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1. 发明授权

US06837963B2 Semiconductor device, method of producing a semiconductor device, and semiconductor substrate cleaning apparatus used for the production method 失效
标题翻译：半导体装置，半导体装置的制造方法以及用于制造方法的半导体基板清洗装置
公开(公告)号：US06837963B2
公开(公告)日：2005-01-04
申请号：US09982779
申请日：2001-10-22
申请人： Hiroshi Tanaka , Naoki Yokoi , Yasuhiro Asaoka , Seiji Muranaka , Toshihiko Nagai
发明人： Hiroshi Tanaka , Naoki Yokoi , Yasuhiro Asaoka , Seiji Muranaka , Toshihiko Nagai
IPC分类号： H01L21/302 , B08B7/00 , H01L21/00 , H01L21/205 , H01L21/304 , H01L21/306 , H01L21/3065 , C23F1/00 , C23C16/00
CPC分类号： H01L21/02046 , B08B7/0035 , H01J2237/335 , H01L21/02052 , H01L21/67028
摘要： A semiconductor device producing method that can clean an edge part of a semiconductor substrate with certainty is provided. The method of producing a semiconductor device includes a step of generating ions and a step of accelerating the ions by means of an electric field and radiating an ion flow onto an edge part of a semiconductor substrate to clean the edge part of the semiconductor substrate. The semiconductor substrate is moved relative to the ion flow while maintaining a state in which the ion flow is being radiated onto the edge part. The step of generating ions includes applying a high-frequency voltage between a pair of electrodes to generate the ions between the electrodes.
摘要翻译：提供一种可以确定地清洁半导体衬底的边缘部分的半导体器件制造方法。制造半导体器件的方法包括产生离子的步骤和通过电场加速离子并将离子流辐射到半导体衬底的边缘部分以清洁半导体衬底的边缘部分的步骤。半导体衬底相对于离子流移动，同时保持离子流被辐射到边缘部分上的状态。产生离子的步骤包括在一对电极之间施加高频电压以在电极之间产生离子。

2. 发明授权

US06586145B2 Method of fabricating semiconductor device and semiconductor device 失效
标题翻译：制造半导体器件和半导体器件的方法
公开(公告)号：US06586145B2
公开(公告)日：2003-07-01
申请号：US10073189
申请日：2002-02-13
申请人： Naoki Yokoi , Hiroshi Tanaka , Yasuhiro Asaoka , Seiji Muranaka , Toshihiko Nagai
发明人： Naoki Yokoi , Hiroshi Tanaka , Yasuhiro Asaoka , Seiji Muranaka , Toshihiko Nagai
IPC分类号： G03F900
CPC分类号： H01L21/76802 , H01L21/28123 , H01L21/31144 , H01L21/32134 , H01L21/32137 , H01L21/32139 , H01L29/66545
摘要： A method of fabricating a semiconductor device causing no pattern shifting of a peripheral oxide film etc. in removal of both of an antireflection film and a mask pattern and having a fine structure not implementable solely by photolithography and the semiconductor device are obtained. The method of fabricating a semiconductor device comprises steps of forming a base film of either a silicon film or a silicon compound film on a semiconductor substrate, forming a hard film of either a metal film or a metal compound film on the base film, forming a resist pattern on the hard film, dryly etching the hard film through the resist pattern serving as a mask for forming a hard pattern, dryly etching the base film through the hard pattern serving as a mask and removing the hard pattern by wet etching with a chemical solution not etching at least the base film.
摘要翻译：制造在除去防反射膜和掩模图案中并且具有仅通过光刻不能实现的精细结构的半导体器件的半导体器件的制造方法，并且获得半导体器件。制造半导体器件的方法包括以下步骤：在半导体衬底上形成硅膜或硅化合物膜的基膜，在基膜上形成金属膜或金属化合物膜的硬膜，形成在硬膜上形成抗蚀剂图案，通过作为形成硬图案的掩模的抗蚀剂图案干硬蚀刻硬膜，通过用作掩模的硬图案将基膜干蚀刻并用化学腐蚀法去除硬图案溶液至少不蚀刻基膜。

3. 发明授权

US06642142B2 Substrate cleaning method and method for producing an electronic device 失效
公开(公告)号：US06642142B2
公开(公告)日：2003-11-04
申请号：US10034371
申请日：2002-01-03
申请人： Toshihiko Nagai , Hiroshi Tanaka , Naoki Yokoi , Yasuhiro Asaoka , Seiji Muranaka
发明人： Toshihiko Nagai , Hiroshi Tanaka , Naoki Yokoi , Yasuhiro Asaoka , Seiji Muranaka
IPC分类号： H01L214763
CPC分类号： H01L21/02063 , B08B3/10 , H01L21/02052 , H01L21/31116 , H01L21/67051 , H01L21/76805 , H01L21/76814
摘要： In a water rinsing process performed after the surface of a substrate has been cleaned using a cleaning solution, a first spinning process, in which water is supplied to the surface of the substrate while the substrate is rotated at a first rotation speed, and a second spinning process, in which the substrate is rotated at a second rotation speed that is higher than the first rotation speed, are repeatedly performed alternately.

