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1. 发明授权

US4412236A Color solid-state imager 失效
标题翻译：彩色固态成像仪
公开(公告)号：US4412236A
公开(公告)日：1983-10-25
申请号：US180042
申请日：1980-08-21
申请人： Akira Sasano , Toshio Nakano , Ken Tsutsui , Michiaki Hashimoto , Tadao Kaneko , Norio Koike , Akiya Izumi
发明人： Akira Sasano , Toshio Nakano , Ken Tsutsui , Michiaki Hashimoto , Tadao Kaneko , Norio Koike , Akiya Izumi
IPC分类号： H01L27/146 , H01L27/14 , H01L27/02 , H01L29/78
CPC分类号： H01L27/14645 , H01L27/14609 , H01L27/14621 , H01L27/14667
摘要： A color solid-state imager comprising a semiconductor body which has a photoelectric conversion function and which includes at least photosensitive elements and switching elements, and predetermined color filters which are formed on the body; characterized in that a light absorbing layer is disposed at least over a vicinity of an output terminal of each switching element. The contours of the color filters can be accurately formed, and unnecessary light can be intercepted to stabilize the electrical characteristics of the solid-state imager.
摘要翻译：一种彩色固态成像器，包括具有光电转换功能并且至少包括光敏元件和开关元件的半导体本体和形成在本体上的预定滤色器; 其特征在于，至少在每个开关元件的输出端子的附近设置光吸收层。可以精确地形成滤色器的轮廓，并且可以截取不必要的光以稳定固态成像器的电特性。

2. 发明授权

US4311773A Method of producing color filters 失效
标题翻译：生产滤色片的方法
公开(公告)号：US4311773A
公开(公告)日：1982-01-19
申请号：US120114
申请日：1980-02-11
申请人： Tadao Kaneko , Michiaki Hashimoto , Toshio Nakano , Akira Sasano
发明人： Tadao Kaneko , Michiaki Hashimoto , Toshio Nakano , Akira Sasano
IPC分类号： G03F7/00 , H01L31/0216 , G03C5/00 , G03C11/00 , G03F5/00
CPC分类号： H01L31/02162 , G03F7/0007
摘要： A method of producing color filters comprising:a step for forming a photosensitive film by coating, on a rugged substrate, a mixture of a light-absorbing material which absorbs light and which can be removed with a solvent and a photosensitive material;a step for irradiating light onto the photosensitive film through a predetermined pattern;a step for removing dissolvable portions of the photosensitive film and the light-absorbing material from the photosensitive film which remains on the substrate; anda step for dyeing the photosensitive film into any desired color.
摘要翻译：一种彩色滤光片的制造方法，其特征在于，包括：通过在粗糙基板上涂布吸收光并可用溶剂和感光材料除去的吸光材料的混合物来形成感光膜的步骤; 用于通过预定图案将光照射到感光膜上的步骤; 从保留在基板上的感光膜除去感光膜和光吸收材料的可溶解部分的步骤; 以及将感光膜染色成任何所需颜色的步骤。

3. 发明授权

US4285007A Color solid-state imager and method of making the same 失效
标题翻译：彩色固态成像仪及其制作方法
公开(公告)号：US4285007A
公开(公告)日：1981-08-18
申请号：US123085
申请日：1980-02-20
申请人： Toshio Nakano , Tadao Kaneko , Michiaki Hashimoto , Yoshio Hatano , Haruo Matsumaru , Akira Sasano , Eiichi Maruyama
发明人： Toshio Nakano , Tadao Kaneko , Michiaki Hashimoto , Yoshio Hatano , Haruo Matsumaru , Akira Sasano , Eiichi Maruyama
IPC分类号： G02B5/20 , H01L27/14 , H01L27/146 , H04N9/04
CPC分类号： H01L27/14645 , H01L27/14609 , H01L27/14621
摘要： A color solid-state imager comprises a semiconductor body over which are successively laminated a predetermined number of filter layers of any desired shape having predetermined spectral characteristics and, laminated on the filter layers, a predetermined number of layers composed of a transparent, organic high molecular material which is sensitive to radiation, the semiconductor substrate having at least a detector portion composed of an array of a plurality of optical detector elements. The method of making color solid-state imagers can be simplified by at least using the radiation-sensitive high molecular material for the intermediate layers or protection layers which are used for forming a laminate construction of color-decomposing filters.Further, in mounting the color-decomposing filters on the semiconductor substrate, it is particularly preferred to form beforehand a film of an organic high molecular material.
摘要翻译：彩色固态成像器包括半导体本体，其上依次层叠具有预定光谱特性的任意所需形状的预定数量的滤光层，并且层叠在滤光层上，预定数量的层由透明的有机高分子对辐射敏感的材料，所述半导体衬底至少具有由多个光学检测器元件的阵列组成的检测器部分。通过至少使用辐射敏感的高分子材料用于形成分色滤光片的层叠结构的中间层或保护层，可以简化制备彩色固态成像器的方法。此外，在将分色滤光片安装在半导体基板上时，特别优选预先形成有机高分子材料的膜。

