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    • 1. 发明授权
    • Thin-film capacitor device and RAM device using ferroelectric film
    • 薄膜电容器和使用铁电薄膜的RAM器件
    • US5889696A
    • 1999-03-30
    • US45958
    • 1998-03-23
    • Takashi KawakuboNoburu FukushimaKazuhide Abe
    • Takashi KawakuboNoburu FukushimaKazuhide Abe
    • H01L27/10G11C11/22H01L21/8242H01L21/8246H01L27/105H01L27/108
    • G11C11/22
    • A semiconductor memory device is constituted by arranging a plurality of memory cells in a matrix format, each of which includes a thin-film capacitor having a ferroelectric film and a pair of electrodes facing each other via the ferroelectric film, and a transfer gate transistor connected to the thin film capacitor. A voltage corresponding to the width of a hysteresis curve obtained when the thin-film capacitor is saturated and polarized falls within the range of 5% or higher to 20% or lower of the voltage difference between the positive and negative directions in a writing operation. A remanent polarization amount obtained when the thin-film capacitor is saturated and polarized falls within the range of 5% or higher to 30% or lower of the total polarization amount obtained upon application of a voltage in the writing operation.
    • 半导体存储器件通过以矩阵形式布置多个存储单元而构成,每个存储单元包括具有铁电膜的薄膜电容器和经由铁电体膜相互面对的一对电极,并且连接有传输栅极晶体管 到薄膜电容器。 当薄膜电容器饱和和极化时获得的滞后曲线的宽度对应的电压落在写入操作中正负方向之间的电压差的5%以上至20%以下的范围内。 当薄膜电容器饱和和极化时获得的剩余极化量落在在写入操作中施加电压时获得的总极化量的5%以上至30%以下的范围内。
    • 2. 发明授权
    • Thin film capacitor
    • 薄膜电容器
    • US5889299A
    • 1999-03-30
    • US804394
    • 1997-02-21
    • Kazuhide AbeShuichi KomatsuMitsuaki IzuhaNoburu FukushimaKenya SanoTakashi Kawakubo
    • Kazuhide AbeShuichi KomatsuMitsuaki IzuhaNoburu FukushimaKenya SanoTakashi Kawakubo
    • H01L21/02H01L29/76
    • H01L28/55
    • A thin film capacitor including a first electrode having on its surface a (100) face of cubic system or a (001) face of tetragonal system, a dielectric thin film epitaxially grown on the first electrode and exhibiting a crystal structure which inherently belongs to a perovskite structure of cubic system, and a second electrode formed on the dielectric thin film. Further, the dielectric thin film meets the following relationship V/V.sub.0 .gtoreq.1.01 where a unit lattice volume of true perovskite crystal structure belonging to the cubic system (lattice constant a.sub.0) is represented by V.sub.0 =a.sub.0.sup.3, and a unit lattice volume (lattice constant a=b.noteq.c) which is strained toward a tetragonal system after the epitaxial growth is represented by V=a.sup.2 c, and also meets the following relationship c/a.gtoreq.1.01 where c/a represents a ratio between a lattice constant "c" in the direction thicknesswise of the film and a lattice constant "a" in the direction parallel with a plane of the film.
    • 一种薄膜电容器,包括在其表面上具有立方体系的(100)面或四方晶系的(001)面的第一电极,在第一电极上外延生长并呈现出固有地属于 立方体的钙钛矿结构,以及形成在电介质薄膜上的第二电极。 此外,电介质薄膜满足以下关系V / V0 / = 1.01,其中属于立方体系的真实钙钛矿晶体结构的单位晶格体积(晶格常数a0)由V0 = a03表示,单位晶格体积 晶格常数a = b NOTEQUAL c),其外延生长后由V = a2c表示为四方晶系,并满足以下关系c / a> / = 1.01其中c / a表示晶格常数 在膜的厚度方向上的“c”和与膜的平面平行的方向上的晶格常数“a”。
    • 5. 发明授权
    • Acoustic semiconductor device
    • 声学半导体器件
    • US08648431B2
    • 2014-02-11
    • US13220116
    • 2011-08-29
    • Kazuhide AbeTadahiro SasakiAtsuko IidaKazuhiko ItayaTakashi Kawakubo
    • Kazuhide AbeTadahiro SasakiAtsuko IidaKazuhiko ItayaTakashi Kawakubo
    • H01L29/84
    • H03J3/20H03B5/326H03H9/02566
    • According to one embodiment, an acoustic semiconductor device includes an element unit, and a first terminal. The element unit includes an acoustic resonance unit. The acoustic resonance unit includes a semiconductor crystal. An acoustic standing wave is excitable in the acoustic resonance unit and is configured to be synchronously coupled with electric charge density within at least one portion of the semiconductor crystal via deformation-potential coupling effect. The first terminal is electrically connected to the element unit. At least one selected from outputting and inputting an electrical signal is implementable via the first terminal. The electrical signal is coupled with the electric charge density. The outputting the electrical signal is from the acoustic resonance unit, and the inputting the electrical signal is into the acoustic resonance unit.
    • 根据一个实施例,声学半导体器件包括元件单元和第一端子。 元件单元包括声共振单元。 声共振单元包括半导体晶体。 声驻波在声共振单元中是可兴奋的,并且被配置为通过变形电势耦合效应与半导体晶体的至少一部分内的电荷密度同步耦合。 第一端子电连接到元件单元。 从输出和输入电信号中选出的至少一个可经由第一终端实现。 电信号与电荷密度耦合。 输出电信号来自声共振单元,并且输入电信号进入声共振单元。
    • 9. 发明授权
    • Voltage controlled oscillator
    • 压控振荡器
    • US07211933B2
    • 2007-05-01
    • US10935264
    • 2004-09-08
    • Takashi KawakuboKazuhide AbeMayumi Morizuka
    • Takashi KawakuboKazuhide AbeMayumi Morizuka
    • H01L41/08
    • H03H9/173H03B5/326H03B5/366H03H9/0542H03H2009/02204Y10T29/42Y10T29/43Y10T29/49005Y10T29/49155
    • The present invention provides a voltage controlled oscillator comprising an thin film BAW resonator and a variable capacitor element. The thin film BAW resonator includes an anchor section formed on a Si substrate, a lower electrode supported on the anchor section and positioned to face the Si substrate, a first piezoelectric film formed on the lower electrode, and an upper electrode formed on the first piezoelectric film. On the other hand, the variable capacitor element includes a stationary electrode formed on a Si substrate, an anchor section formed on the Si substrate, a first electrode supported on the anchor section and positioned to face the Si substrate, a second piezoelectric film formed on the first electrode, and a second electrode formed on the second piezoelectric film.
    • 本发明提供一种包括薄膜BAW谐振器和可变电容器元件的压控振荡器。 薄膜BAW谐振器包括形成在Si衬底上的锚定部分,支撑在锚固部分上并定位成面对Si衬底的下电极,形成在下电极上的第一压电膜,以及形成在第一压电 电影。 另一方面,可变电容器元件包括形成在Si衬底上的固定电极,形成在Si衬底上的锚定部分,支撑在锚定部分上并且定位成面对Si衬底的第一电极,形成在第二压电膜上的第二压电膜 第一电极和形成在第二压电膜上的第二电极。