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1. 发明授权

US5663557A Multiple rotating absolute encoder capable of accurately latching absolute address data with data on number of rotations 失效
标题翻译：多旋转绝对编码器能够精确地将绝对地址数据与转数数据进行锁存
公开(公告)号：US5663557A
公开(公告)日：1997-09-02
申请号：US501651
申请日：1995-07-12
申请人： Tohru Morita , Kou Ohno , Motokatsu Imai , Yuuji Yamazaki
发明人： Tohru Morita , Kou Ohno , Motokatsu Imai , Yuuji Yamazaki
IPC分类号： G01D5/14 , G01D5/16 , G01D5/244 , G01D5/245 , G01D5/249 , G01D5/347 , G01D5/34
CPC分类号： G01D5/145 , G01D5/2455 , G01D5/34792
摘要： A disclosed multiple rotating absolute encoder comprises an encoding plate with a first pattern and a second pattern formed thereon, a first detection unit for reading the first pattern and outputting an information in one rotation of the encoding plate, a second detection unit for reading the second pattern and outputting a first rotation information of the encoding plate, a calculation unit for calculating a second rotation data based on the information in one rotation and the first rotation data, a selection unit for monitoring a rotation speed of the encoding plate and selecting either the first rotation data or the second rotation data in accordance with the rotation speed, and a data calculation unit for calculating rotation information of the encoding plate on the basis of either the first rotation data or the second rotation data selected by the selection unit and the information in one rotation.
摘要翻译：公开的多旋转绝对编码器包括：编码板，其具有形成在其上的第一图案和第二图案;第一检测单元，用于读取第一图案并在编码板的一个旋转中输出信息;第二检测单元，用于读取第二图案输出编码板的第一旋转信息，计算单元，用于基于一个旋转中的信息计算第二旋转数据和第一旋转数据;选择单元，用于监视编码板的转速，并选择根据旋转速度的第一旋转数据或第二旋转数据，以及数据计算单元，用于基于由选择单元选择的第一旋转数据或第二旋转数据以及信息来计算编码板的旋转信息在一个旋转。

2. 发明授权

US06107621A Modular encoder and method of manufacturing the same 有权
标题翻译：模块化编码器及其制造方法
公开(公告)号：US06107621A
公开(公告)日：2000-08-22
申请号：US77115
申请日：1999-07-29
申请人： Motokatsu Imai , Kou Ohno , Yasuhiko Hashimoto , Shigeki Yamauchi
发明人： Motokatsu Imai , Kou Ohno , Yasuhiko Hashimoto , Shigeki Yamauchi
IPC分类号： G01D5/36 , G01D5/347 , G01D11/24 , G01P3/486 , G01D5/34
CPC分类号： G01D5/34707 , G01D11/24 , G01D5/3473
摘要： Each component of a modular encoder can be formed so as to be fixed to a rotary shaft of a rotating unit in a horizontal direction (a direction of a shaft line of a rotary shaft). Consequently, the modular encoder can easily be assembled and fixed, and reliability of fixation can be enhanced at the same time. In addition, the modular encoder has an elliptical shape so that a size thereof can be reduced in a direction in which a dimension should be decreased. Furthermore, if the holding member is rotatably fitted in the locking member in such a manner that the holding member can be rotated around the rotary shaft of the rotating unit, a sign plate can easily be aligned.
摘要翻译： PCT No.PCT / JP97 / 00736 Sec。 371日期1999年7月29日第 102（e）1999年7月29日PCT 1997年3月6日PCT公布。出版物WO97 / 33142 日期1997年9月12日模块化编码器的每个部件可以形成为在水平方向（旋转轴的轴线方向）上固定到旋转单元的旋转轴。因此，可以容易地组装和固定模块化编码器，同时可以提高固定的可靠性。此外，模块化编码器具有椭圆形状，使得其尺寸可以在尺寸应该减小的方向上减小。此外，如果保持构件以使得保持构件能够围绕旋转单元的旋转轴旋转的方式可旋转地装配在锁定构件中，则可以容易地对准符号板。

