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1. 发明授权

US09960407B2 Sealing arrangement of a battery filling port using a rivet 有权
公开(公告)号：US09960407B2
公开(公告)日：2018-05-01
申请号：US14360140
申请日：2012-11-21
申请人： Hiroyuki Nakayama , Takashi Harayama , Kazuyuki Kusama
发明人： Hiroyuki Nakayama , Takashi Harayama , Kazuyuki Kusama
IPC分类号： H01M2/36 , H01M10/052 , F16B19/00 , F16B19/10 , B21J15/04
CPC分类号： H01M2/362 , B21J15/043 , F16B19/008 , F16B19/1045 , H01M2/36 , H01M2/361 , H01M2/365 , H01M10/052
摘要： A sealed battery includes a filling hole, and a gasket and a blind rivet that seal the filling hole. A tapered surface that is inclined toward an inside of a battery case is formed around the filling hole of the battery case. The filling hole is sealed by the gasket and the blind rivet by the blind rivet plastic deforming.

2. 发明授权

US09627184B2 Cleaning method of processing apparatus, program for performing the method, and storage medium for storing the program 有权
公开(公告)号：US09627184B2
公开(公告)日：2017-04-18
申请号：US12960064
申请日：2010-12-03
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
IPC分类号： B08B7/00 , H01J37/32
CPC分类号： H01J37/32862 , H01J37/3244 , H01J37/32449
摘要： A plasma processing apparatus includes a processing chamber, in which a wafer W is plasma-processed, and a CPU controlling an operation of each component. A processing gas is introduced into the processing chamber under a first condition defined by a flow rate and a molecular weight of the processing gas, specifically based on a magnitude of a product A1 (=Q1×m1) of the flow rate Q1 and the molecular weight m1 of the processing gas, and a surface of the wafer W is physically or chemically etched. And then, a pre-purge gas which may be identical to or different from the processing gas is introduced into the processing chamber through a shower head under a second condition derived from the first condition.

3. 发明授权

US08833756B2 Sheet-shaped medium feeding device and sheet-shaped medium processing device 有权
标题翻译：片状介质给料装置和片状介质处理装置
公开(公告)号：US08833756B2
公开(公告)日：2014-09-16
申请号：US13615775
申请日：2012-09-14
申请人： Hiroyuki Nakayama
发明人： Hiroyuki Nakayama
IPC分类号： B65H3/06 , B65H3/52 , B41J3/44 , B65H1/02
CPC分类号： B41J3/44 , B65H1/025 , B65H3/0653 , B65H3/0669 , B65H2403/422 , B65H2701/1912
摘要： A sheet-shaped medium feeding device is provided. A power transmission mechanism includes a retardation mechanism configured to retard rotation start timing of a pick-up roller than movement start timing of a pressing member when the pressing member starts to move from a stand-by position toward the pick-up roller. The retardation mechanism includes a driving side rotational member and a driven side rotational member which are configured to rotate around a common center axis. When the driving side rotational member rotates around the center axis in a predetermined rotation direction by a predetermined play angle, the driving side rotational member is engaged with the driven side rotational member to integrally rotate the driven side rotational member in the rotation direction.
摘要翻译：提供了片状介质供给装置。动力传递机构包括延迟机构，该延迟机构构成为当按压部件开始从待机位置朝向拾取辊移动时，延迟拾取辊的旋转开始正时，而不是按压部件的移动开始正时。延迟机构包括驱动侧旋转构件和从动侧旋转构件，其构造成围绕公共中心轴线旋转。当驱动侧旋转构件以预定的旋转方向围绕中心轴旋转预定的游隙角时，驱动侧旋转构件与从动侧旋转构件接合，以使从动侧旋转构件沿旋转方向一体地旋转。

4. 发明申请

US20140193557A1 Method of Producing Processed Brown Rice 审中-公开
标题翻译：生产加工糙米的方法
公开(公告)号：US20140193557A1
公开(公告)日：2014-07-10
申请号：US14235535
申请日：2012-07-26
申请人： Yuuki Nakayoshi , Hiroyuki Nakayama , Yoji Kameo
发明人： Yuuki Nakayoshi , Hiroyuki Nakayama , Yoji Kameo
IPC分类号： A23L1/182
CPC分类号： A23L7/101 , A23L7/1963 , A23L7/1965 , A23L7/198 , A23L33/10 , A23L33/30
摘要： A method of producing processed brown rice, containing at least the steps of: subjecting raw brown rice to heat-moisture treatment using water vapor having a temperature of from 110 to 150° C. for from 5 to 90 minutes; and subjecting the brown rice after the heat-moisture treatment to heat treatment at a temperature of from 80 to 100° C. for from 5 to 90 minutes.
摘要翻译：一种生产加工糙米的方法，其至少包括以下步骤：使用温度为110至150℃的水蒸气对生糙米进行热湿处理5至90分钟; 并在热湿处理后对糙米进行80〜100℃的温度的热处理5〜90分钟。

