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1. 发明授权

US06302130B1 Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers 有权
标题翻译：用于检测压力型流量控制器孔堵塞的方法和装置
公开(公告)号：US06302130B1
公开(公告)日：2001-10-16
申请号：US09529985
申请日：2000-07-18
申请人： Tadahiro Ohmi , Seiichi Iida , Satoshi Kagatsume , Jun Hirose , Kouji Nishino , Nobukazu Ikeda , Michio Yamaji , Ryousuke Dohi , Kazuhiro Yoshikawa , Mutsunori Koyomogi , Tomio Uno , Eiji Ideta , Takashi Hirose
发明人： Tadahiro Ohmi , Seiichi Iida , Satoshi Kagatsume , Jun Hirose , Kouji Nishino , Nobukazu Ikeda , Michio Yamaji , Ryousuke Dohi , Kazuhiro Yoshikawa , Mutsunori Koyomogi , Tomio Uno , Eiji Ideta , Takashi Hirose
IPC分类号： F17D116
CPC分类号： G05D7/0635 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/8326
摘要： A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting clogging of an orifice in a pressure-type flow rate controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween, and a flow rate setting circuit (32) wherein, with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated with the equation QC=KP1 (K=constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS. The apparatus comprises: a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P1 measured with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) not clogged, a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P1 with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) in the actual conditions, a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t), and an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.
摘要翻译：一种用于通过测量上游侧压力而不破坏使用孔口的流量控制单元中的管道系统来检测孔口堵塞的方法和装置，以延长流量控制单元的寿命并提高其安全性。检测压力型流量控制器中的孔口堵塞的装置具有控制阀（CV），用于测量其上游压力P1的孔口（2），压力检测器（14）和流量设定电路（32）其中，在上游压力P1保持大于下游压力P2的两倍或更多倍的情况下，下游流量QC用等式QC = KP1（K =常数）计算，并且其中控制阀（CV）为由计算流量QC和设定流量QS之间的差分信号QY控制。该装置包括：存储存储器M，存储以从高设定流量QSH切换到低设定流量QSL的流量测量的上游压力P1的标准压力衰减数据Y（t），其中孔口（2）没有堵塞，用于确定上游压力P1的压力衰减数据P（t）的压力检测器（14），其中流量从高设定流量QSH切换到具有孔口（2）的低设定流量QSL 实际情况是用于根据标准压力衰减数据Y（t）检测压力衰减数据P（t）的中央处理单元CPU以及当压力衰减数据P（t）偏离时引起堵塞报警的报警电路（46）从标准压力衰减数据Y（t）到特定程度或以上。

2. 发明授权

US06289923B1 Gas supply system equipped with pressure-type flow rate control unit 有权
标题翻译：供气系统配有压力式流量控制单元
公开(公告)号：US06289923B1
公开(公告)日：2001-09-18
申请号：US09463514
申请日：2000-06-02
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Nobukazu Ikeda , Kouji Nishino , Kazuhiro Yoshikawa , Eiji Ideta , Ryousuke Dohi , Tomio Uno , Michio Yamaji
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Nobukazu Ikeda , Kouji Nishino , Kazuhiro Yoshikawa , Eiji Ideta , Ryousuke Dohi , Tomio Uno , Michio Yamaji
IPC分类号： G05D706
CPC分类号： G05D7/0635 , Y10T137/7759 , Y10T137/7761
摘要： An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency. The gas supply system equipped with a pressure-type flow rate control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream side pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc=KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.
摘要翻译：公开了一种改进的，尺寸较小的低成本的气体供应系统，其配备有例如半导体制造设备中使用的压力式流量控制单元。提高瞬态流量特性，防止气体开始时气体过冲，提高设备的流量控制精度和可靠性。这消除了产品或半导体的不均匀性并提高了生产效率。配置有压力式流量控制单元的气体供给系统被配置为使得在孔口的上游侧的压力保持为比下游侧压力高大约两倍或更多的气体，气体流量被控制以供应气体通过孔口相关阀进行气体使用过程，所述气体供应系统包括用于接收来自气体供应源的气体的控制阀，设置在控制阀的下游侧的孔附件阀，设置在控制阀之间的压力检测器所述控制阀和所述节流孔相关阀，设置在所述节流阀相关阀的阀机构的下游侧的孔口和计算控制单元，其中，基于由所述压力检测器检测到的压力P1，流量Qc 用公式Qc = KP1（K：常数）计算，然后输入流量指定信号Qs和计算流量Qc之间的差作为控制信号Qy i n是用于控制阀的驱动器，由此调节用于调节压力P1的控制阀的打开，从而可以控制供给气体的流量。

