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1. 发明申请

US20120196227A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, PATTERNING PROCESS, AND ACID-DECOMPOSABLE KETO ESTER COMPOUND 有权
标题翻译：化学放大正电阻组合物，花纹过程和酸分解酮酸酯化合物
公开(公告)号：US20120196227A1
公开(公告)日：2012-08-02
申请号：US13362445
申请日：2012-01-31
申请人： Takeru WATANABE , Tomohiro KOBAYASHI , Katsuya TAKEMURA , Jun HATAKEYAMA
发明人： Takeru WATANABE , Tomohiro KOBAYASHI , Katsuya TAKEMURA , Jun HATAKEYAMA
IPC分类号： G03F7/20 , C07J9/00 , G03F7/004
CPC分类号： G03F7/0397 , C07J9/005 , G03F7/0045 , G03F7/0392
摘要： A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER.
摘要翻译：化学放大阳性抗蚀剂组合物包含不溶于碱性显影剂的类固醇骨架的酸可分解的酮酯化合物，但在酸的作用下可溶于碱性显影剂。将组合物暴露于EB，深UV或EUV并开发以形成具有高分辨率和改进的LER的图案。

2. 发明申请

US20100112482A1 FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：环状结构的聚合单体，聚合物，耐腐蚀保护涂料组合物，耐腐蚀组合物和图案处理
公开(公告)号：US20100112482A1
公开(公告)日：2010-05-06
申请号：US12608556
申请日：2009-10-29
申请人： Takeru WATANABE , Satoshi SHINACHI , Takeshi KINSHO , Koji HASEGAWA , Yuji HARADA , Jun HATAKEYAMA , Kazunori MAEDA , Tomohiro KOBAYASHI
发明人： Takeru WATANABE , Satoshi SHINACHI , Takeshi KINSHO , Koji HASEGAWA , Yuji HARADA , Jun HATAKEYAMA , Kazunori MAEDA , Tomohiro KOBAYASHI
IPC分类号： G03F7/004 , C07D307/04 , C07D319/06 , C07D315/00 , C07D307/77 , C08F114/18 , C08F214/18 , C08L27/12 , C08K5/06 , G03F7/20
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
摘要翻译：环状缩醛结构的氟化单体具有式（1），其中R是可以被卤素取代或被氧或羰基分离的C1-C20烷基，Z是与亚烷氧基形成环的二价有机基团，并含有可聚合不饱和基团。衍生自氟化单体的聚合物可赋予适当的防水性，水滑性，亲油性，酸性和水解性，并且可用于配制保护涂料组合物和抗蚀剂组合物。

3. 发明申请

US20090186307A1 HYDROGENATED RING-OPENING METATHESIS POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：氢化环开环聚合物，耐腐蚀组合物和图案处理
公开(公告)号：US20090186307A1
公开(公告)日：2009-07-23
申请号：US12252123
申请日：2008-10-15
申请人： Tomohiro KOBAYASHI , Takashi Kinsho , Takeru Watanabe , Tadahiro Sunaga , Yuichi Okawa
发明人： Tomohiro KOBAYASHI , Takashi Kinsho , Takeru Watanabe , Tadahiro Sunaga , Yuichi Okawa
IPC分类号： G03F7/20 , C08F224/00
CPC分类号： G03F7/0395 , C08G61/08 , Y10S430/106
摘要： Resist compositions comprising a hydrogenated ring-opening metathesis polymer bearing an alicyclic structure in its backbone and comprising structural units having an oxygen atom incorporated as part of the cyclic structure exhibit a high resolution and minimal proximity bias upon ArF excimer laser lithography and have high etching resistance.
摘要翻译：包含在其主链上带有脂环结构的氢化开环复分解聚合物的抗蚀剂组合物并且包括具有作为环状结构的一部分结合的氧原子的结构单元在ArF准分子激光平版印刷法上表现出高分辨率和最小的邻近偏压，并具有高耐蚀刻性。

4. 发明申请

US20090011365A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20090011365A1
公开(公告)日：2009-01-08
申请号：US12167151
申请日：2008-07-02
申请人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/20 , G03C1/00
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/11 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing α-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.
摘要翻译：对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，加入含有氨基的重复单元和含有α-三氟甲基羟基作为添加剂的重复单元的共聚物。该组合物适用于浸没光刻。

