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1. 发明申请

US20110244600A1 METHOD FOR TUNABLY REPAIRING LOW-K DIELECTRIC DAMAGE 审中-公开
公开(公告)号：US20110244600A1
公开(公告)日：2011-10-06
申请号：US13158342
申请日：2011-06-10
申请人： Stephen M. Sirard , James DeYoung , Odette Turmel
发明人： Stephen M. Sirard , James DeYoung , Odette Turmel
IPC分类号： H01L21/306
CPC分类号： H01L21/3105 , H01L21/76814 , H01L21/76826
摘要： A method for providing a tuned repair for damage to a silicon based low-k dielectric layer with organic compounds, where damage replaces a methyl attached to silicon with a hydroxyl attached to silicon is provided. A precursor gas is provided, comprising a first repair agent represented as Si—(R)x(OR′)y, where y≧1 and x+y=4, and wherein R is an alkyl or aryl group and R′ is an alkyl or aryl group and a second repair agent represented as Si—(R)x(OR′)yR″, where y≧1 and x+y=3, and wherein R is an alkyl or aryl group and R′ is an alkyl or aryl group, and R″ is of a group that reduces interfacial surface tension between a wet clean chemical and the low-k dielectric. Some of the first repair agent and second repair agent are bonded to the low-k dielectric to form a monolayer of the first repair agent and the second repair agent.

2. 发明申请

US20110097821A1 METHOD FOR TUNABLY REPAIRING LOW-K DIELECTRIC DAMAGE 有权
标题翻译：用于修复低K电介质损伤的方法
公开(公告)号：US20110097821A1
公开(公告)日：2011-04-28
申请号：US12604222
申请日：2009-10-22
申请人： Stephen M. Sirard , James DeYoung , Odette Turmel
发明人： Stephen M. Sirard , James DeYoung , Odette Turmel
IPC分类号： H01L21/30
CPC分类号： H01L21/3105 , H01L21/76814 , H01L21/76826
摘要： A method for providing a tuned repair for damage to a silicon based low-k dielectric layer with organic compounds, where damage replaces a methyl attached to silicon with a hydroxyl attached to silicon is provided. A precursor gas is provided, comprising a first repair agent represented as Si—(R)x(OR′)y, where y≧1 and x+y=4, and wherein R is an alkyl or aryl group and R′ is an alkyl or aryl group and a second repair agent represented as Si—(R)x(OR′)yR″, where y≧1 and x+y=3, and wherein R is an alkyl or aryl group and R′ is an alkyl or aryl group, and R″ is of a group that reduces interfacial surface tension between a wet clean chemical and the low-k dielectric. Some of the first repair agent and second repair agent are bonded to the low-k dielectric to form a monolayer of the first repair agent and the second repair agent.
摘要翻译：提供了一种用有机化合物对硅基低k电介质层进行损伤的调谐修复方法，其中损伤用连接到硅上的羟基连接到硅上的甲基代替。提供了前体气体，其包含以Si-（R）x（OR'）y表示的第一修复剂，其中y≥1且x + y = 4，并且其中R是烷基或芳基，R'是烷基或芳基，第二修饰剂以Si-（R）x（OR'）yR“表示，其中y≥1且x + y = 3，并且其中R是烷基或芳基，R'是烷基或芳基，并且R“是降低湿清洁化学品和低k电介质之间的界面表面张力的基团。一些第一修复剂和第二修复剂结合到低k电介质以形成第一修复剂和第二修复剂的单层。

3. 发明授权

US07981699B2 Method for tunably repairing low-k dielectric damage 有权
标题翻译：可调谐地修复低k电介质损伤的方法
公开(公告)号：US07981699B2
公开(公告)日：2011-07-19
申请号：US12604222
申请日：2009-10-22
申请人： Stephen M. Sirard , James DeYoung , Odette Turmel
发明人： Stephen M. Sirard , James DeYoung , Odette Turmel
IPC分类号： H01L21/00
CPC分类号： H01L21/3105 , H01L21/76814 , H01L21/76826
摘要： A method for providing a tuned repair for damage to a silicon based low-k dielectric layer with organic compounds, where damage replaces a methyl attached to silicon with a hydroxyl attached to silicon is provided. A precursor gas is provided, comprising a first repair agent represented as Si—(R)x(OR′)y, where y≧1 and x+y=4, and wherein R is an alkyl or aryl group and R′ is an alkyl or aryl group and a second repair agent represented as Si—(R)x(OR′)yR″, where y≧1 and x+y=3, and wherein R is an alkyl or aryl group and R′ is an alkyl or aryl group, and R″ is of a group that reduces interfacial surface tension between a wet clean chemical and the low-k dielectric. Some of the first repair agent and second repair agent are bonded to the low-k dielectric to form a monolayer of the first repair agent and the second repair agent.
摘要翻译：提供了一种用有机化合物对硅基低k电介质层进行损伤的调谐修复方法，其中损伤用连接到硅上的羟基连接到硅上的甲基代替。提供了前体气体，其包含以Si-（R）x（OR'）y表示的第一修复剂，其中y≥1且x + y = 4，并且其中R是烷基或芳基，R'是烷基或芳基，第二修饰剂以Si-（R）x（OR'）yR“表示，其中y≥1且x + y = 3，并且其中R是烷基或芳基，R'是烷基或芳基，并且R“是降低湿清洁化学品和低k电介质之间的界面表面张力的基团。一些第一修复剂和第二修复剂结合到低k电介质以形成第一修复剂和第二修复剂的单层。

