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1. 发明授权

US06632377B1 Chemical-mechanical planarization of metallurgy 有权
标题翻译：化学机械平面化冶金
公开(公告)号：US06632377B1
公开(公告)日：2003-10-14
申请号：US09409798
申请日：1999-09-30
申请人： Vlasta Brusic , Daniel C. Edelstein , Paul M. Feeney , William Guthrie , Mark Jaso , Frank B. Kaufman , Naftali Lustig , Peter Roper , Kenneth Rodbell , David B. Thompson
发明人： Vlasta Brusic , Daniel C. Edelstein , Paul M. Feeney , William Guthrie , Mark Jaso , Frank B. Kaufman , Naftali Lustig , Peter Roper , Kenneth Rodbell , David B. Thompson
IPC分类号： C09K1300
CPC分类号： C09G1/02 , C09K13/04 , C23F3/00 , H01L21/3212
摘要： Copper or a copper alloy is removed by chemical-mechanical planarization (CMP) in a slurry of an oxidizer, an oxidation inhibitor, and an additive that appreciably regulates copper complexing with the oxidation inhibitor.
摘要翻译：铜或铜合金通过化学机械平面化（CMP）在氧化剂，氧化抑制剂和显着调节与氧化抑制剂络合铜的添加剂的浆料中去除。

2. 发明授权

US6136686A Fabrication of interconnects with two different thicknesses 失效
标题翻译：制造具有两种不同厚度的互连
公开(公告)号：US6136686A
公开(公告)日：2000-10-24
申请号：US897172
申请日：1997-07-18
申请人： Jeffrey P. Gambino , Mark Jaso , Hing Wong
发明人： Jeffrey P. Gambino , Mark Jaso , Hing Wong
IPC分类号： H01L21/60 , H01L21/768 , H01L21/8242 , H01L21/4763
CPC分类号： H01L21/76825 , H01L21/76807 , H01L21/76814 , H01L21/76897 , H01L27/10882 , H01L27/10894
摘要： Provision of differential etching of layers by, for example, an etch stop layer or implantation, allows a second trough etch to be performed in accordance with a block-out mask (which does not require high accuracy of registration) to provide troughs or recesses of different depths in layers of insulator. When the recesses or troughs are filled by metal deposition and patterned by planarization in accordance with damascene processing, structurally robust conductors of differing thicknesses may be achieved and optimized to enhance noise immunity and/or signal propagation speed in different functional regions of an integrated circuit such as the so-called array and support portions of a dynamic random access memory.
摘要翻译：通过例如蚀刻停止层或植入来提供层的差分蚀刻允许根据阻挡掩模（其不需要高准确度的配准）来执行第二槽蚀刻，以提供槽或凹槽不同深度的绝缘子层。当通过金属沉积填充凹槽或凹槽时，根据镶嵌工艺通过平面化图案化，可以实现和优化不同厚度的结构坚固的导体并且被优化以增强集成电路的不同功能区域中的抗噪声和/或信号传播速度，例如作为动态随机存取存储器的所谓阵列和支持部分。

3. 发明申请

US20050023132A1 Device for measuring the profile of a metal film sputter deposition target, and system and method employing same 审中-公开
标题翻译：用于测量金属膜溅射沉积靶的轮廓的装置，以及使用其的系统和方法
公开(公告)号：US20050023132A1
公开(公告)日：2005-02-03
申请号：US10923233
申请日：2004-08-19
申请人： Mark Jaso
发明人： Mark Jaso
IPC分类号： C23C14/34 , C23C14/54 , C23C14/32
CPC分类号： H01J37/3482 , C23C14/3407 , C23C14/54 , C23C14/543 , C23C14/564
摘要： An apparatus and method for measuring the erosion profile of a metallic target in a sputtering device are provided by inserting a thin sensor into a gap between the target and a substrate pedestal. The sensor is configured to emit an energy beam toward the surface of the target and to detect a reflection of the energy beam. The sensor may comprise a source element configured to emit a collimated light beam and a plurality of detectors arranged in a linear array. The sensor may also comprise optical fibers configured to reduce the size of the sensor. The detectors are positioned relative to the source element so that one of the detectors in the array will be illuminated by a reflection of the collimated light beam. The distance from the sensor to the target may be derived from the position of the detector illuminated by the reflected beam.
摘要翻译：通过将薄传感器插入到靶和基板基座之间的间隙中来提供用于测量溅射装置中的金属靶的侵蚀曲线的装置和方法。传感器被配置为向目标表面发射能量束并检测能量束的反射。传感器可以包括被配置为发射准直光束的源元件和布置成线性阵列的多个检测器。传感器还可以包括配置成减小传感器尺寸的光纤。检测器相对于源元件定位，使得阵列中的一个检测器将被准直光束的反射照亮。从传感器到目标的距离可以从由反射光束照射的检测器的位置导出。

