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    • 2. 发明申请
    • Process for preparing fluorine-containing polymer and photoresist composition
    • 制备含氟聚合物和光致抗蚀剂组合物的方法
    • US20050191578A1
    • 2005-09-01
    • US11104554
    • 2005-04-13
    • Takayuki ArakiTakuji IshikawaMeiten KohMinoru Toriumi
    • Takayuki ArakiTakuji IshikawaMeiten KohMinoru Toriumi
    • C08F4/34C08F8/00C08F214/18G03C1/492G03F7/004G03F7/039
    • C08F214/18C08F8/00C08F2800/20G03C1/492G03F7/0046G03F7/0392C08F214/26
    • There is provided a process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit derived from a fluorine-containing ethylenic monomer and/or a structural unit derived from a monomer which can provide an aliphatic ring structure in the polymer trunk chain and may have a fluorine atom, and has an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, in which the fluorine-containing ethylenic monomer and/or the monomer which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1): wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or 1; p3 is 1 or 2, and also there is provided a photoresist composition comprising the obtained polymer. The fluorine-containing polymer is excellent in transparency in a vacuum ultraviolet region, and can form an ultra fine pattern as a polymer for a photoresist, particularly for a F2 resist.
    • 提供了一种制备真空紫外线区域的透明度优异的抗蚀剂用含氟聚合物的方法,包括衍生自含氟乙烯性单体的结构单元和/或衍生自单体的结构单元,其可以提供 聚合物主链中的脂族环结构,并且可以具有氟原子,并且具有与酸或Y 2的基团反应的酸反应性基团Y 1,其可以是 转化为酸反应性基团Y 1,其中可以在聚合物主链中提供脂族环结构的含氟乙烯性单体和/或单体通过使用 由式(1)表示的有机过氧化物:其中R 50和R 51相同或不同,并且各自为具有1至30个碳原子的烃基,其可以 具有醚键(键的末端的原子不是氧原子); p1和p2相同或不同,分别为0或1; p3为1或2,并且还提供包含所得聚合物的光致抗蚀剂组合物。 含氟聚合物在真空紫外区域的透明度优异,并且可以形成作为光致抗蚀剂的聚合物的超细图案,特别是用于F2抗蚀剂。
    • 6. 发明授权
    • Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    • 具有酸反应性基团的含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物
    • US06908724B2
    • 2005-06-21
    • US10262893
    • 2002-10-03
    • Takayuki ArakiMeiten KohYoshito TanakaTakuji IshikawaHirokazu AoyamaTetsuo Shimizu
    • Takayuki ArakiMeiten KohYoshito TanakaTakuji IshikawaHirokazu AoyamaTetsuo Shimizu
    • G03F7/004G03F7/038G03F7/039G03F7/075
    • G03F7/039G03F7/0045G03F7/0046G03F7/0382G03F7/0392G03F7/0395G03F7/0397G03F7/0758Y10S430/106Y10S430/108
    • There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
    • 提供了一种具有酸反应性基团的新型含氟聚合物,其具有对真空紫外区域(157nm)中的能量射线(放射线)的高透明性,并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000,由下式表示: - (M1) - (M2) - (A) - ,其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元,A是来自其它可共聚单体的结构单元,M1 / M2的摩尔比为1〜99/99〜1,聚合物的含量为1〜99% 结构单元M1的摩尔数,结构单元M2的1〜99摩尔%和结构单元A1的0〜98摩尔%。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物,并且适用于光致抗蚀剂,化学放大型抗蚀剂组合物由那些聚合物和材料获得。