3. 发明授权

US06606912B2 Structure or construction for mounting a pressure detector 有权
标题翻译：用于安装压力检测器的结构或结构
公开(公告)号：US06606912B2
公开(公告)日：2003-08-19
申请号：US09825340
申请日：2001-04-04
申请人： Tadahiro Ohmi , Takashi Hirose , Eiji Ideta , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Kazuhiro Yoshikawa , Satoshi Kagatsume , Jun Hirose , Kazuo Fukasawa , Hiroshi Koizumi , Hideki Nagaoka
发明人： Tadahiro Ohmi , Takashi Hirose , Eiji Ideta , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino , Kazuhiro Yoshikawa , Satoshi Kagatsume , Jun Hirose , Kazuo Fukasawa , Hiroshi Koizumi , Hideki Nagaoka
IPC分类号： G01L700
CPC分类号： G01L19/0023 , G01L19/0645 , G01L19/145 , G01L19/147
摘要： A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole. The presser member is brought in contact with a block upper surface of the diaphragm base, and the gasket is also brought in contact with the block lower surface of the diaphragm base. A shallow groove is defined in the form of a ring on the lower surface of the block at a place inward of the portion contacting the metal gasket so that the shallow groove absorbs strain caused by the presser member.
摘要翻译：用于安装压力检测器的结构防止了检测器膜片被施加到压力检测器上的应力而被应变，因为检测器安装在设置在管线等中的夹具主体中，从而保持了输出特性和温度特性检测器在安装前后差异很大。压力检测器通过将具有隔膜的膜片基座和具有传感器元件的传感器基座组合并紧固在一起而构成，该传感器基座通过隔膜基座的位移而被激活。压力检测器，其上放置有垫圈，设置在安装在管道中的固定装置本体的安装孔中。压力检测器通过从安装孔中从上方插入的压紧构件气密地按压并紧固。压板构件与隔膜基座的块上表面接触，并且垫圈也与隔膜基座的块下表面接触。浅槽在块体的下表面上在与金属垫片接触的部分的内侧的位置处以环的形式限定，使得浅槽吸收由压紧构件引起的应变。

4. 发明授权

US06408879B1 Fluid control device 失效
公开(公告)号：US06408879B1
公开(公告)日：2002-06-25
申请号：US09127817
申请日：1998-08-03
申请人： Tadahiro Ohmi , Yukio Minami , Akihiro Morimoto , Nobukazu Ikeda , Keiji Hirao , Takashi Hirose , Michio Yamaji , Kazuhiro Yoshikawa
发明人： Tadahiro Ohmi , Yukio Minami , Akihiro Morimoto , Nobukazu Ikeda , Keiji Hirao , Takashi Hirose , Michio Yamaji , Kazuhiro Yoshikawa
IPC分类号： F16K1100
CPC分类号： F16K27/003 , Y10T137/87684
摘要： A fluid control device comprises a first passageway, and a second passageway communicating therewith and having a terminating end closed with a fluid control unit or instrument. The first passageway is adapted to pass a fluid therethrough with a different fluid remaining in the second passageway. The first passageway comprises an upstream portion and a downstream portion communicating with the upstream portion at an approximate right angle therewith. The second passageway extends from a terminating end of the upstream portion of the first passageway in alignment with the upstream portion.

