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1. 发明申请

US20120247675A1 PLASMA PROCESSING APPARATUS AND PLASMA GENERATION ANTENNA 有权
标题翻译：等离子体处理装置和等离子体生成天线
公开(公告)号：US20120247675A1
公开(公告)日：2012-10-04
申请号：US13435552
申请日：2012-03-30
申请人： Taro IKEDA , Tomohito KOMATSU , Shigeru KASAI
发明人： Taro IKEDA , Tomohito KOMATSU , Shigeru KASAI
IPC分类号： H01L21/3065 , H01Q13/10
CPC分类号： H01J37/3222 , C23C16/45565 , C23C16/511 , H01J37/32211 , H01J37/32229 , H01J37/3244 , H01J37/32449 , H05H1/46 , H05H2001/463
摘要： A plasma generation antenna and a plasma processing apparatus can supply a gas and an electromagnetic wave effectively. A plasma processing apparatus 10 includes a processing chamber 100 in which a plasma process is performed; a wavelength shortening plate 480 configured to transmit an electromagnetic wave; and a plasma generation antenna 200 having a shower head 210 provided adjacent to the wavelength shortening plate 480. The shower head 210 is made of a conductor, and has a multiple number of gas holes 215 and a multiple number of slots 220 through which the electromagnetic wave passes. The slots 220 are provided at positions isolated from the gas holes 215.
摘要翻译：等离子体发生天线和等离子体处理装置可以有效地提供气体和电磁波。等离子体处理装置10包括其中执行等离子体处理的处理室100; 构造成透射电磁波的波长缩短板480; 以及等离子体产生天线200，其具有与波长缩短板480相邻设置的淋浴喷头210.喷头210由导体制成，并具有多个气孔215和多个槽220，电磁波通。槽220设置在与气孔215隔开的位置处。

2. 发明申请

US20120067523A1 TUNER AND MICROWAVE PLASMA SOURCE 有权
标题翻译：调谐器和微波等离子体源
公开(公告)号：US20120067523A1
公开(公告)日：2012-03-22
申请号：US13246417
申请日：2011-09-27
申请人： Shigeru KASAI , Taro Ikeda , Yuki Osada
发明人： Shigeru KASAI , Taro Ikeda , Yuki Osada
IPC分类号： C23F1/08 , H03H7/38
CPC分类号： H05B6/80 , H01J37/32192 , H01J37/32256 , H05B6/705 , H05H1/46 , H05H2001/463
摘要： A tuner matching an impedance of a load in the chamber to a characteristic impedance of the microwave power source is provided. The tuner includes: a body having a tubular outer conductor and a tubular inner conductor coaxially provided in the outer conductor, the body forming a part of the microwave transmission path; an annular dielectric slug provided between the outer conductor and the inner conductor, the slug being movable along a longitudinal direction of the inner conductor; and a drive mechanism for moving the slug and including a drive part for applying a driving force; a drive transmission part for transmitting the driving force to the slug; a drive guide part for guiding movement of the slug; and a holding part for holding the slug at the drive transmission part. The drive transmission part, the drive guide part and the holding part are accommodated in the inner conductor.
摘要翻译：提供了将腔室中的负载的阻抗与微波功率源的特性阻抗匹配的调谐器。调谐器包括：主体，其具有管状外导体和同轴地设置在外导体中的管状内导体，主体形成微波传输路径的一部分; 设置在所述外部导体和所述内部导体之间的环状介电块，所述块可沿着所述内部导体的纵向方向移动; 以及驱动机构，用于移动所述塞子并且包括用于施加驱动力的驱动部件; 驱动传递部，用于将驱动力传递到所述塞子; 驱动引导部，用于引导所述塞子的运动; 以及用于将块塞保持在驱动传递部分的保持部分。驱动传递部分，驱动引导部分和保持部分被容纳在内导体中。

3. 发明申请

US20120299671A1 ELECTROMAGNETIC-RADIATION POWER-SUPPLY MECHANISM AND MICROWAVE INTRODUCTION MECHANISM 有权
标题翻译：电磁辐射供电机制与微波介绍机理
公开(公告)号：US20120299671A1
公开(公告)日：2012-11-29
申请号：US13551122
申请日：2012-07-17
申请人： Taro IKEDA , Yuki OSADA , Shigeru KASAI
发明人： Taro IKEDA , Yuki OSADA , Shigeru KASAI
IPC分类号： H01P1/00
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32211 , H01J37/3222 , H01J37/32229 , H01J37/32293 , H01J37/32311 , H01Q15/0006 , H05H2001/4622 , H05H2001/463
摘要： An electromagnetic-radiation power-supply mechanism includes a microwave power introduction port provided on the side of the coaxial waveguide, a power line being connected to the microwave power introduction port; and a power supply antenna for radiating the electromagnetic wave power into the waveguide, the power supply antenna being connected to the power line. The power supply antenna includes an antenna body having a first pole connected to the power line and a second pole connected to an inner conductor of the waveguide; and a ring-shaped reflection portion extending from opposite sides of the antenna body.
摘要翻译：电磁辐射供电机构包括设置在同轴波导一侧的微波功率引入口，与微波功率引入口连接的电力线; 以及用于将电磁波功率辐射到波导中的电源天线，电源天线连接到电力线。电源天线包括天线体，其具有连接到电力线的第一极和连接到波导的内部导体的第二极; 以及从天线体的相对侧延伸的环状的反射部。

