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1. 发明授权

US4368336A Process for formylating xylene mixture 失效
标题翻译：甲酰化二甲苯混合物的方法
公开(公告)号：US4368336A
公开(公告)日：1983-01-11
申请号：US233304
申请日：1981-02-11
申请人： Susumu Fujiyama , Shunichi Matsumoto , Yuji Takamizawa
发明人： Susumu Fujiyama , Shunichi Matsumoto , Yuji Takamizawa
IPC分类号： C07C49/76 , B01J27/00 , B01J27/12 , C07B61/00 , C07C45/00 , C07C45/49 , C07C47/542 , C07C67/00
CPC分类号： C07C45/49
摘要： A xylene mixture containing at least one of m-xylene and o-xylene is formylated by carbon monoxide in the presence of hydrogen fluoride and boron trifluoride at a molar ratio of boron trifluoride to sum total of m-xylene and o-xylene in the xylene mixture of not more than 1.5 to selectively and correspondingly produce at least one of 2,4-dimethylbenzaldehyde and 3,4-dimethylbenzaldehyde.
摘要翻译：包含间二甲苯和邻二甲苯中的至少一种的二甲苯混合物在氟化氢和三氟化硼存在下，通过一氧化碳以三氟化硼的摩尔比与二甲苯中的间二甲苯和邻二甲苯的总和相加来甲酰化不超过1.5的混合物选择性地并相应地产生2,4-二甲基苯甲醛和3,4-二甲基苯甲醛中的至少一种。

2. 发明授权

US4460794A Process for continuous production of alkylbenzaldehydes 失效
标题翻译：连续生产烷基苯甲醛的方法
公开(公告)号：US4460794A
公开(公告)日：1984-07-17
申请号：US386588
申请日：1982-06-09
申请人： Susumu Fujiyama , Shunichi Matsumoto
发明人： Susumu Fujiyama , Shunichi Matsumoto
IPC分类号： B01J27/00 , C07B61/00 , C07C45/00 , C07C45/49 , C07C47/542 , C07C67/00
CPC分类号： C07C45/49
摘要： Alkylbenzaldehyde is continuously produced in high yield from alkylbenzene by formylation with carbon monoxide in the presence of HF--BF.sub.3, where the alkylbenzene, HF--BF.sub.3 and carbon monoxide under a carbon monoxide partial pressure of at least 5 kg/cm.sup.2 absolute are introduced into the reactor to continuously carry out complexing of the alkylbenzene with HF--BF.sub.3 and formylation with the carbon monoxide successively in one and same reactor.
摘要翻译：在HF-BF 3存在下，用一氧化碳进行甲酰化从烷基苯连续制备烷基苯甲醛，其中将烷基苯，HF-BF 3和一氧化碳分压为至少5kg / cm2绝对的一氧化碳引入到反应器中连续进行烷基苯与HF-BF 3的络合，并在一个反应器中依次用一氧化碳进行甲酰化反应。

3. 发明授权

US08970836B2 Defect inspecting apparatus and defect inspecting method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01N21/21 , G01N21/88 , G01B11/06
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

4. 发明申请

US20140268122A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20140268122A1
公开(公告)日：2014-09-18
申请号：US14232929
申请日：2012-06-28
申请人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/956 , G01N2201/126 , G01N2201/127 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a planarly movable table, with illumination light from an inclined direction relative to a direction of a line normal to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut.
摘要翻译：一种用于照射安装在平面可移动台上的表面图案样品上的线性区域的缺陷检查方法和装置，其具有相对于垂直于样品的线的方向的倾斜方向的照明光，接下来在多个指示从照射光照射的样品散射的光的图像，然后处理通过检测散射光的图像而获得的信号，从而检测样品上存在的缺陷; 其特征在于，所述检测多个方向的散射光图像的步骤是通过椭圆形透镜进行的，所述椭圆透镜在光学轴的仰角彼此不同的垂直于与所述表的表面法线形成的平面的一个平面内在其上安装样品和用照射光照射的线性区域的纵向方向，椭圆形透镜由其左侧和右侧部分切割的圆形透镜形成。

