专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5046847A Method for detecting foreign matter and device for realizing same 失效
标题翻译：异物检测方法及其实现方法
公开(公告)号：US5046847A
公开(公告)日：1991-09-10
申请号：US262573
申请日：1988-10-25
申请人： Toshihiko Nakata , Nobuyuki Akiyama , Yoshihiko Yamuchi , Mitsuyoshi Koizumi , Yoshimasa Oshima
发明人： Toshihiko Nakata , Nobuyuki Akiyama , Yoshihiko Yamuchi , Mitsuyoshi Koizumi , Yoshimasa Oshima
IPC分类号： G01N21/21 , G01N21/94 , G03F9/00
CPC分类号： G03F9/70 , G01N21/94 , G01N21/95623 , G01N2021/473 , G01N21/21
摘要： A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.
摘要翻译：一种通过用线性偏振光照射条形区域来检测样品上的异物的方法和装置。由样品反射的一些光被遮光阶段遮挡，并且通过遮光台的由样品反射的其余光指向检测光学系统，由光检测器检测。样品相对于构成样品上的主要图案的一组直线以预定角度倾斜照射。选择该角度使得由直线组反射的衍射光不进入检测光学系统。使用液晶元件的偏振空间滤光片可以设置在检测光学系统内的空间频率区域或傅立叶变换平面的预定限制区域中。由样本散射的光可以在检测光学系统中进一步分离成具有不同波取向特性的部分光束，该特征由多个一维固态成像元件检测。信号由驱动器，加法器和量化器与一维固态成像元件同步处理。

2. 发明授权

US4668089A Exposure apparatus and method of aligning exposure mask with workpiece 失效
标题翻译：曝光装置和曝光掩模与工件对准的方法
公开(公告)号：US4668089A
公开(公告)日：1987-05-26
申请号：US684292
申请日：1984-12-20
申请人： Yoshitada Oshida , Masataka Shiba , Toshihiko Nakata , Mitsuyoshi Koizumi , Naoto Nakashima
发明人： Yoshitada Oshida , Masataka Shiba , Toshihiko Nakata , Mitsuyoshi Koizumi , Naoto Nakashima
IPC分类号： H01L21/30 , G03F9/00 , G01B11/26 , G01J1/32
CPC分类号： G03F9/7049
摘要： An exposure apparatus comprises a light source, a mask plate having an exposure pattern area section and an alignment/reflection area section, a projection lens, a movable stage for holding a workpiece having a workpiece alignment mark, an alignment control and a driver for the movable stage. Before the exposure pattern area section is illuminated by the light source to be projected through the projection lens onto the workpiece, the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section is on that surface of the mask plate which does not face the light source and includes a reflection portion for conducting light from another light source to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion of providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.
摘要翻译：曝光装置包括光源，具有曝光图案区域部分和对准/反射区域部分的掩模板，投影透镜，用于保持具有工件对准标记的工件的可动台，对准控制和用于活动舞台。在通过投影透镜投射到工件上的光源照射曝光图案区域部分之前，工件与掩模正确对准。掩模板与工件之间的对准通过有效地使用具体排列并具有特定结构的对准/反射区域部分进行。对准/反射区域在掩模板的不面向光源的表面上，并且包括用于将来自另一光源的光传导到工件的反射部分，并且传导从工件散射的光并通过投影透镜到对准控制和掩模对准标记部分，当照明时，将掩模对准标记部分的图像提供给对准控制，使得其检测掩模对准标记部分和工件对准标记之间的位置关系，并产生控制信号以实现掩模板和工件之间的对准。