4. 发明授权

US06531381B2 Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device 失效
公开(公告)号：US06531381B2
公开(公告)日：2003-03-11
申请号：US09998692
申请日：2001-12-03
申请人： Yasuhiro Asaoka , Hiroshi Tanaka , Naoki Yokoi , Seiji Muranaka , Toshihiko Nagai
发明人： Yasuhiro Asaoka , Hiroshi Tanaka , Naoki Yokoi , Seiji Muranaka , Toshihiko Nagai
IPC分类号： H01L2120
CPC分类号： H01L21/02052 , B08B3/02 , C11D3/3947 , C11D7/08 , C11D11/0047 , C23F1/30 , H01L21/67051
摘要： Disclosed is a method for removing Pt (or Pt—Ir) and BST contaminants on the surface edge, back, and bevel of a semiconductor wafer. A wafer on which a stacked film selected from the group of a Pt film, a Pt—Ir film, and a Ba—Sr—Ti film is formed is prepared. A chemical containing hydrochloric acid is applied only to the surface edge, back, and bevel of the wafer. The surface edge, back, and bevel of the wafer are rinsed with pure water. Further, a chemical containing hydrogen fluoride is applied. The surface edge, back, and bevel of the wafer are rinsed again with pure water.

5. 发明授权

US06340253B1 Resist peeling system and control method of a resist peeling solution 失效
标题翻译：抗蚀剂剥离系统和抗蚀剂剥离溶液的控制方法
公开(公告)号：US06340253B1
公开(公告)日：2002-01-22
申请号：US09610656
申请日：2000-07-05
申请人： Seiji Muranaka , Hiroshi Tanaka , Yoshiyuki Hori
发明人： Seiji Muranaka , Hiroshi Tanaka , Yoshiyuki Hori
IPC分类号： G03D500
CPC分类号： H01L21/67253 , G03F7/3071 , G03F7/422 , H01L21/31133 , H01L21/67057
摘要： A resist peeling system includes a peeling solution tank for storing a resist peeling solution; an electric conductivity monitor for monitoring the electric conductivity of a resist peeling solution; and a additive components tank for estimating the components ratio in the resist peeling solution on the basis of the electric conductivity thereof and adding, when a component of the resist peeling solution is estimated to be insufficient on the basis of the estimated result, the component lacking for the resist peeling solution to the resist peeling solution by a suitable amount.
摘要翻译：抗蚀剂剥离系统包括用于储存抗蚀剂剥离溶液的剥离溶液罐; 用于监测抗蚀剂剥离溶液的电导率的电导率监测器; 和用于基于其电导率估计抗蚀剂剥离溶液中的组分比率的添加剂组分罐，并且当根据估计结果估计抗蚀剂剥离溶液的组分不足时，该组分缺少对抗蚀剂剥离溶液的抗蚀剂剥离溶液适量。

