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1. 发明申请

US20090015816A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20090015816A1
公开(公告)日：2009-01-15
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

2. 发明申请

US20060139614A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20060139614A1
公开(公告)日：2006-06-29
申请号：US11297324
申请日：2005-12-09
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

3. 发明授权

US08208117B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US08208117B2
公开(公告)日：2012-06-26
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

4. 发明申请

US20090015808A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US20090015808A1
公开(公告)日：2009-01-15
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

5. 发明授权

US08384880B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US08384880B2
公开(公告)日：2013-02-26
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58 , G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

6. 发明申请

US20060227312A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 审中-公开
公开(公告)号：US20060227312A1
公开(公告)日：2006-10-12
申请号：US11448927
申请日：2006-06-08
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

7. 发明授权

US07483119B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US07483119B2
公开(公告)日：2009-01-27
申请号：US11297324
申请日：2005-12-09
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hiroyuki Nagasaka
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hiroyuki Nagasaka
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
摘要翻译：在通过投影光学系统和液体将图案的图像投影到基板上以暴露基板之后，对基板的侧表面和下表面进行拒水处理。通过这样的结构，可以防止曝光在基板的边缘区域曝光的曝光方法，从而可以防止在液浸区域形成良好且从液体流出到基板载台外部的状态下进行曝光被提供。

8. 发明授权

US06342941B1 Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method 失效
标题翻译：曝光装置和方法在曝光前预热面罩; 在曝光之前预热面罩的传送方法; 以及根据曝光装置和方法制造装置的装置制造系统和方法
公开(公告)号：US06342941B1
公开(公告)日：2002-01-29
申请号：US09505143
申请日：2000-02-15
申请人： Masahiro Nei , Kenichiro Kaneko , Hiroki Tateno , Jiro Inoue , Naomasa Shiraishi
发明人： Masahiro Nei , Kenichiro Kaneko , Hiroki Tateno , Jiro Inoue , Naomasa Shiraishi
IPC分类号： G03B2768
CPC分类号： G03F7/70691 , G03F7/70433 , G03F7/70875
摘要： A method and apparatus for exposing an image of a pattern formed in a mask onto a sensitive substrate. The mask is irradiated with an irradiation light. Data is computed relating to the thermal expansion saturation point of the mask due to absorption of the irradiation light. The mask is expanded to the thermal expansion saturation point based on the computed data, and the image of the mask pattern is exposed onto the sensitive substrate.
摘要翻译：一种用于将形成在掩模中的图案的图像曝光到敏感基板上的方法和装置。用照射光照射面罩。计算由于照射光的吸收而导致的掩模的热膨胀饱和点的数据。基于计算出的数据将掩模扩展到热膨胀饱和点，并且将掩模图案的图像暴露在敏感基板上。

9. 发明授权

US08025320B2 Latch device 有权
标题翻译：锁存装置
公开(公告)号：US08025320B2
公开(公告)日：2011-09-27
申请号：US11826606
申请日：2007-07-17
申请人： Jiro Inoue , Aya Morokata
发明人： Jiro Inoue , Aya Morokata
IPC分类号： E05C3/06
CPC分类号： E05B85/26 , E05B81/20 , Y10S292/23 , Y10T292/1047 , Y10T292/1082 , Y10T292/243
摘要： A latch is disposed turnably on a side door and becomes in a state of engaging with a striker disposed on a vehicle body. A ratchet engages with the latch by an engaging operation, and releases the engaging state by a disengaging operation. An open lever performs a door opening operation by the opening operation of an operating handle. A lever member is in contact with the latch in the engaging state, and excessively oscillates the latch in the direction of a closing operation, by which the engaging state between the latch and the ratchet is released during the time from the opening operation of the operating handle to the disengaging operation of the ratchet.
摘要翻译：闩锁可转动地设置在侧门上并变成与设置在车体上的撞针接合的状态。棘轮通过接合操作与闩锁接合，并且通过分离操作释放接合状态。打开的杠杆通过操作手柄的打开操作执行开门操作。杠杆构件在接合状态下与闩锁接触，并且使闩锁在关闭操作的方向上过度地摆动，由此在操作的打开操作期间释放闩锁和棘轮之间的接合状态处理棘轮的分离操作。

10. 发明授权

US07780207B2 Automotive door latch system 有权
标题翻译：汽车门锁系统
公开(公告)号：US07780207B2
公开(公告)日：2010-08-24
申请号：US11224136
申请日：2005-09-13
申请人： Shingo Gotou , Shintaro Okawa , Osamu Hamaguchi , Jiro Inoue
发明人： Shingo Gotou , Shintaro Okawa , Osamu Hamaguchi , Jiro Inoue
IPC分类号： E05B3/00 , E05C3/06
CPC分类号： E05B79/20 , E05B81/14 , E05B81/90 , Y10S292/23 , Y10S292/42 , Y10T292/1047 , Y10T292/1082 , Y10T292/57
摘要： A door latch system of a motor vehicle comprises a latch unit mounted to the vehicle body. The latch unit has a latch condition to latch the door at a closed position and an unlatch condition to unlatch the door thereby to release the door. The system further comprises a power latch canceling mechanism mounted to the vehicle body. The power latch canceling mechanism includes an actuator that, when energized, enforcedly causes the latch unit to assume the unlatch condition. The system further comprises a manual latch canceling mechanism mounted to the vehicle body. The manual latch canceling mechanism includes a handle member that is placed at a position other than a vehicle cabin of the vehicle and a power transmitting member that transmits a movement of the handle member to the latch unit. The manual latch canceling mechanism causes the latch unit to assume the unlatch condition when the handle member is manipulated.
摘要翻译：机动车辆的门闩系统包括安装到车体的闩锁单元。闩锁单元具有闩锁状态以将门闩在闭合位置和解锁状态以解锁门，从而释放门。该系统还包括安装在车身上的动力锁定器取消机构。电源锁存器取消机构包括致动器，当致动器时，致动器强制地使闩锁单元处于解锁状态。该系统还包括安装到车体上的手动锁定器取消机构。手动闩锁解除机构包括放置在车辆的车厢以外的位置的把手构件和将把手构件的移动传递到闩锁单元的动力传递构件。当手柄构件被操纵时，手动闩锁取消机构使闩锁单元呈现解锁状态。

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