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1. 发明申请

US20070292610A1 Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel 审中-公开
标题翻译：成膜源，成膜装置，成膜方法，有机EL面板以及制造有机EL面板的方法
公开(公告)号：US20070292610A1
公开(公告)日：2007-12-20
申请号：US11723242
申请日：2007-03-19
申请人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
发明人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
IPC分类号： C23C16/448
CPC分类号： C23C14/24 , C23C14/545
摘要： It is an object of the invention to continuously perform, under a desired condition and for a long time period, a film formation process capable of producing a high quality film. A film formation apparatus comprises: a discharge outlet disposed within a film formation chamber and facing a film formation surface of a substrate; a material accommodating section disposed outside the film formation chamber and having material containers each containing a film formation material; a heating device for heating the film formation material contained within the material-containers; discharge passages which are air-tightly communicated with the discharge outlet and the material accommodating section; escape passages branching from the discharge passages for diverting the film formation material flowing towards the discharge outlet. On the downstream side of the branching positions of the discharge passages as well as on the escape passages, there are provided flow restricting valves capable of shutting off or passing the film formation material or variably adjusting the flow of the film formation material.
摘要翻译：本发明的目的是在期望的条件下和长时间内连续地进行能够生产高质量薄膜的成膜方法。一种成膜装置，包括：排出口，其配置在成膜室内，面对基板的成膜面; 材料容纳部，其设置在成膜室的外侧，并且具有各自容纳成膜材料的材料容器; 用于加热容纳在所述材料容器内的成膜材料的加热装置; 与排出口和材料容纳部气密地连通的排出通路; 从排放通道分支的排出通路用于转移朝向排出口流动的成膜材料。在排出通道的分支位置的下游侧以及排出通道上，设置有能够切断或通过成膜材料或可变地调节成膜材料的流动的流动限制阀。

2. 发明申请

US20050263074A1 Film formation source, vacuum film formation apparatus, organic EL panel and method of manufacturing the same 审中-公开
标题翻译：成膜源，真空成膜装置，有机EL面板及其制造方法
公开(公告)号：US20050263074A1
公开(公告)日：2005-12-01
申请号：US11139802
申请日：2005-05-31
申请人： Daisuke Masuda , Hirosi Abiko , Shigehiro Umetsu
发明人： Daisuke Masuda , Hirosi Abiko , Shigehiro Umetsu
IPC分类号： H05B33/10 , C23C14/12 , C23C14/24 , C23C16/00 , H01L51/00 , H01L51/50 , H01L51/56 , H05B33/14
CPC分类号： H01L51/001 , C23C14/12 , C23C14/243 , H01L51/0011 , H01L51/56 , Y10T428/10
摘要： A film formation source of a vacuum film formation apparatus for forming thin film on the film formation surface of a substrate comprises: a material accommodating unit containing a film formation material; heating means for heating the film formation material contained within the material accommodating unit; a film formation flow control unit provided at an emission outlet of the material accommodating unit for controlling the direction of the film formation flow. The film formation flow control unit provides a strong directivity to the film formation flow with respect to the moving direction of the film formation surface relative to the film formation source.
摘要翻译：用于在基板的成膜表面上形成薄膜的真空成膜装置的成膜源包括：包含成膜材料的材料容纳单元; 用于加热容纳在所述材料容纳单元内的成膜材料的加热装置; 成膜流量控制单元，设置在材料容纳单元的排出口处，用于控制成膜流动的方向。成膜流量控制单元相对于成膜源相对于成膜表面的移动方向对成膜流动提供强指向性。