4. 发明授权

US4395629A Solid-state color imager and method of manufacturing the same 失效
标题翻译：固态彩色成像仪及其制造方法
公开(公告)号：US4395629A
公开(公告)日：1983-07-26
申请号：US215073
申请日：1980-12-10
申请人： Akira Sasano , Toshio Nakano , Ken Tsutsui , Michiaki Hashimoto , Tadao Kaneko , Yoshio Taniguchi , Haruo Matsumaru , Akiya Izumi
发明人： Akira Sasano , Toshio Nakano , Ken Tsutsui , Michiaki Hashimoto , Tadao Kaneko , Yoshio Taniguchi , Haruo Matsumaru , Akiya Izumi
IPC分类号： H04N9/07 , H01L27/14 , H01L27/146 , G01J3/34
CPC分类号： H01L27/14667 , H01L27/14621 , H01L27/14645
摘要： According to a solid-state imager of this invention, in case where a plurality of color filters are disposed on a semiconductor body for the solid-state imager including a plurality of photosensitive regions and where the color filter of a third color is constructed by the overlapping between filter members of a first color and a second color, that one of the filter members which has a spectral transmittance substantially transmitting light for exposure for use in forming the filter members is arranged as a lower layer closer to a substrate of the semiconductor body. Even when the filter members are formed by the exposure process, a solid-state imager having good characteristics can be manufactured.
摘要翻译：根据本发明的固态成像器，在多个滤色器设置在包括多个感光区域的固态成像器的半导体本体上并且第三颜色的滤色器由在第一颜色和第二颜色的过滤构件之间重叠，具有基本上透射用于形成过滤构件的曝光用光的光谱透射率中的一个被布置为更靠近半导体本体的衬底的下层。即使当通过曝光处理形成过滤构件时，也可以制造具有良好特性的固态成像器。

5. 发明授权

US4430400A Method of producing color filters using dehydrating solution 失效
标题翻译：使用脱水溶液生产滤色片的方法
公开(公告)号：US4430400A
公开(公告)日：1984-02-07
申请号：US304153
申请日：1981-09-21
申请人： Toshio Nakano , Yoshio Taniguchi , Ken Tsutsui , Akira Sasano , Tadeo Kaneko , Akiya Izumi , Michiaki Hashimoto
发明人： Toshio Nakano , Yoshio Taniguchi , Ken Tsutsui , Akira Sasano , Tadeo Kaneko , Akiya Izumi , Michiaki Hashimoto
IPC分类号： G02B5/20 , G03F7/00 , H01L27/14 , H04N9/07 , G03F5/00 , G03C5/00
CPC分类号： G03F7/0007
摘要： Disclosed is a method of producing color filters, which comprises forming a layer of an organic polymeric material having a predetermined light-sensitive characteristic on a substrate, exposing this layer to a predetermined pattern, developing the exposed layer to form a filter base and dyeing the filter base, wherein after the development of the exposed layer, the layer is wetted with a dehydrating solution to remove water from the filter base. By this dehydrating treatment, the filter base can be processed with very high precision.
摘要翻译：公开了一种生产滤色器的方法，其包括在基板上形成具有预定光敏特性的有机聚合物材料层，将该层暴露于预定图案，显影曝光层以形成滤色器基底并染色过滤基底，其中在暴露层的显影之后，用脱水溶液润湿层以从过滤器基底去除水。通过该脱水处理，可以以非常高的精度对过滤器基底进行加工。