4. 发明授权

US07974505B2 Method for fabricating selectively coupled optical waveguides on a substrate 有权
标题翻译：在衬底上制造选择性耦合的光波导的方法
公开(公告)号：US07974505B2
公开(公告)日：2011-07-05
申请号：US12517619
申请日：2008-08-29
申请人： Craig M. Hill , Mark Jaso
发明人： Craig M. Hill , Mark Jaso
IPC分类号： G02B6/12 , G02B6/26 , B29D11/00 , H01L21/00
CPC分类号： G02B6/12002 , G02B6/132 , G02B6/136 , G02B6/2821 , G02B2006/12147
摘要： A method for fabricating selectively coupled optical waveguides on a substrate is disclosed. Initially, a first layer of waveguide material is deposited on a substrate. The first layer of waveguide material is then etched to form multiple level one waveguides and fill shapes. A dielectric layer is deposited on top of the level one waveguides and fill shapes. The surface profile of the dielectric layer deposition tracks the pattern density of the fill shapes. After the surface of the dielectric layer has been polished, a second layer of waveguide material is deposited on the substrate. At least one optically coupled waveguide structure, which is formed by a first level one waveguide and a first level two waveguide, is located adjacent to at least one non-optically coupled waveguide structure, which is formed by a second level one waveguide and a second level two waveguide.
摘要翻译：公开了一种用于在衬底上制造选择性耦合的光波导的方法。最初，第一层波导材料沉积在基底上。然后蚀刻第一层波导材料以形成多个一级波导和填充形状。电介质层沉积在一级波导和填充形状的顶部。介电层沉积的表面轮廓跟踪填充形状的图案密度。在电介质层的表面被抛光之后，第二层波导材料沉积在基片上。由第一级一波导和第一级二波导形成的至少一个光耦合波导结构位于至少一个非光耦合波导结构附近，该至少一个非光耦合波导结构由第二级一波导和第二级波导二级波导。

5. 发明申请

US20060054497A1 Apparatus, method and system for monitoring chamber parameters associated with a deposition process 审中-公开
标题翻译：用于监测与沉积过程相关的室参数的装置，方法和系统
公开(公告)号：US20060054497A1
公开(公告)日：2006-03-16
申请号：US11264235
申请日：2005-11-01
申请人： Mark Jaso , Terry Gilton
发明人： Mark Jaso , Terry Gilton
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： H01J37/3482 , C23C14/3407 , C23C14/54 , C23C14/543 , C23C14/564
摘要： Apparatus and methods for measuring characteristics of a metallic target as well as other interior surfaces of a sputtering chamber. The apparatus includes a sensor configured to emit an energy beam toward a surface of interest and to detect an energy beam therefrom, the detected energy beam being indicative of parameters of a characteristic of interest of the surface of interest. Quantitative and qualitative characteristics of interest may be determined. A sputtering system including the apparatus and operable according to the methods of the invention is also disclosed.
摘要翻译：用于测量金属靶以及溅射室的其它内表面的特性的装置和方法。该装置包括传感器，该传感器被配置为朝着感兴趣的表面发射能量束并且从其中检测能量束，所检测的能量束指示感兴趣的表面的感兴趣特征的参数。可以确定感兴趣的定量和定性特征。还公开了包括该装置并且可根据本发明的方法操作的溅射系统。

6. 发明授权

US08192638B2 Method for manufacturing multiple layers of waveguides 有权
标题翻译：制造多层波导的方法
公开(公告)号：US08192638B2
公开(公告)日：2012-06-05
申请号：US12517692
申请日：2008-08-29
申请人： Andrew T. S. Pomerene , Timothy J. Conway , Craig M. Hill , Mark Jaso
发明人： Andrew T. S. Pomerene , Timothy J. Conway , Craig M. Hill , Mark Jaso
IPC分类号： B29D11/00 , G02B6/10 , G02F1/00
CPC分类号： G02B6/12002 , B82Y20/00 , G02B6/1223 , G02B6/132 , G02B6/136
摘要： A method for manufacturing multiple layers of waveguides is disclosed. Initially, a first cladding layer is deposited on a substrate, a first inner cladding layer is then deposited on the first cladding layer, and a first waveguide material is deposited on the first inner cladding layer. The first inner cladding layer and the first waveguide material are then selectively etched to form a first waveguide layer. Next, a second inner cladding layer followed by a second cladding layer are deposited on the first waveguide layer. The second inner cladding layer and the second cladding layer are removed by using a chemical-mechanical polishing process selective to the first waveguide material. A third inner cladding layer followed by a second waveguide material are deposited on the first waveguide material. The third inner cladding layer and the second waveguide material are then selectively etched to form a second waveguide layer. Finally, a fourth inner cladding layer followed by a third cladding layer are deposited on the second waveguide layer.
摘要翻译：公开了制造多层波导的方法。首先，在基板上沉积第一包层，然后在第一包层上沉积第一内包层，在第一内包层上沉积第一波导材料。然后选择性地蚀刻第一内包层和第一波导材料以形成第一波导层。接下来，在第一波导层上沉积第二内包层和第二覆层。通过使用对第一波导材料选择性的化学机械抛光工艺来除去第二内包层和第二包覆层。在第一波导材料上沉积第三内包层和第二波导材料。然后选择性地蚀刻第三内包层和第二波导材料以形成第二波导层。最后，在第二波导层上沉积第四内包层和第三覆层。