5. 发明授权

US5720505A Pipe joint 失效
标题翻译：管接头
公开(公告)号：US5720505A
公开(公告)日：1998-02-24
申请号：US648501
申请日：1996-05-15
申请人： Tadahiro Ohmi , Michio Yamaji , Nobukazu Ikeda , Tsutomu Shinohara , Kazuhiro Yoshikawa , Tetsuya Kojima
发明人： Tadahiro Ohmi , Michio Yamaji , Nobukazu Ikeda , Tsutomu Shinohara , Kazuhiro Yoshikawa , Tetsuya Kojima
IPC分类号： F16L19/02 , F16L19/03 , F16L27/08 , F16L25/00
CPC分类号： F16L19/0218 , F16L19/0212 , Y10S285/906 , Y10S285/917
摘要： A pipe joint comprises a pair of tubular joint members, an annular gasket interposed between abutting end faces of the joint members, and a nut for joining the joint members. A seal projection is formed on the abutting end face of each joint member at a position radially outward of an inner periphery of the end face. When an end of the seal projection is brought into contact with an end face of the gasket by tightening the nut, a clearance is formed between an outer flat portion of the abutting end face of each joint member and the gasket end face opposed thereto. The clearance is greater than a clearance between an inner flat portion of the abutting end face of each joint member and the gasket end face opposed thereto, and is eliminated when the nut is completely tightened up.
摘要翻译：管接头包括一对管状接头构件，插入在接头构件的邻接端面之间的环形垫圈和用于接合接头构件的螺母。在端面的内周的径向外侧的位置的每个接合构件的邻接端面上形成有密封突起。当通过拧紧螺母将密封突起的端部与垫圈的端面接触时，在每个接头构件的邻接端面的外部平坦部分和与其相对的垫圈端面之间形成间隙。间隙大于每个接头构件的邻接端面的内部平坦部分和与其相对的垫圈端面之间的间隙，并且在螺母完全拧紧时消除。

6. 发明授权

US5427357A Control valve 失效
标题翻译：控制阀
公开(公告)号：US5427357A
公开(公告)日：1995-06-27
申请号：US209906
申请日：1994-03-14
申请人： Mutsunori Koyomogi , Kunihiko Daido , Masahiko Nakazawa , Yukio Minami , Masahiko Sogao , Kazuhiro Yoshikawa , Shuhei Ogawa , Tetsuya Kojima
发明人： Mutsunori Koyomogi , Kunihiko Daido , Masahiko Nakazawa , Yukio Minami , Masahiko Sogao , Kazuhiro Yoshikawa , Shuhei Ogawa , Tetsuya Kojima
IPC分类号： F16K1/10 , F16K41/10 , F16K3/00
CPC分类号： F16K41/10 , F16K1/10 , Y10T137/6416
摘要： A control valve comprises a valve body having a fluid channel and a valve seat; a valve operating part; a valve stem supporting member having its upper end fixed to the valve operating part and its lower end fixed to the valve body; a valve stem penetrating the valve stem supporting member and having its upper end part connected to the valve operating part and its lower end part entering the valve body, the valve stem being movable upward or downward by the valve operating part; and a valve element attached to the lower end of the valve stem. The valve element is moved upward or downward by moving the valve stem upward or downward, the valve element being brought into contact with and seated in the valve seat to close a fluid channel as it is moved downward, the valve element being detached from the valve seat to open the fluid channel as it is moved upward. The valve stem supporting member has an upper tubular body and a lower tubular body, the upper tubular body having its upper end fixed to the valve operating part and its lower end detached from the valve body, the lower tubular body having its lower end fixed to the valve body and its upper end detached from the valve operating part, the two tubular bodies being spaced apart each other, the lower end part of the upper tubular body and the upper end part of the lower tubular body being connected by a connecting member.
摘要翻译：控制阀包括具有流体通道和阀座的阀体; 阀门操作部分; 阀杆支撑构件，其上端固定到阀操作部分，其下端固定到阀体; 阀杆贯穿阀杆支撑构件，其上端部分连接到阀操作部分，其下端部分进入阀体，阀杆可由阀操作部件向上或向下移动; 以及附接到阀杆的下端的阀元件。阀元件通过向上或向下移动阀杆而向上或向下移动，阀元件与阀座接触并安置在阀座中，以在其向下移动时闭合流体通道，阀元件从阀门拆下座椅向上移动以打开流体通道。阀杆支撑构件具有上管状体和下管状体，上管状体的上端固定到阀操作部分，其下端与阀体分离，下管状体的下端固定到阀体及其上端与阀操作部分脱离，两个管状体彼此间隔开，上管状体的下端部和下管状体的上端部通过连接部件连接。

