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1. 发明授权

US07439504B2 Pattern inspection method and apparatus using electron beam 失效
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US07439504B2
公开(公告)日：2008-10-21
申请号：US11176344
申请日：2005-07-08
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary particles emanated from the surface of the specimen by the irradiation, signals outputted from each sensor of the plural sensors which simultaneously detect the secondary particles are added, an image of the surface of the specimen on which the pattern is obtained from the added signals, and the image is processed to detect a defect of the pattern.
摘要翻译：一种图案检查方法和装置，其中带电粒子束照射到形成有图案的样本的表面上，多个传感器同时检测通过照射从样品表面发出的二次颗粒，从每个传感器输出的信号添加同时检测二次粒子的多个传感器，从附加的信号中添加从其获得图案的样本的表面的图像，并且处理图像以检测图案的缺陷。

2. 发明授权

US06940069B2 Pattern inspection method and apparatus using electron beam 有权
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US06940069B2
公开(公告)日：2005-09-06
申请号：US10637496
申请日：2003-08-11
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： G01N23/04 , G01N23/20 , G01N23/225 , G01Q30/04 , G02F1/13 , G06T1/00 , G21K7/00 , H01J37/22 , H01J37/244 , H01J37/28 , G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： A pattern inspection method which irradiates a charged particle beam onto a surface of a specimen on which a pattern is formed, simultaneously detecting with plural sensors secondary particles emanated from the surface of the specimen by the irradiation, adding signals outputted from each sensor of the plural sensors which simultaneously detected the secondary particles, obtaining an image of the surface of the specimen on which the pattern is formed from the added signals and processing the image to detect a defect of the pattern.
摘要翻译：将带电粒子束照射在其上形成有图案的样本的表面上的图案检查方法，同时利用多个传感器检测从照射后从样品表面发出的二次粒子，从多个传感器的每个传感器输出的相加信号同时检测次级粒子的传感器，从附加的信号获得形成有图案的样本的表面的图像，并处理图像以检测图案的缺陷。

3. 发明授权

US06614022B2 Pattern inspection method and apparatus using electron beam 失效
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US06614022B2
公开(公告)日：2003-09-02
申请号：US09908713
申请日：2001-07-20
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： H01J37244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： In the detecting system for irradiating the electron beam and detecting the secondary electron thereof, an area of the detector is an important factor for high-speed detection. For the technique of the current electron optical system and detector, a detector of the area larger than a constant area is necessary and detection of 200 Msps or more by receiving limitation on the frequency inversely proportional to the area is substantially difficult. For example, for detection at 400 Msps under the condition that the required area is 4 mm square and the rate for 4 mm square is defined as 150 Msps, four discrete high-speed detectors of 2 mm square are arranged to amplify and then add the signals for A/D conversion. Otherwise, the secondary electron is sequentially inputted to the detector of 8 mm square with the secondary electron deflector, the secondary electron is detected at 100 Msps and arranged after the A/D conversion. In any case, the area of 4 mm square and rate of 400 Msps can be attained.
摘要翻译：在用于照射电子束并检测其二次电子的检测系统中，检测器的面积是高速检测的重要因素。对于当前电子光学系统和检测器的技术，需要一个大于恒定面积的区域的检测器，并且通过接收与该区域成反比的频率的限制来检测200 Msps以上是非常困难的。例如，对于在所需面积为4平方毫米，4平方毫米的速率定义为150 Msps的条件下，以400 Msps进行检测，放置4个离散高速2 mm的高速检测器，放大，然后将A / D转换。否则，二次电子依次输入到具有二次电子偏转器的8mm正方形的检测器，二次电子以100Msps检测并且在A / D转换之后排列。在任何情况下，可以获得4平方毫米的面积和400 Msps的面积。

4. 发明申请

US20050263703A1 Pattern inspection method and apparatus using electron beam 失效
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US20050263703A1
公开(公告)日：2005-12-01
申请号：US11176344
申请日：2005-07-08
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： G01N23/04 , G01N23/20 , G01N23/225 , G01Q30/04 , G02F1/13 , G06T1/00 , G21K7/00 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary particles emanated from the surface of the specimen by the irradiation, signals outputted from each sensor of the plural sensors which simultaneously detect the secondary particles are added, an image of the surface of the specimen on which the pattern is obtained from the added signals, and the image is processed to detect a defect of the pattern.
摘要翻译：一种图案检查方法和装置，其中带电粒子束照射到形成有图案的样本的表面上，多个传感器同时检测通过照射从样品表面发出的二次颗粒，从每个传感器输出的信号添加同时检测二次粒子的多个传感器，从附加的信号中添加从其获得图案的样本的表面的图像，并且处理图像以检测图案的缺陷。