5. 发明授权

US08739732B2 Plasma treatment container internal member, and plasma treatment apparatus having the plasma treatment container internal member 有权
标题翻译：等离子体处理容器内部构件和具有等离子体处理容器内部构件的等离子体处理装置
公开(公告)号：US08739732B2
公开(公告)日：2014-06-03
申请号：US10477759
申请日：2002-05-17
申请人： Nobuyuki Nagayama , Hiroyuki Nakayama , Kouji Mitsuhashi
发明人： Nobuyuki Nagayama , Hiroyuki Nakayama , Kouji Mitsuhashi
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H01J37/32477 , C23C4/02
摘要： A plasma treatment container internal member, which is used in a plasma treatment container for performing a process on an object to be treated by plasma, includes an anodic oxide coating formed on a surface of a base material of the plasma treatment container internal member by an anodic oxidation treatment using plasma discharge, and a thermally sprayed film formed on the anodic oxide coating. The anodic oxidation treatment includes immersing the base material in an alkaline organic solvent, and performing the plasma discharge in the alkaline organic solvent.
摘要翻译：在等离子体处理容器中使用的等离子体处理容器内部件，用于对待处理物体进行等离子体处理的工序包括在等离子体处理容器内部部件的基材的表面上形成的阳极氧化层，使用等离子体放电的阳极氧化处理和在阳极氧化物涂层上形成的热喷涂膜。阳极氧化处理包括将碱性物质浸渍在碱性有机溶剂中，并在碱性有机溶剂中进行等离子体放电。

6. 发明授权

US08647003B2 Printing device 有权
标题翻译：印刷装置
公开(公告)号：US08647003B2
公开(公告)日：2014-02-11
申请号：US13004210
申请日：2011-01-11
申请人： Hiroyuki Nakayama
发明人： Hiroyuki Nakayama
IPC分类号： B41J15/00
CPC分类号： B65H23/08 , B41J15/042 , B65H2403/51 , B65H2801/12
摘要： A roll paper supply device has a roll paper compartment that stores roll paper with the axis of rotation transverse so that the roll paper can roll there inside; supply rollers that feed the roll paper from the roll paper compartment in a sheet; a roll paper cover that opens and closes the roll paper compartment; and a side pressure plate that contacts one side of the roll paper when the access cover is closed, and displaces away from the side of the roll paper when the access cover opens.
摘要翻译：卷纸供给装置具有卷纸纸箱，其存储横向具有旋转轴线的卷纸，使得卷纸可以在内侧滚动; 供应辊，其将卷纸从卷纸隔间供给到纸张中; 卷纸纸盖，打开和关闭卷纸箱; 以及当所述通行盖关闭时接触所述卷纸的一侧的侧压板，并且当所述检修盖打开时从所述卷纸的侧面移开。

7. 发明授权

US08500116B2 Image processing device and sheet feeder mechanism 有权
标题翻译：图像处理装置和送纸机构
公开(公告)号：US08500116B2
公开(公告)日：2013-08-06
申请号：US13406729
申请日：2012-02-28
申请人： Hiroyuki Nakayama
发明人： Hiroyuki Nakayama
IPC分类号： B65H3/52
CPC分类号： B65H3/5207 , B65H3/0653 , B65H2301/3122 , B65H2403/732 , B65H2601/324 , B65H2701/1912
摘要： A drop in performance can be easily resolved when the retard roller becomes worn. A hopper disposed to a main unit stores sheets in a stack. A conveyance path conveys sheets from the hopper. A feed roller is disposed facing the conveyance path. A retard unit has a retard roller is disposed opposite the feed roller with the conveyance path therebetween, and a torque limiter connected coaxially to the retard roller. An urging means urges the retard unit so that the retard roller presses against the feed roller. The retard unit is removably installed to the main unit.
摘要翻译：当阻滞辊磨损时，可以轻松解决性能下降。设置在主机上的料斗将纸叠放在一起。输送路径从料斗输送片材。馈送辊面对输送路径设置。延迟单元具有与供给辊相对设置的延迟辊，其间具有输送路径，以及与减速辊同轴连接的扭矩限制器。推动装置促使延迟单元使得延迟辊压靠进给辊。延迟单元可拆卸地安装在主机上。