6. 发明授权

US4331506A Method of manufacturing target of image pickup tube 失效
标题翻译：摄像管目标的制造方法
公开(公告)号：US4331506A
公开(公告)日：1982-05-25
申请号：US212213
申请日：1980-12-02
申请人： Akira Sasano , Toshio Nakano , Ken Tsutsui , Chushiro Kusano , Tadaaki Hirai , Eiichi Maruyama
发明人： Akira Sasano , Toshio Nakano , Ken Tsutsui , Chushiro Kusano , Tadaaki Hirai , Eiichi Maruyama
IPC分类号： H01J9/233 , H01J31/46 , H01J31/26
CPC分类号： H01J31/46 , H01J9/233
摘要： A method of manufacturing a target of an image pickup tube comprising the steps of: forming a plurality of groups of transparent conductive signal electrodes on a transparent insulating base plate; forming a first layer on at least a portion constituting an image area of the image pickup tube, said first layer being substantially insoluble in etching liquid used for etching an insulating layer to constitute an intermediate layer insulator in a double layered interconnection structure; forming, after formation of said first layer, an insulating layer to constitute said intermediate-layer insulator; removing a predetermined portion of said insulating layer, removing said first layer together with said insulating layer located thereon; forming bus bars; and forming a photoconductive layer on said plurality of groups of the transparent conductive signal electrodes.This invention provides an excellent method for mass production.
摘要翻译：一种制造图像拾取管的目标的方法，包括以下步骤：在透明绝缘基板上形成多组透明导电信号电极; 在构成图像拾取管的图像区域的至少一部分上形成第一层，所述第一层基本上不溶于用于蚀刻绝缘层的蚀刻液，以构成双层互连结构中的中间层绝缘体; 在形成所述第一层之后形成构成所述中间层绝缘体的绝缘层; 去除所述绝缘层的预定部分，与位于其上的所述绝缘层一起去除所述第一层; 形成母线; 以及在所述多个透明导电信号电极组上形成光电导层。本发明提供了一种很好的批量生产方法。

7. 发明授权

US4273812A Method of producing material patterns by evaporating material through a perforated mask having a reinforcing bridge 失效
标题翻译：通过具有加强桥的穿孔掩模蒸发材料来生产材料图案的方法
公开(公告)号：US4273812A
公开(公告)日：1981-06-16
申请号：US8587
申请日：1979-02-01
申请人： Ken Tsutsui , Akira Sasano , Toshio Nakano , Haruo Matsumaru , Eiichi Maruyama
发明人： Ken Tsutsui , Akira Sasano , Toshio Nakano , Haruo Matsumaru , Eiichi Maruyama
IPC分类号： C23C14/04 , H05K3/14 , H05K3/10 , C23C13/00 , C23C13/02
CPC分类号： H05K3/143 , C23C14/042
摘要： A method of producing material patterns in which at least one substrate is fixed together with a mask to a substrate holder, and an evaporated film of desired substances is formed on the surface of the substrate by means of evaporation sources provided to confront the substrate. The mask is fabricated to have a plurality of reinforcing bridges formed in the desired portions of the mask openings of desired shape formed in the mask. The mask is held spaced from the substrate by a small distance during the evaporation, so that the evaporation may be effected at least through two pattern openings defined at both sides of each bridge. The evaporation is performed by means of evaporation sources which are located such that the line interconnecting one of the edges of each bridge and the evaporation source located at the same side with respect to the substantial bridging direction of the bridge and another line interconnecting the other edge of the bridge and the evaporation source located at the same side as the other edge intersect each other at a point on the surface of the substrate or in the clearance between the substrate surface and the mask. This method makes it possible to produce patterns which could never be produced by the conventional evaporation method.
摘要翻译：一种生产材料图案的方法，其中至少一个基板与掩模一起固定到基板保持器上，并且通过设置成面对基板的蒸发源在基板的表面上形成所需物质的蒸发膜。掩模被制造成具有形成在形成在掩模中的所需形状的掩模开口的所需部分中的多个加强桥。掩模在蒸发期间与衬底间隔开一小段距离，使得蒸发可以至少通过限定在每个桥的两侧的两个图案开口进行。通过蒸发源进行蒸发，所述蒸发源被定位成使得相对于桥的基本桥接方向互连每个桥的边缘之一的线和位于同一侧的蒸发源的线，另一条线与另一边相互连接和位于与另一边缘相同侧的蒸发源在基板的表面上的点处或基板表面与掩模之间的间隙中彼此相交。这种方法使得可以产生由常规蒸发方法所不能产生的图案。

