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1. 发明申请

US20100112482A1 FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：环状结构的聚合单体，聚合物，耐腐蚀保护涂料组合物，耐腐蚀组合物和图案处理
公开(公告)号：US20100112482A1
公开(公告)日：2010-05-06
申请号：US12608556
申请日：2009-10-29
申请人： Takeru WATANABE , Satoshi SHINACHI , Takeshi KINSHO , Koji HASEGAWA , Yuji HARADA , Jun HATAKEYAMA , Kazunori MAEDA , Tomohiro KOBAYASHI
发明人： Takeru WATANABE , Satoshi SHINACHI , Takeshi KINSHO , Koji HASEGAWA , Yuji HARADA , Jun HATAKEYAMA , Kazunori MAEDA , Tomohiro KOBAYASHI
IPC分类号： G03F7/004 , C07D307/04 , C07D319/06 , C07D315/00 , C07D307/77 , C08F114/18 , C08F214/18 , C08L27/12 , C08K5/06 , G03F7/20
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
摘要翻译：环状缩醛结构的氟化单体具有式（1），其中R是可以被卤素取代或被氧或羰基分离的C1-C20烷基，Z是与亚烷氧基形成环的二价有机基团，并含有可聚合不饱和基团。衍生自氟化单体的聚合物可赋予适当的防水性，水滑性，亲油性，酸性和水解性，并且可用于配制保护涂料组合物和抗蚀剂组合物。

2. 发明申请

US20090280434A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20090280434A1
公开(公告)日：2009-11-12
申请号：US12463751
申请日：2009-05-11
申请人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

3. 发明申请

US20090286182A1 RESIST PROTECTIVE COATING COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀涂料组合物和图案方法
公开(公告)号：US20090286182A1
公开(公告)日：2009-11-19
申请号：US12463750
申请日：2009-05-11
申请人： Yuji HARADA , Jun HATAKEYAMA , Koji HASEGAWA , Satoshi SHINACHI
发明人： Yuji HARADA , Jun HATAKEYAMA , Koji HASEGAWA , Satoshi SHINACHI
IPC分类号： G03F7/20 , C08F18/20 , G03F7/004
CPC分类号： G03F7/11 , C08F220/24 , C08F232/08 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl)acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second polymer containing sulfonic acid and/or sulfonic acid amine salt in repeat units is applied onto a resist film. The protective coating is effective in minimizing development defects and forming a resist pattern of improved profile.
摘要翻译：包含碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物作为基础聚合物的共聚物的保护性涂料组合物，任选地与含有重复单元的磺酸和/或磺酸胺盐的第二聚合物混合物施加到抗蚀膜保护涂层有效地使开发缺陷最小化并形成改进型材的抗蚀剂图案。

4. 发明申请

US20090208873A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：聚合物，耐腐蚀组合物和方法
公开(公告)号：US20090208873A1
公开(公告)日：2009-08-20
申请号：US12371455
申请日：2009-02-13
申请人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
IPC分类号： G03F7/20 , C08F118/02 , G03F7/039
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0392 , G03F7/0397
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
摘要翻译：通过使具有羟基部分被保护的六氟醇侧基的单体和具有酸不稳定基团的单体的共聚合得到的聚合物可用作浸渍光刻用光致抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出良好的拒水性和水滑动，并且产生很少的显影缺陷。

5. 发明申请

US20100266957A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20100266957A1
公开(公告)日：2010-10-21
申请号：US12761202
申请日：2010-04-15
申请人： Yuji HARADA , Jun Hatakeyama , Koji Hasegawa , Tomohiro Kobayashi
发明人： Yuji HARADA , Jun Hatakeyama , Koji Hasegawa , Tomohiro Kobayashi
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/2041
摘要： An additive polymer comprising recurring units of formula (1) is added to a resist composition comprising a base resin, a photoacid generator, and an organic solvent. R1 is hydrogen or methyl, R2 is alkylene or fluoroalkylene, and R3 is fluoroalkyl. The additive polymer is highly transparent to radiation with wavelength of up to 200 nm. Water repellency, water slip, acid lability, hydrolysis and other properties of the polymer may be adjusted by a choice of polymer structure.
摘要翻译：将包含式（1）的重复单元的添加剂聚合物加入到包含基础树脂，光致酸发生剂和有机溶剂的抗蚀剂组合物中。 R1是氢或甲基，R2是亚烷基或氟代亚烷基，R3是氟烷基。添加剂聚合物对波长高达200nm的辐射是高度透明的。通过选择聚合物结构可以调节聚合物的拒水性，水滑动性，酸性，水解性和其它性能。

6. 发明申请

US20110177455A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：聚合物，耐腐蚀组合物和方法
公开(公告)号：US20110177455A1
公开(公告)日：2011-07-21
申请号：US13006598
申请日：2011-01-14
申请人： Yuji HARADA , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
发明人： Yuji HARADA , Takeru Watanabe , Takeshi Sasami , Yuuki Suka , Koji Hasegawa
IPC分类号： G03F7/004 , C08F14/18 , C08F18/20 , G03F7/20
CPC分类号： C08F14/18 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/11 , G03F7/2041 , C08F2/00 , C08F220/24
摘要： A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.
摘要翻译：提供了包含式（1）的重复单元并且在碱性显影剂中具有在碱性显影剂的作用下增加的溶解度的聚合物。该聚合物对于高达200nm的辐射具有透明性，并且具有改善的防水性，水滑性，酸性和水解性，并且可用作配制抗蚀剂组合物的添加剂聚合物。 R1为H，F，甲基或三氟甲基，R2为单价氟化烃基，An为（n + 1）价烃基或氟化烃基，n为1,2或3。

