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1. 发明授权

US08382938B2 Gate valve cleaning method and substrate processing system 有权
标题翻译：闸阀清洗方法和基板处理系统
公开(公告)号：US08382938B2
公开(公告)日：2013-02-26
申请号：US13243462
申请日：2011-09-23
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： H01L21/00 , B08B9/00
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

2. 发明申请

US20080181750A1 GATE VALVE CLEANING METHOD AND SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：门阀清洗方法和基板处理系统
公开(公告)号：US20080181750A1
公开(公告)日：2008-07-31
申请号：US11969428
申请日：2008-01-04
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： H01L21/677 , B08B5/02
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

3. 发明申请

US20080031710A1 INTERMEDIATE TRANSFER CHAMBER, SUBSTRATE PROCESSING SYSTEM, AND EXHAUST METHOD FOR THE INTERMEDIATE TRANSFER CHAMBER 有权
标题翻译：中间传送室，基板处理系统和中间传送室的排气方法
公开(公告)号：US20080031710A1
公开(公告)日：2008-02-07
申请号：US11831361
申请日：2007-07-31
申请人： Tsuyoshi MORIYA , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi MORIYA , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B65H1/24
CPC分类号： H01L21/67201 , Y10S414/135
摘要： An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the interior thereof is at a first pressure and contains moisture, and a chamber of a process module being in a second environment where the interior thereof is at a second pressure lower than the first pressure. The intermediate transfer chamber comprises a transfer arm comprising a pick that bidirectionally transfers a substrate between the loader module and the chamber and supports the substrate, a load-lock module exhaust system that exhausts the interior of the intermediate transfer chamber so as to reduce pressure in the intermediate transfer chamber from the first pressure to the second pressure, and a plate-like member that controls the conductance of exhaust on at least a principal surface of the substrate opposite to the pick when the interior of the intermediate transfer chamber is exhausted.
摘要翻译：可以防止在基板中形成缺陷的中间转印室。中间转移室设置在处于第一环境中的第一环境中的装载器模块和处于第二环境中的处于第二环境的第二环境中的第二环境中的处理模块室，比第一个压力。中间传送室包括传送臂，传送臂包括在装载器模块和室之间双向传送衬底并支撑衬底的拾取器，负载锁定模块排气系统，其排出中间转印室的内部，以便减少所述中间转印室从所述第一压力到所述第二压力，以及板状构件，其在所述中间转印室的内部被耗尽时控制与所述拾取器相对的所述基板的至少主表面上的排气的电导。

4. 发明授权

US08048235B2 Gate valve cleaning method and substrate processing system 有权
标题翻译：闸阀清洗方法和基板处理系统
公开(公告)号：US08048235B2
公开(公告)日：2011-11-01
申请号：US11969428
申请日：2008-01-04
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B08B6/00 , B08B5/02 , B08B7/02
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

5. 发明授权

US08113757B2 Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber 有权
标题翻译：中间转移室，衬底处理系统和中间转移室的排气方法
公开(公告)号：US08113757B2
公开(公告)日：2012-02-14
申请号：US11831361
申请日：2007-07-31
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B65G65/34
CPC分类号： H01L21/67201 , Y10S414/135
摘要： An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the interior thereof is at a first pressure and contains moisture, and a chamber of a process module being in a second environment where the interior thereof is at a second pressure lower than the first pressure. The intermediate transfer chamber comprises a transfer arm comprising a pick that bidirectionally transfers a substrate between the loader module and the chamber and supports the substrate, a load-lock module exhaust system that exhausts the interior of the intermediate transfer chamber so as to reduce pressure in the intermediate transfer chamber from the first pressure to the second pressure, and a plate-like member that controls the conductance of exhaust on at least a principal surface of the substrate opposite to the pick when the interior of the intermediate transfer chamber is exhausted.
摘要翻译：可以防止在基板中形成缺陷的中间转印室。中间转移室设置在处于第一环境中的第一环境中的装载器模块和处于第二环境中的处于第二环境的第二环境中的第二环境中的处理模块室，比第一个压力。中间传送室包括传送臂，传送臂包括在装载器模块和室之间双向传送衬底并支撑衬底的拾取器，负载锁定模块排气系统，其排出中间转印室的内部，以便减少所述中间转印室从所述第一压力到所述第二压力，以及板状构件，其在所述中间转印室的内部被耗尽时控制与所述拾取器相对的所述基板的至少主表面上的排气的电导。

6. 发明申请

US20120012254A1 GATE VALVE CLEANING METHOD AND SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：门阀清洗方法和基板处理系统
公开(公告)号：US20120012254A1
公开(公告)日：2012-01-19
申请号：US13243462
申请日：2011-09-23
申请人： Tsuyoshi MORIYA , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi MORIYA , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B08B13/00 , C23F1/08
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

7. 发明授权

US08337629B2 Method for cleaning elements in vacuum chamber and apparatus for processing substrates 有权
公开(公告)号：US08337629B2
公开(公告)日：2012-12-25
申请号：US13495404
申请日：2012-06-13
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
IPC分类号： B08B5/00 , B08B7/00
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.

