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1. 发明专利

JP2013164509A Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：JP2013164509A
公开(公告)日：2013-08-22
申请号：JP2012027462
申请日：2012-02-10
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社 , Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： MOTOIKE NAOTO , OMORI KATSUMI , NAMITO TOSHIAKI , YAEGASHI HIDETAMI , KOYAMA KENICHI
IPC分类号： G03F7/40 , G03F7/039 , H01L21/027
CPC分类号： G03F7/2026 , G03F7/0045 , G03F7/405
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method.SOLUTION: The pattern forming method comprises: a first pattern forming step of forming a first pattern as a resist by applying a resist composition on a support body to form a resist film, then exposing and developing the resist film; a film forming step of forming a SiOfilm on the surface of the first pattern and the support body; an etching step of etching the SiOfilm to leave the SiOfilm only on a side wall portion of the first pattern; and a second pattern forming step of removing the first pattern and forming a second pattern in the SiOfilm. The resist composition comprises: a base material component (A) the solubility of which with a developing solution changes by an action of an acid; and an acid generator component (B) that generates an acid by exposure. The base material component (A) includes a resin component (A1) having a structural unit (a1') including an acid decomposable group which shows increase in polarity by an action of an acid and which has no polycyclic group.
摘要翻译：要解决的问题：提供一种图案形成方法。解决方案：图案形成方法包括：第一图案形成步骤，通过在支撑体上施加抗蚀剂组合物形成第一图案作为抗蚀剂以形成抗蚀剂膜，然后暴露并开发抗蚀膜; 在第一图案和支撑体的表面上形成SiO膜的成膜步骤; 蚀刻步骤，蚀刻SiO膜以仅在第一图案的侧壁部分上留下SiO膜; 以及第二图案形成步骤，去除所述第一图案并在所述SiO膜中形成第二图案。抗蚀剂组合物包括：其与显影液的溶解度通过酸的作用而改变的基材组分（A）和通过曝光产生酸的酸发生剂组分（B）。基材成分（A）具有含有酸分解性基团的结构单元（a1'）的树脂成分（A1），其通过酸的作用显示极性增加，且不具有多环基。

2. 发明专利

JP2014062990A Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：JP2014062990A
公开(公告)日：2014-04-10
申请号：JP2012207413
申请日：2012-09-20
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社 , Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MURAMATSU MAKOTO , KITANO TAKAHIRO , TOMITA TADATOSHI , TAUCHI HIROSHI , MOTOIKE NAOTO , NAMITO TOSHIAKI , OMORI KATSUMI
IPC分类号： G03F7/40 , C08F297/00 , G03F7/039 , G03F7/11 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method by which a fine pattern with small roughness can be formed.SOLUTION: The pattern forming method includes steps of: forming a resist film by applying a resist composition on a process target body; patterning the resist film by exposure and development; forming a surface modified region on the process target body by using the patterned resist film; removing the patterned resist film; applying a block copolymer containing a first polymer and a second polymer on the process target body; subjecting the block copolymer to phase separation; and removing one of the first polymer and the second polymer of the phase-separated block copolymer. The resist composition comprises: a resin component having a structural unit which shows increase in the polarity by an action of an acid and includes an acid decomposable group having a monocyclic or linear hydrocarbon group; and an acid generator component which generates an acid by exposure.
摘要翻译：要解决的问题：提供可以形成粗糙度小的精细图案的图案形成方法。解决方案：图案形成方法包括以下步骤：通过将抗蚀剂组合物涂覆在加工对象体上而形成抗蚀剂膜; 通过曝光和显影图案化抗蚀剂膜; 通过使用图案化的抗蚀剂膜在工艺目标体上形成表面改性区域; 去除图案化的抗蚀剂膜; 将含有第一聚合物和第二聚合物的嵌段共聚物施加到所述工艺靶体上; 对嵌段共聚物进行相分离; 并除去相分离的嵌段共聚物的第一聚合物和第二聚合物之一。抗蚀剂组合物包括：具有结构单元的树脂组分，其通过酸的作用显示极性增加，并且包括具有单环或直链烃基的酸可分解基团; 以及通过曝光产生酸的酸发生剂组分。

