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1. 发明授权

US08785114B2 Method for manufacturing micro-structure 有权
标题翻译：微结构制造方法
公开(公告)号：US08785114B2
公开(公告)日：2014-07-22
申请号：US13157460
申请日：2011-06-10
申请人： Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
发明人： Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
IPC分类号： G03F7/30 , G03F7/40 , G03F7/038 , G03F7/023 , G03F7/20
CPC分类号： C09D163/04 , B81C1/00619 , B81C2201/0108 , G03F7/0226 , G03F7/0236 , G03F7/30 , G03F7/40 , G03F7/70466
摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
摘要翻译：通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，为无机材料膜提供孔，并通过孔蚀刻掉牺牲膜图案，以限定具有图案轮廓的空间。图案化阶段包括以下步骤：（A）使用包含甲酚酚醛清漆树脂和交联剂的组合物形成牺牲膜，（B）将膜图案化为第一高能辐射，（C）显影，和（D）曝光牺牲膜图案到第二高能量辐射和热处理，从而在甲酚酚醛清漆树脂内形成交联。

2. 发明申请

US20110305990A1 METHOD FOR MANUFACTURING MICRO-STRUCTURE 有权
标题翻译：制造微结构的方法
公开(公告)号：US20110305990A1
公开(公告)日：2011-12-15
申请号：US13157460
申请日：2011-06-10
申请人： Hideto KATO , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
发明人： Hideto KATO , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： C09D163/04 , B81C1/00619 , B81C2201/0108 , G03F7/0226 , G03F7/0236 , G03F7/30 , G03F7/40 , G03F7/70466
摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
摘要翻译：通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，为无机材料膜提供孔，并通过孔蚀刻掉牺牲膜图案，以限定具有图案轮廓的空间。图案化阶段包括以下步骤：（A）使用包含甲酚酚醛清漆树脂和交联剂的组合物形成牺牲膜，（B）将膜图案化为第一高能辐射，（C）显影，和（D）曝光牺牲膜图案到第二高能量辐射和热处理，从而在甲酚酚醛清漆树脂内形成交联。

3. 发明授权

US06437058B2 Polymers and positive resist compositions 有权
标题翻译：聚合物和正性抗蚀剂组合物
公开(公告)号：US06437058B2
公开(公告)日：2002-08-20
申请号：US09777903
申请日：2001-02-07
申请人： Tomoyoshi Furihata , Hideto Kato , Yoshinori Hirano
发明人： Tomoyoshi Furihata , Hideto Kato , Yoshinori Hirano
IPC分类号： C08G830
CPC分类号： C08G8/30 , C08G8/28 , C08L61/06 , C08L61/14
摘要： A polymer in the form of a novolac resin is provided wherein the novolac resin has a weight average molecular weight of 1,000-30,000, some of the hydrogen atoms of hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups, and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted acetal groups and/or crosslinked within a molecule or between molecules with crosslinking groups having C—O—C linkages. The polymer is formulated into a positive resist composition having improved uniformity, sensitivity, resolution and pattern profile as well as improved heat resistance, film retention, substrate adhesion and storage stability.
摘要翻译：提供酚醛清漆树脂形式的聚合物，其中酚醛清漆树脂的重均分子量为1,000-3,000，羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基代替，一些氢剩余羟基的原子被取代的缩醛基团取代和/或在分子内或具有具有COC键的交联基团的分子之间交联。将聚合物配制成具有改进的均匀性，灵敏度，分辨率和图案轮廓以及改善的耐热性，膜保留性，底物粘合性和储存稳定性的正性抗蚀剂组合物。

