专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2014062990A Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：JP2014062990A
公开(公告)日：2014-04-10
申请号：JP2012207413
申请日：2012-09-20
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社 , Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： MURAMATSU MAKOTO , KITANO TAKAHIRO , TOMITA TADATOSHI , TAUCHI HIROSHI , MOTOIKE NAOTO , NAMITO TOSHIAKI , OMORI KATSUMI
IPC分类号： G03F7/40 , C08F297/00 , G03F7/039 , G03F7/11 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method by which a fine pattern with small roughness can be formed.SOLUTION: The pattern forming method includes steps of: forming a resist film by applying a resist composition on a process target body; patterning the resist film by exposure and development; forming a surface modified region on the process target body by using the patterned resist film; removing the patterned resist film; applying a block copolymer containing a first polymer and a second polymer on the process target body; subjecting the block copolymer to phase separation; and removing one of the first polymer and the second polymer of the phase-separated block copolymer. The resist composition comprises: a resin component having a structural unit which shows increase in the polarity by an action of an acid and includes an acid decomposable group having a monocyclic or linear hydrocarbon group; and an acid generator component which generates an acid by exposure.
摘要翻译：要解决的问题：提供可以形成粗糙度小的精细图案的图案形成方法。解决方案：图案形成方法包括以下步骤：通过将抗蚀剂组合物涂覆在加工对象体上而形成抗蚀剂膜; 通过曝光和显影图案化抗蚀剂膜; 通过使用图案化的抗蚀剂膜在工艺目标体上形成表面改性区域; 去除图案化的抗蚀剂膜; 将含有第一聚合物和第二聚合物的嵌段共聚物施加到所述工艺靶体上; 对嵌段共聚物进行相分离; 并除去相分离的嵌段共聚物的第一聚合物和第二聚合物之一。抗蚀剂组合物包括：具有结构单元的树脂组分，其通过酸的作用显示极性增加，并且包括具有单环或直链烃基的酸可分解基团; 以及通过曝光产生酸的酸发生剂组分。

2. 发明专利

JP2015008246A 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム有权
标题翻译：基板处理方法，程序，计算机存储介质和基板处理系统
公开(公告)号：JP2015008246A
公开(公告)日：2015-01-15
申请号：JP2013133383
申请日：2013-06-26
申请人：東京エレクトロン株式会社 , Tokyo Electron Ltd
发明人： MURAMATSU MAKOTO , KITANO TAKAHIRO , TOMITA TADATOSHI , NISHI TAKANORI , KAWAKAMI SHINICHIRO , YAMAUCHI TAKESHI
IPC分类号： H01L21/027 , G03F7/40
CPC分类号： G03F7/20 , B81C2201/0149 , C08L53/00 , C09D153/00 , G03F7/0002 , G03F7/16 , G03F7/32 , G03F7/40 , H01L21/02282 , H01L21/0274 , H01L21/3086 , H01L21/31133 , H01L21/67028 , H01L21/67051 , H01L21/6708
摘要：【課題】親水性ポリマーと疎水性ポリマーとを含むブロック共重合体を用いた基板処理において、基板上に所定のパターンを適切に形成する。【解決手段】ブロック共重合体を用いて基板を処理する方法であって、親水性ポリマーと疎水性ポリマーに対して中間の親和性を有する中性層を基板上に形成し、次いで中性層上にレジストパターンを形成した後にブロック共重合体を塗布する。その後、ブロック共重合体を親水性ポリマーと疎水性ポリマーに相分離させ、次いで相分離したブロック共重合体に紫外線を照射する。その後、親水性ポリマーに対して第1の溶解度を有し、水より沸点が低く、水に対して可溶で、且つ疎水性ポリマーを溶解しない第1の極性有機溶剤を、ブロック共重合体に供給し、次いで、第1の溶解度より低い第2の溶解度を有し、水よりも沸点が高く、且つ疎水性ポリマーを溶解しない第2の極性有機溶剤を、ブロック共重合体に供給する。【選択図】図7
摘要翻译：要解决的问题：在使用包括亲水性聚合物和疏水性聚合物的嵌段共聚物的基板处理中，在基板上适当地形成预定图案。解决方案：使用嵌段共聚物来处理基材的方法包括：形成具有中等亲和力的中性层在基材上的亲水性聚合物和疏水性聚合物; 随后在中性层上形成抗蚀剂图案; 用嵌段共聚物涂覆抗蚀剂图案; 随后将嵌段共聚物相分离成亲水聚合物和疏水聚合物; 随后用紫外线照射相分离的嵌段共聚物; 向嵌段共聚物中提供相对于亲水性聚合物具有第一溶解度的第一极性有机溶剂，其沸点低于水的沸点，可溶于水，并且不溶解疏水性聚合物; 并且将第二溶解度低于第一溶解度的第二极性有机溶剂供给嵌段共聚物，其沸点高于水，并且不溶解疏水性聚合物。

3. 发明专利

JP2013247159A Pattern formation method, pattern formation device, and computer readable storage medium 有权
标题翻译：图案形成方法，图案形成装置和计算机可读存储介质
公开(公告)号：JP2013247159A
公开(公告)日：2013-12-09
申请号：JP2012117949
申请日：2012-05-23
