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1. 发明授权

US08785114B2 Method for manufacturing micro-structure 有权
标题翻译：微结构制造方法
公开(公告)号：US08785114B2
公开(公告)日：2014-07-22
申请号：US13157460
申请日：2011-06-10
申请人： Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
发明人： Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
IPC分类号： G03F7/30 , G03F7/40 , G03F7/038 , G03F7/023 , G03F7/20
CPC分类号： C09D163/04 , B81C1/00619 , B81C2201/0108 , G03F7/0226 , G03F7/0236 , G03F7/30 , G03F7/40 , G03F7/70466
摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
摘要翻译：通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，为无机材料膜提供孔，并通过孔蚀刻掉牺牲膜图案，以限定具有图案轮廓的空间。图案化阶段包括以下步骤：（A）使用包含甲酚酚醛清漆树脂和交联剂的组合物形成牺牲膜，（B）将膜图案化为第一高能辐射，（C）显影，和（D）曝光牺牲膜图案到第二高能量辐射和热处理，从而在甲酚酚醛清漆树脂内形成交联。

2. 发明授权

US08048611B2 Polyorganosiloxane, resin composition, and patterning process 失效
标题翻译：聚有机硅氧烷，树脂组合物和图案化工艺
公开(公告)号：US08048611B2
公开(公告)日：2011-11-01
申请号：US12429282
申请日：2009-04-24
申请人： Hideto Kato , Tomoyoshi Furihata , Masahiro Furuya , Yoshinori Hirano
发明人： Hideto Kato , Tomoyoshi Furihata , Masahiro Furuya , Yoshinori Hirano
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08G77/38 , C08G77/14 , C08G77/50 , C08L83/10 , C08L83/14 , G03F7/0392 , G03F7/0757 , G03F7/40 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L27/1248 , Y10S430/114 , C08L2666/28
摘要： A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.
摘要翻译：改性聚有机硅氧烷化合物，使得一些硅键合的羟基被酸不稳定基团取代，和/或分子间或分子内的交联与具有C-O-C键的交联基团形成。包含聚有机硅氧烷的组合物的固化膜可用作TFT基板上的层间绝缘膜。

3. 发明授权

US06437058B2 Polymers and positive resist compositions 有权
标题翻译：聚合物和正性抗蚀剂组合物
公开(公告)号：US06437058B2
公开(公告)日：2002-08-20
申请号：US09777903
申请日：2001-02-07
申请人： Tomoyoshi Furihata , Hideto Kato , Yoshinori Hirano
发明人： Tomoyoshi Furihata , Hideto Kato , Yoshinori Hirano
IPC分类号： C08G830
CPC分类号： C08G8/30 , C08G8/28 , C08L61/06 , C08L61/14
摘要： A polymer in the form of a novolac resin is provided wherein the novolac resin has a weight average molecular weight of 1,000-30,000, some of the hydrogen atoms of hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups, and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted acetal groups and/or crosslinked within a molecule or between molecules with crosslinking groups having C—O—C linkages. The polymer is formulated into a positive resist composition having improved uniformity, sensitivity, resolution and pattern profile as well as improved heat resistance, film retention, substrate adhesion and storage stability.
摘要翻译：提供酚醛清漆树脂形式的聚合物，其中酚醛清漆树脂的重均分子量为1,000-3,000，羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基代替，一些氢剩余羟基的原子被取代的缩醛基团取代和/或在分子内或具有具有COC键的交联基团的分子之间交联。将聚合物配制成具有改进的均匀性，灵敏度，分辨率和图案轮廓以及改善的耐热性，膜保留性，底物粘合性和储存稳定性的正性抗蚀剂组合物。