7. 发明授权

US5379982A Control valve 失效
标题翻译：控制阀
公开(公告)号：US5379982A
公开(公告)日：1995-01-10
申请号：US209903
申请日：1994-03-14
申请人： Mutsunori Koyomogi , Yukio Minami , Masahiko Nakazawa , Kazuhiro Yoshikawa , Tetsuya Kojima
发明人： Mutsunori Koyomogi , Yukio Minami , Masahiko Nakazawa , Kazuhiro Yoshikawa , Tetsuya Kojima
IPC分类号： F16K1/00 , F16K1/10 , F16K41/10 , F16K51/00 , F16K49/00
CPC分类号： F16K41/10 , F16K1/10 , Y10T137/7036
摘要： A control valve comprises a valve body having a fluid channel and a valve seat; a valve operating part; a valve stem supporting member having its upper end fixed to the valve operating part and its lower end fixed to the valve body; a valve stem penetrating the valve stem supporting member and having its upper end part connected to the valve operating part and its lower end part entering the valve body, the valve stem being movable upward or downward by the valve operating part; and a valve element attached to the lower end of the valve stem. The valve element is moved upward or downward by moving the valve stem upward or downward, the valve element being brought into contact with and seated in the valve seat to close a fluid channel as it is moved downward, the valve element being detached from the valve seat to open the fluid channel as it is moved upward. The valve stem comprises an upper bar-shaped member of metal connected to the valve operating member and a lower bar-shaped member made of a fiber reinforced plastic to which the valve element is attached. The upper and lower bar-shaped members are movable upward from a lower end position where the valve element is in a fully open state. The lower bar-shaped member is stop from moving upward at an upper end position where the valve element is in a fully open state. An uppward moving distance of the upper bar-shaped member from a lower end position is made longer than a moving distance of the lower bar-shaped member from the lower end position to the upper end position.
摘要翻译：控制阀包括具有流体通道和阀座的阀体; 阀门操作部分; 阀杆支撑构件，其上端固定到阀操作部分，其下端固定到阀体; 阀杆贯穿阀杆支撑构件，其上端部分连接到阀操作部分，其下端部分进入阀体，阀杆可由阀操作部件向上或向下移动; 以及附接到阀杆的下端的阀元件。阀元件通过向上或向下移动阀杆而向上或向下移动，阀元件与阀座接触并安置在阀座中，以在其向下移动时闭合流体通道，阀元件从阀门拆下座椅向上移动以打开流体通道。阀杆包括连接到阀操作构件的上部金属板状金属构件和由附着有阀元件的纤维增强塑料制成的下部杆状构件。上下条形构件可从阀元件处于完全打开状态的下端位置向上移动。下阀杆件在阀元件处于完全打开状态的上端位置处停止向上移动。上部条形构件从下端位置向上的移动距离比下部杆形构件从下端位置到上端位置的移动距离长。

8. 发明申请

US20120125376A1 WET PROCESSING APPARATUS AND WET PROCESSING METHOD 审中-公开
标题翻译：湿处理装置和湿处理方法
公开(公告)号：US20120125376A1
公开(公告)日：2012-05-24
申请号：US13381424
申请日：2010-05-27
申请人： Tadahiro Ohmi , Tetsuya Goto , Takaaki Matsuoka , Takenao Nemoto , Yoriyuki Murakawa , Kazuhiro Yoshikawa
发明人： Tadahiro Ohmi , Tetsuya Goto , Takaaki Matsuoka , Takenao Nemoto , Yoriyuki Murakawa , Kazuhiro Yoshikawa
IPC分类号： B08B7/00
CPC分类号： H01L21/67051 , H01L21/6708 , H01L21/6838
摘要： A wet processing apparatus holds on a stage a substrate to be processed and carries out a wet treatment by rotating the stage. The substrate is held by the stage, with the center of the substrate being offset from the rotation center of the stage, using a Bernoulli chuck which causes an inert gas to flow to a back surface of the substrate, so that the substrate is eccentrically rotated along with the rotation of the stage. A first gas supply passage which is used for the Bernoulli chuck is provided at a rotation shaft portion in the stage and the stage is also provided with second gas supply passages which communicate with the first gas supply passage to thereby introduce the inert gas to the back surface of the substrate. The second gas supply passages are axisymmetric with respect to a central axis of the substrate.
摘要翻译：湿式处理装置在待处理的基板的台上保持，并通过旋转台进行湿处理。基板由载物台保持，其中基板的中心偏离载物台的旋转中心，使用伯努利卡盘，其使惰性气体流到基板的背面，使得基板偏心旋转以及舞台的旋转。用于伯努利卡盘的第一气体供给通道设置在舞台的旋转轴部分，舞台还设置有与第一气体供给通道连通的第二气体供给通道，从而将惰性气体引入到背部基板的表面。第二气体供给通道相对于基板的中心轴线是对称的。