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： MURAMATSU MAKOTO , KITANO TAKAHIRO , TOMITA TADATOSHI , TAUCHI HIROSHI
IPC分类号： H01L21/027 , H01L21/3205 , H01L21/768
摘要： PROBLEM TO BE SOLVED: To provide a pattern formation method capable of avoiding increase of manufacturing costs or deterioration of a throughput when a pattern is formed by block copolymer.SOLUTION: A pattern formation method includes steps of: forming a film of block copolymer containing at least two kinds of polymer on a film; separating at least the two kinds of polymer from each other by heating the film of the block copolymer; acquiring an image of a surface of the film of the block copolymer in which at least the two kinds of polymer are separated from each other; and determining whether at least the two kinds of polymer are properly separated from each other according to the image.
摘要翻译：要解决的问题：提供一种图案形成方法，其能够避免当通过嵌段共聚物形成图案时制造成本的增加或生产量的劣化。图案形成方法包括以下步骤：形成含有膜上最少有两种聚合物; 通过加热嵌段共聚物的膜将至少两种聚合物彼此分离; 获取其中至少两种聚合物彼此分离的嵌段共聚物的膜的表面的图像; 以及根据图像确定至少两种聚合物是否彼此适当地分离。

4. 发明专利

JP2013232621A Pattern forming method, pattern forming device, and computer readable storage medium 有权
标题翻译：图案形成方法，图案形成装置和计算机可读存储介质
公开(公告)号：JP2013232621A
公开(公告)日：2013-11-14
申请号：JP2012285132
申请日：2012-12-27
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： MURAMATSU MAKOTO , KITANO TAKAHIRO , TOMITA TADATOSHI , TAUCHI HIROSHI
IPC分类号： H01L21/027 , G03F7/40 , H01L21/28 , H01L21/768
CPC分类号： G03F7/40 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/2002 , G03F7/405 , H01L21/0271 , H01L21/0337 , H01L21/31133 , H01L21/67109 , H01L21/67115 , H01L21/6715 , H01L21/67178
摘要： PROBLEM TO BE SOLVED: To improve the solubility ratio to an organic solvent between an A-polymer region and a B-polymer region in a block copolymer.SOLUTION: A pattern forming method includes the steps of: forming a film of a block copolymer containing at least two kinds of polymers on a substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with UV light in an atmosphere of inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the UV light.
摘要翻译：要解决的问题：提高嵌段共聚物中A聚合物区域与B聚合物区域之间的有机溶剂的溶解度比。解决方案：图案形成方法包括以下步骤：形成含有基材上至少有两种聚合物; 加热嵌段共聚物的膜; 在惰性气体气氛中用UV光照射嵌段共聚物的加热膜; 并向被照射的紫外光的嵌段共聚物的膜供给有机溶剂。

5. 发明专利

JP2013105867A Substrate holder, regeneration method of substrate holder, and manufacturing method of substrate holder 有权
标题翻译：基板支架，基板保持架再生方法及基板支架的制造方法
公开(公告)号：JP2013105867A
公开(公告)日：2013-05-30
申请号：JP2011248267
申请日：2011-11-14
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： ISHII TAKAYUKI , KITANO TAKAHIRO
IPC分类号： H01L21/027 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a substrate holder which is easily remanufactured.SOLUTION: A spin chuck 1 attracting and holding a wafer W has: an attraction board 10 having heat resistance that withstands a temperature equal to or higher than a first temperature; a sealing member 11 continuously provided along an outer peripheral part on an upper surface of the attraction board 10; and a supporting member 12 provided on the upper surface of the attraction board 10 which is located at the inner side of the sealing member 11. The sealing member 11 and the support member 12 are formed by an ultraviolet hardening resin carbonizing at a temperature equal to or higher than a second temperature that is lower than the first temperature.