7. 发明申请

US20100136486A1 RESIST PROTECTIVE COATING COMPOSITON AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀涂料组合物和方法
公开(公告)号：US20100136486A1
公开(公告)日：2010-06-03
申请号：US12628705
申请日：2009-12-01
申请人： Yuji HARADA , Jun Hatakeyama , Koji Hasegawa
发明人： Yuji HARADA , Jun Hatakeyama , Koji Hasegawa
IPC分类号： G03F7/20 , C08F214/18 , C08F218/14 , C08F218/02 , C08L27/12
CPC分类号： C09D127/12 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/30 , C08L33/16 , C09D125/18 , C09D133/16 , G03F7/0046 , G03F7/11 , G03F7/2041 , C08L2666/04 , C08F212/14 , C08F232/08 , C08F212/32
摘要： A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
摘要翻译：包含酰基保护的六氟醇结构的聚合物作为基础聚合物的保护性涂料组合物，任选地与含有重复单元的磺酸胺盐的第二聚合物的混合物施加到抗蚀剂膜上。保护涂层对波长高达200nm的辐射是透明的。

8. 发明申请

US20110305979A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS 审中-公开
标题翻译：耐腐顶层组合物和图案处理方法
公开(公告)号：US20110305979A1
公开(公告)日：2011-12-15
申请号：US13116853
申请日：2011-05-26
申请人： Yuji HARADA , Taku MORISAWA , Takeru WATANABE , Yuki SUKA
发明人： Yuji HARADA , Taku MORISAWA , Takeru WATANABE , Yuki SUKA
IPC分类号： G03F1/00 , C09D127/12 , C08K5/06 , G03F7/20
CPC分类号： G03F7/2041 , C08F220/20 , C08F220/22 , C08K5/05 , C08K5/06 , G03F7/11 , C08F222/1006 , C08F228/02
摘要： The invention provides a resist top coat composition wherein the composition contains polymer (P1-1) with a weight-average molecular weight of 1,000 to 500,000, having at least repeating units represented by the following general formulae (1a), (1b-1), and (1c). There can be a resist top coat composition having excellent water repellent and water sliding properties with fewer development defects and with a good resist pattern profile after development, and a patterning process using this composition.
摘要翻译：本发明提供一种抗蚀剂面漆组合物，其中组合物含有重均分子量为1,000至500,000的聚合物（P1-1），至少具有由以下通式（1a），（1b-1）表示的重复单元，，（1c）。可以使用具有优异的防水性和水滑动性的抗蚀剂面漆组合物，具有较少的显影缺陷和显影后的良好抗蚀剂图案轮廓，以及使用该组合物的图案化工艺。

9. 发明申请

US20080090172A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20080090172A1
公开(公告)日：2008-04-17
申请号：US11872952
申请日：2007-10-16
申请人： Jun HATAKEYAMA , Takao YOSHIHARA , Yuji HARADA , Wataru KUSAKI
发明人： Jun HATAKEYAMA , Takao YOSHIHARA , Yuji HARADA , Wataru KUSAKI
IPC分类号： G03C1/73 , G03C1/74 , G03F7/20
CPC分类号： G03F7/0397 , C08F220/10 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(═O)—O—, —O—, or —C(═O)—R20—C(═O)—O— wherein R20 is alkylene, 0≦(a-1)
摘要翻译：抗蚀剂组合物包含含有具有式（1）的重复单元的聚合物，其中R 1，R 4，R 7和R 4， 14是H或甲基，R 2，R 3，R 15和R 16，是H，烷基或氟烷基，R是F或H，R 5是亚烷基，R 6是氟化烷基，R 8是单键或亚烷基，R 10和R 11是H，F，甲基或三氟甲基，R 12和R 13 >是单键，-O-或-CR 18 R 19，R 9，R 18， R 19是H，F，甲基或三氟甲基，R 17是亚烷基，X 1，X 2，并且X 3是-C（-O）-O-，-O-或-C（-O）-R 20 -C（-O） - 其中R 20为亚烷基，0 <=（a-1）<1,0 <=（a-2）<1,0 <=（a-3）（a-1）+（a-2）+（a-3）<1,0

10. 发明申请

US20110006339A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110006339A1
公开(公告)日：2011-01-13
申请号：US12828422
申请日：2010-07-01
申请人： Kaoru UCHIDA , Kazuyuki SAWADA , Yuji HARADA
发明人： Kaoru UCHIDA , Kazuyuki SAWADA , Yuji HARADA
IPC分类号： H01L29/739 , H01L21/331
CPC分类号： H01L29/7393 , H01L29/063 , H01L29/66325
摘要： A lateral hybrid IGBT is provided including: a RESURF region which is an n-type dopant layer formed in a surface portion of a substrate 1 made of p-type Si; a base region which is a p-type dopant layer; an emitter/source region which is an n-type dopant layer with a high concentration; a collector region which is a p-type dopant layer with a low concentration and formed in the RESURF region; a drain region which is an n-type dopant layer with a high concentration and formed adjacent to the collector region but on another cross-section; a base connection region which is a p-type dopant layer with a high concentration; a gate insulator film; and a gate electrode, wherein the collector region is shallower than the drain region located on the other cross-section.
摘要翻译：提供一种横向混合IGBT，包括：RESURF区，其是在由p型Si制成的衬底1的表面部分中形成的n型掺杂剂层; 作为p型掺杂剂层的基极区域; 作为高浓度的n型掺杂剂层的发射极/源极区域; 作为在RESURF区域中形成的低浓度的p型掺杂剂层的集电极区域; 漏极区域，其是具有高浓度的n型掺杂剂层，并且形成在集电极区域附近但在另一截面上; 作为高浓度的p型掺杂剂层的基极连接区域; 栅极绝缘膜; 以及栅电极，其中所述集电极区域比位于另一截面上的漏极区域浅。

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