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    • 4. 发明申请
    • METHOD FOR REMOVING HARD CARBON LAYERS
    • 去层用于硬质涂层
    • WO2012167886A8
    • 2014-01-23
    • PCT/EP2012002305
    • 2012-05-31
    • OERLIKON TRADING AGRAMM JUERGENWIDRIG BENO
    • RAMM JUERGENWIDRIG BENO
    • C23G5/00
    • C23G5/00
    • The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.
    • 一种用于汽提的碳层,特别是工具和组件基板表面的TA-C层的方法。 的被剥离基板被相应配置的基板支架上在真空室中,真空室中的至少一种加入气态形式支持反应气体中去除碳和低电压等离子放电在所述真空室的反应气体的激发,并因此支持所需的化学反应或 创建用于经涂覆的基材的剥离反应。 低压等离子体放电为直流低电压电弧放电,与电子轰击被剥离仅基底表面并基本上作为反应气体,氧,氮和氢被使用。