4. 发明申请

US20100107977A1 FILM FORMING APPARATUS 审中-公开
标题翻译：电影制作装置
公开(公告)号：US20100107977A1
公开(公告)日：2010-05-06
申请号：US12652942
申请日：2010-01-06
申请人： Shigeru KASAI , Takashi KAKEGAWA
发明人： Shigeru KASAI , Takashi KAKEGAWA
IPC分类号： C23C16/52 , C23C16/00
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/45572 , H01J37/3244 , H01L21/28556
摘要： A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, which has a large number of gas-discharging holes, a gas-supplying mechanism that supplies a process gas into the chamber through the showerhead, and a showerhead-temperature controlling unit that controls a temperature of the showerhead.
摘要翻译：本发明的成膜装置是一种成膜装置，它包括：一个限定腔室的处理容器，布置在该腔室中的基座，待处理的基底可以放置在其上;一个与基座相对设置的喷头具有大量排气孔的气体供给机构，其通过喷头将处理气体供给到室内;以及喷头温度控制单元，其控制喷头的温度。

5. 发明申请

US20090041640A1 PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子体加工设备
公开(公告)号：US20090041640A1
公开(公告)日：2009-02-12
申请号：US12243598
申请日：2008-10-01
申请人： Shigeru KASAI , Yuki OSADA , Takashi OGINO
发明人： Shigeru KASAI , Yuki OSADA , Takashi OGINO
IPC分类号： H05H1/46
CPC分类号： H05B6/705
摘要： A plasma processing apparatus includes a chamber for containing a substrate to be processed, a gas supply unit for supplying a processing gas into the chamber, and a microwave introducing unit for introducing plasma generating microwaves into the chamber. The microwave introducing unit includes a microwave oscillator for outputting a plurality of microwaves having specified outputs, and an antenna section having a plurality of antennas to which the microwaves outputted from the microwave oscillator are respectively transmitted.
摘要翻译：等离子体处理装置包括用于容纳待处理基板的室，用于将处理气体供应到室中的气体供给单元和用于将等离子体产生微波引入室的微波引入单元。微波引入单元包括微波振荡器，用于输出具有特定输出的多个微波，以及具有分别从微波振荡器输出微波的多个天线的天线部分。

6. 发明申请

US20100224324A1 PLASMA GENERATING APPARATUS, PLASMA GENERATING METHOD AND REMOTE PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：等离子体发生装置，等离子体生成方法和远程等离子体处理装置
公开(公告)号：US20100224324A1
公开(公告)日：2010-09-09
申请号：US12723075
申请日：2010-03-12
申请人： Shigeru KASAI
发明人： Shigeru KASAI
IPC分类号： C23F1/08 , C23C16/00 , C23C16/511
CPC分类号： H01J37/3222 , H01J37/32192
摘要： A compact plasma generating apparatus providing high efficiency of plasma excitation is presented. A plasma generating apparatus (100) comprises a microwave generating apparatus (10) for generating microwaves, a coaxial waveguide (20) having a coaxial structure comprising an inner tube (20a) and an outer tube (20b), a monopole antenna (21) being attached to one end of said inner tube (20a), for directing the microwaves generated by said microwave generating apparatus (10) to the monopole antenna (21), a resonator (22) composed of dielectric material for holding the monopole antenna (21), and a chamber (23) in which a specific process gas is fed for plasma excitation. The chamber (23) has an open surface and the resonator (22) is placed on this open surface, and the process gas is excited by the microwaves radiated from the monopole antenna (21) through the resonator (22) into the interior of the chamber (23) to generate plasma.
摘要翻译：提出了一种提供高效等离子体激发的小型等离子体发生装置。一种等离子体产生装置（100）包括用于产生微波的微波产生装置（10），具有包括内管（20a）和外管（20b）的同轴结构的同轴波导（20），单极天线（21）附接到所述内管（20a）的一端，用于将由所述微波发生装置（10）产生的微波引导到单极天线（21），由用于保持单极天线（21）的电介质材料构成的谐振器）和其中给予用于等离子体激发的特定工艺气体的室（23）。腔室（23）具有开口表面，并且谐振器（22）被放置在该开放表面上，并且处理气体被从单极天线（21）通过谐振器（22）辐射的微波激发到内部室（23）以产生等离子体。