3. 发明专利

JP2008060265A Removal solution recovery system after removal of protective film and method of collecting removal solution after removal of protective film 有权
标题翻译：拆卸保护膜后拆卸解决方案恢复系统及拆除保护膜后取出拆卸方法
公开(公告)号：JP2008060265A
公开(公告)日：2008-03-13
申请号：JP2006234254
申请日：2006-08-30
申请人： Tokyo Electron Ltd , Tokyo Ohka Kogyo Co Ltd , 東京エレクトロン株式会社 , 東京応化工業株式会社
发明人： HIRANO TOMOYUKI , ZENSEI SATOSHI , OMORI KATSUMI , YOSHIHARA KOSUKE , YAMAMOTO TARO
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a removal solution recovery system which can increase a recovery rate of a removal solution after use while avoiding a reduction in the throughput of a protective film removing process. SOLUTION: A removal solution recovery system 6 comprises a recovery tank 61 holding therein a solution containing a recovery solvent R for resolving and collecting a volatile component in a removal solution after being used; a transportation pipe 60 for transporting the volatile component into the recovery tank 61; a bubbling mechanism 63 for resolving the volatile component into the recovery solvent R; a liquid supply mechanism 62 for supplying a liquid containing a new recovery solvent into the recovery tank 61; a liquid discharging mechanism for discharging the liquid containing the recovery solvent R in the recovery tank 61; and a system controller 34 for causing the liquid discharging mechanism to discharge the liquid containing the recovery solvent R and the volatile component dissolved therein in the recovery tank 61, and for causing the liquid supply mechanism 62 to supply the liquid containing the new recovery solvent into the recovery tank 61 at predetermined timing. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种除去溶液回收系统，其可以在使用后提高除去溶液的回收率，同时避免保护膜除去过程的通过量的降低。解决方案：除去溶液回收系统6包括回收罐61，其中含有含有回收溶剂R的溶液，用于在使用后分解和收集去除溶液中的挥发性组分; 用于将挥发性成分输送到回收罐61中的输送管60; 用于将挥发性成分分解成回收溶剂R的鼓泡机构63; 用于将含有新的回收溶剂的液体供应到回收罐61中的液体供给机构62; 用于将包含回收溶剂R的液体排出到回收罐61中的液体排出机构; 以及系统控制器34，用于使液体排出机构将包含回收溶剂R和溶解在其中的挥发性成分的液体排出到回收罐61中，并使液体供给机构62将含有新的回收溶剂的液体供给到回收罐61。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2014164044A Photosensitive resin composition, pattern forming method, and production method of structure including phase separation structure 审中-公开
标题翻译：光敏树脂组合物，图案形成方法和包括相分离结构的结构生产方法
公开(公告)号：JP2014164044A
公开(公告)日：2014-09-08
申请号：JP2013033679
申请日：2013-02-22
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MIYASHITA KENICHIRO , SHIONO HIROHISA , MIYAGI MASARU , MATSUMIYA YU , KUROSAWA TSUYOSHI , OMORI KATSUMI
IPC分类号： G03F7/038 , G03F7/039 , G03F7/32 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To form a guide pattern in a chemical epitaxy process by an easy method as well as into a favorable shape.SOLUTION: A pattern forming method includes the steps of: forming a photosensitive resin film on a support body, exposing the film, and subjecting the exposed photosensitive resin film to negative development by using a developing solution comprising an organic solvent to form a pre-pattern; applying and heating a surface treating agent on the support body where the pre-pattern is formed so as to form a neutralized film; and subjecting the pre-pattern and the neutralized film formed on the support body to alkali development so as to remove the pre-pattern from the support body and to form a pattern comprising the neutralized film on the support body. The following photosensitive resin composition is used in the above pattern forming method. The photosensitive resin composition comprises a polymeric compound, as a base component which shows decrease in solubility with the organic solvent by an action of an acid, which has a structural unit having a lactone-containing polycyclic group, a -SO- group-containing polycyclic group or a carbonate-containing polycyclic group.
摘要翻译：要解决的问题：通过简单的方法形成化学外延过程中的引导图案，并且形成有利的形状。解决方案：图案形成方法包括以下步骤：在支撑体上形成感光树脂膜，通过使用包含有机溶剂的显影液形成预图案，使曝光的感光性树脂膜发生负显影; 在形成预图案的支撑体上施加和加热表面处理剂以形成中和膜; 并且将形成在支撑体上的预制图案和中和膜进行碱显影，以从支撑体移除预图案，并在支撑体上形成包括中和膜的图案。在上述图案形成方法中使用以下的感光性树脂组合物。感光性树脂组合物含有作为碱性成分的高分子化合物，该组合物通过酸的作用显示出与有机溶剂的溶解性降低，其具有含内酯多环基团的结构单元，含-SO-基的多环基团或含碳酸酯的多环基团。

