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1. 发明授权

US4808258A Plasma processing method and apparatus for carrying out the same 失效
标题翻译：等离子体处理方法及其执行装置
公开(公告)号：US4808258A
公开(公告)日：1989-02-28
申请号：US662014
申请日：1984-10-18
申请人： Toru Otsubo , Susumu Aiuchi , Takashi Kamimura , Minoru Noguchi , Teru Fujii
发明人： Toru Otsubo , Susumu Aiuchi , Takashi Kamimura , Minoru Noguchi , Teru Fujii
IPC分类号： H01L21/302 , C23C16/517 , H01J37/32 , C23F1/02 , H01L21/306
CPC分类号： H01J37/32146 , C23C16/517 , H01J37/32155 , H01J37/32165
摘要： A plasma processing method and an apparatus for carrying out the method in which a processing gas is introduced into a processing chamber, and periodically an amplitude modulated or frequency-modulated high-frequency voltage is applied to plasma generating means, to generate a discharge plasma and to carry out predetermined processing by the plasma.
摘要翻译：一种等离子体处理方法和装置，用于执行将处理气体引入处理室，并周期性地将调幅或调频的高频电压施加到等离子体产生装置，以产生放电等离子体和以进行等离子体的预定处理。

2. 发明授权

US4487678A Dry-etching apparatus 失效
标题翻译：干式蚀刻装置
公开(公告)号：US4487678A
公开(公告)日：1984-12-11
申请号：US597749
申请日：1984-04-06
申请人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi , Takashi Kamimura , Teru Fujii
发明人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi , Takashi Kamimura , Teru Fujii
IPC分类号： H01J37/18 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/677 , C23C15/00
CPC分类号： H01L21/302 , H01J37/185 , H01L21/67069 , H01L21/67126 , H01L21/67745
摘要： The invention is directed to a dry-etching apparatus used for etching an aluminum wiring film formed on a wafer, and more particularly to a dry-etching apparatus which can remove chlorides deposited on the surface of the wafer during the dry etching thereof, as well as an etching resist film, without having to take the wafer out. This dry-etching apparatus is provided with an etching chamber, a vacuum antechamber attached to the etching chamber by a gate valve, and a post-treatment chamber attached to the vacuum antechamber. The apparatus is so formed that etched wafers removed to the vacuum antechamber can be sent therefrom to the post-treatment chamber, and then the post-treated wafers can be removed to the vacuum antechamber again, and then removed therefrom to the atmosphere.
摘要翻译：本发明涉及一种用于蚀刻形成在晶片上的铝布线膜的干蚀刻装置，更具体地说涉及一种能够在其干蚀刻期间去除沉积在晶片表面上的氯化物的干蚀刻装置，以及作为抗蚀剂膜，而不必将晶片取出。该干式蚀刻装置设置有蚀刻室，通过闸阀附着到蚀刻室的真空室以及与真空前厅连接的后处理室。该设备被形成为将去除到真空前厅的蚀刻的晶片从其中被送到后处理室，然后将经后处理的晶片再次移至真空前厅，然后从其中移除到大气中。

3. 发明授权

US4479848A Etching method and apparatus 失效
标题翻译：蚀刻方法和装置
公开(公告)号：US4479848A
公开(公告)日：1984-10-30
申请号：US579941
申请日：1984-02-14
申请人： Toru Otsubo , Susumu Aiuchi , Takashi Kamimura
发明人： Toru Otsubo , Susumu Aiuchi , Takashi Kamimura
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/02
CPC分类号： H01J37/32935 , H01L21/302
摘要： The present invention consists in an etching method and apparatus wherein an optical image which is reflected from a region of a dicing stripe pattern on a substrate to-be-etched, such as a semiconductor wafer, is focused by a projecting optical system during selective etching. The focused pattern is converted into an image signal by an image detector, and a change of contrast in the region of the dicing stripe pattern is determined from the image signal. Based on this, an ending time for the etching can be decided from the change of contrast.
摘要翻译：本发明是一种蚀刻方法和装置，其中在选择性刻蚀中通过投影光学系统聚焦由半导体晶片等待刻蚀的基板上的切割条纹图案的区域反射的光学图像。通过图像检测器将聚焦图案转换为图像信号，并根据图像信号确定切割条纹图案区域中的对比度变化。基于此，可以根据对比度的变化来确定蚀刻的结束时间。