5. 发明授权

US08741064B2 Heat treatment method and heat treatment apparatus 有权
标题翻译：热处理方法和热处理装置
公开(公告)号：US08741064B2
公开(公告)日：2014-06-03
申请号：US13533206
申请日：2012-06-26
申请人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
发明人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
IPC分类号： C23C16/00
CPC分类号： H01L21/67309 , C21D9/0068 , C23C16/56 , H01L21/67109
摘要： A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other.
摘要翻译：衬底保持器具有两个保持器构成体，每个保持器构造体具有布置在假想圆上的多个列，以及保持各个衬底周向部分的衬底保持部。保持器构成体保持基板，使得它们的前表面或其背面朝向上方具有面向上的基板和具有面向上的后部的基板沿垂直方向交替布置。保持构造体中的至少一个沿垂直方向移动，以改变保持器构成体相对于彼此的位置。设置第一对垂直相邻的基板与它们各自的前表面彼此面对的距离，以确保处理均匀性，并且大于第二对垂直相邻基板之间的距离，并且其相应的后表面彼此面对。

6. 发明授权

US08230806B2 Heat treatment method and heat treatment apparatus wherein the substrate holder is composed of two holder constituting bodies that move relative to each other 有权
标题翻译：热处理方法和热处理装置，其中基板保持件由相对于彼此移动的两个保持器构成体构成
公开(公告)号：US08230806B2
公开(公告)日：2012-07-31
申请号：US12987406
申请日：2011-01-10
申请人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
发明人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
IPC分类号： B05B5/00 , C23C16/00
CPC分类号： H01L21/67309 , C21D9/0068 , C23C16/56 , H01L21/67109
摘要： A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates.
摘要翻译：热处理设备具有一个具有两个保持器构成体的衬底保持器，每个保持器构成体具有多个列和衬底保持部。保持器构造体中的一个保持基板，使得它们的前表面朝上，而另一个保持基板，使得它们的后表面朝上。保持器构造体中的至少一个垂直移动以改变保持器构造体相对于彼此的位置。第一对垂直相邻基板中的一个彼此相对的前表面和第一对基板之间的距离设定为确保处理均匀性并且大于第二对垂直方向之间的距离相邻的基板，其各自的后表面彼此相对，另一个是第二对基板。

7. 发明授权

US07092348B2 Optical recording apparatus capable of changing the length of synchronization portions 有权
标题翻译：能够改变同步部分的长度的光学记录装置
公开(公告)号：US07092348B2
公开(公告)日：2006-08-15
申请号：US11176339
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/24 , G11B5/09
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中，每次记录信息时，反转标记和标记之间的空格。介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于同步信号部分。

8. 发明授权

US07084990B2 Method and its apparatus for measuring size and shape of fine patterns 有权
公开(公告)号：US07084990B2
公开(公告)日：2006-08-01
申请号：US10372270
申请日：2003-02-25
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01B11/03
CPC分类号： G01B11/02 , G01B11/24
摘要： In size measurement of a semiconductor device, profiles of a pattern formed in a resist process are determined through an exposure/development simulation in respect of individual different combinations of exposure values and focus values to form a profile matrix and scattered light intensity distributions corresponding to the individual profiles are determined through calculation to form a scattered light library, thereby forming a profile library consisting of the profile matrix and scattered light library. A scattered light intensity distribution of an actually measured pattern is compared with the scattered light intensity distributions of the scattered light library and a profile of profile matrix corresponding to a scattered light intensity distribution of scattered light library having the highest coincidence is determined as a three-dimensional shape of the actually measured pattern.

9. 发明授权

US07037735B2 Apparatus and method for testing defects 失效
公开(公告)号：US07037735B2
公开(公告)日：2006-05-02
申请号：US10170378
申请日：2002-06-14
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： H01L21/66 , G01R31/26
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.

10. 发明授权

US06720117B2 Exposure mask with appended mask error data 失效
标题翻译：曝光掩模与附加的掩模错误数据
公开(公告)号：US06720117B2
公开(公告)日：2004-04-13
申请号：US10390670
申请日：2003-03-19
申请人： Shunichi Matsumoto , Yasuhiro Yoshitake , Takeshi Kato , Norio Hasegawa
发明人： Shunichi Matsumoto , Yasuhiro Yoshitake , Takeshi Kato , Norio Hasegawa
IPC分类号： G03F900
CPC分类号： G03F9/7019 , G03F9/7011 , G03F9/7084
摘要： An exposure mask includes an optically transparent substrate, a device area constituted with a pattern formed on the substrate, and alignment marks formed on the substrate. Further measurement data for relative positional displacement between the device area and the alignment marks on the substrate is appended together with information for identifying the substrate to the substrate.
摘要翻译：曝光掩模包括光学透明基板，由形成在基板上的图案构成的器件区域和形成在基板上的对准标记。将用于将衬底识别到衬底的信息附加在衬底上的器件区域和对准标记之间的相对位置位移的另外的测量数据。

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