4. 发明授权

US08048611B2 Polyorganosiloxane, resin composition, and patterning process 失效
标题翻译：聚有机硅氧烷，树脂组合物和图案化工艺
公开(公告)号：US08048611B2
公开(公告)日：2011-11-01
申请号：US12429282
申请日：2009-04-24
申请人： Hideto Kato , Tomoyoshi Furihata , Masahiro Furuya , Yoshinori Hirano
发明人： Hideto Kato , Tomoyoshi Furihata , Masahiro Furuya , Yoshinori Hirano
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08G77/38 , C08G77/14 , C08G77/50 , C08L83/10 , C08L83/14 , G03F7/0392 , G03F7/0757 , G03F7/40 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L27/1248 , Y10S430/114 , C08L2666/28
摘要： A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.
摘要翻译：改性聚有机硅氧烷化合物，使得一些硅键合的羟基被酸不稳定基团取代，和/或分子间或分子内的交联与具有C-O-C键的交联基团形成。包含聚有机硅氧烷的组合物的固化膜可用作TFT基板上的层间绝缘膜。

5. 发明授权

US06866982B2 Resist composition and patterning process 失效
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06866982B2
公开(公告)日：2005-03-15
申请号：US10329456
申请日：2002-12-27
申请人： Hideto Kato , Yoshinori Hirano , Toshihiko Fujii , Hiromasa Yamaguchi
发明人： Hideto Kato , Yoshinori Hirano , Toshihiko Fujii , Hiromasa Yamaguchi
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , G03F7/075 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392 , G03F7/0755 , G03F7/0757
摘要： A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.
摘要翻译：一种抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的基本上不溶于碱的聚合物，其在消除酸不稳定基团时变得碱溶性，（B）光酸产生剂，和（C）非离子氟化有机硅氧烷由包含全氟烷基的硅氧烷键和聚氧乙烯型聚醚键组成的化合物暴露于波长为至少150nm的UV并用碱性溶液显影以形成图案而不留下浮渣。

6. 发明授权

US06635400B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06635400B2
公开(公告)日：2003-10-21
申请号：US09835375
申请日：2001-04-17
申请人： Hideto Kato , Kazuhiro Nishikawa , Yoshinori Hirano , Katsuya Takemura
发明人： Hideto Kato , Kazuhiro Nishikawa , Yoshinori Hirano , Katsuya Takemura
IPC分类号： G03F7023
CPC分类号： G03F7/168 , G03F7/0233 , G03F7/0392
摘要： A resist composition comprising (A) an alkali-insoluble or substantially insoluble polymer having acidic functional groups protected with acid labile groups, which polymer becomes alkali-soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a 1,2-naphthoquinonediazidosulfonyl group-bearing compound has a high resolution and sensitivity, and provides resist patterns of excellent plating resistance when used in UV lithography at an exposure light wavelength of at least 300 nm.
摘要翻译：一种抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的碱不溶性或基本上不溶的聚合物，该聚合物在消除酸不稳定基团时变得碱溶性，（B）光酸产生剂，和（C）具有1,2-萘醌二叠氮基磺酰基的化合物具有高分辨率和灵敏度，并且当在至少300nm的曝光光波长下用于UV光刻时，提供具有优异电镀电阻的抗蚀剂图案。

7. 发明授权

US08835091B2 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition 有权
标题翻译：微结构和光学图案化的牺牲成膜组合物的制造方法
公开(公告)号：US08835091B2
公开(公告)日：2014-09-16
申请号：US13474795
申请日：2012-05-18
申请人： Yoshinori Hirano , Hideyoshi Yanagisawa
发明人： Yoshinori Hirano , Hideyoshi Yanagisawa
IPC分类号： G03F7/023 , G03F7/38 , G03F7/40 , B81C1/00
CPC分类号： G03F7/0384 , B81B2203/0384 , B81C1/00111 , G03F7/00 , G03F7/023 , G03F7/0236 , G03F7/38 , G03F7/40 , Y10S430/122 , Y10S430/123
摘要： A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.
摘要翻译：通过图案化牺牲膜来制造微结构，在图案上形成无机材料膜，并通过孔蚀刻去除牺牲膜图案，以限定具有图案轮廓的空间。图案化阶段包括以下步骤：（A）用包含甲酚酚醛清漆树脂，交联剂和光酸产生剂的组合物涂布基材，（B）加热以形成牺牲膜，（C）图案曝光，（D）显影以形成牺牲膜图案，和（E）在甲酚酚醛清漆树脂内形成交联。