3. 发明授权

US09420662B2 Light-emitting device 有权
标题翻译：发光装置
公开(公告)号：US09420662B2
公开(公告)日：2016-08-16
申请号：US14426121
申请日：2012-09-05
申请人： Shuichi Seki , Shigehiro Umetsu , Hiroki Tan , Katsuhiro Kanauchi
发明人： Shuichi Seki , Shigehiro Umetsu , Hiroki Tan , Katsuhiro Kanauchi
IPC分类号： H05B37/00 , H05B33/08 , H01L51/50 , H01L27/32 , H05B33/14
CPC分类号： H05B33/0896 , H01L27/3218 , H01L51/5036 , H01L51/504 , H01L2251/5361 , H05B33/0857 , H05B33/14
摘要： A light-emitting device (10) includes a first light-emitting region (100) and a second light-emitting region (200). The first light-emitting region (100) emits a light ray having a first color by making a first light-emitting layer group including at least two or more kinds of light-emitting layers emit light. In addition, the second light-emitting region (200) emits alight ray having the first color (for example, daylight color, natural white color, white color, warm white color, or incandescent color) by making a second light-emitting layer group including at least two or more kinds of light-emitting layers emit light. In addition, at least one kind of light-emitting layer included in the second light-emitting layer group emits a light ray having a different spectrum peak from all of the light-emitting layers included in the first light-emitting layer group. Therefore, the color-rendering properties of light emitted from the light-emitting device (10) are improved.
摘要翻译：发光装置（10）包括第一发光区域（100）和第二发光区域（200）。第一发光区域（100）通过使包括至少两种以上的发光层发光的第一发光层组发射具有第一颜色的光线。此外，第二发光区域（200）通过使第二发光区域（200）发射具有第一颜色（例如，日光颜色，天然白色，白色，暖白色或白炽色）包括至少两种以上的发光层发光。另外，包括在第二发光层组中的至少一种发光层从包括在第一发光层组中的所有发光层发射具有不同光谱峰值的光线。因此，提高了从发光装置（10）发射的光的显色性。

4. 发明申请

US20070176534A1 Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device 审中-公开
标题翻译：成膜源，真空成膜装置，有机EL元件的制造方法以及有机EL元件
公开(公告)号：US20070176534A1
公开(公告)日：2007-08-02
申请号：US11727773
申请日：2007-03-28
申请人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
发明人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
IPC分类号： B05D5/12 , H01J1/62
CPC分类号： C23C14/243 , H01L51/001 , H01L51/56
摘要： Film formation is conducted with a high level of directivity. A film formation source of a vacuum film formation apparatus, includes a material container for housing a film forming material, a heating unit for heating the film forming material inside the material container, and a rectifier provided at an ejection port of the material container. In this source, the rectifier includes a passage partitioned into fine openings, and a set directivity is obtained on the basis of the cross-sectional area Sa of each opening within the rectifier, the distance L from the ejection tip of the rectifier to the film formation target surface, and the film formation rate R for the film forming material at a point on the film formation target surface directly above the center of the rectifier.
摘要翻译：以高水平的方向性进行成膜。真空成膜装置的成膜源包括用于容纳成膜材料的材料容器，用于加热材料容器内部的成膜材料的加热单元和设置在材料容器的排出口处的整流器。在该源中，整流器包括分隔成细孔的通道，并且基于整流器内的每个开口的横截面积Sa，从整流器的喷射端到膜的距离L获得设定的方向性成膜靶表面，以及成膜材料在整流器中心正上方的成膜靶表面上的点的成膜速度R.

5. 发明申请

US20060045958A1 Film formation source, vacuum film formation apparatus, and method of manufacturing organic EL panel 审中-公开
标题翻译：成膜源，真空成膜装置以及有机EL面板的制造方法
公开(公告)号：US20060045958A1
公开(公告)日：2006-03-02
申请号：US11185788
申请日：2005-07-21
申请人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
发明人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
IPC分类号： B05D5/06 , C23C16/00
CPC分类号： C23C14/243 , C23C14/12
摘要： It is an object of the present invention to easily adjust the percentage of each component when mixing together several film formation materials, so as to prevent deviation among film formation areas. A film formation source of a vacuum film formation apparatus comprises: a plurality of material accommodating units containing a plurality of film formation materials; a plurality of heating means for heating the film formation materials contained within the material accommodating units; a plurality of discharge outlets for discharging atom flows or molecule flows of film formation materials; a plurality of discharge passages for air-tightly communicating the material accommodating units with discharge outlets. Two groups of discharge outlets each for discharging an identical film formation material are arranged in one direction, in a manner such that two elongated discharge areas formed by linearly connecting the outer edges of the discharge outlets are at least partially overlapped with each other when viewed from overhead.
摘要翻译：本发明的目的是在将多个成膜材料混合在一起时容易地调节各成分的百分比，以防止成膜区域之间的偏差。真空成膜装置的成膜源包括：多个包含多个成膜材料的材料容纳单元; 多个加热装置，用于加热容纳在所述材料容纳单元内的成膜材料; 用于排出成膜材料的原子流或分子流的多个排出口; 多个排出通道，用于将材料容纳单元与排出口气密连通。两组用于排出相同的成膜材料的排出口布置在一个方向上，使得当从排出口的外边缘线性连接形成的两个细长的排出区域彼此至少部分重叠时，高架。