6. 发明申请

US20110298097A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110298097A1
公开(公告)日：2011-12-08
申请号：US13156021
申请日：2011-06-08
申请人： Manabu Sueyoshi , Seiji Muranaka , Tomoryo Shono , Itaru Kanno
发明人： Manabu Sueyoshi , Seiji Muranaka , Tomoryo Shono , Itaru Kanno
IPC分类号： H01L29/41 , H01L21/283
CPC分类号： H01L25/0657 , H01L21/76898 , H01L23/3128 , H01L23/481 , H01L24/05 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/92 , H01L25/0652 , H01L25/50 , H01L2224/0401 , H01L2224/04042 , H01L2224/05009 , H01L2224/05017 , H01L2224/05554 , H01L2224/0557 , H01L2224/056 , H01L2224/05624 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/13111 , H01L2224/13116 , H01L2224/13139 , H01L2224/13147 , H01L2224/16145 , H01L2224/16146 , H01L2224/16225 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48137 , H01L2224/48227 , H01L2224/48229 , H01L2224/73204 , H01L2224/73215 , H01L2224/73257 , H01L2224/73265 , H01L2224/83005 , H01L2224/9202 , H01L2225/0651 , H01L2225/06513 , H01L2225/06517 , H01L2225/06544 , H01L2225/06558 , H01L2924/00014 , H01L2924/0002 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01029 , H01L2924/01033 , H01L2924/01042 , H01L2924/01044 , H01L2924/01047 , H01L2924/0105 , H01L2924/01073 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/10162 , H01L2924/14 , H01L2924/15311 , H01L2924/181 , H01L2924/00 , H01L2924/00012 , H01L2924/00011 , H01L2224/05552 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A semiconductor device is provided wherein stacked semiconductor substrates are electrically coupled together in a satisfactory state by a conductor buried in the interior of a through hole. A first semiconductor substrate includes a substrate having main surfaces, further includes a semiconductor element formed within and over the substrate, a wiring coupled to the semiconductor element electrically, and a conductive layer formed in the interior of a through hole, the through hole extending through mutually confronting first and second main surfaces as the main surfaces of the substrate and reaching the wiring. The first semiconductor substrate and a second semiconductor substrate are stacked and the conductive layer is coupled to a wiring of the second semiconductor substrate electrically. In a second main surface of the conductive layer, a recess is formed around an end portion of the through hole so that a bottom wall surface of the recess is present in the interior of the substrate. A conductive material which constitutes the conductive layer is filled in the interior of the recess.
摘要翻译：提供一种半导体器件，其中堆叠的半导体衬底通过埋在通孔内部的导体在令人满意的状态下电耦合在一起。第一半导体衬底包括具有主表面的衬底，还包括形成在衬底内和上面的半导体元件，电连接到半导体元件的布线，以及形成在通孔内部的导电层，所述通孔延伸穿过相互面对的第一和第二主表面作为基板的主表面并到达布线。层叠第一半导体衬底和第二半导体衬底，并且导电层电连接到第二半导体衬底的布线。在导电层的第二主表面中，在通孔的端部周围形成凹部，使得凹部的底壁表面存在于基板的内部。构成导电层的导电材料填充在凹部的内部。

7. 发明申请

US20110062539A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110062539A1
公开(公告)日：2011-03-17
申请号：US12885093
申请日：2010-09-17
申请人： Ryoji MATSUDA , Motoi Ashida , Shuichi Ueno , Shoichi Fukui , Shinya Hirano , Seiji Muranaka , Kazuyuki Omori
发明人： Ryoji MATSUDA , Motoi Ashida , Shuichi Ueno , Shoichi Fukui , Shinya Hirano , Seiji Muranaka , Kazuyuki Omori
IPC分类号： H01L29/82 , H01L21/04
CPC分类号： H01L27/228 , B82Y25/00 , H01F10/131 , H01F10/14 , H01F10/142 , H01F10/145 , H01F10/20 , H01F10/22 , H01F10/3254 , H01L21/76807 , H01L21/76816 , H01L21/76844 , H01L27/105 , H01L43/08 , H01L43/12
摘要： To provide a semiconductor device in which the deterioration of the rewrite property is suppressed. In a memory cell region, magnetoresistive elements in a semiconductor magnetic-storage device are formed in an array shape in a mode that the magnetoresistive elements are arranged at portions where digit lines extending in one direction intersect bit lines extending in the direction approximately orthogonal to the digit lines. The digit line and the bit line have such a wiring structure constituted by covering a copper film to be a wiring main body with a cladding layer. One end side of the magnetoresistive element is electrically coupled to the bit line via a top via formed from a non-magnetic material.
摘要翻译：提供抑制重写特性劣化的半导体器件。在存储单元区域中，半导体磁存储器件中的磁阻元件形成为阵列形状，其方式是将磁阻元件布置在沿一个方向延伸的数字线与沿大致垂直于数字线。数字线和位线具有这样一种布线结构，其通过用覆盖层覆盖作为布线主体的铜膜而构成。磁阻元件的一端侧经由由非磁性材料形成的顶部通孔电耦合到位线。