4. 发明授权

US06911292B2 Positive resist composition and patterning process 失效
标题翻译：正抗蚀剂组成和图案化工艺
公开(公告)号：US06911292B2
公开(公告)日：2005-06-28
申请号：US10737788
申请日：2003-12-18
申请人： Tomoyoshi Furihata , Hideto Kato
发明人： Tomoyoshi Furihata , Hideto Kato
IPC分类号： G03F7/022 , C08F222/02 , C08G8/28 , G03F7/023 , G03F7/033 , G03F7/40 , H01L21/027 , H05K3/18 , H05K3/24 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/023 , G03F7/40 , H05K3/184 , H05K3/243
摘要： A positive resist composition contains a novolak resin in which 3-27 mol % of the hydroxyl group hydrogens are substituted with 1,2-naphthoquinonediazidosulfonyl ester groups, a methyl vinyl ether-monoalkyl maleate copolymer and optionally, an alkali-soluble cellulose whose glucose ring substituent groups are substituted with organic groups at a specific rate. The composition is useful as a thick film photoresist which is subject to a plating step and offers many advantages including high sensitivity, perpendicular geometry, high resolution, and crack resistance during and after the plating step.
摘要翻译：正型抗蚀剂组合物含有酚醛清漆树脂，其中3〜27摩尔％的羟基氢被1,2-萘醌二叠氮磺酰酯基取代，甲基乙烯基醚 - 单烷基马来酸酯共聚物和任选的碱溶性纤维素，其葡萄糖环取代基以特定速率被有机基团取代。该组合物可用作经受电镀步骤的厚膜光致抗蚀剂，并且在电镀步骤期间和之后提供许多优点，包括高灵敏度，垂直几何形状，高分辨率和抗裂纹性。

5. 发明申请

US20050058937A1 Positive resist composition and patterning process 有权
标题翻译：正抗蚀剂组成和图案化工艺
公开(公告)号：US20050058937A1
公开(公告)日：2005-03-17
申请号：US10936621
申请日：2004-09-09
申请人： Tomoyoshi Furihata , Hideto Kato
发明人： Tomoyoshi Furihata , Hideto Kato
IPC分类号： G03F7/004 , C08G8/28 , G03C1/76 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0236 , G03F7/022
摘要： A positive resist composition comprising a mixture of an alkali-soluble novolak resin prepared using m-cresol, p-cresol and 2,5-xylenol as starting reactants and a phenolic compound, wherein the hydrogen atoms of all hydroxyl groups are substituted in a proportion of 0.03-0.05 mol per hydrogen atom with 1,2-naphthoquinonediazidosulfonyl ester groups, has lo uniformity, high sensitivity and high resolution, and is improved in heat resistance, film retention, substrate adhesion, and storage stability.
摘要翻译：一种正性抗蚀剂组合物，其包含使用间甲酚，对甲酚和2,5-二甲苯酚作为起始反应物制备的碱溶性酚醛清漆树脂和酚类化合物的混合物，其中所有羟基的氢原子以一定比例被取代每个氢原子为0.03-0.05mol，与1,2-萘醌二叠氮磺酰酯基具有均匀性，高灵敏度和高分辨率，并且耐热性，膜保留性，基材粘合性和储存稳定性得到改善。

6. 发明授权

US06558867B2 Lift-off resist compositions 有权
标题翻译：剥离抗蚀剂组合物
公开(公告)号：US06558867B2
公开(公告)日：2003-05-06
申请号：US09789837
申请日：2001-02-22
申请人： Kazumi Noda , Tomoyoshi Furihata , Hideto Kato
发明人： Kazumi Noda , Tomoyoshi Furihata , Hideto Kato
IPC分类号： G03F7023
CPC分类号： G03F7/0226
摘要： A single layer lift-off resist composition comprising a novolac resin, a quinonediazidosulfonate photosensitive agent, and an aromatic hydroxy compound having at least one phenolic hydroxyl group in which the phenolic hydroxyl group is partially acylated is improved in adhesion to a substrate.
摘要翻译：包含酚醛清漆树脂，醌二叠氮基磺酸盐感光剂和具有酚羟基被部分酰化的至少一个酚羟基的芳族羟基化合物的单层剥离抗蚀剂组合物在与基材的粘附性方面提高。

7. 发明授权

US06242151B1 Polymers, resist compositions and patterning method 有权
标题翻译：聚合物，抗蚀剂组合物和图案化方法
公开(公告)号：US06242151B1
公开(公告)日：2001-06-05
申请号：US09372035
申请日：1999-08-11
申请人： Tomoyoshi Furihata , Hideto Kato , Satoshi Okazaki
发明人： Tomoyoshi Furihata , Hideto Kato , Satoshi Okazaki
IPC分类号： G03F7023
CPC分类号： C08L61/14 , C08G8/28 , C08G8/32 , G03F7/023
摘要： The invention provides a novel polymer in the form of a novolac resin in which some of the hydrogen atoms of the hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted carbonyl or sulfonyl groups. The polymer has a weight average molecular weight calculated as polystyrene of 1,000-30,000. The polymer is formulated into a resist composition having improved uniformity, sensitivity, resolution and pattern geometry in microfabrication.
摘要翻译：本发明提供一种酚醛清漆树脂形式的新型聚合物，其中羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基团取代，其余羟基的一些氢原子被取代的羰基或磺酰基。该聚合物的重均分子量为聚苯乙烯计算为1000-3,000。将聚合物配制成具有改进的微细加工中的均匀性，灵敏度，分辨率和图案几何形状的抗蚀剂组合物。