4. 发明授权

US5759424A Plasma processing apparatus and processing method 失效
标题翻译：等离子体处理装置及处理方法
公开(公告)号：US5759424A
公开(公告)日：1998-06-02
申请号：US409077
申请日：1995-03-22
申请人： Mitsuko Imatake , Ichiro Sasaki , Toru Otsubo , Hitoshi Tamura , Takashi Kamimura
发明人： Mitsuko Imatake , Ichiro Sasaki , Toru Otsubo , Hitoshi Tamura , Takashi Kamimura
IPC分类号： H01J37/32 , H05H1/00 , G01N21/00
CPC分类号： H01J37/32935 , H01J37/3299
摘要： A plasma processing apparatus is provided with a processing chamber having at least a pair of opposing windows to allow observation of the interior thereof, a plasma generation unit for generating a plasma in the processing chamber, a plasma light emission monitoring unit arranged externally of the processing chamber for monitoring the light emission of the plasma through one of the pair of opposing windows, a reference light irradiation unit for irradiating a reference light to the plasma light emission monitoring unit from that window of the pair of opposing windows which is opposite to the plasma light emission monitoring unit through the pair of opposing windows, and a control for controlling a plasma processing state of the substrate to be processed by comparing the data on the light emission of the plasma monitored by the plasma light emission unit and the reference light.
摘要翻译：等离子体处理装置具有处理室，该处理室具有至少一对相对的窗口以允许观察其内部;等离子体产生单元，用于在所述处理室中产生等离子体;等离子体发光监测单元，其布置在所述处理的外部用于通过所述一对相对窗口中的一个监视等离子体的发光的参考光照射单元，用于从与所述等离子体相对的所述一对相对窗口的所述窗口向等离子体发光监测单元照射参考光通过一对相对窗口的发光监视单元，以及用于通过比较由等离子体发光单元监视的等离子体的发光的数据和参考光来控制待处理的基板的等离子体处理状态的控制。

5. 发明申请

US20080231376A1 Oscillation circuit controlling phase difference of output signals 审中-公开
标题翻译：振荡电路控制输出信号的相位差
公开(公告)号：US20080231376A1
公开(公告)日：2008-09-25
申请号：US11724015
申请日：2007-03-14
申请人： Masaki Kinoshita , Satoshi Terada , Takashi Kamimura
发明人： Masaki Kinoshita , Satoshi Terada , Takashi Kamimura
IPC分类号： H03L7/00
CPC分类号： H03L7/0995 , H03K3/0322 , H03L7/0998
摘要： A ring oscillation circuit composed of multiple op amps connected in series in a loop configuration is included to output a first output signal by adding multiple output signals of multiple op amps and to output a second output signal by adding all remaining output signals of multiple op amps.
摘要翻译：包括以环路配置串联连接的多个运算放大器组成的环形振荡电路，通过添加多个运算放大器的多个输出信号来输出第一输出信号，并通过加上多个运算放大器的所有剩余输出信号来输出第二输出信号。