8. 发明授权

US08440050B2 Plasma processing apparatus and method, and storage medium 有权
标题翻译：等离子体处理装置和方法以及存储介质
公开(公告)号：US08440050B2
公开(公告)日：2013-05-14
申请号：US12372156
申请日：2009-02-17
申请人： Manabu Iwata , Hiroyuki Nakayama , Kenji Masuzawa , Masanobu Honda
发明人： Manabu Iwata , Hiroyuki Nakayama , Kenji Masuzawa , Masanobu Honda
IPC分类号： C23F1/00 , H01L21/306 , G06F19/00
CPC分类号： H01J37/32027 , H01J37/32091 , H01J37/32165
摘要： A plasma processing apparatus includes a vacuum evacuable processing chamber, a first electrode divided into an outer electrode and an inner electrode, a second electrode, a first and a second high frequency power application unit for applying to the second electrode a first and a second high frequency power having a relatively high frequency and a relatively low frequency, respectively, a first and a second DC voltage application circuit apply a DC voltage to the outer and the inner electrode, respectively, and a processing gas supply unit. A space between the first electrode and the second electrode serves as a plasma generation space, and frequency-impedance characteristics of the outer electrode are set such that the impedance increases at the frequency of the second high frequency power and decreases at the frequency of the first high frequency power as the DC voltage applied to the outer electrode increases.
摘要翻译：等离子体处理装置包括真空排气处理室，分为外部电极和内部电极的第一电极，第二电极，第一和第二高频电力施加单元，用于向第二电极施加第一和第二高电平第一和第二直流电压施加电路分别对外电极和内电极分别施加直流电压和处理气体供给单元。第一电极和第二电极之间的空间用作等离子体产生空间，外部电极的频率阻抗特性被设定为使得阻抗在第二高频功率的频率下增加，并且在第一随着施加到外部电极的DC电压的增加，高频功率增加。

9. 发明授权

US08404050B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US08404050B2
公开(公告)日：2013-03-26
申请号：US13559373
申请日：2012-07-26
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： C23C16/00
CPC分类号： H01J37/32431 , H01J2237/022
摘要： There is provided a plasma processing apparatus including a plasma generating unit for generating a plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed. The plasma processing apparatus further includes a particle moving unit for electrostatically driving particles in a region above the substrate to be removed out of the region above the substrate in the processing chamber while the processing on the substrate is performed by using the plasma. In addition, there is provided a plasma processing method of a plasma processing apparatus including the steps of generating plasma in a processing chamber in which a set processing is performed on a substrate serving as an object to be processed; and performing the processing on the substrate by the plasma.
摘要翻译：提供了一种等离子体处理装置，其包括等离子体产生单元，用于在处理室中产生等离子体，其中对作为待处理对象的基板进行设定处理。等离子体处理装置还包括一个粒子移动单元，用于在通过使用等离子体进行基板上的处理的同时，在处理室中的基板上方的区域中，将基板上方的区域中的颗粒静电驱动。此外，提供了一种等离子体处理装置的等离子体处理方法，其包括以下步骤：在对作为被处理对象的基板进行设定处理的处理室中产生等离子体; 并通过等离子体对衬底进行处理。

10. 发明授权

US08314192B2 Interpenetrating polymer network structure and polishing pad, and process for producing the same 失效
标题翻译：互穿聚合物网络结构和抛光垫，及其制造方法
公开(公告)号：US08314192B2
公开(公告)日：2012-11-20
申请号：US12375371
申请日：2006-07-28
申请人： Norikazu Tabata , Kazuhiko Hashisaka , Masahiro Sugimura , Takuo Sakamoto , Masaki Ue , Hiroyuki Nakayama , Seiji Fukuda
发明人： Norikazu Tabata , Kazuhiko Hashisaka , Masahiro Sugimura , Takuo Sakamoto , Masaki Ue , Hiroyuki Nakayama , Seiji Fukuda
IPC分类号： C08F2/00
CPC分类号： B24B37/24 , B24D18/0027 , C08F2/38 , C08F2/40 , C08F265/04 , C08F283/00 , C08J3/246 , C08L33/10 , C08L75/00 , C08L2205/04 , C08L75/04
摘要： The present invention relates to a process for producing an interpenetrating polymer network structure, which comprises the steps of impregnating a polymer molding with a radical polymerizable composition containing an ethylenically unsaturated compound and a radical polymerization initiator; and polymerizing the ethylenically unsaturated compound in a swollen state of the polymer molding impregnated with the radical polymerizable composition; wherein a chain transfer agent and/or a radical polymerization inhibitor are added to the radical polymerizable composition and/or the polymer molding before impregnating the polymer molding with the radical polymerizable composition. According to the present invention, a highly uniform interpenetrating polymer network structure can be obtained. The present invention also provides a polishing pad which is exhibits high in-plane uniformity of a polishing rate during polishing, and also has excellent flattening properties and improved pad lifetime during polishing, and a process for producing the same.
摘要翻译：本发明涉及一种互穿聚合物网状结构体的制造方法，其特征在于，包括使含有烯键式不饱和化合物和自由基聚合引发剂的自由基聚合性组合物浸渍聚合物成型体的工序; 并在浸渍有自由基聚合性组合物的聚合物成型体的溶胀状态下聚合烯属不饱和化合物; 其中在用可自由基聚合的组合物浸渍聚合物模制品之前，将链转移剂和/或自由基聚合抑制剂加入到可自由基聚合的组合物和/或聚合物模制品中。根据本发明，可以获得高度均匀的互穿聚合物网络结构。本发明还提供一种研磨抛光时的研磨速度平面均匀性高的抛光垫，并且还具有优异的平坦化性能和抛光时的垫寿命的改善及其制造方法。

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