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    • 1. 发明授权
    • Fluid supply apparatus
    • 流体供应装置
    • US06178995B2
    • 2001-01-30
    • US09355872
    • 1999-08-05
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiYukio MinamiKouji NishinoKouji KawataNobukazu IkedaMichio Yamaji
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiYukio MinamiKouji NishinoKouji KawataNobukazu IkedaMichio Yamaji
    • G05D706
    • G05D7/0635Y10T137/7759Y10T137/7761
    • A fluid feeding apparatus includes parallel flow passages connected at their downstream side, each parallel passage including a pressure flow controller (C) for regulating the flow of fluid and a fluid changeover valve (D) for opening and closing the passage on the downstream side of the pressure flow controller. A fluid feeding control unit (B) controls the pressure flow controllers and changeover valves so that when a changeover valve is closed a control valve (1) upstream of the changeover valve is also closed to prevent a pressure buildup at the changeover valve. In addition to the control valve (1), each pressure flow controller includes an orifice (5) downstream from the control valve, a pressure detector (3) for sensing pressure (P1) in the passage at a point between the control valve and the orifice, and a calculation control unit (6) for producing a control signal Qy for controlling the drive (2) for the control valve. The calculation control unit first calculates a flow rate signal Qc=KP1, where K is a constant and P1 is the pressure sensed by the pressure detector. The calculation control unit then calculates Qy as the difference between a set point or flow rate specifying signal Qs and the calculated value Qc. Thus, the flow rate on the downstream side of the orifice is controlled by regulating the pressure P1 on the upstream side of the orifice via the control valve. The fluid feeding apparatus avoids transient overshooting at the start of fluid feeding and at fluid changeover time and is suitable for use in semiconductor manufacturing facilities and other gas supply systems where high precision is required.
    • 流体供给装置包括在其下游侧连接的平行流路,每个平行通道包括用于调节流体流动的压力流量控制器(C)和用于打开和关闭流体的下游侧的通道的流体切换阀(D) 压力流量控制器。 流体供给控制单元(B)控制压力流量控制器和切换阀,使得当切换阀关闭时,转换阀上游的控制阀(1)也被关闭以防止在转换阀处产生压力。 除了控制阀(1)之外,每个压力流量控制器包括在控制阀下游的孔口(5),压力检测器(3),用于感测通道中压力(P1)在控制阀和控制阀 孔,以及用于产生用于控制用于控制阀的驱动器(2)的控制信号Qy的计算控制单元(6)。 计算控制单元首先计算流量信号Qc = KP1,其中K是常数,P1是由压力检测器感测的压力。 计算控制单元然后计算Qy作为设定点或流量指定信号Qs与计算值Qc之间的差。 因此,通过控制阀调节孔口上游侧的压力P1来控制孔口下游侧的流量。 流体供给装置在流体供给开始时和流体切换时间期间避免瞬时过冲,并且适用于需要高精度的半导体制造设备和其它气体供应系统。
    • 2. 发明授权
    • Pressure-type flow rate control apparatus
    • 压力式流量控制装置
    • US06152168A
    • 2000-11-28
    • US284352
    • 1999-05-24
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiTomio UnoKouji NishinoHiroyuki FukudaNobukazu IkedaMichio Yamaji
    • Tadahiro OhmiTetu KagazumeKazuhiko SugiyamaRyousuke DohiTomio UnoKouji NishinoHiroyuki FukudaNobukazu IkedaMichio Yamaji
    • F16K17/22G05D7/06
    • G05D7/0647Y10T137/7759Y10T137/7761
    • A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q=KP1 (K=constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves a variable orifice wherein the gap is adjusted by the orifice drive.
    • PCT No.PCT / JP98 / 03620 Sec。 371日期1999年5月24日 102(e)日期1999年5月24日PCT提交1998年8月13日PCT公布。 公开号WO99 /​​ 09463 日期1999年2月25日一种特别用于半导体制造设备中的气体供给系统的压力式流量控制装置。 流量控制装置设置有可变孔口,其允许容易地切换流体流量控制范围以及压力型流量控制装置的尺寸减小,并且提供其它优点,包括改进的气体替换性,防止灰尘 形成和降低流量控制系统的制造成本。 该装置包括孔口,设置在孔口的上游侧的控制阀,设置在控制阀和孔口之间的压力检测器,以及控制单元,用于根据检测到的压力P1计算流体流量Q 压力检测器具有等式Q = KP1(K =常数),并且在控制阀的驱动器中输出设定流量信号Qs和计算流量信号Q之间的差作为控制信号Qy,其中压力P1 on 孔口的上游侧通过致动用于控制孔口下游流体的流速的控制阀来调节,孔口上游侧的压力P1与保持在不同的孔口的下游压力P2之间的比率P2 / P1 高于受控流体的临界压力的比例,其特征在于,直接触摸式金属隔膜阀单元用作孔口,并且阀海之间的环形间隙 并且隔膜用于可变孔口,其中间隙由孔口驱动器调节。
    • 7. 发明授权
    • Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers
    • 用于检测压力型流量控制器孔堵塞的方法和装置
    • US06302130B1
    • 2001-10-16
    • US09529985
    • 2000-07-18
    • Tadahiro OhmiSeiichi IidaSatoshi KagatsumeJun HiroseKouji NishinoNobukazu IkedaMichio YamajiRyousuke DohiKazuhiro YoshikawaMutsunori KoyomogiTomio UnoEiji IdetaTakashi Hirose
    • Tadahiro OhmiSeiichi IidaSatoshi KagatsumeJun HiroseKouji NishinoNobukazu IkedaMichio YamajiRyousuke DohiKazuhiro YoshikawaMutsunori KoyomogiTomio UnoEiji IdetaTakashi Hirose
    • F17D116
    • G05D7/0635Y10T137/0396Y10T137/7759Y10T137/7761Y10T137/8326
    • A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting clogging of an orifice in a pressure-type flow rate controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween, and a flow rate setting circuit (32) wherein, with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated with the equation QC=KP1 (K=constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS. The apparatus comprises: a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P1 measured with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) not clogged, a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P1 with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) in the actual conditions, a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t), and an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.
    • 一种用于通过测量上游侧压力而不破坏使用孔口的流量控制单元中的管道系统来检测孔口堵塞的方法和装置,以延长流量控制单元的寿命并提高其安全性。 检测压力型流量控制器中的孔口堵塞的装置具有控制阀(CV),用于测量其上游压力P1的孔口(2),压力检测器(14)和流量设定电路 (32)其中,在上游压力P1保持大于下游压力P2的两倍或更多倍的情况下,下游流量QC用等式QC = KP1(K =常数)计算,并且其中控制阀(CV)为 由计算流量QC和设定流量QS之间的差分信号QY控制。 该装置包括:存储存储器M,存储以从高设定流量QSH切换到低设定流量QSL的流量测量的上游压力P1的标准压力衰减数据Y(t),其中孔口(2)没有堵塞 ,用于确定上游压力P1的压力衰减数据P(t)的压力检测器(14),其中流量从高设定流量QSH切换到具有孔口(2)的低设定流量QSL 实际情况是用于根据标准压力衰减数据Y(t)检测压力衰减数据P(t)的中央处理单元CPU以及当压力衰减数据P(t)偏离时引起堵塞报警的报​​警电路(46) 从标准压力衰减数据Y(t)到特定程度或以上。