6. 发明授权

US06427100B1 Motor control apparatus for hybrid vehicle 有权
标题翻译：混合动力汽车电机控制装置
公开(公告)号：US06427100B1
公开(公告)日：2002-07-30
申请号：US09686901
申请日：2000-10-12
申请人： Toshiaki Kaku , Takashi Kamimura
发明人： Toshiaki Kaku , Takashi Kamimura
IPC分类号： B60L1102
CPC分类号： B60W20/50 , B60K6/48 , B60L3/0038 , B60L3/0084 , B60L3/04 , B60L11/14 , B60L15/20 , B60L2240/80 , B60W10/06 , B60W10/08 , B60W20/00 , B60W2050/021 , Y02T10/6221 , Y02T10/6286 , Y02T10/645 , Y02T10/70 , Y02T10/7077 , Y02T10/72 , Y02T10/7275 , Y10S903/903
摘要： Disclosed is a motor control apparatus which can detect an abnormality in a feedback control loop and can suppress a change in the behavior of a vehicle that does not meet a driver's demand when the abnormality occurs. A motor control apparatus for a hybrid vehicle with an engine for outputting driving force of the vehicle, a motor for generating driving force for assisting the output from the engine and a battery for supplying power to the motor and for storing electric energy regenerated by the motor acting as a generator when the driving force is not required, is provided with: a detector for detecting supplied power to the motor or supplied current to the motor; a feedback controller for performing feedback control to keep the supplied power or the supplied current at a target value based on the detection result from the detector; an abnormality detector for detecting an abnormality in the detector; and an abnormality processing device for fixing supplied power or supplied current to the motor to a predetermined value by reducing a gain in the feedback control or stopping the feedback control until a predetermined time elapses since detection of an abnormality in the detector, and stopping controlling the motor after the predetermined time elapses since detection of the abnormality.
摘要翻译：公开了一种电动机控制装置，其可以检测反馈控制回路中的异常，并且可以在发生异常时抑制不符合驾驶员需求的车辆的行为的变化。一种用于混合动力车辆的电动机控制装置，其具有用于输出车辆的驱动力的发动机，用于产生用于辅助来自发动机的输出的驱动力的电动机和用于向电动机供电并且用于存储由电动机再生的电能的电池在不需要驱动力的情况下作为发电机，设置有检测器，用于检测对电动机的供电或供给到电动机的电流; 反馈控制器，用于执行反馈控制，以基于来自检测器的检测结果将所提供的功率或所提供的电流保持在目标值; 用于检测检测器中的异常的异常检测器; 以及异常处理装置，用于通过减少反馈控制中的增益或停止反馈控制将供给的电力或供给电流固定到电动机达到预定值，直到从检测器中的异常检测到经过预定时间，并且停止控制从检测到异常起经过了预定时间之后的电动机。

7. 发明授权

US5825035A Processing method and apparatus using focused ion beam generating means 失效
标题翻译：使用聚焦离子束产生装置的处理方法和装置
公开(公告)号：US5825035A
公开(公告)日：1998-10-20
申请号：US745657
申请日：1996-11-08
申请人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
发明人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
IPC分类号： H01J37/317
CPC分类号： H01J37/3056 , H01J2237/0802 , H01J2237/0805 , H01J2237/0807 , H01J2237/0817 , H01J2237/31732 , H01J2237/31742
摘要： A processing method using a plasma ion source for generating a focused ion beam, characterized by covering, with an insulator, an inner wall of a plasma holding vessel excluding a reference electrode for applying a voltage to a plasma and an ion extraction electrode for extracting ions from the plasma, and employing means of continuously controlling the absolute value of an ion beam current in a range of from 1 to 10 .mu.A by changing the absolute value of an ion extraction voltage applied between the reference electrode and the ion extraction electrode in a range of from 0 to 100 V; and an apparatus for carrying out the processing method. This is advantageous in stabilizing the ion beam current and in preventing the ion beam from being made dim even when the current value of the ion beam is changed.
摘要翻译：一种使用等离子体离子源产生聚焦离子束的处理方法，其特征在于，用绝缘体覆盖除了用于向等离子体施加电压的参考电极之外的等离子体保持容器的内壁和用于提取离子的离子提取电极并且通过改变在参考电极和离子提取电极之间施加的离子提取电压的绝对值，在1至10μA的范围内连续地控制离子束电流的绝对值的方法，范围为0〜100V; 以及用于执行处理方法的装置。这有利于稳定离子束电流，并且即使当离子束的电流值改变时也防止离子束变暗。

