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    • 1. 发明授权
    • Semiconductor integrated circuit switch matrix
    • 半导体集成电路开关矩阵
    • US08551830B2
    • 2013-10-08
    • US12110800
    • 2008-04-28
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • H01L21/336H01L21/8234
    • H01L27/12H01L21/8221H01L27/0688Y10S257/903
    • There is provided a small-type semiconductor integrated circuit whose circuit area is small and whose wiring length is short. The semiconductor integrated circuit is constructed in a multi-layer structure and is provided with a first semiconductor layer, a first semiconductor layer transistor formed in the first semiconductor layer, a wiring layer which is deposited on the first semiconductor layer and in which metal wires are formed, a second semiconductor layer deposited on the wiring layer and a second semiconductor layer transistor formed in the second semiconductor layer. It is noted that insulation of a gate insulating film of the first semiconductor layer transistor is almost equal with that of a gate insulating film of the second semiconductor layer transistor and the gate insulating film of the second semiconductor layer transistor is formed by means of radical oxidation or radical nitridation.
    • 提供电路面积小,布线长度短的小型半导体集成电路。 半导体集成电路构造为多层结构,并且设置有第一半导体层,形成在第一半导体层中的第一半导体层晶体管,布置在第一半导体层上并且其中金属线为 形成,沉积在布线层上的第二半导体层和形成在第二半导体层中的第二半导体层晶体管。 注意,第一半导体层晶体管的栅极绝缘膜的绝缘几乎等于第二半导体层晶体管的栅极绝缘膜的绝缘,并且通过自由基氧化形成第二半导体层晶体管的栅极绝缘膜 或自由基氮化。
    • 2. 发明申请
    • Semiconductor integrated circuit and manufacturing method of the same
    • 半导体集成电路及其制造方法相同
    • US20060017101A1
    • 2006-01-26
    • US11182026
    • 2005-07-15
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • H01L29/76
    • H01L27/12H01L21/8221H01L27/0688Y10S257/903
    • There is provided a small-type semiconductor integrated circuit whose circuit area is small and whose wiring length is short. The semiconductor integrated circuit is constructed in a multi-layer structure and is provided with a first semiconductor layer, a first semiconductor layer transistor formed in the first semiconductor layer, a wiring layer which is deposited on the first semiconductor layer and in which metal wires are formed, a second semiconductor layer deposited on the wiring layer and a second semiconductor layer transistor formed in the second semiconductor layer. It is noted that insulation of a gate insulating film of the first semiconductor layer transistor is almost equal with that of a gate insulating film of the second semiconductor layer transistor and the gate insulating film of the second semiconductor layer transistor is formed by means of radical oxidation or radical nitridation.
    • 提供电路面积小,布线长度短的小型半导体集成电路。 半导体集成电路构造为多层结构,并且设置有第一半导体层,形成在第一半导体层中的第一半导体层晶体管,布置在第一半导体层上并且其中金属线为 形成,沉积在布线层上的第二半导体层和形成在第二半导体层中的第二半导体层晶体管。 注意,第一半导体层晶体管的栅极绝缘膜的绝缘几乎等于第二半导体层晶体管的栅极绝缘膜的绝缘,并且通过自由基氧化形成第二半导体层晶体管的栅极绝缘膜 或自由基氮化。
    • 4. 发明申请
    • Semiconductor Integrated Circuit Switch Matrix
    • 半导体集成电路开关矩阵
    • US20080318370A1
    • 2008-12-25
    • US12110800
    • 2008-04-28
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • H01L21/336
    • H01L27/12H01L21/8221H01L27/0688Y10S257/903
    • There is provided a small-type semiconductor integrated circuit whose circuit area is small and whose wiring length is short. The semiconductor integrated circuit is constructed in a multi-layer structure and is provided with a first semiconductor layer, a first semiconductor layer transistor formed in the first semiconductor layer, a wiring layer which is deposited on the first semiconductor layer and in which metal wires are formed, a second semiconductor layer deposited on the wiring layer and a second semiconductor layer transistor formed in the second semiconductor layer. It is noted that insulation of a gate insulating film of the first semiconductor layer transistor is almost equal with that of a gate insulating film of the second semiconductor layer transistor and the gate insulating film of the second semiconductor layer transistor is formed by means of radical oxidation or radical nitridation.
