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1. 发明授权

US08234651B2 Information processing method and apparatus using the same 有权
标题翻译：信息处理方法及使用其的装置
公开(公告)号：US08234651B2
公开(公告)日：2012-07-31
申请号：US11994513
申请日：2006-05-31
申请人： Kouichi Hayakawa
发明人： Kouichi Hayakawa
IPC分类号： G06F9/46
CPC分类号： G06F9/4881 , G06F12/109 , G06F2209/485 , G06F2212/656
摘要： A processor processes the task A and the task B sequentially, wherein the task A performs an application to generate data that should be output to or input from an HDD, and the task B controls a data input and output request to the HDD controller.
摘要翻译：处理器依次对任务A和任务B进行处理，其中任务A执行应用程序以生成应当从HDD输出或从HDD输入的数据，并且任务B控制向HDD控制器的数据输入和输出请求。

2. 发明申请

US20100019148A1 INSPECTION APPARATUS FOR CIRCUIT PATTERN 审中-公开
标题翻译：电路图检查装置
公开(公告)号：US20100019148A1
公开(公告)日：2010-01-28
申请号：US12575961
申请日：2009-10-08
申请人： Yasuhiko NARA , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
发明人： Yasuhiko NARA , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
摘要翻译：在电路图案检查装置中，当电子束照射到已经形成电路图案的具有多个芯片的基板的表面上时，检测从照射的基板产生的信号以形成图像，将形成的图像与另一图像进行比较，以便检测电路图案上的缺陷。在将电子束照射到芯片或多个芯片上以获取用于检查目的的图像之前，将电子束预先照射到要照射的区域上，使得要检查的基板的充电条件为任意控制

3. 发明授权

US07348558B2 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
标题翻译：带电粒子束装置和自动散光调节方法
公开(公告)号：US07348558B2
公开(公告)日：2008-03-25
申请号：US11404610
申请日：2006-04-13
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.
摘要翻译：根据本发明，用于自动调整带电粒子束装置中的像散的技术。根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点来自相对较少数量的二维图像的单一操作。具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

4. 发明申请

US20070028240A1 Information processing method and information processing apparatus for processing a plurality of threads 审中-公开
标题翻译：用于处理多个线程的信息处理方法和信息处理装置
公开(公告)号：US20070028240A1
公开(公告)日：2007-02-01
申请号：US11487148
申请日：2006-07-14
申请人： Kouichi Hayakawa
发明人： Kouichi Hayakawa
IPC分类号： G06F9/46
CPC分类号： G06F11/3636
摘要： A user enters a signal requesting monitoring of information related to a thread. An operating system sets a stop flag at “1” in the thread. If the thread in which the stop flag is set is being executed by a processor, its context is saved in a main memory and the thread is placed in a stopped state. If the thread in which the stop flag is set is ready to transition to a running state, the thread is stopped without restoring its context in a register. The context saved in the main memory is displayed accordingly. In other cases, the thread is not stopped. When the monitoring by the user is completed, “0” is substituted into the stop flag so that the thread in a stopped state is restored for execution.
摘要翻译：用户输入请求监视与线程有关的信息的信号。操作系统在线程中设置“1”的停止标志。如果设置了停止标志的线程正在由处理器执行，则其上下文保存在主存储器中，并且线程处于停止状态。如果设置了停止标志的线程准备转换到运行状态，则线程将停止，而不会在其寄存器中恢复其上下文。保存在主存储器中的上下文将相应显示。在其他情况下，线程不会停止。当用户的监视完成时，将“0”代入停止标志，使得处于停止状态的线程被恢复执行。

5. 发明授权

US07030394B2 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
标题翻译：带电粒子束装置和自动散光调节方法
公开(公告)号：US07030394B2
公开(公告)日：2006-04-18
申请号：US10980096
申请日：2004-11-02
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Iizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G01B11/00
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.
摘要翻译：根据本发明，用于自动调整带电粒子束装置中的像散的技术。根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点来自相对较少数量的二维图像的单一操作。具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