8. 发明授权

US06218069B1 Photosensitive resin composition and making process 有权
标题翻译：感光树脂组合物和制备方法
公开(公告)号：US06218069B1
公开(公告)日：2001-04-17
申请号：US09480627
申请日：2000-01-10
申请人： Hideto Kato , Tomoyoshi Furihata , Satoshi Okazaki
发明人： Hideto Kato , Tomoyoshi Furihata , Satoshi Okazaki
IPC分类号： G03F7023
CPC分类号： G03F7/023
摘要： A photosensitive resin composition contains a photosensitive resin comprising recurring units of formula (1) and having a Mw of 1,300-11,000 and 20-5,000 ppm of a tertiary amine compound of formula (2). R is hydrogen or a 1,2-naphthoquinonediazido-5-sulfonic acid residue, the content of 1,2-naphthoquinonediazido-5-sulfonic acid residue in R is 3-27 mol %, and m is a number from 0 to 3, X is a C6-20 alkyl, aryl or aralkyl group, Y and Z each are a C1-20 alkyl group. The composition is improved in sensitivity stability and adhesion to substrates and eliminates the risk of causing corrosion of metal substrates.
摘要翻译：感光性树脂组合物含有包含式（1）的重复单元，Mw为1,300〜11,000和20〜500ppm的式（2）的叔胺化合物的感光性树脂，R为氢或1,2-萘醌二叠氮 -5-磺酸残基，R中1,2-萘醌二叠氮基-5-磺酸残基的含量为3-27mol％，m为0-3的数，X为C6-20烷基，芳基或芳烷基，Y和Z各自为C 1-20烷基。该组合物的灵敏度稳定性和与基材的粘附性得到改善，并且消除了引起金属基材腐蚀的风险。

9. 发明授权

US06790581B2 Hybrid compound, resist, and patterning process 失效
标题翻译：混合化合物，抗蚀剂和图案化工艺
公开(公告)号：US06790581B2
公开(公告)日：2004-09-14
申请号：US10268761
申请日：2002-10-11
申请人： Hideto Kato , Tomoyoshi Furihata
发明人： Hideto Kato , Tomoyoshi Furihata
IPC分类号： G03F7023
CPC分类号： G03F7/0757 , G03F7/023
摘要： A phenolic resin/silicone resin hybrid compound is obtained by effecting hydrolytic condensation of an organooxysilane in the co-presence of a phenolic resin. The hybrid compound is used as the base polymer in a resist for endowing a resist film with excellent adhesion to a metal substrate.
摘要翻译：通过在酚醛树脂的共存下进行有机氧基硅烷的水解缩合得到酚醛树脂/有机硅树脂杂化化合物。在用于赋予抗蚀剂膜的抗蚀剂中，混合化合物用作与金属基材具有优异粘附性的基础聚合物。

10. 发明授权

US07175960B2 Positive resist composition and patterning process 有权
标题翻译：正抗蚀剂组成和图案化工艺
公开(公告)号：US07175960B2
公开(公告)日：2007-02-13
申请号：US10936621
申请日：2004-09-09
申请人： Tomoyoshi Furihata , Hideto Kato
发明人： Tomoyoshi Furihata , Hideto Kato
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/0236 , G03F7/022
摘要： A positive resist composition comprising a mixture of an alkali-soluble novolak resin prepared using m-cresol, p-cresol and 2,5-xylenol as starting reactants and a phenolic compound, wherein the hydrogen atoms of all hydroxyl groups are substituted in a proportion of 0.03–0.05 mol per hydrogen atom with 1,2-naphthoquinonediazidosulfonyl ester groups, has uniformity, high sensitivity and high resolution, and is improved in heat resistance, film retention, substrate adhesion, and storage stability.
摘要翻译：一种正性抗蚀剂组合物，其包含使用间甲酚，对甲酚和2,5-二甲苯酚作为起始反应物制备的碱溶性酚醛清漆树脂和酚类化合物的混合物，其中所有羟基的氢原子以一定比例被取代每个氢原子为0.03-0.05mol与1,2-萘醌二叠氮磺酰酯基团，具有均匀性，高灵敏度和高分辨率，并且耐热性，保留膜，基材粘合性和储存稳定性都得到改善。

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