摘要翻译：要解决的问题：提供容易再制造的衬底保持器。吸引和保持晶片W的旋转卡盘1具有：具有耐受等于或高于第一温度的耐热性的吸引板10; 密封构件11，其沿着吸引板10的上表面的外周部连续设置; 以及设置在位于密封构件11的内侧的吸引板10的上表面上的支撑构件12.密封构件11和支撑构件12通过紫外线硬化树脂在等于或高于低于第一温度的第二温度。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2013098371A Application processing device, application processing method, program, and computer storage medium 有权
标题翻译：应用处理设备，应用处理方法，程序和计算机存储介质
公开(公告)号：JP2013098371A
公开(公告)日：2013-05-20
申请号：JP2011240075
申请日：2011-11-01
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： ISHII TAKAYUKI , SAKAMOTO TAKAHIRO , KITANO TAKAHIRO
IPC分类号： H01L21/027 , B05C5/02 , B05C11/10 , B05D1/26
CPC分类号： H01L21/6715 , B05D1/005
摘要： PROBLEM TO BE SOLVED: To efficiently and uniformly apply a high-viscosity coating liquid onto a substrate.SOLUTION: An application nozzle 33 of a resist applying device 1 includes: a body portion 60 in which a storage chamber 62 for storing a resist liquid R is formed; a slit-like discharge port 61 which is formed in a lower surface of the body portion 60 and forms a resist liquid reservoir at a front end thereof due to surface tension of the resist liquid R; and a resist liquid channel 63 communicating with the storage chamber 62 and the discharge port 61. The resist applying device 1 includes a moving mechanism for moving the applying nozzle 33 and a wafer relatively in a vertical direction and a horizontal direction and a pressure adjusting mechanism 71 for adjusting a pressure in the storage chamber. The pressure adjusting mechanism 71 adjusts the pressure in the storage chamber 62 and keeps the pressure negative so that a discharge of the resist liquid R from the discharge port 61 is fixed while the applying nozzle 33 and the wafer are relatively moved to apply the resist liquid R to the wafer.
摘要翻译：要解决的问题：为了高效均匀地将高粘度涂布液施加到基板上。抗蚀剂涂敷装置1的涂布用喷嘴33包括：主体部60，形成有用于存储抗蚀剂液体R的储藏室62; 形成在主体部分60的下表面中并由于抗蚀剂液体R的表面张力而在其前端形成抗蚀液储存器的狭缝状排出口61; 以及与储存室62和排出口61连通的抗蚀剂液体通道63.抗蚀剂涂敷装置1包括用于在垂直方向和水平方向上相对移动施加喷嘴33和晶片的移动机构和压力调节机构 71，用于调节储存室中的压力。压力调节机构71调节储存室62中的压力并保持压力负值，使得在施加喷嘴33和晶片相对移动的同时从排出口61排出抗蚀剂液体R以施加抗蚀剂液体 R到晶圆。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2013084686A Deposition equipment, deposition method and recording medium 有权
标题翻译：沉积设备，沉积方法和记录介质
公开(公告)号：JP2013084686A
公开(公告)日：2013-05-09
申请号：JP2011222225
申请日：2011-10-06
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： TERADA SHOICHI , HIROSHIRO KOKICHI , NISHI TAKANORI , KITANO TAKAHIRO
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： B29C33/58 , B29C33/56 , B29C59/02
摘要： PROBLEM TO BE SOLVED: To provide a technique for, when supplying a deposition gas to a transfer pattern formation region on a surface of a template to form a releasing film, preventing the releasing film from being formed on a side face and a back face of the template.SOLUTION: Deposition equipment includes: a deposition gas supply unit for locally supplying a deposition gas to a transfer pattern formation region to form a releasing film; a purge fluid supply unit for supplying a purge fluid to an outside region formed around the transfer pattern formation region so as to be along an outer periphery of the transfer pattern formation region; and an exhaust unit for exhausting the inside of a region, to which the purge fluid is supplied, in the outside region so as to be along the outer periphery of the transfer pattern formation region, to remove the purge fluid traveling toward the transfer pattern formation region in the outside region and the excessive deposition gas traveling from the transfer pattern formation region toward a side face of a template. This structure prevents the gas from entering the side face.