8. 发明授权

US4788582A Semiconductor device and method of manufacturing the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US4788582A
公开(公告)日：1988-11-29
申请号：US929056
申请日：1986-11-10
申请人： Hideaki Yamamoto , Koichi Seki , Toshihiro Tanaka , Akira Sasano , Toshihisa Tsukada , Yasuharu Shimomoto , Toshio Nakano , Hideto Kanamori
发明人： Hideaki Yamamoto , Koichi Seki , Toshihiro Tanaka , Akira Sasano , Toshihisa Tsukada , Yasuharu Shimomoto , Toshio Nakano , Hideto Kanamori
IPC分类号： H01L31/10 , H01L27/14 , H01L31/0216 , H01L31/0224 , H01L31/04 , H01L31/18 , H01L31/20 , H01L23/48 , H01L29/04 , H01L45/00
CPC分类号： H01L31/022466 , H01L24/24 , H01L31/02164 , H01L31/1884 , H01L31/202 , H01L2924/12032 , H01L2924/12043 , Y02E10/50 , Y02P70/521 , Y10S148/147
摘要： A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interfacial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and right shielding film.
摘要翻译：诸如太阳能电池，光电二极管和固态成像装置的半导体器件包括由给定衬底上形成的非晶硅制成的半导体层和由非晶硅与直接形成在金属膜上的金属膜之间的界面反应形成的透明导电层非晶硅。该透明导电层用作器件的透明电极，如果需要，部分除去用于透明导电层的金属膜之后的剩余部分用作导电层和右屏蔽膜。

9. 发明授权

US5151385A Method of manufacturing a metallic silicide transparent electrode 失效
标题翻译：制造金属硅氧烷透明电极的方法
公开(公告)号：US5151385A
公开(公告)日：1992-09-29
申请号：US252144
申请日：1988-10-03
申请人： Hideaki Yamamoto , Koichi Seki , Toshihiro Tanaka , Akira Sasano , Toshihisa Tsukada , Yasuharu Shimomoto , Toshio Nakano , Hideto Kanamori
发明人： Hideaki Yamamoto , Koichi Seki , Toshihiro Tanaka , Akira Sasano , Toshihisa Tsukada , Yasuharu Shimomoto , Toshio Nakano , Hideto Kanamori
IPC分类号： H01L31/10 , H01L27/14 , H01L31/0216 , H01L31/0224 , H01L31/04 , H01L31/18 , H01L31/20
CPC分类号： H01L31/022466 , H01L24/24 , H01L31/02164 , H01L31/1884 , H01L31/202 , H01L2924/12032 , H01L2924/12043 , Y02E10/50 , Y02P70/521 , Y10S148/147
摘要： A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interfacial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and light shielding film.

10. 发明授权

US4387987A Method of producing solid-state color imaging devices 失效
标题翻译：生产固态彩色成像装置的方法
公开(公告)号：US4387987A
公开(公告)日：1983-06-14
申请号：US266191
申请日：1981-05-22
申请人： Norio Koike , Akira Sasano , Yoshio Taniguchi , Toshio Nakano , Masakazu Aoki , Iwao Takemoto
发明人： Norio Koike , Akira Sasano , Yoshio Taniguchi , Toshio Nakano , Masakazu Aoki , Iwao Takemoto
IPC分类号： G03F7/20 , G02B5/20 , G03F7/26 , H01L27/14 , H04N9/04 , H04N9/07 , G03B27/32 , G03B27/02
CPC分类号： H01L27/14685 , H01L27/14621 , H04N9/045
摘要： In a solid-state imaging device wherein filters of the three primary colors in the mosaic filter configuration are stacked on a solid-state imager LSI in which a plurality of picture elements each consisting of a photoelectric conversion element and a scanning element are arrayed in the shape of a matrix; a method of producing a solid-state imaging device wherein the dimensions of filter layout patterns on exposure masks for the respective colors used in case of manufacturing the color filters of:T.sub.R
摘要翻译：在固态成像装置中，将马赛克滤波器结构中的三原色滤光片堆叠在固态成像器LSI上，其中将由光电转换元件和扫描元件组成的多个像素排列在矩阵的形状; 一种制造固态成像装置的方法，其中在制造滤色器的情况下用于各种颜色的曝光掩模上的滤色器布局图案的尺寸：TR

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