5. 发明申请

US20120308930A1 PATTERNING PROCESS AND RESIST COMPOSITION 有权
标题翻译：绘图工艺和耐腐蚀组合物
公开(公告)号：US20120308930A1
公开(公告)日：2012-12-06
申请号：US13482650
申请日：2012-05-29
申请人： Jun HATAKEYAMA , Tomohiro KOBAYASHI
发明人： Jun HATAKEYAMA , Tomohiro KOBAYASHI
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/004 , G03F7/0046 , G03F7/0382 , G03F7/039 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2004 , G03F7/2006 , G03F7/2008 , G03F7/2022 , G03F7/2041 , G03F7/325 , G03F7/38 , G03F7/70466
摘要： A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units having an acid labile group-substituted carboxyl group and/or hydroxy group and recurring units having an oxirane or oxetane ring, an acid generator, and an organic solvent displays a high dissolution contrast in organic solvent development and controlled acid diffusion. A fine hole pattern featuring good size control can be formed.
摘要翻译：通过将抗蚀剂组合物施加到基材上，预烘烤，暴露于高能辐射，烘烤（PEB）和在有机溶剂显影剂中显影曝光的抗蚀剂膜以溶解抗蚀剂膜的未曝光区域来形成负图案。包含具有酸不稳定基团取代的羧基和/或羟基的重复单元的聚合物和具有环氧乙烷或氧杂环丁烷环的重复单元，酸产生剂和有机溶剂的抗蚀剂组合物在有机溶剂显影中显示高溶解度对比度并控制酸扩散。可以形成具有良好尺寸控制的细孔图案。

6. 发明申请

US20080241736A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20080241736A1
公开(公告)日：2008-10-02
申请号：US12053292
申请日：2008-03-21
申请人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/12 , Y10S430/121
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译：对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，添加包含含有羧酸铵盐的重复单元和含有至少一个氟原子的重复单元作为添加剂的共聚物。该组合物适用于浸没光刻。

7. 发明申请

US20120135357A1 POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS 审中-公开
标题翻译：聚合物，阳性抗蚀剂组合物和方法
公开(公告)号：US20120135357A1
公开(公告)日：2012-05-31
申请号：US13303283
申请日：2011-11-23
申请人： Tomohiro KOBAYASHI , Takayuki Nagasawa , Ryosuke Taniguchi , Youichi Ohsawa , Kenji Funatsu , Seiichiro Tachibana
发明人： Tomohiro KOBAYASHI , Takayuki Nagasawa , Ryosuke Taniguchi , Youichi Ohsawa , Kenji Funatsu , Seiichiro Tachibana
IPC分类号： G03F7/20 , C08F214/18
CPC分类号： G03F7/2041 , C08K5/375 , C08K5/42 , C08L41/00 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A positive resist composition comprising a polymer comprising recurring units of a specific structure adapted to generate an acid upon exposure to high-energy radiation, recurring units of a lactone ring-containing structure, and acid labile units, all the recurring units being free of hydroxyl, can form a fine size pattern having a rectangular profile and improved collapse resistance.
摘要翻译：一种正性抗蚀剂组合物，其包含聚合物，其包含适于在暴露于高能量辐射时产生酸的特定结构的重复单元，含内酯环结构的重复单元和酸不稳定单元，所有重复单元不含羟基可以形成具有矩形轮廓和改进的抗倒塌性的精细尺寸图案。

8. 发明申请

US20080008959A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS 有权
标题翻译：积极的组合物和绘图过程
公开(公告)号：US20080008959A1
公开(公告)日：2008-01-10
申请号：US11773656
申请日：2007-07-05
申请人： Ryosuke TANIGUCHI , Tsunehiro NISHI , Tomohiro KOBAYASHI
发明人： Ryosuke TANIGUCHI , Tsunehiro NISHI , Tomohiro KOBAYASHI
IPC分类号： G03C1/10 , G03C5/38
CPC分类号： G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： In a positive resist composition comprising (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) a photoacid generator, component (A) is a polymer of formula (1) wherein R1 is H, methyl or trifluoromethyl, R2 and R3 are alkyl, R4 is a monovalent hydrocarbon group, X1 is O, S or CH2CH2, X2 is O, S, CH2 or CH2CH2, n is 1 or 2, a and b each are from 0.01 to less than 1, c, d1 and d2 each are from 0 to less than 1, and a+b+c+d1+d2=1. The resist composition forms a pattern with high rectangularity at an enhanced resolution when processed by ArF lithography.
摘要翻译：在包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）光酸产生剂的正型抗蚀剂组合物中，组分（A）是式（1）的聚合物，其中R 1是H，甲基或三氟甲基，R 2和R 3是烷基，R 4是一价烃基，X O，S或CH 2 CH 2，X 2是O，S，CH 2， 2或CH 2 CH 2，n为1或2，a和b各自为0.01至小于1，c，d1和d2各自为从0到小于1，a + b + c + d1 + d2 = 1。当通过ArF光刻处理时，抗蚀剂组合物以增强的分辨率形成具有高矩形性的图案。