3. 发明授权

US4788577A Substrate surface deflecting device 失效
标题翻译：基板表面偏转装置
公开(公告)号：US4788577A
公开(公告)日：1988-11-29
申请号：US142698
申请日：1988-01-11
申请人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
发明人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
IPC分类号： G02F1/13 , G03B27/32 , G03F7/20 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mechanism for measuring the level of the substrate so as to subject the substrate to deflection via the flexible chuck plate, thereby producing a uniform gap between the mask and the substrate.
摘要翻译：曝光装置包括：设置在舞台上的底板; 柔性卡盘板，其能够在真空下将基板的大致整个表面吸附到其表面; 多个垂直位移产生机构，包括设置在基板处的预定间隔的多个进给螺杆，用于旋转地驱动每个进给螺杆的多个旋转致动器，以及插入在卡盘板和基板之间的多个弹簧构件以允许每个所述进给螺杆的末端与所述卡盘板的后表面接合; 限制机构，用于以不相对于基板水平位移的方式限制卡盘板; 用于保持面罩的面罩座; 用于测量由所述面罩支架保持的面罩的高度的机构; 以及用于测量吸附到卡盘板上的基板的高度的机构，由此垂直位移产生机构的旋转致动器中的每个旋转致动器基于掩模和由用于测量液面的机构测量的底板之间的间隙而被驱动掩模和用于测量基板的水平的机构，以便使基板经由柔性卡盘板偏转，从而在掩模和基板之间产生均匀的间隙。

4. 发明授权

US08695110B2 Scanning probe microscope and sample observing method using the same 有权
标题翻译：扫描探针显微镜及使用其的样品观察方法
公开(公告)号：US08695110B2
公开(公告)日：2014-04-08
申请号：US13586754
申请日：2012-08-15
申请人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
发明人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
IPC分类号： G01Q70/00 , G01Q70/16 , G01N13/00
CPC分类号： G01Q60/18 , G01Q60/22
摘要： In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
摘要翻译：在使用孔径探针的近场扫描显微镜中，实际上孔径形成的上限为至多几十nm。在使用散射探针的近场扫描显微镜中，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nm。此外，通过探针的损伤或磨损，测量再现性被严重降低。可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品通过将nm级圆柱形结构与nm级微粒组合，并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。

5. 发明授权

US08629985B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08629985B2
公开(公告)日：2014-01-14
申请号：US13605395
申请日：2012-09-06
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： A displacement measurement method, an apparatus thereof, and a probe microscope. which enable stable measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air and mechanical vibration. A pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. An optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：位移测量方法，其装置和探针显微镜。这使得能够以亚纳米级或更低的精度稳定地测量被测物体的位移量和移动距离，而不受诸如空气波动和机械振动之类的扰动的影响。脉冲束被分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束在相对的方向上通过相同的延迟光路被发送到被测物体的一个脉冲周期的延迟，然后被测量对象反射。通过对两束脉冲光束进行干涉而获得由测量对象的运动引起的光学相位变化。

6. 发明申请

US20130329227A1 OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION APPARATUS 有权
标题翻译：光学检测方法和光学检测装置
公开(公告)号：US20130329227A1
公开(公告)日：2013-12-12
申请号：US13983077
申请日：2011-12-20
申请人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
发明人： Kenji Nakahira , Toshifumi Honda , Toshihiko Nakata
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8835
摘要： An optical inspection apparatus is provided which suppresses the influence of quantum noise including: light irradiator which irradiates a sample with light; reference light emitter which emits reference light; light interference unit which generates interfering light through interference between transmitted light, scattered light, or reflected light from the sample irradiated with light by the light irradiator, and the reference light emitted by the reference light emitter; light detector which detects the interfering light generated by the light interference unit; defect identifier which identifies the presence or absence of a defect based on a detection signal obtained by the light detector detecting the interfering light; and light convertor which converts at least the state of the transmitted, scattered, or reflected light from the sample, the state of the reference light emitted by the reference light emitter, or the state of the interfering light generated by the light interference unit.
摘要翻译：提供抑制量子噪声影响的光学检查装置，包括：用光照射样品的光照射器; 发射参考光的参考光发射器; 光干涉单元，其通过光照射器照射的样品的透射光，散射光或反射光之间的干涉产生干涉光，以及由参考光发射器发射的参考光; 光检测器，其检测由光干涉单元产生的干涉光; 缺陷识别器，其基于由所述光检测器检测到所述干扰光获得的检测信号来识别缺陷的存在或不存在; 以及光转换器，其至少转换来自样品的透射，散射或反射光的状态，由参考光发射器发射的参考光的状态或由光干涉单元产生的干涉光的状态。