摘要翻译：要解决的问题：为了提供一种技术，当向模板表面上的转印图案形成区域供应沉积气体以形成脱模膜时，防止在侧面上形成剥离膜，并且模板的背面。沉积设备包括：沉积气体供应单元，用于将沉积气体局部供应到转印图案形成区域以形成释放膜; 吹扫流体供给单元，用于将清洗流体供给到形成在转印图案形成区域周围的外部区域，以沿着转印图案形成区域的外周; 以及排气单元，用于沿着沿着转印图案形成区域的外周排出向外部区域供给吹扫流体的区域的内部，以去除朝向转印图案形成行进的净化流体区域和从转印图案形成区域向模板的侧面行进的过多的沉积气体。这种结构防止气体进入侧面。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2012227318A Substrate processing method, program, computer storage medium, substrate processing apparatus and imprint system 审中-公开
标题翻译：基板处理方法，程序，计算机存储介质，基板处理设备和印刷系统
公开(公告)号：JP2012227318A
公开(公告)日：2012-11-15
申请号：JP2011092765
申请日：2011-04-19
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： HIROSHIRO KOKICHI , NISHI TAKANORI , TERADA SHOICHI , KITANO TAKAHIRO
IPC分类号： H01L21/027 , B05C9/12 , B05C11/08 , B29C39/10 , B29C59/02
摘要： PROBLEM TO BE SOLVED: To effectively form a coating film on a substrate to improve throughput of substrate processing.SOLUTION: In a wafer processing apparatus, ultraviolet light is radiated on a surface Wof a wafer W to clean the surface W(FIG. 18(a)); subsequently, an adherence agent B is coated on the whole area of the surface Wof the wafer W (FIG. 18(b)); the adherence agent B is burned (FIG. 18(c)); subsequently, the adherence agent B is rinsed and an adhesion film Bis deposited on the wafer W (FIG. 18(d)); subsequently, a resist solution R having a photoinitiator is coated on the adhesion film Bof the wafer W (FIG. 18(e)); subsequently, ultraviolet of a predetermined amount of light is radiated on the resist solution R on the wafer W to make the resist solution R be in a semi-cured state such that the resist solution R does not spread and cohere on the wafer W; and a semi-cured resist film Ris deposited on the wafer (FIG. 18(f)).
