标题翻译：用于形成微波炉的水溶性树脂组合物及其形成微波炉的方法
公开(公告)号：US20100119717A1
公开(公告)日：2010-05-13
申请号：US12451150
申请日：2008-05-01
申请人： Sung-Eun Hong , Yusuke Takano , Wen-Bing Kang
发明人： Sung-Eun Hong , Yusuke Takano , Wen-Bing Kang
IPC分类号： B05D3/00 , C08K5/17
CPC分类号： H01L21/0271 , G03F7/40 , H01L21/3085 , H01L21/3086 , H01L21/3088
摘要： A process which comprises applying a water-soluble resin composition comprising a water-soluble vinyl resin, a compound having at least two amino groups in the molecule, a solvent, and, if necessary, an additive such as a surfactant on a resist pattern (2) formed on a substrate (1) to form a water-soluble resin film (3) , modifying part of the water-soluble resin film adjacent to the resist pattern through mixing to form a water-insolubilized layer (4) which cannot be removed by water washing on the surface of the resist pattern, and removing unmodified part of the water-soluble resin film by water washing and which enables the effective scale-down of separation size and hole opening size of a resist pattern to a level finer than the limit of resolution of the wave length of exposure. It is preferable to use as the water-soluble vinyl resin a homopolymer of a nitrogen-containing vinyl monomer such as acrylamine, vinylpyrrolidone or vinylimidazole, a copolymer of two or more nitrogen-containing vinyl monomers, or a copolymer of at least one nitrogen-containing vinyl monomer and at least one nitrogen-free vinyl monomer.
摘要翻译：一种方法，其包括将包含水溶性乙烯基树脂的水溶性树脂组合物，分子中具有至少两个氨基的化合物，溶剂和必要时在抗蚀图案上添加表面活性剂等添加剂 2）形成在基板（1）上以形成水溶性树脂膜（3），通过混合将与抗蚀剂图案相邻的水溶性树脂膜的一部分进行改性以形成不可溶的水不溶层（4）通过在抗蚀剂图案的表面上进行水洗除去，并且通过水洗除去未改性的水溶性树脂膜的部分，并且能够将抗蚀剂图案的分离尺寸和开孔尺寸有效地缩小到比曝光波长分辨率的极限。作为水溶性乙烯基树脂，优选使用丙烯酰胺，乙烯基吡咯烷酮或乙烯基咪唑等含氮乙烯基单体的均聚物，两种以上含氮乙烯基单体的共聚物，或至少一种含氮乙烯基单体的共聚物，含有乙烯基单体和至少一种无氮乙烯基单体。

5. 发明授权

US08568955B2 Composition for formation of top antireflective film, and pattern formation method using the composition 有权
标题翻译：用于形成顶部抗反射膜的组合物和使用该组合物的图案形成方法
公开(公告)号：US08568955B2
公开(公告)日：2013-10-29
申请号：US12747652
申请日：2008-12-10
申请人： Yasushi Akiyama , Go Noya , Katsutoshi Kuramoto , Yusuke Takano
发明人： Yasushi Akiyama , Go Noya , Katsutoshi Kuramoto , Yusuke Takano
IPC分类号： G11B7/24 , C04B24/22
CPC分类号： G03F7/091 , G03F7/0046
摘要： Disclosed is a composition for forming a top antireflective film, which comprises at least one fluorine-containing compound and a quaternary ammonium compound represented by the formula (1) [wherein at least one of R1, R2, R3, and R4 represents a hydroxyl group or an alkanol group, and the others independently represent a hydrogen or an alkyl group having 1 to 10 carbon atoms; and X− represents a hydroxyl group, a halide ion or a sulfate ion], and optionally a water-soluble polymer, an acid, a surfactant and an aqueous solvent. The composition for forming a top antireflective film can exhibit the same levels of functions as those of conventional top antireflective film-forming compositions when applied in a smaller amount.
摘要翻译：公开了一种用于形成顶部抗反射膜的组合物，其包含至少一种含氟化合物和由式（1）表示的季铵化合物[其中R 1，R 2，R 3和R 4中的至少一个表示羟基或链烷醇基，其余独立地表示氢或碳原子数1〜10的烷基。和X-表示羟基，卤离子或硫酸根离子]，以及任选的水溶性聚合物，酸，表面活性剂和水性溶剂。用于形成顶部抗反射膜的组合物可以表现出与常规顶部抗反射成膜组合物相同程度的功能，当以较小的量使用时。