5. 发明专利

JP2014160770A Method for manufacturing structure including phase separation structure, and structure including phase separation structure 有权
标题翻译：包括相分离结构在内的制造方法，包括相分离结构的结构
公开(公告)号：JP2014160770A
公开(公告)日：2014-09-04
申请号：JP2013031165
申请日：2013-02-20
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUROSAWA TSUYOSHI , SHIONO HIROHISA , MIYAGI MASARU , MATSUMIYA YU , MIYASHITA KENICHIRO , OMORI KATSUMI
IPC分类号： H01L21/027 , B05D7/24 , B82Y30/00 , B82Y40/00 , G03F7/11
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a structure including a phase separation structure by which a structure including a phase separation structure can be manufactured without carrying out a complicated process, by forming a photosensitive resin pattern of an ultrathin film on a substrate.SOLUTION: The method for manufacturing a structure including a phase separation structure comprises the steps of: forming a neutralized film containing a surface treating agent on a substrate; forming a photosensitive resin film on the neutralized film, exposing and developing the resin film to form a pattern; forming a layer containing a block copolymer in which a plurality of types of polymers are bonded, on the pattern so as to cover the pattern and the neutralized film; and inducing phase separation in the layer containing the block copolymer on the pattern and the neutralized film.
摘要翻译：要解决的问题：提供一种制造包括相分离结构的结构的方法，通过该相分离结构可以制造包括相分离结构的结构而不进行复杂的工艺，通过在基板上形成超薄膜的感光性树脂图案解决方案：制造包括相分离结构的结构的方法包括以下步骤：在基底上形成含有表面处理剂的中和膜; 在中和膜上形成感光性树脂膜，使树脂膜露出显影而形成图案; 在图案上形成含有多种类型的聚合物的嵌段共聚物的层以覆盖图案和中和的膜; 并在图案和中和膜上引起含有嵌段共聚物的层中的相分离。

6. 发明专利

JP2014160197A Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：JP2014160197A
公开(公告)日：2014-09-04
申请号：JP2013031283
申请日：2013-02-20
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUROSAWA TSUYOSHI , SHIONO HIROHISA , MIYAGI MASARU , MATSUMIYA YU , MIYASHITA KENICHIRO , OMORI KATSUMI
IPC分类号： G03F7/039 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a new photosensitive resin pattern to be used for a guide pattern upon forming a finer pattern by using, for example, a phase separation structure formed by self-organization of a block copolymer.SOLUTION: A method for forming a pattern with a film thickness of 20 nm or less is provided, which includes: a step of forming a photosensitive resin film by using a photosensitive resin composition on a substrate; a step of exposing the photosensitive resin film; and a step of forming a pattern by developing the photosensitive resin film.
摘要翻译：要解决的问题：提供通过使用例如通过嵌段共聚物的自组织形成的相分离结构形成更精细图案而用于引导图案的新的感光性树脂图案。解决方案：一种形成方法提供膜厚度为20nm以下的图案，其包括：通过在基板上使用感光性树脂组合物形成感光性树脂膜的工序; 曝光感光性树脂膜的工序; 以及通过显影感光性树脂膜形成图案的步骤。

7. 发明专利

JP2014185311A Substrate agent and pattern formation method 有权
标题翻译：基板代理和图案形成方法
公开(公告)号：JP2014185311A
公开(公告)日：2014-10-02
申请号：JP2013137276
申请日：2013-06-28
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUROSAWA TSUYOSHI , SHIONO HIROHISA , MIYAGI MASARU , MATSUMIYA YU , MIYASHITA KENICHIRO , OMORI KATSUMI
IPC分类号： C09D125/00 , B05D7/24 , B82Y30/00 , B82Y40/00 , C09D5/00 , H01L21/027 , H01L21/312
摘要： PROBLEM TO BE SOLVED: To provide a substrate agent which enables production of a substrate provided with a nano structure in which positions and orientation are designed more freely on the surface of the substrate by using phase separation of a block copolymer and allows easy distinguished use for purposes by selecting the type of a block copolymer used, and to provide a method of forming a pattern of a layer containing a block copolymer by using the substrate agent.SOLUTION: A substrate agent for phase separation of a layer containing a block copolymer composed of a plurality of kinds of blocks formed on a substrate includes a resin ingredient, and the resin ingredient contains 90 mol% or more structural units originated from aromatic ring-containing monomers and mol5% or less structural units derived from methacrylic acid or a methacrylate ester.
摘要翻译：要解决的问题：提供一种基板剂，其可以通过使用嵌段共聚物的相分离来生产具有纳米结构的基板，其中位置和取向在基板的表面上更自由地设计，并且允许容易地区分使用目的是通过选择所使用的嵌段共聚物的类型，并提供通过使用底物剂形成含有嵌段共聚物的层的图案的方法。溶液：用于相分离包含嵌段共聚物的层的基材形成在基板上的多个块状物包括树脂成分，树脂成分含有90摩尔％以上来自芳香族环的单体的结构单元和mol5％以下的衍生自甲基丙烯酸或甲基丙烯酸酯的结构单元。