4. 发明申请

US20130006351A1 POLYMER COATINGS CONTAINING DRUG POWDER OF CONTROLLED MORPHOLOGY 有权
公开(公告)号：US20130006351A1
公开(公告)日：2013-01-03
申请号：US13605904
申请日：2012-09-06
申请人： Doug Taylor , Jim McClain , Clint Smoke , Mike Cole , James DeYoung
发明人： Doug Taylor , Jim McClain , Clint Smoke , Mike Cole , James DeYoung
IPC分类号： A61F2/06 , A61P3/10 , A61P29/00 , A61P9/12 , A61P1/04 , A61K38/02 , A61K38/43 , A61P25/16 , A61K31/551 , A61K31/436 , B32B5/00 , B32B27/30 , B32B27/32 , B32B27/40 , B32B27/36 , B32B27/00 , A61K9/00
CPC分类号： A61F2/82 , A61F2210/0076 , A61F2250/0067 , A61L31/10 , A61L31/16 , A61L2300/416 , A61L2300/426 , A61L2300/606 , A61L2300/63 , A61L2420/08 , Y10T428/264 , Y10T428/265 , Y10T428/31507 , Y10T428/31544 , Y10T428/31551 , Y10T428/31663 , Y10T428/31786 , Y10T428/31935 , Y10T428/31938
摘要： A method for depositing a coating comprising a polymer and pharmaceutical agent on a substrate, comprising the following steps: discharging at least one pharmaceutical agent in a therapeutically desirable morphology in dry powder form through a first orifice; discharging at least one polymer in dry powder form through a second orifice; depositing the polymer and/or pharmaceutical particles onto said substrate, wherein an electrical potential is maintained between the substrate and the pharmaceutical and/or polymer particles, thereby forming said coating; and sintering said coating under conditions that do not substantially modify the morphology of said pharmaceutical agent.

5. 发明授权

US08298565B2 Polymer coatings containing drug powder of controlled morphology 有权
标题翻译：含有受控形态药物粉末的聚合物涂层
公开(公告)号：US08298565B2
公开(公告)日：2012-10-30
申请号：US11995687
申请日：2006-07-14
申请人： Doug Taylor , Jim McClain , Clint Smoke , Mike Cole , James DeYoung
发明人： Doug Taylor , Jim McClain , Clint Smoke , Mike Cole , James DeYoung
IPC分类号： A61F2/00 , A61K31/436 , B05D7/02
CPC分类号： A61F2/82 , A61F2210/0076 , A61F2250/0067 , A61L31/10 , A61L31/16 , A61L2300/416 , A61L2300/426 , A61L2300/606 , A61L2300/63 , A61L2420/08 , Y10T428/264 , Y10T428/265 , Y10T428/31507 , Y10T428/31544 , Y10T428/31551 , Y10T428/31663 , Y10T428/31786 , Y10T428/31935 , Y10T428/31938
摘要： A method for depositing a coating comprising a polymer and pharmaceutical agent on a substrate, comprising the following steps: discharging at least one pharmaceutical agent in a therapeutically desirable morphology in dry powder form through a first orifice; discharging at least one polymer in dry powder form through a second orifice; depositing the polymer and/or pharmaceutical particles onto the substrate, wherein an electrical potential is maintained between the substrate and the pharmaceutical and/or polymer particles, thereby forming the coating; and sintering the coating under conditions that do not substantially modify the morphology of the pharmaceutical agent.
摘要翻译：一种用于在基底上沉积包含聚合物和药剂的涂层的方法，包括以下步骤：通过第一孔排出至少一种治疗上需要的干粉形式的药剂; 通过第二孔排出至少一种干粉形式的聚合物; 将聚合物和/或药物颗粒沉积到基底上，其中在基底和药物和/或聚合物颗粒之间保持电位，从而形成涂层; 并在不显着改变药剂形态的条件下烧结涂层。