8. 发明授权

US06713232B2 Method of manufacturing semiconductor device with improved removal of resist residues 失效
标题翻译：制造具有改善抗蚀剂残留物去除的半导体器件的方法
公开(公告)号：US06713232B2
公开(公告)日：2004-03-30
申请号：US09727542
申请日：2000-12-04
申请人： Seiji Muranaka , Itaru Kanno , Mami Shirota , Junji Kondo
发明人： Seiji Muranaka , Itaru Kanno , Mami Shirota , Junji Kondo
IPC分类号： G03C500
CPC分类号： H01L21/02071 , G03F7/426 , H01L21/31133 , H01L21/76802 , H01L21/76838
摘要： Resist residues, which is formed in a process of forming Al interconnections, are removed through use of a single chemical. A chemical which contains an organic acid or a salt thereof and water and which has a pH below 8 is used as a treatment for removing resist or resist residues. The chemical may be used in a process in which Al, W, Ti, TiN, and SiO2 are exposed on the surface of a wafer after etching of an Al interconnection; in a process in which Al, W, Ti, TiN, and SiO2 are exposed on the surface of a wafer after etching a hole reaching an Al interconnection in an dielectric layer; in a process in which Cu is exposed on the surface of a semiconductor wafer after dry-etching of a Cu interconnection or etching of an interlayer dielectric film laid on a Cu interconnection; and in a process in which metal material such as W, WN, Ti, or TiN; poly-Si; SiN; and SiO2 are exposed on the surface of a wafer after etching of a metal gate.
摘要翻译：通过使用单一化学物质去除在形成Al互连的过程中形成的抗蚀剂残留物。使用含有有机酸或其盐和水并且pH低于8的化学物质作为去除抗蚀剂或抗蚀剂残留物的处理。该化学品可用于在Al互连之后Al，W，Ti，TiN和SiO2暴露在晶片表面上的工艺中; 在蚀刻在电介质层中达到Al互连的孔之后，在晶片表面上露出Al，W，Ti，TiN和SiO 2的工艺中，在Cu互连的干蚀刻或Cu互连上的层间电介质膜的蚀刻之后，在半导体晶片的表面上露出Cu的工序; 并且在诸如W，WN，Ti或TiN的金属材料的过程中，多晶硅; 罪; 并且在蚀刻金属栅极之后，在晶片的表面上露出SiO 2。

9. 发明授权

US6053059A Analyzing system of organic substance adhering to a surface of a sample 失效
标题翻译：分析附着在样品表面的有机物质的系统
公开(公告)号：US6053059A
公开(公告)日：2000-04-25
申请号：US89421
申请日：1998-06-03
申请人： Seiji Muranaka , Kuniaki Miyake
发明人： Seiji Muranaka , Kuniaki Miyake
IPC分类号： G01N27/62 , G01N1/00 , G01N1/02 , G01N1/22 , G01N30/00 , G01N30/72
CPC分类号： G01N1/4022 , G01N2001/028 , G01N30/7206
摘要： An organic substance analyzing system identifies and quantifies organic substances adhering to the surface of a sample placed in a chamber for a local organic substance analysis on the surface of the sample. The organic substance analyzing system heats a portion of the sample from the front side or the back side of the sample, collects gases discharged out of the portion of the surface and analyzes the collected gases. A lamp, a laser or an electron beam source is used as a heating means for locally heating a portion to be analyzed on the surface of the sample to locally discharge the gases out of the portion. Otherwise, the entire surface of the sample is heated, and the discharged gases are collected for every section so as to be analyzed.
摘要翻译：有机物质分析系统鉴定和量化附着在放置在室内的样品表面上的有机物质，用于在样品表面进行局部有机物质分析。有机物质分析系统从样品的前侧或背面加热样品的一部分，收集排出表面部分的气体并分析收集的气体。使用灯，激光或电子束源作为加热装置，用于局部加热样品表面上待分析的部分，以将气体局部排出部分。否则，将样品的整个表面加热，并对每个部分收集排出的气体以进行分析。

10. 发明授权

US06410454B1 Method and apparatus for removing contaminants from the surface of a semiconductor wafer 失效
标题翻译：从半导体晶片的表面去除污染物的方法和装置
公开(公告)号：US06410454B1
公开(公告)日：2002-06-25
申请号：US08982586
申请日：1997-12-02
申请人： Seiji Muranaka , Cozy Ban , Akihiko Osaki
发明人： Seiji Muranaka , Cozy Ban , Akihiko Osaki
IPC分类号： B01J1908
CPC分类号： H01L21/02046 , C23C16/0236 , C23C16/452
摘要： In a semiconductor wafer-processing, hydrogen gas is introduced into the same chamber as used for film formation and heated to generate hydrogen radicals. Alternatively, a plasma is applied to generate hydrogen radicals, or the semiconductor wafer is heated immediately before film formation. Thereby, contaminants on the surface of the wafer are removed. Thereafter, a conductive film or an insulating film is formed on the wafer in the same chamber.
摘要翻译：在半导体晶片处理中，将氢气引入到用于成膜的相同的室中，并加热以产生氢自由基。或者，施加等离子体以产生氢自由基，或者在成膜之前立即加热半导体晶片。由此，去除晶片表面上的杂质。此后，在相同的室中的晶片上形成导电膜或绝缘膜。

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