9. 发明申请

US20090016000A1 PORTABLE ELECTRONIC DEVICE 审中-公开
标题翻译：便携式电子设备
公开(公告)号：US20090016000A1
公开(公告)日：2009-01-15
申请号：US12167710
申请日：2008-07-03
申请人： Tomohiro KOBAYASHI
发明人： Tomohiro KOBAYASHI
IPC分类号： H05K5/02
CPC分类号： G02F1/133308 , G02F2201/503 , G06F1/1626 , G06F1/1656 , H04M1/0266 , H04M1/185
摘要： Disclosed is a portable electronic device including: a display; a display holder for holding the display interiorly, the display holder being in the shape of a rectangle; anda housing for housing the display and the display holder in an internal space thereof, the housing being composed of an upper frame for holding the display holder and a lower frame to be fitted with the upper frame, the upper frame being in the shape of a rectangle and includes an opening for exposing the display outward; wherein the upper frame further includes a first portion shaped in concave/convex style in at least one end portion of the opening on an inner surface thereof, the end portion being arranged in longitudinal side along a short side of the upper frame, and the display holder includes a second portion shaped to be fitted with the first portion.
摘要翻译：公开了一种便携式电子设备，包括：显示器; 用于将显示器内部保持的显示器保持器，显示器保持器为矩形; 以及用于将所述显示器和所述显示器保持器容纳在其内部空间中的壳体，所述壳体由用于保持所述显示器保持器的上框架和与所述上框架配合的下框架构成，所述上框架形状为包括用于向外露出显示器的开口; 其中，所述上框架还包括在其内表面上的所述开口的至少一个端部中以凹/凸形式形成的第一部分，所述端部沿着所述上框架的短边布置在纵向侧，并且所述显示器保持器包括成形为与第一部分配合的第二部分。

10. 发明申请

US20120308932A1 POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS USING SAID CHEMICALLY AMPLIFIED RESIST COMPOSITION 有权
标题翻译：聚合物，化学放大电阻组合物和使用化学放大电阻组合物的图案处理
公开(公告)号：US20120308932A1
公开(公告)日：2012-12-06
申请号：US13476700
申请日：2012-05-21
申请人： Masayoshi SAGEHASHI , Youichi OHSAWA , Koji HASEGAWA , Tomohiro KOBAYASHI
发明人： Masayoshi SAGEHASHI , Youichi OHSAWA , Koji HASEGAWA , Tomohiro KOBAYASHI
IPC分类号： G03F7/20 , G03F7/004 , C08F228/02
CPC分类号： G03F7/2041 , C08F24/00 , C08F220/38 , G03F7/0045 , G03F7/0397 , G03F7/11 , G03F7/30 , Y10S430/111
摘要： There is disclosed a polymer having a repeating unit shown by the following general formula (1). There can be, in a photolithography using a high energy beam such as an ArF excimer laser beam and an EUV as a light source, (1) a polymer that gives a resist composition having an appropriate adhesion with a substrate and being capable of forming a pattern having excellent resolution, especially an excellent rectangular pattern profile, (2) a chemically amplified resist composition containing the said polymer, and (3) a patterning process using the said chemically amplified resist composition.
摘要翻译：公开了具有下述通式（1）所示的重复单元的聚合物。在使用诸如ArF准分子激光束和EUV作为光源的高能量光束的光刻中可以存在：（1）提供具有与基板的适当粘合性并且能够形成具有优异分辨率的图案，特别是优异的矩形图案，（2）含有所述聚合物的化学放大抗蚀剂组合物，和（3）使用所述化学放大抗蚀剂组合物的图案化工艺。

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