7. 发明申请

US20100025364A1 Method for Manufacturing Multiple Layers of Waveguides 有权
标题翻译：制造多层波导的方法
公开(公告)号：US20100025364A1
公开(公告)日：2010-02-04
申请号：US12517692
申请日：2008-08-29
申请人： Andrew T.S. Pomerene , Timothy J. Conway , Craig M. Hill , Mark Jaso
发明人： Andrew T.S. Pomerene , Timothy J. Conway , Craig M. Hill , Mark Jaso
IPC分类号： B29D11/00
CPC分类号： G02B6/12002 , B82Y20/00 , G02B6/1223 , G02B6/132 , G02B6/136
摘要： A method for manufacturing multiple layers of waveguides is disclosed. Initially, a first cladding layer is deposited on a substrate, a first inner cladding layer is then deposited on the first cladding layer, and a first waveguide material is deposited on the first inner cladding layer. The first inner cladding layer and the first waveguide material are then selectively etched to form a first waveguide layer. Next, a second inner cladding layer followed by a second cladding layer are deposited on the first waveguide layer. The second inner cladding layer and the second cladding layer are removed by using a chemical-mechanical polishing process selective to the first waveguide material. A third inner cladding layer followed by a second waveguide material are deposited on the first waveguide material. The third inner cladding layer and the second waveguide material are then selectively etched to form a second waveguide layer. Finally, a fourth inner cladding layer followed by a third cladding layer are deposited on the second waveguide layer.
摘要翻译：公开了制造多层波导的方法。首先，在基板上沉积第一包层，然后在第一包层上沉积第一内包层，在第一内包层上沉积第一波导材料。然后选择性地蚀刻第一内包层和第一波导材料以形成第一波导层。接下来，在第一波导层上沉积第二内包层和第二覆层。通过使用对第一波导材料选择性的化学机械抛光工艺来除去第二内包层和第二包覆层。在第一波导材料上沉积第三内包层和第二波导材料。然后选择性地蚀刻第三内包层和第二波导材料以形成第二波导层。最后，在第二波导层上沉积第四内包层和第三覆层。

8. 发明申请

US20100014804A1 Method for Fabricating Selectively Coupled Optical Waveguides on a Substrate 有权
标题翻译：在基板上制造选择性耦合的光波导的方法
公开(公告)号：US20100014804A1
公开(公告)日：2010-01-21
申请号：US12517619
申请日：2008-08-29
申请人： Craig M Hill , Mark Jaso
发明人： Craig M Hill , Mark Jaso
IPC分类号： G02B6/12 , G02B6/26 , B29D11/00
CPC分类号： G02B6/12002 , G02B6/132 , G02B6/136 , G02B6/2821 , G02B2006/12147
摘要： A method for fabricating selectively coupled optical waveguides on a substrate is disclosed. Initially, a first layer of waveguide material is deposited on a substrate. The first layer of waveguide material is then etched to form multiple level one waveguides and fill shapes. A dielectric layer is deposited on top of the level one waveguides and fill shapes. The surface profile of the dielectric layer deposition tracks the pattern density of the fill shapes. After the surface of the dielectric layer has been polished, a second layer of waveguide material is deposited on the substrate. At least one optically coupled waveguide structure, which is formed by a first level one waveguide and a first level two waveguide, is located adjacent to at least one non-optically coupled waveguide structure, which is formed by a second level one waveguide and a second level two waveguide.
摘要翻译：公开了一种用于在衬底上制造选择性耦合的光波导的方法。最初，第一层波导材料沉积在基底上。然后蚀刻第一层波导材料以形成多个一级波导和填充形状。电介质层沉积在一级波导和填充形状的顶部。介电层沉积的表面轮廓跟踪填充形状的图案密度。在电介质层的表面被抛光之后，第二层波导材料沉积在基片上。由第一级一波导和第一级二波导形成的至少一个光耦合波导结构位于至少一个非光耦合波导结构附近，该至少一个非光耦合波导结构由第二级一波导和第二级波导二级波导。

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