7. 发明授权

US08361784B2 Method of inspecting a DNA chip and apparatus thereof 有权
标题翻译：检查DNA芯片的方法及其装置
公开(公告)号：US08361784B2
公开(公告)日：2013-01-29
申请号：US11709120
申请日：2007-02-22
申请人： Yoshitada Oshida , Toshihiko Nakata , Tomoaki Sakata , Kenji Yasuda , Satoshi Takahashi
发明人： Yoshitada Oshida , Toshihiko Nakata , Tomoaki Sakata , Kenji Yasuda , Satoshi Takahashi
IPC分类号： C12M1/34 , G01N21/64
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A DNA inspecting apparatus including driving means for relatively changing positions of the multi-spot lights and a position of the DNA chip so as to detect the fluorescent lights in such a manner that a desired area on the DNA chip is irradiated with the multi-spot lights, and a control system for determining and inspecting DNA information about the to-be-inspected DNA chip from fluorescent light intensities and fluorescent light positions of the desired area on the DNA chip, the fluorescent light intensities and the fluorescent light positions being detected by the driving means and the fluorescent light detecting means.
摘要翻译：一种DNA检查装置，包括用于相对改变多点灯位置的驱动装置和DNA芯片的位置，以便以这样的方式检测荧光，使得DNA芯片上的期望区域被多点照射灯和用于从DNA芯片上的期望区域的荧光强度和荧光灯位置确定和检查关于待检查DNA芯片的DNA信息的控制系统，荧光强度和荧光灯位置由驱动装置和荧光检测装置。

8. 发明授权

US08284406B2 Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope 失效
标题翻译：位移测量方法及其装置，平台装置和探针显微镜
公开(公告)号：US08284406B2
公开(公告)日：2012-10-09
申请号：US12063860
申请日：2006-08-09
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01Q20/02 , G01B9/02014 , G01B9/02057 , G01B9/02058 , G01B9/02076 , G01B2290/45 , G01B2290/70 , G01S17/50
摘要： The present invention provides a displacement measurement method, an apparatus thereof, a probe microscope. which make it possible to stably measure an amount of displacement and a moving distance of an object under measurement with an accuracy of the sub-nanometer order or below without being affected by disturbances such as fluctuations of air, mechanical vibration.Specifically, with the present invention, a pulsed beam is split into two; one beam is reflected by an object under measurement and then inputted to a delay optical path equivalent to one pulse period; and the other beam is sent through the same delay optical path in the opposite direction up to the object under measurement with a delay of one pulse period, and then reflected by the object under measurement. Then, an optical phase variation caused by the movement of the object under measurement is obtained by subjecting the two pulsed beams to interference.
摘要翻译：本发明提供一种位移测量方法，其装置，探针显微镜。这使得可以在不受空气波动，机械振动等干扰的影响的情况下以亚纳米级或更低的精度来稳定地测量被测物体的位移量和移动距离。具体地说，利用本发明，将脉冲光束分成两部分; 一个光束被测量对象反射，然后输入到等于一个脉冲周期的延迟光路; 并且另一个光束以相同的方向通过相同的延迟光路，直到被测物体的延迟为一个脉冲周期，然后被测量对象反射。然后，通过对两个脉冲光束进行干涉来获得由测量对象的运动引起的光学相位变化。

9. 发明申请

US20120194809A1 METHOD AND APPARATUS FOR DETECTING DEFECTS 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20120194809A1
公开(公告)日：2012-08-02
申请号：US13362808
申请日：2012-01-31
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统方向。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

10. 发明申请

US20120092484A1 DEFECT INSPECTION METHOD AND APPARATUS THEREFOR 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US20120092484A1
公开(公告)日：2012-04-19
申请号：US13375239
申请日：2010-07-01
申请人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
发明人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , G01N21/9501
摘要： To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
摘要翻译：为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振仰角和波长相同但偏振不同。根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式