6. 发明申请

US20070269587A1 Film formation source, vacuum film formation apparatus, organic el panel and method of manufacturing the same 审中-公开
标题翻译：成膜源，真空成膜装置，有机EL面板及其制造方法
公开(公告)号：US20070269587A1
公开(公告)日：2007-11-22
申请号：US11715461
申请日：2007-03-08
申请人： Daisuke Masuda , Hirosi Abiko , Shigehiro Umetsu
发明人： Daisuke Masuda , Hirosi Abiko , Shigehiro Umetsu
IPC分类号： B05D5/06 , B05D5/12
CPC分类号： H01L51/001 , C23C14/12 , C23C14/243 , H01L51/0011 , H01L51/56 , Y10T428/10
摘要： A film formation source of a vacuum film formation apparatus for forming thin film on the film formation surface of a substrate includes a material accommodating unit containing a film formation material; a heater for heating the film formation material contained within the material accommodating unit; and a film formation flow control unit provided at an emission outlet of the material accommodating unit for controlling the direction of the film formation flow. The film formation flow control unit provides a strong directivity to the film formation flow with respect to the moving direction of the film formation surface relative to the film formation source.
摘要翻译：用于在基材的成膜表面上形成薄膜的真空成膜装置的成膜源包括含有成膜材料的材料容纳单元; 用于加热容纳在所述材料容纳单元内的成膜材料的加热器; 以及成膜流量控制单元，设置在所述材料容纳单元的排出口处，用于控制成膜流的方向。成膜流量控制单元相对于成膜源相对于成膜表面的移动方向对成膜流动提供强指向性。

7. 发明申请

US20060248977A1 Supporting unit, and moving table device and linear-motion guiding device using the supporting unit 失效
标题翻译：支撑单元，移动台装置和使用支撑单元的直线运动导向装置
公开(公告)号：US20060248977A1
公开(公告)日：2006-11-09
申请号：US10558686
申请日：2004-06-25
申请人： Shigehiro Umetsu , Tatsuro Shimoyama , Koji Uchida
发明人： Shigehiro Umetsu , Tatsuro Shimoyama , Koji Uchida
IPC分类号： G05G11/00
CPC分类号： G03F7/70816 , B23Q1/38 , B23Q1/545 , F16C29/02 , F16C2322/39 , G12B5/00 , Y10T74/20341 , Y10T74/20348 , Y10T74/20354
摘要： A supporting unit in a moving table device, easily connected to a base and a table, is provided. A supporting unit (Uα) has a pair of planar bearing plates. Inside the planar bearing plates are positioned spherical bearing plates, respectively. Further, a spherical axial member is sandwiched between the spherical bearing plates (34a, 34b). A planar bearing is formed between each of the planar bearing plates and each of the spherical bearing plates. A spherical bearing is formed between each of the spherical bearing plates and the spherical axial member. Thus, the supporting unit (Uα) is provided with a certain degree of movability in five-axis directions. With the high degree of movability, the supporting unit (Uα) can be easily connected to a base and a table.
摘要翻译：提供了一种移动台装置中的支撑单元，其容易地连接到基座和工作台。支撑单元（Ualpha）具有一对平面支承板。平面轴承板内分别定位有球面轴承板。此外，球面轴向构件夹在球面轴承板（34a，34b）之间。在每个平面支承板和每个球面轴承板之间形成平面轴承。在每个球面轴承板和球形轴向构件之间形成球面轴承。因此，支撑单元（Ualpha）在五轴方向上具有一定程度的可移动性。具有高度的可移动性，支撑单元（Ualpha）可以方便地连接到底座和桌子上。

8. 发明申请

US20050217584A1 Film formation source, film formation apparatus, film formation method, organic EL panel, and method of manufacturing organic EL panel 审中-公开
标题翻译：成膜源，成膜装置，成膜方法，有机EL面板以及制造有机EL面板的方法
公开(公告)号：US20050217584A1
公开(公告)日：2005-10-06
申请号：US11090048
申请日：2005-03-28
申请人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
发明人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
IPC分类号： H05B33/10 , C23C14/24 , C23C14/54 , H01L51/50 , C23C16/00
CPC分类号： C23C14/24 , C23C14/545
摘要： It is an object of the invention to continuously perform, under a desired condition and for a long time period, a film formation process capable of producing a high quality film. A film formation apparatus comprises: a discharge outlet disposed within a film formation chamber and facing a film formation surface of a substrate; a material accommodating section disposed outside the film formation chamber and having material containers each containing a film formation material; a heating device for heating the film formation material contained within the material-containers; discharge passages which are air-tightly communicated with the discharge outlet and the material accommodating section; escape passages branching from the discharge passages for diverting the film formation material flowing towards the discharge outlet. On the downstream side of the branching positions of the discharge passages as well as on the escape passages, there are provided flow restricting valves capable of shutting off or passing the film formation material or variably adjusting the flow of the film formation material.
摘要翻译：本发明的目的是在期望的条件下和长时间内连续地进行能够生产高质量薄膜的成膜方法。一种成膜装置，包括：排出口，其配置在成膜室内，面对基板的成膜面; 材料容纳部，其设置在成膜室的外侧，并且具有各自容纳成膜材料的材料容器; 用于加热容纳在所述材料容器内的成膜材料的加热装置; 与排出口和材料容纳部气密地连通的排出通路; 从排放通道分支的排出通路用于转移朝向排出口流动的成膜材料。在排出通道的分支位置的下游侧以及排出通道上，设置有能够切断或通过成膜材料或可变地调节成膜材料的流动的流动限制阀。