8. 发明专利

JP2014160204A Base coat agent, pattern formation method 有权
标题翻译：基层代理，图案形成方法
公开(公告)号：JP2014160204A
公开(公告)日：2014-09-04
申请号：JP2013031420
申请日：2013-02-20
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUROSAWA TSUYOSHI , SHIONO HIROHISA , MIYAGI MASARU , MATSUMIYA YU , MIYASHITA KENICHIRO , OMORI KATSUMI
IPC分类号： G03F7/11 , G03F7/039 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a base coat agent capable of manufacturing a base plate having a nanostructure of which a position and an orientation are freely designed on the base plate by using a phase separation of a block copolymer, and to provide a pattern formation method of a layer containing the block copolymer by using the base coat agent.SOLUTION: There is provided a base coat agent used for a phase separation of a layer containing a block copolymer to which a plurality of kinds of blocks formed on a base plate bind, and containing a resin component having a constitutional unit derived from an aromatic ring-containing monomer (A') and an acid generator component generating acid by a light exposure (B).
摘要翻译：要解决的问题：提供一种底涂层剂，其能够通过使用嵌段共聚物的相分离，在基板上制造具有位置和取向自由设计的纳米结构的基板，并提供图案形成通过使用底涂剂的含有嵌段共聚物的层的方法。提供了一种底涂剂，其用于相分离含有嵌段共聚物的层，其中形成在基板上的多种嵌段结合并且含有具有衍生自含芳环单体（A'）的结构单元的树脂组分和通过曝光产生酸的酸产生剂组分（B）。

9. 发明专利

JP2005157399A Chemically amplified resist composition 有权
标题翻译：化学稳定组分
公开(公告)号：JP2005157399A
公开(公告)日：2005-06-16
申请号：JP2005031087
申请日：2005-02-07
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： OMORI KATSUMI , HANEDA HIDEO , KANEKO FUMITAKE , SATO MITSURU , SATO KAZUFUMI , NAKAYAMA TOSHIMASA
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide positive and negative chemically amplified resist compositions, having high sensitivity and giving a resist pattern of superior shape.
SOLUTION: The chemically amplified resist compositions contain (A) a film-forming component, whose alkali solubility is changed by the action of an acid and (B) an acid-generating agent comprising a combination of an oximesulfonate compound represented by Formula (I) with an onium salt, wherein R
1 is an inert organic group and R
2 is an aromatic polycyclic hydrocarbon group, a saturated or unsaturated nonaromatic polycyclic hydrocarbon group or a substituted derivative group thereof.
COPYRIGHT: (C)2005,JPO&NCIPI

10. 发明专利

JP2014185318A Substrate agent and pattern formation method 有权
标题翻译：基板代理和图案形成方法
公开(公告)号：JP2014185318A
公开(公告)日：2014-10-02
申请号：JP2013260594
申请日：2013-12-17
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： KUROSAWA TSUYOSHI , SHIONO HIROHISA , MIYAGI MASARU , MATSUMIYA YU , MIYASHITA KENICHIRO , OMORI KATSUMI
IPC分类号： C09D201/00 , B05D1/36 , B05D5/04 , B05D7/24 , B82Y30/00 , B82Y40/00 , C09D5/00
摘要： PROBLEM TO BE SOLVED: To provide a substrate agent and a method of forming a pattern of a layer containing a block copolymer by using the substrate agent.SOLUTION: A substrate agent for phase separation of a layer containing a block copolymer 3 consisting of a plurality of kinds of blocks formed on a substrate 1 and bonded together contains a resin ingredient, and the resin ingredient comprises structural units having an aromatic group, structural units having a hydroxyalkyl group and structural units having no aromatic groups or hydroxyalkyl groups.
摘要翻译：要解决的问题：提供一种基质剂和通过使用底物剂形成含有嵌段共聚物的层的图案的方法。溶液：用于相分离含有由多个组成的嵌段共聚物3的层的基材形成在基板1上并结合在一起的块的种类包含树脂成分，并且树脂成分包括具有芳族基团的结构单元，具有羟烷基的结构单元和不具有芳族基团或羟烷基的结构单元。

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