6. 发明申请

US20050092930A1 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
标题翻译：带电粒子束装置和自动散光调节方法
公开(公告)号：US20050092930A1
公开(公告)日：2005-05-05
申请号：US10980096
申请日：2004-11-02
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Lizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami Lizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G01R31/307 , H01J37/153 , G01K1/08 , G21K5/10 , H01J3/14 , H01J3/26 , H01J37/08
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.
摘要翻译：根据本发明，用于自动调整带电粒子束装置中的像散的技术。根据本发明的实施例可以提供一种带电粒子束装置和自动像散调节方法，其能够通过在多个像散校正量和焦点校正量中找到多个像散校正量和焦点校正量来在相对短的时间段内自动校正散光和焦点来自相对较少数量的二维图像的单一操作。具体实施例可以执行这种自动聚焦，同时最小化对受试样品造成的损害。实施例包括用于通过使用带电粒子束来进行检查，测量和以相对高的精度制造的带电粒子光学系统。

7. 发明申请

US20050043903A1 Circuit-pattern inspection apparatus 失效
标题翻译：电路图形检查装置
公开(公告)号：US20050043903A1
公开(公告)日：2005-02-24
申请号：US10896895
申请日：2004-07-23
申请人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Takashi Hiroi
发明人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Takashi Hiroi
IPC分类号： G01N21/956 , G03F1/84 , G03F1/86 , G06F19/00 , G06T1/00 , G06T7/00 , H01L21/027 , H01L21/66
CPC分类号： G06T7/001 , G01N2021/95615 , G06T2207/30148
摘要： The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a large area of the semiconductor wafer, comparison is made between dies on a wafer that are separated from each other by a distance of at least one die width. For example, when a value according to a difference between such dies exceeds a pre-determined value, an existence of the gradual changing can be confirmed.
摘要翻译：所公开的主题涉及用于检测半导体晶片的大面积上的缺陷扩展的逐渐变化的电路图案检查装置。为了检测在半导体晶片的大面积上扩展的缺陷相关状态的逐渐变化，在晶片上相互间隔至少一个管芯宽度的距离的晶片之间进行比较。例如，当根据这种模具之间的差异的值超过预定值时，可以确认逐渐变化的存在。

8. 发明申请

US20070284526A1 Inspection apparatus for circuit pattern 审中-公开
标题翻译：电路图案检查装置
公开(公告)号：US20070284526A1
公开(公告)日：2007-12-13
申请号：US11790330
申请日：2007-04-25
申请人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
发明人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
摘要翻译：在电路图案检查装置中，当电子束照射到已经形成电路图案的具有多个芯片的基板的表面上时，检测从照射的基板产生的信号以形成图像，将形成的图像与另一图像进行比较，以便检测电路图案上的缺陷。在将电子束照射到芯片或多个芯片上以获取用于检查目的的图像之前，将电子束预先照射到要照射的区域上，使得要检查的基板的充电条件为任意控制

9. 发明授权

US07223975B2 Inspection apparatus for circuit pattern 有权
公开(公告)号：US07223975B2
公开(公告)日：2007-05-29
申请号：US10843642
申请日：2004-05-12
申请人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
发明人： Yasuhiko Nara , Masaaki Nojiri , Kouichi Hayakawa , Hiroyuki Shinada , Yukio Hagita
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.

10. 发明申请

US20060289751A1 Charged particle beam apparatus and automatic astigmatism adjustment method 有权
公开(公告)号：US20060289751A1
公开(公告)日：2006-12-28
申请号：US11404610
申请日：2006-04-13
申请人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami lizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
发明人： Masahiro Watanabe , Hiroyuki Shinada , Atsuko Takafuji , Masami lizuka , Yasuhiro Gunji , Kouichi Hayakawa , Masayoshi Takeda
IPC分类号： G21K7/00
CPC分类号： G01R31/307 , H01J37/153 , H01J2237/1532 , H01J2237/216 , H01J2237/2817
摘要： According to the invention, techniques for automatically adjusting for astigmatism in a charged particle beam apparatus. Embodiments according to the present invention can provide a charged particle beam apparatus and an automatic astigmatism adjustment methods capable of automatically correcting astigmatism and a focal point in a relatively short period of time by finding a plurality of astigmatism correction quantities and a focal point correction quantity in a single operation from a relatively small number of 2 dimensional images. Specific embodiments can perform such automatic focusing while minimizing damages inflicted on subject samples. Embodiments include, among others, a charged particle optical system for carrying out an inspection, a measurement and a fabrication with a relatively high degree of accuracy by using a charged particle beam.

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