9. 发明授权

US07624661B2 Supporting unit, and moving table device and linear-motion guiding device that use the supporting unit 失效
标题翻译：支撑单元，移动台装置和使用支撑单元的直线运动导向装置
公开(公告)号：US07624661B2
公开(公告)日：2009-12-01
申请号：US10558686
申请日：2004-06-25
申请人： Shigehiro Umetsu , Tatsuro Shimoyama , Koji Uchida
发明人： Shigehiro Umetsu , Tatsuro Shimoyama , Koji Uchida
IPC分类号： G05G11/00
CPC分类号： G03F7/70816 , B23Q1/38 , B23Q1/545 , F16C29/02 , F16C2322/39 , G12B5/00 , Y10T74/20341 , Y10T74/20348 , Y10T74/20354
摘要： A supporting unit in a moving table device, easily connected to a base and a table, is provided. A supporting unit (Uα) has a pair of planar bearing plates. Inside the planar bearing plates are positioned spherical bearing plates, respectively. Further, a spherical axial member is sandwiched between the spherical bearing plates (34a, 34b). A planar bearing is formed between each of the planar bearing plates and each of the spherical bearing plates. A spherical bearing is formed between each of the spherical bearing plates and the spherical axial member. Thus, the supporting unit (Uα) is provided with a certain degree of movability in five-axis directions. With the high degree of movability, the supporting unit (Uα) can be easily connected to a base and a table.
摘要翻译：提供了一种移动台装置中的支撑单元，其容易地连接到基座和工作台。支撑单元（Ualpha）具有一对平面支承板。平面轴承板内分别定位有球面轴承板。此外，球面轴向构件夹在球面轴承板（34a，34b）之间。在每个平面支承板和每个球面轴承板之间形成平面轴承。在每个球面轴承板和球形轴向构件之间形成球面轴承。因此，支撑单元（Ualpha）在五轴方向上具有一定程度的可移动性。具有高度的可移动性，支撑单元（Ualpha）可以方便地连接到底座和桌子上。

10. 发明申请

US20050257745A1 Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device 审中-公开
标题翻译：成膜源，真空成膜装置，有机EL元件的制造方法以及有机EL元件
公开(公告)号：US20050257745A1
公开(公告)日：2005-11-24
申请号：US11123180
申请日：2005-05-06
申请人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
发明人： Hirosi Abiko , Daisuke Masuda , Shigehiro Umetsu
IPC分类号： H05B33/10 , C23C14/12 , C23C14/24 , C23C14/34 , C23C16/00 , H01L51/00 , H01L51/40 , H01L51/50 , H01L51/56 , H05B33/14
CPC分类号： C23C14/243 , H01L51/001 , H01L51/56
摘要： Film formation is conducted with a high level of directivity. A film formation source of a vacuum film formation apparatus, comprises a material container for housing a film forming material, heating means for heating the film forming material inside the material container, and a rectifier provided at an ejection port of the material container. In this source, the rectifier comprises a passage partitioned into fine openings, and a set directivity is obtained on the basis of the cross-sectional area Sa of each opening within the rectifier, the distance L from the ejection tip of the rectifier to the film formation target surface, and the film formation rate R for the film forming material at a point on the film formation target surface directly above the center of the rectifier.
摘要翻译：以高水平的方向性进行成膜。真空成膜装置的成膜源包括用于容纳成膜材料的材料容器，用于加热材料容器内部的成膜材料的加热装置和设置在材料容器的排出口处的整流器。在该源中，整流器包括分为细孔的通道，并且基于整流器内的每个开口的横截面积Sa，从整流器的喷射端到膜的距离L获得设定的方向性成膜靶表面，以及成膜材料在整流器中心正上方的成膜靶表面上的点的成膜速度R.

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