3. 发明申请

US20060139614A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20060139614A1
公开(公告)日：2006-06-29
申请号：US11297324
申请日：2005-12-09
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

4. 发明授权

US08208117B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US08208117B2
公开(公告)日：2012-06-26
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

5. 发明申请

US20090015808A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US20090015808A1
公开(公告)日：2009-01-15
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

6. 发明申请

US20070002299A1 Exposure apparatus, exposure method, and device fabrication method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20070002299A1
公开(公告)日：2007-01-04
申请号：US11407210
申请日：2006-04-20
申请人： Motokatsu Imai , Susumu Makinouchi
发明人： Motokatsu Imai , Susumu Makinouchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.
摘要翻译：曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。在浸渍区域的外周形成有能够将一部分液体保持在基板上的备用浸渍区域。可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离基质。

7. 发明授权

US08272544B2 Exposure apparatus, exposure method, and device fabrication method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08272544B2
公开(公告)日：2012-09-25
申请号：US13064361
申请日：2011-03-21
申请人： Motokatsu Imai , Susumu Makinouchi
发明人： Motokatsu Imai , Susumu Makinouchi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.
摘要翻译：曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。在浸渍区域的外周形成有能够将一部分液体保持在基板上的备用浸渍区域。可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离基质。

8. 发明授权

US07932996B2 Exposure apparatus, exposure method, and device fabrication method 有权
公开(公告)号：US07932996B2
公开(公告)日：2011-04-26
申请号：US11407210
申请日：2006-04-20
申请人： Motokatsu Imai , Susumu Makinouchi
发明人： Motokatsu Imai , Susumu Makinouchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.

9. 发明申请

US20090015816A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20090015816A1
公开(公告)日：2009-01-15
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

10. 发明授权

US5252825A Absolute encoder using interpolation to obtain high resolution 失效
标题翻译：绝对编码器采用插补获得高分辨率
公开(公告)号：US5252825A
公开(公告)日：1993-10-12
申请号：US728269
申请日：1991-07-11
申请人： Motokatsu Imai , Koh Ohno , Tsuyoshi Matsumoto
发明人： Motokatsu Imai , Koh Ohno , Tsuyoshi Matsumoto
IPC分类号： G01D5/249 , H03M1/14 , H03M1/26 , H03M1/30 , G01D5/34
CPC分类号： H03M1/143 , H03M1/203 , H03M1/26 , H03M1/30 , H03M1/303
摘要： An absolute encoder device comprises a code plate having a 1-track type absolute pattern whose minimum reading unit length is .lambda., a first incremental pattern with a pitch .lambda., and a second incremental pattern with pitch 2.sup.-n .lambda.. The device also comprises a detector section, which is movable relative to the code plate, which includes a detector detecting the absolute pattern and obtaining an absolute pattern signal, a detector detecting a first incremental pattern and obtaining a first incremental signal, and a detector detecting a second incremental pattern and obtaining a second incremental pattern signal. A shorter cyclic incremental signal is generated from the first incremental signal by interpolating and the shorter cyclic signal is synchronized with the second incremental signal. The absolute pattern signal, the second incremental signal and the synchronized first incremental signal represent the relative positional relationship between the code plate and the detector section.
摘要翻译：绝对编码器装置包括具有最小读取单位长度为λ的1-轨道型绝对图案的代码板，具有间距λ的第一增量图案和具有间距2-nλ的第二增量图案。该装置还包括可相对于码板移动的检测器部分，其包括检测绝对图案并获得绝对图案信号的检测器，检测第一增量图案并获得第一增量信号的检测器，以及检测器检测第二增量模式并获得第二增量模式信号。通过内插从第一增量信号产生较短的循环增量信号，并且较短的循环信号与第二增量信号同步。绝对模式信号，第二增量信号和同步的第一增量信号表示代码板和检测器部分之间的相对位置关系。

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