摘要翻译：要解决的问题：为了有效地在基板上形成涂膜以提高基板处理的生产率。解决方案：在晶片处理设备中，将紫外光照射在晶片W的表面W 1 上以清洁表面W 1 （图18（a））; 随后，在晶片W的表面W 1 的整个区域上涂覆粘附剂B（图18（b））; 粘附剂B燃烧（图18（c））; 随后，漂洗粘附剂B，并且在晶片W上沉积粘附膜B（SB（18））以形成粘合膜（图18（d））。随后，将具有光引发剂的抗蚀剂溶液R涂覆在晶片W的粘合膜B F 上（图18（e））; 随后，将预定量的光的紫外线照射在晶片W上的抗蚀剂溶液R上，以使抗蚀剂溶液R处于半固化状态，使得抗蚀剂溶液R不会在晶片W上扩散和粘结; 并将半固化的抗蚀剂膜R F 沉积在晶片上（图18（f））。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2012146850A Electrode manufacturing device, electrode manufacturing method, program, and computer storage medium 有权
标题翻译：电极制造装置，电极制造方法，程序和计算机存储介质
公开(公告)号：JP2012146850A
公开(公告)日：2012-08-02
申请号：JP2011004733
申请日：2011-01-13
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： FUKUOKA TETSUO , TERADA KAZUO , KITANO TAKAHIRO
IPC分类号： H01G11/00 , H01G11/06 , H01G11/22 , H01G11/84 , H01G11/86 , H01G13/00 , H01M4/04 , H01M4/139
CPC分类号： Y02E60/13
摘要： PROBLEM TO BE SOLVED: To appropriately and efficiently form an active material layer on a surface of a belt-like substrate when manufacturing an electrode.SOLUTION: An electrode manufacturing device comprises an unwind roll 10 unwinding a belt-like metal foil M, a coating part 11 coating an active material compound on both sides of the metal foil M, a dehydration part 12 dehydrating the active material compound coated on the metal foil M to form an active material layer, and a wind roll 13 winding the metal foil M. The dehydration part 12 is arranged in line in a length direction of the metal foil M and includes a plurality of LEDs 30 emitting infrared rays. The dehydration part 12 is divided into a plurality of regions Ta, Tb, Tc. A peak emission wavelength of the LED 30 in one of the regions Ta, Tb, Tc is set, with respect to a film thickness of water in the active material compound in the one of the regions Ta, Tb, Tc, at a wavelength of the infrared ray within a range in which the active material compound does not boil and at a wavelength in which an infrared ray absorption ratio of water becomes maximum.
摘要翻译：要解决的问题：在制造电极时，在带状基板的表面上适当且有效地形成活性物质层。解决方案：电极制造装置包括展开带状金属箔M的展开辊10，在金属箔M的两侧涂覆活性物质化合物的涂布部11，使活性物质化合物脱水的脱水部12 涂覆在金属箔M上以形成活性物质层，以及缠绕金属箔M的卷绕辊13.脱水部分12在金属箔M的长度方向上成直线排列，并且包括发射红外线的多个LED 30 射线。脱水部12被分割为多个区域Ta，Tb，Tc。在区域Ta，Tb，Tc中的一个区域中的LED 30的峰值发射波长相对于区域Ta，Tb，Tc中的一个区域中的活性物质化合物中的水的膜厚设定为波长活性物质化合物不沸腾的范围内的红外线和水的红外线吸收倍数变得最大的波长。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2012038868A Vaporizer, substrate processing apparatus, coating development apparatus and substrate processing method 有权
标题翻译：蒸发器，基板处理装置，涂层开发装置和基板处理方法
公开(公告)号：JP2012038868A
公开(公告)日：2012-02-23
申请号：JP2010176703
申请日：2010-08-05
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： ITO KAZUHIKO , KITANO TAKAHIRO , FUKUOKA TETSUO , ISHII TAKAYUKI
IPC分类号： H01L21/027
CPC分类号： C23C16/52 , G03F7/16 , G03F7/162 , H01L21/67253
摘要： PROBLEM TO BE SOLVED: To provide a vaporizer capable of readily detecting whether or not a substrate is supplied with a process gas produced by vaporizing a liquid agent, and to provide a substrate processing apparatus with the vaporizer, a coating development apparatus with the substrate processing apparatus, and a substrate processing method.SOLUTION: The vaporizer herein disclosed comprises: a heating plate placed in a chamber for heating and vaporizing a liquid agent; a gas supply part operable to supply, into the chamber, a carrier gas which carries the agent vaporized by the heating plate; a first detector operable to detect the supply of the carrier gas into the chamber; and a second detector operable to detect the vaporization of the liquid agent by the heating plate.
摘要翻译：要解决的问题：提供一种能够容易地检测基板是否被供给通过汽化液体试剂而产生的处理气体的蒸发器，并且提供具有蒸发器的基板处理装置，具有基板处理装置和基板处理方法。解决方案：本文公开的蒸发器包括：放置在用于加热和蒸发液体试剂的室中的加热板; 气体供给部件，其可操作以向所述腔室供应承载由所述加热板蒸发的试剂的载气; 第一检测器，其可操作以检测载气进入所述室的供应; 以及第二检测器，其可操作以检测所述加热板对所述液体试剂的蒸发。版权所有（C）2012，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式