8. 发明授权

US5195930A Self-balanced drive shaft assembly 失效
标题翻译：自平衡驱动轴组件
公开(公告)号：US5195930A
公开(公告)日：1993-03-23
申请号：US619346
申请日：1990-11-29
申请人： Yoshinori Hirano , Hiroshi Okuzumi
发明人： Yoshinori Hirano , Hiroshi Okuzumi
IPC分类号： B60K17/22 , F16C3/02 , F16F15/10 , F16F15/12 , F16F15/16 , F16F15/173
CPC分类号： F16F15/173 , B60K17/22 , F16C3/02 , Y10T464/50
摘要： A self-balanced drive shaft assembly comprises a cylindrical shaft having an axially extending cylindrical bore formed therein; a small amount of liquid contained in the bore of the cylindrical shaft, the liquid being movable in the bore in response to movement of the shaft; and two joints operatively connected to axially opposed ends of the shaft respectively. At least one of the joints permits a pivotal movement of the shaft about a pivot point defined by the other joint.
摘要翻译：自平衡驱动轴组件包括圆柱形轴，其中形成有轴向延伸的圆柱形孔; 容纳在圆柱形轴的孔中的少量液体，液体响应于轴的移动而在孔中可移动; 以及分别可操作地连接到轴的轴向相对端的两个接头。关节中的至少一个允许轴围绕由另一关节限定的枢转点的枢转运动。

9. 发明授权

US4966251A Automotive vehicle with center bearing of propeller shaft assembly variable in position 失效
标题翻译：具有传动轴总成中心轴承的汽车车辆位置可变
公开(公告)号：US4966251A
公开(公告)日：1990-10-30
申请号：US355658
申请日：1989-05-23
申请人： Yoshinori Hirano
发明人： Yoshinori Hirano
IPC分类号： B60K17/24
CPC分类号： B60K17/24
摘要： A system for reducing vibration and noise generated from a propeller shaft assembly of an automotive vehicle comprises a center bearing which is variable in position relative to the vehicle body under the control of a controller.

10. 发明授权

US4721071A Cooling system for automotive engine or the like 失效
标题翻译：汽车发动机等的冷却系统
公开(公告)号：US4721071A
公开(公告)日：1988-01-26
申请号：US918052
申请日：1986-10-14
申请人： Kazuyuki Fujigaya , Yoshinori Hirano , Hitoshi Shimonosono
发明人： Kazuyuki Fujigaya , Yoshinori Hirano , Hitoshi Shimonosono
IPC分类号： F01P3/20 , F01P3/22 , F01P7/08
CPC分类号： F01P3/20 , F01P3/2271 , F01P2025/52 , F01P7/08
摘要： A reservoir in which coolant is stored, is fluidly interposed between the downstream end of the condensor in which coolant vapor from the engine coolant jacket is condensed, and a coolant return pump which is responsive to a level sensor disposed in the coolant jacket, in a manner to form part of the cooling circuit of the system. The system further includes two temperature sensors, the first is disposed in the lower tank of the radiator and the other in the coolant jacket proximate the cylinder head. A device which modifies the pressure prevailing in the system is operated in response to one or both of the temperature sensors. This device can take the form of a cooling fan or an electromagnetic valve which controls one of a coolant jacket/atmosphere vent or a reservoir/atmosphere vent.
摘要翻译：存储冷却剂的储存器被流体地插入在冷凝器的下游端之间，冷凝器的下游端在其中来自发动机冷却剂套的冷却剂蒸气被冷凝，冷却剂回流泵响应于设置在冷却剂套中的液位传感器，以形成系统的冷却回路的一部分。该系统还包括两个温度传感器，第一个设置在散热器的下槽中，另一个设置在靠近气缸盖的冷却剂护套中。响应于一个或两个温度传感器来操作改变系统中存在的压力的装置。该装置可以采取冷却风扇或电磁阀的形式，其控制冷却套/大气排放口或储存器/大气排放口之一。

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