6. 发明授权

US08501394B2 Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern 有权
标题翻译：超细图形掩模，其制造方法以及使用该掩模形成超细图案的方法
公开(公告)号：US08501394B2
公开(公告)日：2013-08-06
申请号：US12864529
申请日：2009-01-27
申请人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
发明人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
IPC分类号： G03F7/26
CPC分类号： H01L21/0337 , C09D183/14 , C09D183/16 , G03F7/40 , H01L21/0274 , H01L21/0338 , H01L21/31144 , Y10T428/24479
摘要： There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity.The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed.
摘要翻译：提供了一种形成超细图案的方法，其可以简单地产生具有高质量生产率的超细图案。该方法包括以下步骤：在待处理的膜上形成第一凸起图案，在构成第一凸起图案的凸起的侧壁上形成由含硅氮烷的树脂组合物形成的间隔物，并使用如下方式形成超细图案掩模隔离物或设置在间隔物周围的树脂层。间隔物通过仅在其第一凸起图案周围的部分固化均匀涂覆的树脂组合物而形成。根据这种图案形成方法，与传统方法不同，可以形成超细纹图案。

7. 发明申请

US20120160801A1 Superfine Pattern Mask, Method for Production Thereof, and Method Employing the Same for forming Superfine Pattern 有权
标题翻译：超细纹图案面膜，其制造方法以及使用其形成超细纹图案的方法
公开(公告)号：US20120160801A1
公开(公告)日：2012-06-28
申请号：US12978740
申请日：2010-12-27
申请人： Munirathna Padmanaban , Jin Li , Toru Koike , Yusuke Takano , Kazunori Kurosawa
发明人： Munirathna Padmanaban , Jin Li , Toru Koike , Yusuke Takano , Kazunori Kurosawa
IPC分类号： B05D5/02 , C08L83/06
CPC分类号： C09D183/16 , C08G77/12 , C08G77/62 , G03F7/405 , H01L21/0337 , H01L21/0338 , C08L83/00
摘要： There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity.The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.
摘要翻译：提供了用于形成超细纹图案的组合物和使用该组合物形成超细纹图案的方法。该组合物能够简单地产生具有高批量生产率的超细纹理。组合物包含全氢聚硅氮烷（I），具有烃基的含硅聚合物（II）和溶剂。这些聚合物的混合物含有硅 - 氢键和硅 - 烃基键，其量使得硅 - 烃基键的数量相对于硅 - 氢键的总数为1〜44％，硅烃基键合。将该组合物施加在抗蚀剂图案上以在图案的脊的侧壁上形成由该组合物形成的间隔物，然后将间隔物或设置在间隔物周围的树脂层用作掩模以形成超细纹图案。

8. 发明申请

US20100308015A1 SUPERFINE-PATTERNED MASK, METHOD FOR PRODUCTION THEREOF, AND METHOD EMPLOYING THE SAME FOR FORMING SUPERFINE-PATTERN 有权
标题翻译：超级图案掩模，其生产方法和使用其形成超级图案的方法
公开(公告)号：US20100308015A1
公开(公告)日：2010-12-09
申请号：US12864529
申请日：2009-01-27
申请人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
发明人： Yusuke Takano , Jin Li , Tomonori Ishikawa , Go Noya
IPC分类号： C23F1/00 , B32B3/30 , B05D3/10
CPC分类号： H01L21/0337 , C09D183/14 , C09D183/16 , G03F7/40 , H01L21/0274 , H01L21/0338 , H01L21/31144 , Y10T428/24479
摘要： There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity.The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed.
摘要翻译：提供了一种形成超细图案的方法，其可以简单地产生具有高质量生产率的超细图案。该方法包括以下步骤：在待处理的膜上形成第一凸起图案，在构成第一凸起图案的凸起的侧壁上形成由含硅氮烷的树脂组合物形成的间隔物，并使用如下方式形成超细图案掩模隔离物或设置在间隔物周围的树脂层。间隔物通过仅在其第一凸起图案周围的部分固化均匀涂覆的树脂组合物而形成。根据这种图案形成方法，与传统方法不同，可以形成超细纹图案。