6. 发明申请

US20070154848A1 Low pH Development Solutions for Chemically Amplified Photoresists 失效
标题翻译：用于化学放大光致抗蚀剂的低pH开发解决方案
公开(公告)号：US20070154848A1
公开(公告)日：2007-07-05
申请号：US11684672
申请日：2007-03-12
申请人： Mark Wagner , James DeYoung , Merrick Miles , Chris Harbinson
发明人： Mark Wagner , James DeYoung , Merrick Miles , Chris Harbinson
IPC分类号： G03C5/00
CPC分类号： G03F7/36 , G03F7/32 , G03F7/325 , G03F7/327
摘要： A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to radiant energy causing a chemical shift to take place in the exposed portion and thereby form at least one light field region in the polymer resist layer while concurrently maintaining at least one portion of the polymer layer unexposed to the radiant energy to thereby form at least one dark field region in the polymer resist layer; (c) optionally baking the polymer resist layer; (d) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system comprising a polar group, under conditions in which the at least one light field region is preferentially removed from the substrate by the carbon dioxide solvent system as compared to the at least one dark field region; wherein the carbon dioxide solvent system comprises a first phase and a second phase, the first phase comprising carbon dioxide and the second phase comprising a polar fluid, with the at least one light field region being preferentially soluble in the polar fluid as compared to the at least one dark field region.
摘要翻译：通过以下方式进行用二氧化碳显影系统进行正色调光刻的方法：（a）提供衬底，其上形成有聚合物抗蚀剂层的衬底，（b）将至少一部分聚合物抗蚀剂层暴露于导致在暴露部分发生化学位移的辐射能，从而在聚合物抗蚀剂层中形成至少一个光场区域，同时保持聚合物层的至少一部分未暴露于辐射能，从而形成至少一个黑暗聚合物抗蚀剂层中的场区域; （c）任选地烘烤聚合物抗蚀剂层; （d）将所述聚合物抗蚀剂层与二氧化碳溶剂体系接触，所述溶剂体系包含极性基团，其中所述至少一个光场区域优选地通过二氧化碳溶剂系统从所述底物除去，至少一个暗场区域; 其中所述二氧化碳溶剂系统包括第一相和第二相，所述第一相包含二氧化碳，所述第二相包含极性流体，其中所述至少一个光场区域优先溶于极性流体中，与第至少一个暗场区域。

7. 发明申请

US20050208429A1 Low pH development solutions for chemically amplified photoresists 有权
标题翻译：用于化学放大光致抗蚀剂的低pH开发解决方案
公开(公告)号：US20050208429A1
公开(公告)日：2005-09-22
申请号：US11133077
申请日：2005-05-19
申请人： James DeYoung , James McClain
发明人： James DeYoung , James McClain
IPC分类号： G03F20060101 , G03F7/00 , G03F7/32 , G03F7/36
CPC分类号： G03F7/36 , G03F7/32 , G03F7/325 , G03F7/327
摘要： A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to radiant energy causing a chemical shift to take place in the exposed portion and thereby form at least one light field region in the polymer resist layer while concurrently maintaining at least one portion of the polymer layer unexposed to the radiant energy to thereby form at least one dark field region in the polymer resist layer; (c) optionally baking the polymer resist layer; (d) contacting the polymer resist layer to a carbon dioxide solvent system, the solvent system comprising a polar group, under conditions in which the at least one light field region is preferentially removed from the substrate by the carbon dioxide solvent system as compared to the at least one dark field region; wherein the carbon dioxide solvent system comprises a first phase and a second phase, the first phase comprising carbon dioxide and the second phase comprising a polar fluid, with the at least one light field region being preferentially soluble in the polar fluid as compared to the at least one dark field region.
摘要翻译：通过以下方式进行用二氧化碳显影系统进行正色调光刻的方法：（a）提供衬底，其上形成有聚合物抗蚀剂层的衬底，（b）将至少一部分聚合物抗蚀剂层暴露于导致在暴露部分发生化学位移的辐射能，从而在聚合物抗蚀剂层中形成至少一个光场区域，同时保持聚合物层的至少一部分未暴露于辐射能，从而形成至少一个黑暗聚合物抗蚀剂层中的场区域; （c）任选地烘烤聚合物抗蚀剂层; （d）将所述聚合物抗蚀剂层与二氧化碳溶剂体系接触，所述溶剂体系包含极性基团，其中所述至少一个光场区域优选地通过二氧化碳溶剂系统从所述底物除去，至少一个暗场区域; 其中所述二氧化碳溶剂系统包括第一相和第二相，所述第一相包含二氧化碳，所述第二相包含极性流体，其中所述至少一个光场区域优先溶于极性流体中，与第至少一个暗场区域。

