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    • 8. 发明申请
    • Process for preparing fluorine-containing polymer and photoresist composition
    • 制备含氟聚合物和光致抗蚀剂组合物的方法
    • US20050191578A1
    • 2005-09-01
    • US11104554
    • 2005-04-13
    • Takayuki ArakiTakuji IshikawaMeiten KohMinoru Toriumi
    • Takayuki ArakiTakuji IshikawaMeiten KohMinoru Toriumi
    • C08F4/34C08F8/00C08F214/18G03C1/492G03F7/004G03F7/039
    • C08F214/18C08F8/00C08F2800/20G03C1/492G03F7/0046G03F7/0392C08F214/26
    • There is provided a process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit derived from a fluorine-containing ethylenic monomer and/or a structural unit derived from a monomer which can provide an aliphatic ring structure in the polymer trunk chain and may have a fluorine atom, and has an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, in which the fluorine-containing ethylenic monomer and/or the monomer which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1): wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or 1; p3 is 1 or 2, and also there is provided a photoresist composition comprising the obtained polymer. The fluorine-containing polymer is excellent in transparency in a vacuum ultraviolet region, and can form an ultra fine pattern as a polymer for a photoresist, particularly for a F2 resist.
    • 提供了一种制备真空紫外线区域的透明度优异的抗蚀剂用含氟聚合物的方法,包括衍生自含氟乙烯性单体的结构单元和/或衍生自单体的结构单元,其可以提供 聚合物主链中的脂族环结构,并且可以具有氟原子,并且具有与酸或Y 2的基团反应的酸反应性基团Y 1,其可以是 转化为酸反应性基团Y 1,其中可以在聚合物主链中提供脂族环结构的含氟乙烯性单体和/或单体通过使用 由式(1)表示的有机过氧化物:其中R 50和R 51相同或不同,并且各自为具有1至30个碳原子的烃基,其可以 具有醚键(键的末端的原子不是氧原子); p1和p2相同或不同,分别为0或1; p3为1或2,并且还提供包含所得聚合物的光致抗蚀剂组合物。 含氟聚合物在真空紫外区域的透明度优异,并且可以形成作为光致抗蚀剂的聚合物的超细图案,特别是用于F2抗蚀剂。