5. 发明授权

US06376854B2 Method of inspecting a pattern on a substrate 有权
标题翻译：检查基板上的图案的方法
公开(公告)号：US06376854B2
公开(公告)日：2002-04-23
申请号：US09848422
申请日：2001-05-04
申请人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
发明人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
IPC分类号： G01N2188
CPC分类号： G01N21/95607
摘要： A method for inspecting a pattern formed on a substrate, includes the steps of moving a table along a first direction on which a substrate to be inspected is mounted, irradiating a converged electron beam on the substrate by scanning the converged electron beam along a second direction which is perpendicular to the first direction; detecting an electron radiated from the substrate by the irradiation of the converged electron beam in which the movement of the table and the scanning of the converged electron beam are synchronized; forming a digital image of the substrate from the detected electron; improving a quality of the digital image by filtering the digital image; and detecting a defect of a pattern formed on the substrate by using the improved quality digital image.
摘要翻译：一种用于检查形成在基板上的图案的方法，包括以下步骤：沿着安装有待检查的基板的第一方向移动工作台，通过沿第二方向扫描会聚的电子束将会聚的电子束照射在基板上其垂直于第一方向; 通过会聚电子束的照射来检测从基板辐射的电子，其中台的移动和会聚电子束的扫描同步; 从检测到的电子形成衬底的数字图像; 通过过滤数字图像来提高数字图像的质量; 以及通过使用改进的质量数字图像来检测在基板上形成的图案的缺陷。

6. 发明授权

US06236057B1 Method of inspecting pattern and apparatus thereof with a differential brightness image detection 有权
标题翻译：用差分亮度图像检测来检查图案及其装置的方法
公开(公告)号：US06236057B1
公开(公告)日：2001-05-22
申请号：US09610954
申请日：2000-07-06
申请人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
发明人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
IPC分类号： G01N2188
CPC分类号： G01N21/95607
摘要： A method and apparatus for inspecting a pattern, a first image of a first area on a sample is acquired by imaging the first area formed as a first pattern, and the first image is memorized. A second image of a second area on the sample is acquired by imaging the second area formed as a second pattern which is to be the same as the first pattern. A defect of the first pattern is detected by acquiring a differential image between the first image and the second image. The detection of the defect includes processing the differential image by using information of brightness corresponding to both of the first image and the second image.
摘要翻译：通过对形成为第一图案的第一区域进行成像，并记录第一图像来获取用于检查图案的样品的第一区域的第一图像的方法和装置。通过对形成为与第一图案相同的第二图案的第二区域成像来获取样品上的第二区域的第二图像。通过获取第一图像和第二图像之间的差分图像来检测第一图案的缺陷。缺陷的检测包括通过使用与第一图像和第二图像两者相对应的亮度的信息来处理差分图像。

7. 发明授权

US6087673A Method of inspecting pattern and apparatus thereof 失效
标题翻译：检查图案及其装置的方法
公开(公告)号：US6087673A
公开(公告)日：2000-07-11
申请号：US81636
申请日：1998-05-20
申请人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
发明人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
IPC分类号： G01N23/20 , G01N21/88 , G01N21/956 , G01N23/225 , G06T1/00 , H01L21/66
CPC分类号： G01N21/95607
摘要： In a method of inspecting a defect and an apparatus thereof, an allowable range for a gradation value of a difference image is determined for each pixel from one pixel or less of position shift quantity between two images to be compared, a variation rate in a local gradation value of an image, and a representative value of the local gradation value. Then, by comparing the gradation value of the difference image with the allowable range determined for each pixel, a pixel, on which the gradation value of the difference image is within the allowable range, is judged to be an non-defective candidate and a pixel, on which the gradation value of the difference image is beyond the allowable range, is judged to be a defective candidate. This reduces the number of false information caused by mismatches attributed to an object to be inspected and an image detecting system, such as an infinitesimal difference in pattern configuration, a difference in the gradation value, a distortion of a pattern, and a position shift, thus making it possible to detect a more minute defect.
摘要翻译：在检查缺陷的方法和装置中，针对要比较的两个图像之间的位置偏移量的一个像素或更少的像素，针对每个像素确定差分图像的灰度值的允许范围，局部变化率图像的灰度值和局部灰度值的代表值。然后，通过将差分图像的灰度值与对于每个像素确定的容许范围进行比较，将差分图像的灰度值在允许范围内的像素判断为无缺陷候选和像素，其中差分图像的灰度值超出允许范围，被判断为缺陷候选。这减少了归因于待检查对象的失配和图像检测系统引起的错误信息的数量，例如图案配置中的无穷小差异，灰度值的差异，图案的失真和位置偏移，从而可以检测到更小的缺陷。

8. 发明申请

US20060289751A1 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
公开(公告)号：US20060289751A1
公开(公告)日：2006-12-28
申请号：US11404610
申请日：2006-04-13
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami lizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami lizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G21K7/00
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

9. 发明授权

US06825480B1 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
标题翻译：带电粒子束装置和自动散光调节方法
公开(公告)号：US06825480B1
公开(公告)日：2004-11-30
申请号：US09603459
申请日：2000-06-22
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G01B1100
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.
摘要翻译：根据本发明，用于自动调整带电粒子束装置中的像散的技术。根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点来自相对较少数量的二维图像的单一操作。具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

10. 发明授权

US07348558B2 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
标题翻译：带电粒子束装置和自动散光调节方法
公开(公告)号：US07348558B2
公开(公告)日：2008-03-25
申请号：US11404610
申请日：2006-04-13
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.
摘要翻译：根据本发明，用于自动调整带电粒子束装置中的像散的技术。根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点来自相对较少数量的二维图像的单一操作。具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

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