9. 发明授权

US07399582B2 Material for forming fine pattern and method for forming fine pattern using the same 有权
标题翻译：用于形成精细图案的材料和使用其形成精细图案的方法
公开(公告)号：US07399582B2
公开(公告)日：2008-07-15
申请号：US10565113
申请日：2004-06-04
申请人： Kiyohisa Takahashi , Yusuke Takano
发明人： Kiyohisa Takahashi , Yusuke Takano
IPC分类号： G03F7/40 , H01L21/027
CPC分类号： G03F7/40
摘要： In the method wherein a resist pattern is miniaturized effectively by applying a fine pattern forming material, the fine pattern forming material used for providing with a cured coated layer pattern, wherein development defects are reduced by water development is offered, wherein the fine pattern forming material comprises a water-soluble resin, a water-soluble crosslinking agent and water or a mixed solution consisting of water and a water-soluble organic solvent, and further comprises an amine compound.
摘要翻译：在通过施加精细图案形成材料使抗蚀剂图案小型化的方法中，提供了用于提供具有固化涂层图案的精细图案形成材料，其中通过水显影减少显影缺陷，其中精细图案形成材料包括水溶性树脂，水溶性交联剂和水或由水和水溶性有机溶剂组成的混合溶液，并且还包含胺化合物。

10. 发明申请

US20080044759A1 Fine Pattern Forming Material, Method Of Forming Fine Resist Pattern And Electronic Device 审中-公开
标题翻译：精细图案形成材料，形成精细抗蚀图案和电子器件的方法
公开(公告)号：US20080044759A1
公开(公告)日：2008-02-21
申请号：US11660970
申请日：2005-08-23
申请人： Takeo Ishibashi , Kiyohisa Takahashi , Yusuke Takano
发明人： Takeo Ishibashi , Kiyohisa Takahashi , Yusuke Takano
IPC分类号： G03C1/00 , G03C5/00
CPC分类号： G03F7/40 , H01L21/0274 , H01L21/3086 , H01L21/3088
摘要： A fine pattern forming material comprising a water soluble resin of polyvinyl alcohol derivative, etc., a water soluble crosslinking agent of melamine derivative, urea derivative, etc., an amine compound, a nonionic surfactant and water or a solution of a mixture of water and water soluble organic solvent, the solution exhibiting a pH value of >7. This fine pattern forming material is applied on to resist pattern (3) to thereby form coating layer (4), and the coating layer (4) is heated and developed to thereby form crosslinked coating layer (5). The thickness of the crosslinked coating layer is increased by the use of a secondary amine compound and/or tertiary amine compound over that realized when no amine compound is added, while the thickness of the crosslinked coating layer is decreased by the use of a quaternary amine.
摘要翻译：包含聚乙烯醇衍生物的水溶性树脂等的精细图案形成材料，三聚氰胺衍生物的水溶性交联剂，脲衍生物等，胺化合物，非离子表面活性剂和水或水混合物的溶液和水溶性有机溶剂，该溶液的pH值> 7。将这种精细图案形成材料涂覆在抗蚀剂图案（3）上，从而形成涂层（4），并将涂层（4）加热显影，从而形成交联涂层（5）。通过使用仲胺化合物和/或叔胺化合物，当不添加胺化合物时，交联涂层的厚度增加，而交联涂层的厚度通过使用季胺。

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