8. 发明授权

US06596093B2 Methods for cleaning microelectronic structures with cyclical phase modulation 失效
公开(公告)号：US06596093B2
公开(公告)日：2003-07-22
申请号：US09951259
申请日：2001-09-13
申请人： James DeYoung , James B. McClain , Michael E. Cole , David Brainard
发明人： James DeYoung , James B. McClain , Michael E. Cole , David Brainard
IPC分类号： B08B300
CPC分类号： B08B7/0021 , C23G5/00 , H01L21/02063 , Y10S134/902 , Y10S438/906
摘要： A method of cleaning and removing water, entrained solutes and particulate matter during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing a partially fabricated integrated circuit, MEM's device, or optoelectronic device having water and entrained solutes on the substrate; (b) providing a densified (e.g., liquid or supercritical) carbon dioxide cleaning composition, the cleaning composition comprising carbon dioxide and, optionally but preferably, a cleaning adjunct; (c) immersing the surface portion in the densified carbon dioxide drying composition, and subjecting the densified carbon dioxide drying composition to cyclical phase modulation during at least a portion of the immersing step to thereby facilitating cleaning; and then (d) removing the cleaning composition from the surface portion. Process parameters are preferably controlled so that the drying composition is maintained as a homogeneous composition during the immersing step, the removing step, or both the immersing and removing step, without substantial deposition of the drying/cleaning adjunct or entrained solutes on the substrate.

9. 发明授权

US08852625B2 Coatings containing multiple drugs 有权
标题翻译：含多种药物的涂料
公开(公告)号：US08852625B2
公开(公告)日：2014-10-07
申请号：US12298459
申请日：2007-04-26
申请人： James DeYoung , Doug Taylor , Jim McClain , Clint Smoke , Mike Cole
发明人： James DeYoung , Doug Taylor , Jim McClain , Clint Smoke , Mike Cole
IPC分类号： A61L31/10 , A61L31/16
CPC分类号： A61L31/16 , A61F2/90 , A61F2210/0004 , A61F2250/0067 , A61L31/06 , A61L31/10 , A61L31/148 , A61L2300/20 , A61L2300/216 , A61L2300/236 , A61L2300/416 , A61L2300/42 , A61L2300/426 , A61L2300/602 , A61L2300/608 , A61L2300/61 , A61L2420/02 , A61L2420/06 , A61L2420/08
摘要： A method for depositing a coating comprising a polymer and at least two pharmaceutical agents on a substrate, comprising the following steps: providing a stent framework; depositing on said stent framework a first layer comprising a first pharmaceutical agent; depositing a second layer comprising a second pharmaceutical agent; Wherein said first and second pharmaceutical agents are selected from two different classes of pharmaceutical agents.
摘要翻译：一种用于在基底上沉积包含聚合物和至少两种药剂的涂层的方法，包括以下步骤：提供支架框架; 在所述支架框架上沉积包含第一药剂的第一层; 沉积包含第二药剂的第二层; 其中所述第一和第二药剂选自两种不同类型的药剂。

10. 发明授权

US08758429B2 Polymer coatings containing drug powder of controlled morphology 有权
标题翻译：含有受控形态药物粉末的聚合物涂层
公开(公告)号：US08758429B2
公开(公告)日：2014-06-24
申请号：US13605904
申请日：2012-09-06
申请人： Doug Taylor , Jim McClain , Clint Smoke , Mike Cole , James DeYoung
发明人： Doug Taylor , Jim McClain , Clint Smoke , Mike Cole , James DeYoung
IPC分类号： A61F2/06
CPC分类号： A61F2/82 , A61F2210/0076 , A61F2250/0067 , A61L31/10 , A61L31/16 , A61L2300/416 , A61L2300/426 , A61L2300/606 , A61L2300/63 , A61L2420/08 , Y10T428/264 , Y10T428/265 , Y10T428/31507 , Y10T428/31544 , Y10T428/31551 , Y10T428/31663 , Y10T428/31786 , Y10T428/31935 , Y10T428/31938
摘要： A method for depositing a coating comprising a polymer and pharmaceutical agent on a substrate, comprising the following steps: discharging at least one pharmaceutical agent in a therapeutically desirable morphology in dry powder form through a first orifice; discharging at least one polymer in dry powder form through a second orifice; depositing the polymer and/or pharmaceutical particles onto said substrate, wherein an electrical potential is maintained between the substrate and the pharmaceutical and/or polymer particles, thereby forming said coating; and sintering said coating under conditions that do not substantially modify the morphology of said pharmaceutical agent.
摘要翻译：一种用于在基底上沉积包含聚合物和药剂的涂层的方法，包括以下步骤：通过第一孔排出至少一种治疗上需要的干粉形式的药剂; 通过第二孔排出至少一种干粉形式的聚合物; 将所述聚合物和/或药物颗粒沉积到所述基底上，其中在所述基底和所述药物和/或聚合物颗粒之间保持电位，从而形成所述涂层; 并且在不显着改变所述药剂的形态的条件下烧结所述涂层。

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