9. 发明授权

US09240505B2 Method of etching backside Si substrate of SOI substrate to expose SiO2 layer using fluonitric acid 有权
标题翻译：用SOI衬底蚀刻Si衬底以使用氟硝酸曝光SiO 2层的方法
公开(公告)号：US09240505B2
公开(公告)日：2016-01-19
申请号：US13883828
申请日：2011-10-28
申请人： Tadahiro Ohmi , Tomotsugu Ohashi , Kazuhiro Yoshikawa , Tatsuro Yoshida , Teppei Uchimura , Kazuki Soeda , Shigetoshi Sugawa
发明人： Tadahiro Ohmi , Tomotsugu Ohashi , Kazuhiro Yoshikawa , Tatsuro Yoshida , Teppei Uchimura , Kazuki Soeda , Shigetoshi Sugawa
IPC分类号： H01L21/00 , H01L21/20 , H01L31/0248 , H01L21/306 , H01L21/67 , H01L29/786 , H01L27/146
CPC分类号： H01L31/0248 , H01L21/30604 , H01L21/6708 , H01L27/1464 , H01L29/78603
摘要： A method of etching capable of rapidly and flatly performing wet etching on a Si substrate using fluonitric acid represented by HF(a)HNO3(b)H2O(c) (where the unit of a, b and c is wt % and a+b+c=100). The etching rate of an SiO2 layer with the highly concentrated fluonitric acid is significantly lowered by the appropriate selection of its composition as compared with the etching rate of the Si substrate, and etch the Si substrate until the SiO2 layer is exposed. In this way, it is possible to rapidly etch the Si substrate and significantly enhance the flatness of the etched surface.
摘要翻译：使用HF（a）HNO 3（b）H 2 O（c）（其中a，b和c的单位为wt％和a + b）表示的氟酸，在Si衬底上快速且平坦地进行湿蚀刻的方法 + c = 100）。与Si衬底的蚀刻速率相比，通过适当选择其组成，通过适当选择具有高浓度荧光酮的SiO 2层的蚀刻速率，并且蚀刻Si衬底直至暴露SiO 2层。以这种方式，可以快速蚀刻Si衬底并显着提高蚀刻表面的平坦度。

10. 发明申请

US20130320477A1 METHOD OF ETCHING OF SOI SUBSTRATE, AND BACK-ILLUMINATED PHOTOELECTRIC CONVERSION MODULE ON SOI SUBSTRATE AND PROCESS OF MANUFACTURE THEREOF 有权
标题翻译： SOI衬底的蚀刻方法和SOI衬底上的后照明光电转换模块及其制造方法
公开(公告)号：US20130320477A1
公开(公告)日：2013-12-05
申请号：US13883828
申请日：2011-10-28
申请人： Tadahiro Ohmi , Tomotsugu Ohashi , Kazuhiro Yoshikawa , Tatsuro Yoshida , Teppei Uchimura , Kazuki Soeda , Shigetoshi Sugawa
发明人： Tadahiro Ohmi , Tomotsugu Ohashi , Kazuhiro Yoshikawa , Tatsuro Yoshida , Teppei Uchimura , Kazuki Soeda , Shigetoshi Sugawa
IPC分类号： H01L31/0248 , H01L21/306
CPC分类号： H01L31/0248 , H01L21/30604 , H01L21/6708 , H01L27/1464 , H01L29/78603
摘要： A method of etching capable of rapidly and flatly performing wet etching on a Si substrate using fluonitric acid represented by HF(a)HNO3(b)H2O(c) (where the unit of a, b and c is wt % and a+b+c=100). The etching rate of an SiO2 layer with the highly concentrated fluonitric acid is significantly lowered by the appropriate selection of its composition as compared with the etching rate of the Si substrate, and etch the Si substrate until the SiO2 layer is exposed. In this way, it is possible to rapidly etch the Si substrate and significantly enhance the flatness of the etched surface.
摘要翻译：使用HF（a）HNO 3（b）H 2 O（c）（其中a，b和c的单位为wt％和a + b）表示的氟酸，在Si衬底上快速且平坦地进行湿蚀刻的方法 + c = 100）。与Si衬底的蚀刻速率相比，通过适当选择其组成，通过适当选择具有高浓度荧光酮的SiO 2层的蚀刻速率，并且蚀刻Si衬底直至暴露SiO 2层。以这种方式，可以快速蚀刻Si衬底并显着提高蚀刻表面的平坦度。

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