    • 提供电路面积小,布线长度短的小型半导体集成电路。 半导体集成电路构造为多层结构,并且设置有第一半导体层,形成在第一半导体层中的第一半导体层晶体管,布置在第一半导体层上并且其中金属线为 形成,沉积在布线层上的第二半导体层和形成在第二半导体层中的第二半导体层晶体管。 注意,第一半导体层晶体管的栅极绝缘膜的绝缘几乎等于第二半导体层晶体管的栅极绝缘膜的绝缘,并且通过自由基氧化形成第二半导体层晶体管的栅极绝缘膜 或自由基氮化。
    • 6. 发明授权
    • Semiconductor integrated circuit switch matrix
    • 半导体集成电路开关矩阵
    • US07667276B2
    • 2010-02-23
    • US11182026
    • 2005-07-15
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • Tadahiro OhmiKoji KotaniKazuyuki MaruoTakahiro Yamaguchi
    • H01L29/76H01L29/94H01L31/062H01L31/113H01L31/119
    • H01L27/12H01L21/8221H01L27/0688Y10S257/903
    • There is provided a small-type semiconductor integrated circuit whose circuit area is small and whose wiring length is short. The semiconductor integrated circuit is constructed in a multi-layer structure and is provided with a first semiconductor layer, a first semiconductor layer transistor formed in the first semiconductor layer, a wiring layer which is deposited on the first semiconductor layer and in which metal wires are formed, a second semiconductor layer deposited on the wiring layer and a second semiconductor layer transistor formed in the second semiconductor layer. It is noted that insulation of a gate insulating film of the first semiconductor layer transistor is almost equal with that of a gate insulating film of the second semiconductor layer transistor and the gate insulating film of the second semiconductor layer transistor is formed by means of radical oxidation or radical nitridation.
    • 提供电路面积小,布线长度短的小型半导体集成电路。 半导体集成电路构造为多层结构,并且设置有第一半导体层,形成在第一半导体层中的第一半导体层晶体管,布置在第一半导体层上并且其中金属线为 形成,沉积在布线层上的第二半导体层和形成在第二半导体层中的第二半导体层晶体管。 注意,第一半导体层晶体管的栅极绝缘膜的绝缘几乎等于第二半导体层晶体管的栅极绝缘膜的绝缘,并且通过自由基氧化形成第二半导体层晶体管的栅极绝缘膜 或自由基氮化。
    • 9. 发明授权
    • Semiconductor integrated data matching circuit
    • 半导体集成数据匹配电路
    • US5661421A
    • 1997-08-26
    • US507473
    • 1995-09-29
    • Tadahiro OhmiTadashi ShibataKoji Kotani
    • Tadahiro OhmiTadashi ShibataKoji Kotani
    • G06F7/04G06G7/60G06N3/063H03K19/21A03K5/22
    • G06N3/0635
    • A semiconductor integrated circuit for effecting data matching at high speed is provided in a simple circuit. The semiconductor integrated circuit includes a first input terminal and a second input terminal to which first and second voltage signals representing first and second values are inputted, respectively, and an output terminal. A predetermined output signal is produced at the output terminal when the difference between the first and second values is smaller than a predetermined difference value. The semiconductor integrated circuit of this invention comprises first and second inverters, each inverter comprising neuron MOS transistors having a plurality of input gates. The first and second signals or, first and second processed signals obtained by applying predetermined processing to the first and second signals, are inputted to at least one of the input gates of the inverters.
    • PCT No.PCT / JP94 / 00263 Sec。 371 1995年9月29日第 102(e)1995年9月29日PCT PCT 1994年2月22日PCT公布。 WO94 / 19761 PCT出版物 日期1994年9月1日在简单的电路中提供用于高速实现数据匹配的半导体集成电路。 半导体集成电路包括分别输入表示第一和第二值的第一和第二电压信号的第一输入端和第二输入端和输出端。 当第一和第二值之间的差小于预定的差值时,在输出端产生预定的输出信号。 本发明的半导体集成电路包括第一和第二反相器,每个反相器包括具有多个输入门的神经元MOS晶体管。 通过对第一和第二信号应用预定处理而获得的第一和第二信号或第一和第二处理信号被输入至反相器的至少一个输入门。