8. 发明申请

US20120285623A1 PLASMA PROCESSING APPARATUS AND METHOD 有权
标题翻译：等离子体加工设备和方法
公开(公告)号：US20120285623A1
公开(公告)日：2012-11-15
申请号：US13559373
申请日：2012-07-26
申请人： Tsuyoshi MORIYA , Hiroyuki Nakayama
发明人： Tsuyoshi MORIYA , Hiroyuki Nakayama
IPC分类号： H01L21/3065 , B05C11/00
CPC分类号： H01J37/32431 , H01J2237/022
摘要： There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.
摘要翻译：提供了一种等离子体处理装置，其包括等离子体产生单元，用于在处理室中产生等离子体，其中对作为待处理对象的基板进行设定处理。等离子体处理装置还包括一个粒子移动单元，用于在通过使用等离子体进行基板上的处理的同时，在处理室中的基板上方的区域中，将基板上方的区域中的颗粒静电驱动。此外，提供了一种等离子体处理装置的等离子体处理方法，其包括以下步骤：在对作为被处理对象的基板进行设定处理的处理室中产生等离子体; 并通过等离子体对衬底进行处理。

9. 发明授权

US07797984B2 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring 有权
标题翻译：包括颗粒监测单元，颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
公开(公告)号：US07797984B2
公开(公告)日：2010-09-21
申请号：US12258196
申请日：2008-10-24
申请人： Hiroyuki Nakayama , Tsuyoshi Moriya
发明人： Hiroyuki Nakayama , Tsuyoshi Moriya
IPC分类号： G01N21/53
CPC分类号： H01J37/32935 , B08B9/08 , G01N15/0272 , G01N15/06 , G01N2015/0693 , Y10T428/30 , Y10T428/315 , Y10T428/8305
摘要： A semiconductor manufacturing apparatus includes a processing chamber for performing a manufacturing processing on a wafer. A gas supply line for introducing a purge gas is connected to an upper portion of the processing chamber, a valve being installed on the gas supply line. A rough pumping line with a valve is connected to a lower portion of the processing chamber. Installed on the rough pumping line are a dry pump for exhausting a gas in the processing chamber and a particle monitoring unit for monitoring particles between the valve and the dry pump. In the semiconductor manufacturing apparatus, after the valve is opened, the purge gas is supplied to apply physical vibration due to shock wave in the processing chamber so that deposits are detached therefrom to be monitored as particles.
摘要翻译：半导体制造装置包括用于在晶片上进行制造处理的处理室。用于引入吹扫气体的气体供给管线连接到处理室的上部，安装在气体供给管线上的阀。具有阀的粗抽泵线连接到处理室的下部。安装在粗抽油管上的是用于排出处理室中的气体的干燥泵和用于监测阀和干泵之间的颗粒的颗粒监测单元。在半导体制造装置中，在阀打开之后，供给吹扫气体以在处理室中施加由冲击波引起的物理振动，从而将沉积物从其中分离出来，作为颗粒被监测。

10. 发明授权

US07756599B2 Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program 有权
标题翻译：衬底处理装置，用于执行其操作和控制方法的程序以及存储程序的计算机可读存储介质
公开(公告)号：US07756599B2
公开(公告)日：2010-07-13
申请号：US11254668
申请日：2005-10-21
申请人： Tomoyuki Kudo , Jun Ozawa , Hiroshi Nakamura , Kazunori Kazama , Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
发明人： Tomoyuki Kudo , Jun Ozawa , Hiroshi Nakamura , Kazunori Kazama , Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
IPC分类号： G06F19/00 , B65H1/00 , H01L21/306
CPC分类号： H01L21/67201 , H01L21/67017 , H01L21/67253 , H01L21/67748 , Y10S414/135 , Y10S414/139
摘要： A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the substrate is transferred between the vacuum preparation chamber of the vacuum processing unit and the transfer unit, stopping introducing the nonreactive gas when an inner pressure of the vacuum preparation chamber becomes same as an atmospheric pressure, starting an evacuation process of the corrosive gas in the vacuum preparation chamber and then opening to atmosphere performed by letting the vacuum preparation chamber communicate with an atmosphere, and opening the gate valve after the step of opening to atmosphere.
摘要翻译：提供一种存储用于执行基板处理装置的操作方法的程序的计算机可读存储介质。操作方法包括以下步骤：在基板在真空处理单元的真空处理室和转印单元的真空准备室之间转移时，在闸阀打开之前将非反应性气体引入真空准备室中，当内部真空制备室的压力与大气压力相同，开始真空制备室中的腐蚀性气体的抽空处理，然后通过使真空制备室与大气连通而进入大气，并在真空准备室之后打开闸阀向大气开放的一步。

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