8. 发明授权

US5583344A Process method and apparatus using focused ion beam generating means 失效
公开(公告)号：US5583344A
公开(公告)日：1996-12-10
申请号：US595993
申请日：1996-02-09
申请人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
发明人： Michinobu Mizumura , Yuuichi Hamamura , Junzou Azuma , Akira Shimase , Takashi Kamimura , Fumikazu Itoh , Kaoru Umemura , Yoshimi Kawanami , Yuuichi Madokoro
IPC分类号： G01Q30/20 , G01Q60/52 , H01J37/305 , H01J37/317
CPC分类号： H01J37/3056 , H01J2237/0802 , H01J2237/0805 , H01J2237/0807 , H01J2237/0817 , H01J2237/31732 , H01J2237/31742 , H01J2237/31749
摘要： A processing method and a processing apparatus realizing the method use a focused ion beam generator. The apparatus includes a plasma or liquid metal ion source producing ions not influencing electric characteristics of a sample, an ion beam generator for extracting ions from the ion source into an ion beam, an ion beam focusing device for focusing the ion beam, an irradiator for irradiating the focused ion beam onto the sample, and a sample chamber in which the sample to be irradiated for processing is installed. The focused ion beam is irradiated onto a sample such as a silicon wafer or device to conduct on a particular position of the sample a fine machining work, a fine layer accumulation, and an analysis.

9. 发明授权

US07576117B1 Cyclic amine CCR3 antagonist 失效
标题翻译：环胺CCR3拮抗剂
公开(公告)号：US07576117B1
公开(公告)日：2009-08-18
申请号：US10031698
申请日：2000-08-04
申请人： Tatsuki Shiota , Masaki Sudoh , Tomonori Yokoyama , Yumiko Muroga , Takashi Kamimura , Akinobu Nakanishi
发明人： Tatsuki Shiota , Masaki Sudoh , Tomonori Yokoyama , Yumiko Muroga , Takashi Kamimura , Akinobu Nakanishi
IPC分类号： A61K31/40 , A61K31/38
CPC分类号： C07D207/14 , A61K31/40 , A61K31/445
摘要： A medicine containing, as an active ingredient, a cyclic amine derivative represented by the following formula (I), a pharmaceutically acceptable acid addition salt thereof or a pharmaceutically acceptable C1 to C6 alkyl addition salt thereof. The medicine has an action for treating or preventing diseases in which CCR3 participates, such as asthma and allergic rhinitis.
摘要翻译：含有下式（I）表示的环状胺衍生物，其药学上可接受的酸加成盐或其药学上可接受的C1〜C6烷基加成盐作为有效成分的药物。该药物具有治疗或预防CCR3参与疾病的作用，如哮喘和过敏性鼻炎。

10. 发明申请

US20050287142A1 Remedies or preventives for rheumatoid arthritis 审中-公开
标题翻译：类风湿关节炎的治疗或预防措施
公开(公告)号：US20050287142A1
公开(公告)日：2005-12-29
申请号：US11207785
申请日：2005-08-22
申请人： Yasunori Nakayama , Takashi Kamimura , Tohru Akahoshi , Hirobumi Kondo
发明人： Yasunori Nakayama , Takashi Kamimura , Tohru Akahoshi , Hirobumi Kondo
IPC分类号： A61K31/00 , A61K31/711 , A61K38/19 , A61K48/00 , A61P19/02 , A61P29/00 , C07K16/24 , A61K39/395
CPC分类号： A61K31/00 , A61K31/711 , A61K38/195 , A61K48/00 , A61K2039/505 , C07K16/24 , G01N33/5029 , G01N33/5044 , G01N2800/102
摘要： This invention provides a therapeutic agent for treating or preventing rheumatoid arthritis containing a LARC inhibitor or a LARC receptor inhibitor.
摘要翻译：本发明提供治疗或预防含有LARC抑制剂或LARC受体抑制剂的类风湿性关节炎的治疗剂。

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