7. 发明申请

US20090178614A1 FILM-FORMING APPARATUS 有权
标题翻译：电影制作装置
公开(公告)号：US20090178614A1
公开(公告)日：2009-07-16
申请号：US12404878
申请日：2009-03-16
申请人： Shigeru KASAI , Takashi KAKEGAWA
发明人： Shigeru KASAI , Takashi KAKEGAWA
IPC分类号： C23C16/44
CPC分类号： C23C16/4557 , C23C16/45565 , C23C16/45572 , H01J37/3244 , H01L21/28556
摘要： A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, which has a large number of gas-discharging holes, a gas-supplying mechanism that supplies a process gas into the chamber through the showerhead, and a showerhead-temperature controlling unit that controls a temperature of the showerhead.
摘要翻译：本发明的成膜装置是一种成膜装置，它包括：一个限定腔室的处理容器，布置在该腔室中的基座，待处理的基底可以放置在其上;一个与基座相对设置的喷头具有大量排气孔的气体供给机构，其通过喷头将处理气体供给到室内;以及喷头温度控制单元，其控制喷头的温度。

8. 发明申请

US20090159214A1 MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS 审中-公开
标题翻译：微波等离子体源和等离子体处理装置
公开(公告)号：US20090159214A1
公开(公告)日：2009-06-25
申请号：US12361040
申请日：2009-01-28
申请人： Shigeru KASAI
发明人： Shigeru KASAI
IPC分类号： H01L21/306 , C23C16/00 , C23F1/00 , B01J19/12
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/3222 , H01J37/32256
摘要： A microwave plasma source (2) is provided with a microwave outputting section (30) which outputs plural divided microwaves, and a plurality of antenna modules (41) for guiding the plural divided microwaves into a chamber. Each antenna module (41) is provided with an amplifier section (42) having one or more amplifier (47) for amplifying a microwave, and an antenna section (44) having an antenna (51) for radiating the amplified microwave into the chamber, and a tuner (43) for adjusting impedance in a microwave transmission path. The tuner (43) is integrally arranged with the antenna section (44) to be located close to the amplifier (47).
摘要翻译：微波等离子体源（2）设置有输出多个分开的微波的微波输出部（30）和用于将多个分割的微波引导到室内的多个天线模块（41）。每个天线模块（41）设置有具有用于放大微波的一个或多个放大器（47）的放大器部分（42）和具有用于将放大的微波辐射到腔室中的天线（51）的天线部分（44）以及用于调节微波传输路径中的阻抗的调谐器（43）。调谐器（43）与天线部分（44）整体地布置成靠近放大器（47）。

9. 发明申请

US20090127955A1 MOTOR 有权
标题翻译：发动机
公开(公告)号：US20090127955A1
公开(公告)日：2009-05-21
申请号：US12272006
申请日：2008-11-17
申请人： Shigeru KASAI
发明人： Shigeru KASAI
IPC分类号： H02K7/08
CPC分类号： H02K5/1672 , H02K7/081
摘要： A motor may include a rotor provided with a rotation shaft, a stator, a frame fixed to the stator and provided with a bearing part that rotatably supports an output side of the rotation shaft, and an urging member mounted on the bearing part for urging the rotation shaft. The bearing part may include a bearing, formed with a protruded part protruded from a flat plate part of the frame. The urging member may include a bottom face part provided with a spring part for urging the rotation shaft, a pair of side plate parts bent from side edge parts of the bottom face part, and a pair of hook parts bent on inner sides from the pair of the side plate parts to be engaged with the protruded part. The urging member is mounted on the bearing part such that the hook parts are engaged with the protruded part.
摘要翻译：电动机可以包括设置有旋转轴的转子，定子，固定到定子上的框架，并且设置有可旋转地支撑旋转轴的输出侧的轴承部分，以及安装在轴承部分上用于推动旋转轴。轴承部件可以包括形成有从框架的平板部突出的突出部的轴承。推动构件可以包括设置有用于推动旋转轴的弹簧部分的底面部分，从底面部分的侧边缘部分弯曲的一对侧板部分和从该对的内侧弯曲的一对钩部的侧板部件与突出部分接合。推动构件安装在轴承部分上，使得钩部与突出部接合。

10. 发明申请

US20090127952A1 MOTOR DEVICE 有权
标题翻译：电机装置
公开(公告)号：US20090127952A1
公开(公告)日：2009-05-21
申请号：US12271996
申请日：2008-11-17
申请人： Shigeru KASAI
发明人： Shigeru KASAI
IPC分类号： H02K7/116
CPC分类号： H02K7/116 , F16C35/10 , H02K5/1672 , H02K37/24 , Y10T74/19684 , Y10T74/2186
摘要： A motor device may include a motor main body provided with a stator part and a rotation shaft, an output shaft provided with a lead screw part, a motor frame provided with an opposite-to-output side support part that supports the stator part and an opposite-to-output side of the output shaft, and which is provided with an output side support part which supports an output side of the output shaft, and a gear part for transmitting a driving force of the rotation shaft to the output shaft. The opposite-to-output side support part rotatably supports the rotation shaft and further rotatably supports the opposite-to-output side of the output shaft.
摘要翻译：电动机装置可以包括设置有定子部分和旋转轴的电动机主体，设置有丝杠部分的输出轴，设置有支撑定子部分的相对输出侧支撑部分的电动机框架和输出轴的相对输出侧，并且设置有支撑输出轴的输出侧的输出侧支撑部和用于将旋转轴的驱动力传递到输出轴的齿轮部。相对输出侧支撑部可旋转地支撑旋转轴并进一步可旋转地支撑输出轴的相对输出侧。

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