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1. 发明专利

IL223536D0 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE AND OPTICAL PART 未知
公开(公告)号：IL223536D0
公开(公告)日：2013-02-03
申请号：IL22353612
申请日：2012-12-09
申请人： NIKON CORP , HITOSHI ISHIZAWA , HIROYUKI NAGASAKA , HIROAKI TAKAIWA , SHIGERU HIRUKAWA , RYUICHI HOSHIKA
IPC分类号： G03F7/20 , H01L20060101 , H01L21/027
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

2. 发明专利

IL176057D0 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART 未知
公开(公告)号：IL176057D0
公开(公告)日：2006-10-05
申请号：IL17605706
申请日：2006-05-31
申请人： NIKON CORP , HITOSHI ISHIZAWA , HIROYUKI NAGASAKA , HIROAKI TAKAIWA , SHIGERU HIRUKAWA , RYUICHI HOSHIKA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

3. 发明授权

US09041901B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US09041901B2
公开(公告)日：2015-05-26
申请号：US12318574
申请日：2008-12-31
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.

4. 发明授权

US08488101B2 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position 有权
标题翻译：浸渍曝光装置和方法，其检测由曝光位置到卸载位置的基板台上保持的基板上的残留液体
公开(公告)号：US08488101B2
公开(公告)日：2013-07-16
申请号：US13067867
申请日：2011-06-30
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table.
摘要翻译：光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影光学系统，向投影光学系统和基板之间的空间供应液体的液体供应部件，以及液体检测器，其在暴露的基板从衬底台卸载之前检测残留在暴露的衬底的表面上的液体。

5. 发明申请

US20110261331A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110261331A1
公开(公告)日：2011-10-27
申请号：US13067867
申请日：2011-06-30
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table.
摘要翻译：光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影光学系统，向投影光学系统和基板之间的空间供应液体的液体供应部件，以及液体检测器，其在暴露的基板从衬底台卸载之前检测残留在暴露的衬底的表面上的液体。

6. 发明授权

US07826031B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US07826031B2
公开(公告)日：2010-11-02
申请号：US11606935
申请日：2006-12-01
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

7. 发明授权

US07486380B2 Wafer table for immersion lithography 有权
标题翻译：用于浸没光刻的晶圆台
公开(公告)号：US07486380B2
公开(公告)日：2009-02-03
申请号：US11606913
申请日：2006-12-01
申请人： Andrew J Hazelton , Hiroaki Takaiwa
发明人： Andrew J Hazelton , Hiroaki Takaiwa
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70975 , G03F7/70341 , G03F7/707 , G03F7/70716 , Y10T29/49826
摘要： Methods and apparatus allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system. According to one example, an exposure apparatus includes a lens and a wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.
摘要翻译：方法和装置允许液体基本上容纳在浸没式光刻系统的透镜和晶片台组件之间。根据一个示例，曝光装置包括透镜和晶片台组件。晶片台组件具有顶表面，并且被布置成支撑晶片相对于透镜以及至少一个部件移动。晶片的顶表面和部件的顶表面各自与晶片台组件的顶表面基本相同的高度。包括晶片的顶表面，晶片台组件的顶表面和至少一个部件的顶表面的晶片台组件的整个顶表面基本上是平面的。

8. 发明申请

US20070242242A1 Exposure Apparatus, Exposure Method, Method for Producing Device, and Optical Part 有权
标题翻译：曝光装置，曝光方法，制造装置和光学部件的方法
公开(公告)号：US20070242242A1
公开(公告)日：2007-10-18
申请号：US10581307
申请日：2004-12-03
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/42 , G01N21/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），具有防液平面（30A）的板构件（30）可替换地设置在基板台（PT）上，以防止液体保留，保持良好的曝光精度。

9. 发明申请

US20070171391A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20070171391A1
公开(公告)日：2007-07-26
申请号：US11709856
申请日：2007-02-23
申请人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
发明人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03F7/26 , G03B27/42
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/7075 , Y10S430/146
摘要： An exposure system includes an exposure section for irradiating a formed resist film with exposing light through a mask with an immersion liquid provided on the resist film, and a drying section for drying a surface of the resist film after irradiation.
摘要翻译：曝光系统包括曝光部分，用于用设置在抗蚀剂膜上的浸渍液体通过掩模曝光光照射形成的抗蚀剂膜;以及干燥部，用于在照射后干燥抗蚀剂膜的表面。

10. 发明申请

US20070159609A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070159609A1
公开(公告)日：2007-07-12
申请号：US10587268
申请日：2005-01-28
申请人： Hiroaki Takaiwa , Takashi Horiuchi
发明人： Hiroaki Takaiwa , Takashi Horiuchi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/7085 , G03F7/70916
摘要： An exposure apparatus for exposing a substrate by emitting exposure light thereto through a projection optical system and liquid, has a detection apparatus that detects whether the liquid is present on an object disposed lower than a front end of the projection optical system. Another detection apparatus has an emitting portion that emits detection light to an immersion area between the projection optical system and an object disposed on an image plane side thereof, and a light-receiving portion disposed at a predetermined position for the detection light; therein, at least one of size and shape of the immersion area is obtained based on light receiving results. The detection apparatus is used to detect the presence of liquid on such lower-disposed object, the state of the immersion area, or shape or contact angle of the liquid. Optimal measures are taken, based on detection results, for maintaining high exposure and measurement accuracies.
摘要翻译：一种用于通过投影光学系统和液体向其发射曝光的曝光基板的曝光装置，具有检测装置，其检测液体是否存在于投影光学系统的前端下方的物体上。另一种检测装置具有发射部分，其向投影光学系统和设置在其图像平面侧的物体之间的浸没区域发射检测光;以及光接收部分，设置在用于检测光的预定位置; 其中，基于光接收结果获得浸渍区域的尺寸和形状中的至少一个。该检测装置用于检测这种下位物体上的液体的存在，浸渍区域的状态，或液体的形状或接触角。基于检测结果，采取最佳措施，保持高曝光和测量精度。

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